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11.发明授权Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester 失效苯并内酯环化合物的重氮酯和使用重氮酯的正性光致抗蚀剂组合物和元素
公开(公告)号：US5221592A
公开(公告)日：1993-06-22
申请号：US847527
申请日：1992-03-06
IPC分类号： G03F7/022
CPC分类号： G03F7/022 , Y10S430/168
摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on the benzolactone ring compound has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.
摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中苯并内酯环化合物上的至少一个羟基已用由60至100摩尔％2的重氮磺酰氯酯化， 1,4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。
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12.发明授权Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether 失效由4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯基醚制备的聚合物
公开(公告)号：US5037949A
公开(公告)日：1991-08-06
申请号：US489448
申请日：1990-03-06
CPC分类号： C07C65/24 , C07C217/90 , C08G69/40 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/123 , C08G73/124 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)hexafluoroisopropyl]diphenyl ether.
摘要翻译： 本发明涉及显示低熔点，更好的溶解度，低介电常数，优异的热和热氧化稳定性以及改善的加工特性的新的含氟聚酰亚胺，聚酰胺酸/酯，聚酰胺，加成聚酰亚胺和酰亚胺低聚物。 本发明的产物的特征在于它们衍生自4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯醚。
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13.发明授权Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers 失效含有二（（氨基羟基苯基）六氟异丙基）二苯基醚的聚酰胺聚苯并恶唑的光致抗蚀剂组合物
公开(公告)号：US5011753A
公开(公告)日：1991-04-30
申请号：US476332
申请日：1990-02-07
CPC分类号： H01B3/303 , C08G69/26 , C08G69/32 , C08G73/22 , G02F1/133723 , G03F7/0233 , G03F7/037
摘要： Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.
摘要翻译： 衍生自至少一种选自未取代的和取代的4,4'-双[2-（4-氨基-3-羟基苯基）六氟异丙基）]二苯基醚4,4'-二胺的二胺的耐热，可成形的羟基和/或烷氧基取代的聚酰胺 ' - 双 - [2-（3-氨基-4-羟基苯基）六氟异丙基]二苯醚和二羧酸或其衍生物例如 其酸卤素或酯。 本发明的聚酰胺可以被热固化以形成对于水解，化学和辐射攻击是稳定的较高耐热性的聚苯并恶唑。 本发明的聚酰胺可以通过模制，挤出和溶剂浇铸方法形成成型制品，优选在溶剂或稀释剂的存在下，然后任选地转化成耐热不溶性聚苯并恶唑。 这些成型制品在飞机，电子和其他商业应用中是有用的，其中需要耐热，耐化学性和耐辐射性以及良好的机械和电学性能。
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14.发明授权Polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking group 失效具有至少一个含氟连接基团的聚酰胺 - 聚酰胺 - 聚酰亚胺和聚苯并恶唑 - 聚酰胺 - 聚酰亚胺聚合物
公开(公告)号：US4978733A
公开(公告)日：1990-12-18
申请号：US321024
申请日：1989-03-09
申请人： Dinesh N. Khanna
发明人： Dinesh N. Khanna
CPC分类号： C08J3/091 , C08G73/14 , C08G73/22 , C08J2379/08
摘要： The present invention provides polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymers derived therefrom with improved processing and film characteristics having incorporated into the polymeric backbone the polymeric condensation residuum of novel aromatic diamino compounds having the formula: ##STR1## wherein A is selected from the group consisting of SO.sub.2, O, S, CO, C.sub.1 to C.sub.6 alkylene, perfluoroalkylene or perfluoroarylalkylene having from 1 to 10 carbon atoms and a bond directly linking the two aromatic groups, and R is selected from the group consisting of hydrogen, hydroxy and C.sub.1 to C.sub.4 alkoxy.The PA-PA-PI polymers of this invention are prepared by reacting compounds of the above formula alone or admixed with other aromatic diamines, with carboxyphenyl trimellitimide or the acid halide or ester derivatives thereof, alone or admixed with one or more aromatic diacid chlorides and/or one or more aromatic tetracarboxylic acids or anhydrides thereof. Polybenzoxazole-polyamide-polyimide derivatives of such polymers are prepared utilizing compounds of the above formula wherein R is hydroxy or C.sub.1 to C.sub.4 alkoxy, and by subjecting the resulting alkoxy or hydroxy-substituted polyamide-polyamide-polyimide to a dehydrating and cyclizing reaction to form the oxazole linkage which gives rise to polybenzoxazole-polyamide-polyimide polymers.
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15.发明授权Polymers prepared from 4,4'-bis(2-(amino(halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether 失效由4,4'-双（2-（氨基（卤代）苯氧基苯基）六氟异丙基）二苯基醚制备的聚合物
公开(公告)号：US4925915A
公开(公告)日：1990-05-15
申请号：US124704
申请日：1987-11-24
CPC分类号： C08G69/40 , C07C217/90 , C07C65/24 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/123 , C08G73/124 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The product of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)-hexafluoroisopropyl]diphenyl ether.
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16.发明授权Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers 失效使用含有低金属含量对甲酚低聚物的光敏组合物的图像形成
公开(公告)号：US5858627A
公开(公告)日：1999-01-12
申请号：US920564
申请日：1997-08-29
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027 , G03F7/38
CPC分类号： G03F7/023 , G03F7/0236
摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。
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17.发明授权Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom 失效使用离子交换催化剂在极性溶剂中的酚醛清漆树脂中的金属离子还原，并由其制备光致抗蚀剂组合物
公开(公告)号：US5521052A
公开(公告)日：1996-05-28
申请号：US365659
申请日：1994-12-30
CPC分类号： C08G8/04 , G03F7/004 , Y10S430/106 , Y10S438/948
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了利用处理过的阴离子和阳离子交换树脂生产具有极低水平金属离子的水不溶性水溶性成膜酚醛清漆树脂的方法。 还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。
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公开(公告)号：US5130481A
公开(公告)日：1992-07-14
申请号：US645332
申请日：1991-01-04
申请人： Dinesh N. Khanna , William R. Lee
发明人： Dinesh N. Khanna , William R. Lee
IPC分类号： C07C233/75 , C07C233/76 , C07C233/80 , C07C237/40 , C07C317/40 , C07C323/42 , C08G59/44 , C08G59/54 , C08G59/62 , C08G69/26 , C08G73/10 , C08G73/14 , C08G73/22 , C08K5/20 , C08K5/32 , C08K5/372 , C08K5/41
CPC分类号： C08K5/3725 , C07C233/80 , C07C237/40 , C07C317/40 , C07C323/42 , C08G59/44 , C08G59/54 , C08G59/621 , C08G69/26 , C08G73/1039 , C08G73/14 , C08G73/22 , C08K5/20 , C08K5/32 , C08K5/41
摘要： Nitro dinitro and diamino compounds having the formula: ##STR1## wherein A is selected from the group consisting of SO.sub.2 ; O, S, CO, C.sub.1 to C.sub.6 alkylene, perfluoroalkylene or perfluoroarylalkylene having from 1 to 10 carbon atoms, and a carbon-carbon bond directly linking the two aromatic groups, R is selected from the group consisting of hydrogen, hydroxy and C.sub.1 to C.sub.4 alkoxy, and R' is selected from the group consisting of NO.sub.2 and NH.sub.2.In the most preferred embodiment, the A linking group is selected from hexafluoroisopropylidene or 1-phenyl-2,- 2,2-trifluoroethane, and R is hydroxy.The compounds of the present invention, where R' is NH.sub.2, may be used as crosslinking agents for epoxy resins and for unsaturated elastomers, or as a reactant monomer with an organic diacid or dianhydride co-reactant monomer in the preparation of polyamide, polyimide, polyamide-imide and polybenzoxazole polymers having superior thermal and mechanical properties.
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公开(公告)号：US5106720A
公开(公告)日：1992-04-21
申请号：US405493
申请日：1989-09-11
CPC分类号： C08G73/1067 , C08G73/10 , C08G73/1039 , C08G73/1064 , C08G73/1071 , C08G73/1078 , G03F7/0233 , G03F7/0387 , Y10S430/107
摘要： A base developable negative acting photoresist composition which is thermally stable, provides high resolution at short exposure times and is capable of development by means of conventional aqueous alkaline developers. The present compositions comprise an alkali soluble hydroxylated polyamide and/or polyimide binder material, a photopolymerizable compound containing at least two ethylenically-unsaturated double bonds, and a light-sensitive photoinitiator.
摘要翻译： 具有热稳定性的基底显影负性光致抗蚀剂组合物在短曝光时间下提供高分辨率，并且能够通过常规水性碱性显影剂显影。 本发明的组合物包含碱溶性羟基化聚酰胺和/或聚酰亚胺粘合剂材料，含有至少两个烯键式不饱和双键的光聚合化合物和光敏光引发剂。
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公开(公告)号：US5071948A
公开(公告)日：1991-12-10
申请号：US558739
申请日：1990-07-26
申请人： Dinesh N. Khanna
发明人： Dinesh N. Khanna
CPC分类号： C08G73/22 , C08G73/1085 , C08G73/14
摘要： The present invention provides polyamide-polyimide and polybenzoxazole-polyimide polymers derived therefrom with improved processing and film characteristics having incorporated into the polymeric backbone the polymeric condensation residuum of novel aromatic diamino compounds having the formula: ##STR1## wherein A is selected from the group consisting of SO.sub.2, O, S, CO, C.sub.1 to C.sub.6 alkyl, perfluoroalkyl or perfluoroarylalkyl having from 1 to 10 carbon atoms and a carbon-carbon double bond directly linking the two aromatic groups, and R is hydrogen.The polyamide-polyimide polymers of this invention are prepared by reacting compounds of the above formula, alone or admixed with other aromatic diamines, with one or more aromatic tetracarboxylic acids or anhydrides thereof. Polybenzoxazole-polyimide derivatives of such polyamide-polyimide.
摘要翻译： 本发明提供了聚酰胺 - 聚酰亚胺和聚苯并恶唑 - 聚酰亚胺聚合物，其具有改进的加工和膜特性，其结合到聚合物主链中，具有下式的新型芳族二氨基化合物的聚合物冷凝残留物：其中A选自 的SO 2，O，S，CO，C 1至C 6烷基，具有1至10个碳原子的全氟烷基或全氟芳基烷基和直接连接两个芳族基团的碳 - 碳双键，R为氢。 本发明的聚酰胺 - 聚酰亚胺聚合物通过使单独或与其它芳族二胺混合的上述化合物与一种或多种芳族四羧酸或其酸酐反应来制备。 这种聚酰胺 - 聚酰亚胺的聚苯并恶唑 - 聚酰亚胺衍生物。
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