公开(公告)号：US10816486B2

公开(公告)日：2020-10-27

申请号：US16364163

申请日：2019-03-25

Applicant: KLA-Tencor Corporation

Inventor： Nikolay Artemiev ,  Antonio Gellineau ,  Alexander Bykanov ,  Alexander Kuznetsov

IPC: G01N23/207 ,  G01N23/20008

Abstract: Multilayer targets enabling fast and accurate, absolute calibration and alignment of X-ray based measurement systems are described herein. The multilayer calibration targets have very high diffraction efficiency and are manufactured using fast, low cost production techniques. Each target includes a multilayer structure built up with pairs of X-ray transparent and X-ray absorbing materials. The layers of the multilayer target structure is oriented parallel to an incident X-ray beam. Measured diffraction patterns indicate misalignment in position and orientation between the incident X-Ray beam and the multilayer target. In another aspect, a composite multilayer target includes at least two multilayer structures arranged adjacent one another along a direction aligned with the incident X-ray beam, adjacent one another along a direction perpendicular to the incident X-ray beam, or a combination thereof. In some embodiments, the multilayer structures are spatially separated from one another by a gap distance.

公开(公告)号：US20170307548A1

公开(公告)日：2017-10-26

申请号：US15495634

申请日：2017-04-24

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  John Wade Viatella

IPC: G01N23/201 ,  G01N23/20 ,  G21K1/02

CPC classification number: G01N23/201 ,  G01N2223/054 ,  G01N2223/309 ,  G01N2223/316 ,  G21K1/04 ,  G21K7/00

Abstract: Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

公开(公告)号：US20170131129A1

公开(公告)日：2017-05-11

申请号：US15261639

申请日：2016-09-09

Applicant: KLA-Tencor Corporation

Inventor： Brian Ahr ,  Alexander Bykanov ,  Rudy F. Garcia ,  Layton Hale ,  Oleg Khodykin

IPC: G01F11/38 ,  H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006 ,  H05H2240/00

Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.

公开(公告)号：US10959318B2

公开(公告)日：2021-03-23

申请号：US15867633

申请日：2018-01-10

Applicant: KLA-Tencor Corporation

Inventor： Oleg Khodykin ,  Alexander Bykanov

IPC: G01N23/201 ,  G01N23/207 ,  H05G2/00

Abstract: Methods and systems for x-ray based semiconductor metrology utilizing a broadband, soft X-ray illumination source are described herein. A laser produced plasma (LPP) light source generates high brightness, broadband, soft x-ray illumination. The LPP light source directs a highly focused, short duration laser source to a non-metallic droplet target in a liquid or solid state. In one example, a droplet generator dispenses a sequence of nominally 50 micron droplets of feed material at a rate between 50 and 400 kilohertz. In one aspect, the duration of each pulse of excitation light is less than one nanosecond. In some embodiments, the duration of each pulse of excitation light is less than 0.5 nanoseconds. In some embodiments, the LPP light source includes a gas separation system that separates unspent feed material from other gases in the plasma chamber and provides the separated feed material back to the droplet generator.

公开(公告)号：US20180328868A1

公开(公告)日：2018-11-15

申请号：US15974962

申请日：2018-05-09

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  Antonio Gellineau ,  Alexander Kuznetsov ,  Andrei Veldman ,  John Hench

IPC: G01N23/201 ,  H01L21/67 ,  G01N23/205 ,  H01L21/68 ,  G01N23/207 ,  H01L21/687

CPC classification number: G01N23/201 ,  G01N23/205 ,  G01N23/207 ,  G01N2223/6116 ,  H01L21/67259 ,  H01L21/67282 ,  H01L21/67288 ,  H01L21/681 ,  H01L21/68764

Abstract: Methods and systems for positioning a specimen and characterizing an x-ray beam incident onto the specimen in a Transmission, Small-Angle X-ray Scatterometry (T-SAXS) metrology system are described herein. A specimen positioning system locates a wafer vertically and actively positions the wafer in six degrees of freedom with respect to the x-ray illumination beam without attenuating the transmitted radiation. In some embodiments, a cylindrically shaped occlusion element is scanned across the illumination beam while the detected intensity of the transmitted flux is measured to precisely locate the beam center. In some other embodiments, a periodic calibration target is employed to precisely locate the beam center. The periodic calibration target includes one or more spatially defined zones having different periodic structures that diffract X-ray illumination light into distinct, measurable diffraction patterns.

公开(公告)号：US10034362B2

公开(公告)日：2018-07-24

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00 ,  G03F7/20

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

公开(公告)号：US09420678B2

公开(公告)日：2016-08-16

申请号：US14497506

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin

IPC: H05G2/00 ,  G21K5/04 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916

Abstract: A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.

Abstract translation: 一种用于在EUV光源中产生排除缓冲气体流的系统，包括真空室，光路，等离子体产生区域，至少一个屏蔽件，至少一个安装在所述至少一个屏蔽件中的通孔，至少 一个缓冲气体喷射器，布置在所述至少一个通孔内，以将缓冲气体基本上朝向等离子体产生区域注入到光路中，以防止目标材料流入光路;以及真空泵，其布置成移除缓冲器 气体和来自真空室的目标材料。

公开(公告)号：US20150076359A1

公开(公告)日：2015-03-19

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01J1/16

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US20150008335A1

公开(公告)日：2015-01-08

申请号：US14497506

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916

Abstract: A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.

Abstract translation: 一种用于在EUV光源中产生排除缓冲气体流的系统，包括真空室，光路，等离子体产生区域，至少一个屏蔽件，至少一个安装在所述至少一个屏蔽件中的通孔，至少 一个缓冲气体喷射器，布置在所述至少一个通孔内，以将缓冲气体基本上朝向等离子体产生区域注入到光路中，以防止目标材料流入光路;以及真空泵，其布置成移除缓冲器 气体和来自真空室的目标材料。