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224 条记录 (耗时 0.031 秒)

    Cleaning apparatus, cleaning method and recording medium
    12.
    发明授权
    Cleaning apparatus, cleaning method and recording medium 有权
    清洁装置，清洁方法和记录介质

    公开(公告)号：US08308870B2

    公开(公告)日：2012-11-13

    申请号：US12610599

    申请日：2009-11-02

    申请人： Teruomi Minami ,  Takashi Yabuta ,  Satoru Tanaka ,  Hirotaka Maruyama ,  Kouichi Eguchi

    发明人： Teruomi Minami ,  Takashi Yabuta ,  Satoru Tanaka ,  Hirotaka Maruyama ,  Kouichi Eguchi

    IPC分类号： B08B3/08

    CPC分类号： H01L21/67051

    摘要： Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a rinsing treatment, and a drying treatment with IPA, in order, on a wafer W while rotating wafer W, and includes a cleaning liquid supply device for supplying a cleaning liquid for cleaning the drain cup and the drain tube to the drain cup in a state where the cleaning liquid is not supplied to the wafer. Also, the apparatus further includes a control unit for controlling respective components of the cleaning apparatus. The control unit, after the cleaning treatment and then the rinsing treatment of wafer W, at the time when the drying treatment is performed by IPA, controls the cleaning liquid to be supplied to the drain cup.

    摘要翻译： 公开了一种清洁装置和清洁方法，其可以在基板经受清洁处理之后收集化学液体而不降低生产量，并通过使用诸如IPA的干燥溶剂进行干燥。 所公开的清洁装置在旋转晶片W的同时在晶片W上进行化学液体清洗处理，漂洗处理和IPA干燥处理，并且包括用于提供用于清洁的清洁液的清洗液供给装置 排水杯和排水管排入排水杯，在清洗液未供给到晶片的状态下。 此外，该装置还包括用于控制清洁装置的各个部件的控制单元。 在通过IPA进行干燥处理之后，控制单元在进行清洁处理，然后进行晶片W的漂洗处理之后，控制向排水杯供给的清洗液。

    Imprinting device and imprinting method
    13.
    发明授权
    Imprinting device and imprinting method 有权
    压印装置和压印方法

    公开(公告)号：US08215944B2

    公开(公告)日：2012-07-10

    申请号：US12810557

    申请日：2008-12-25

    申请人： Yoshiaki Takaya ,  Yuji Hashima ,  Yoshihisa Hayashida ,  Hirosuke Kawaguchi ,  Satoru Tanaka ,  Akihiko Kanai ,  Kazuaki Uehara

    发明人： Yoshiaki Takaya ,  Yuji Hashima ,  Yoshihisa Hayashida ,  Hirosuke Kawaguchi ,  Satoru Tanaka ,  Akihiko Kanai ,  Kazuaki Uehara

    IPC分类号： A01J21/00 ,  A01J25/12 ,  B28B11/08 ,  B29C35/04

    CPC分类号： B29C59/022 ,  B29C33/42 ,  B29C2035/0822 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.

    摘要翻译： 本发明提供能够均匀地在模具和成型体之间施加压力并且可以以快速的速度增加和降低温度的压印装置和压印方法。 压印装置用于将模具上的图案转印到薄膜成型对象上，并且包括用于保持模具的台，与成型对象一起构成加压室的加压室壳体，密封装置将气密密封 所述加压室壳体和所述成型体，用于打开和关闭所述加压室壳体与所述成型体之间的空间的开闭装置，调节所述加压室内的大气压的加压单元， 或模具和模制对象两者以及脱气装置，其消除了存在于模具和模制对象之间的任何气体。

    COMPOUNDS HAVING NPY Y5 RECEPTOR ANTAGONISTIC ACTIVITY
    14.
    发明申请
    COMPOUNDS HAVING NPY Y5 RECEPTOR ANTAGONISTIC ACTIVITY 失效
    具有NPY Y5受体拮抗活性的化合物

    公开(公告)号：US20120130070A1

    公开(公告)日：2012-05-24

    申请号：US13354881

    申请日：2012-01-20

    申请人： Masahiro SAKAGAMI ,  Hiroshi Hashizume ,  Satoru Tanaka

    发明人： Masahiro SAKAGAMI ,  Hiroshi Hashizume ,  Satoru Tanaka

    IPC分类号： C07D471/04

    CPC分类号： C07D231/12 ,  C07D231/14 ,  C07D233/64 ,  C07D249/08 ,  C07D401/04 ,  C07D401/14 ,  C07D403/04 ,  C07D407/04 ,  C07D413/04 ,  C07D417/04 ,  C07D471/04 ,  C07D487/04

    摘要： This invention provides a compound of the formula (I): a pharmaceutically acceptable salt or solvate thereof, wherein R1 is substituted or unsubstituted alkyl or the like, R2 is hydrogen or substituted or unsubstituted alkyl, Ring A is monocyclic or bicyclic aromatic heterocycle, R3 is substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl or substituted or unsubstituted heterocycle, R4 is halogen, cyano, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl or the like, m is an integer between 0 and 2, n is an integer between 0 and 5, R is halogen, oxo, cyano, nitro, substituted or unsubstituted alkyl or the like, and p is an integer between 0 and 2 as novel compounds having NPY Y5 antagonistic activity.

    摘要翻译： 本发明提供式（I）化合物：其药学上可接受的盐或溶剂合物，其中R 1为取代或未取代的烷基等，R 2为氢或取代或未取代的烷基，环A为单环或双环芳族杂环，R 3 取代或未取代的芳基，取代或未取代的杂芳基或取代或未取代的杂环，R4为卤素，氰基，取代或未取代的烷基，取代或未取代的环烷基等，m为0至2之间的整数，n为0 和5，R是卤素，氧代，氰基，硝基，取代或未取代的烷基等，p是0和2之间的整数，作为具有NPY Y5拮抗活性的新化合物。

    Substrate processing method and substrate processing apparatus
    16.
    发明授权
    Substrate processing method and substrate processing apparatus 有权
    基板处理方法和基板处理装置

    公开(公告)号：US08137478B2

    公开(公告)日：2012-03-20

    申请号：US12857973

    申请日：2010-08-17

    申请人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

    发明人： Kenji Sekiguchi ,  Noritaka Uchida ,  Satoru Tanaka ,  Hiroki Ohno

    IPC分类号： B08B7/00 ,  B08B7/04

    CPC分类号： H01L21/67051 ,  B08B3/02 ,  B08B3/024 ,  B08B3/04 ,  H01L21/6708 ,  Y10S134/902

    摘要： A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.

    摘要翻译： 使用诸如去离子水的工艺液体处理衬底（W）。 然后，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第一流体，形成液膜。 接下来，在晶片（W）旋转的同时，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第二流体。 在该供给动作中，第二流体与基板（W）的供给位置（Sf）从基板（W）的旋转中心（Po）向径向外侧移动。 结果，可以防止在通过使用第一和第二流体干燥基板（W）之后产生颗粒。

    Isoxazole derivative and isothiazole derivative having inhibitory activity on 11β-hydroxysteroid dehydrogenase type 1
    17.
    发明授权
    Isoxazole derivative and isothiazole derivative having inhibitory activity on 11β-hydroxysteroid dehydrogenase type 1 有权
    具有抑制活性的异恶唑衍生物和异噻唑衍生物

    公开(公告)号：US08017638B2

    公开(公告)日：2011-09-13

    申请号：US12293246

    申请日：2007-03-28

    申请人： Tomoyuki Ogawa ,  Nobuo Chomei ,  Koji Masuda ,  Satoru Tanaka

    发明人： Tomoyuki Ogawa ,  Nobuo Chomei ,  Koji Masuda ,  Satoru Tanaka

    IPC分类号： A61K31/42 ,  C07D261/06

    CPC分类号： C07D261/18 ,  C07D275/02 ,  C07D413/12 ,  C07D417/12 ,  C07D471/10

    摘要： Disclosed is a compound useful as an inhibitor of 11β-hydroxysteroid dehydrogenase type 1.A compound represented by the formula: a pharmaceutically acceptable salt or solvate thereof, wherein R1 is a group of the formula: —C(═O)NR4R5, (wherein R4 and R5 are each independently, hydrogen, optionally substituted alkyl or the like) or a group of the formula: —NR6C(═O)R7, (wherein R6 and R7 are each independently, hydrogen, optionally substituted alkyl or the like), X and Y are each independently —O— or the like, Z is a bond or the like, R2 is optionally substituted alkyl, optionally substituted alkenyl or the like, R3 is optionally substituted alkyl, optionally substituted alkenyl or the like.

    摘要翻译： 公开了一种可用作11型β-羟基类固醇脱氢酶抑制剂的化合物。下式表示的化合物：其药学上可接受的盐或溶剂合物，其中R 1是下式的基团：-C（= O）NR 4 R 5，（ 其中R 4和R 5各自独立地为氢，任选取代的烷基等）或下式的基团：-NR 6 C（= O）R 7，（其中R 6和R 7各自独立地为氢，任选取代的烷基等） X和Y各自独立地为-O-等，Z为键或类似物，R 2为任选取代的烷基，任选取代的烯基等，R 3为任选取代的烷基，任选取代的烯基等。

    MULTILAYER INDUCTOR AND POWER CONVERTER COMPRISING IT
    19.
    发明申请
    MULTILAYER INDUCTOR AND POWER CONVERTER COMPRISING IT 有权
    多层电感器和电源转换器

    公开(公告)号：US20100283447A1

    公开(公告)日：2010-11-11

    申请号：US12810351

    申请日：2008-12-25

    申请人： Takeshi Tachibana ,  Satoru Tanaka

    发明人： Takeshi Tachibana ,  Satoru Tanaka

    IPC分类号： G05F3/02 ,  H01F5/00

    CPC分类号： H01F1/344 ,  C04B35/265 ,  C04B35/6262 ,  C04B2235/3262 ,  C04B2235/3275 ,  C04B2235/3279 ,  C04B2235/3281 ,  C04B2235/3284 ,  C04B2235/3293 ,  C04B2235/5409 ,  H01F17/0013 ,  H01F17/04 ,  H01F41/046

    摘要： A multilayer inductor comprising a coil embedded in a magnetic portion, and a magnetic gap formed by a non-magnetic portion in part of a magnetic path, the magnetic portion being made of Ni ferrite, whose relative temperature coefficient αμir of initial permeability at a frequency of 1 MHz is more than +10 ppm/° C. and +40 ppm/° C. or less between −40° C. and +80° C., the non-magnetic portion being made of Zn ferrite containing more Zn than in the magnetic portion and having a Curie temperature Tc of −50° C. or lower, and the Zn content changing continuously in boundary regions between the non-magnetic portion and the magnetic portion, whereby the thickness of the magnetic gap changes with the temperature.

    摘要翻译： 一种包括嵌入在磁性部分中的线圈和由磁路的一部分中的非磁性部分形成的磁隙的多层电感器，该磁性部分由Ni铁氧体制成，其初始磁导率的相对温度系数αμir在频率 1 MHz的温度在-40°C至+ 80°C之间超过+ 10 ppm /°C和+ 40 ppm /°C或更低，非磁性部分由含有更多Zn的Zn铁氧体组成 在磁性部分中具有-50℃或更低的居里温度Tc，并且Zn含量在非磁性部分和磁性部分之间的边界区域中连续变化，由此磁隙的厚度随温度变化 。