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11.发明申请公开(公告)号：US20170198396A1
公开(公告)日：2017-07-13
申请号：US14994668
申请日：2016-01-13
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill
IPC: C23C16/513 , F16K15/02 , F16K3/06 , F16K51/02 , F16K1/22
CPC classification number: C23C16/513 , F16K1/22 , F16K3/06 , F16K15/026 , F16K51/02 , H01J37/32348 , H01J37/32844 , Y02C20/30
Abstract: A valve assembly is provided that comprises a vacuum valve including a body and an electrically grounded surface on at least a surface of the body and an electrode extending substantially parallel to the electrically grounded surface and adjacent to the vacuum valve. The vacuum valve assembly also includes a barrier dielectric, a least a portion of which is located between the electrode and the electrically grounded surface. The vacuum valve assembly further includes a dielectric barrier discharge structure formed from the electrically grounded surface, the electrode, and the barrier dielectric. The dielectric barrier discharge structure is adapted to generate a plasma on the electrically grounded surface to clean at least a portion of the vacuum valve.
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公开(公告)号：US20140209181A1
公开(公告)日：2014-07-31
申请号：US13753019
申请日：2013-01-29
Applicant: MKS Instruments, Inc.
Inventor： Paul D. Lucas , Gordon Hill , Jaroslaw Wojciech Pisera
IPC: F16K49/00
CPC classification number: F16K49/00 , F16K1/2261 , F16K3/10 , F16K49/007 , Y10T137/0419 , Y10T137/6416
Abstract: A valve assembly comprises: a valve body including a passageway through which a first gas can be transmitted through the valve assembly; a valve flow control element movable relative to the valve body between an opened position wherein flow through the passageway is at a maximum flow, and a closed position wherein flow through the passageway is at a minimum flow, the valve flow control element is shaped so that a control gap is provided between the valve body and valve flow control element through which the first gas can flow, and the dimensions of the control gap vary depending on the position of the valve flow control element relative to the valve body; and a gas injector arrangement for selectively injecting a second gas into the control gap when the valve assembly is used to control the flow of the first gas through the passageway. The injection of the second gas when the valve flow control element is at or near its closed position helps minimize condensate being deposited on the valve flow control element, as well as reduce the closed conductance of the valve.
Abstract translation: 阀组件包括：阀体，其包括通道，第一气体可以穿过所述通道穿过所述阀组件; 阀流量控制元件，其可相对于阀体在打开位置之间移动，打开位置，其中通过通道的流动处于最大流动，以及关闭位置，其中流过通道的流动处于最小流量，阀流量控制元件的形状使得 在阀体和阀流量控制元件之间提供控制间隙，第一气体可以通过该控制间隙流动，并且控制间隙的尺寸根据阀流量控制元件相对于阀体的位置而变化; 以及气体喷射器装置，用于当阀组件用于控制通过通道的第一气体的流动时，将第二气体选择性地喷射到控制间隙中。 当阀流量控制元件处于或接近其关闭位置时，第二气体的注入有助于最小化沉积在阀流量控制元件上的冷凝物，并且减小阀的闭合电导。
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公开(公告)号：US12159765B2
公开(公告)日：2024-12-03
申请号：US17902208
申请日：2022-09-02
Applicant: MKS Instruments, Inc.
Inventor： Ron Collins , Andrew Cowe , Gordon Hill
IPC: H01J37/32
Abstract: A plasma source is provided that is configured to form a section of a wall of a vacuum component. The plasma source comprises a body including a dielectric member, a first surface exposed to an exterior region of the vacuum component, and a second surface exposed to an interior region of the vacuum component. The plasma source also comprises at least one electrode disposed in a receiving channel of the body with at least a portion of the dielectric member located adjacent to the at least one electrode in the receiving channel. The plasma source further comprise at least one discharge region adjacent to the receiving channel within the body. The at least one discharge region is exposed to the interior region of the vacuum component via an opening on the second surface of the body.
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14.发明公开公开(公告)号：US20240063001A1
公开(公告)日：2024-02-22
申请号：US18449488
申请日：2023-08-14
Applicant: MKS Instruments, Inc.
Inventor： Hongke Ye , Gordon Hill
CPC classification number: H01J37/32862 , H01J37/32963 , C23C16/4405
Abstract: Systems and methods of monitoring a cleaning process for a deposition chamber are provided. A chamber cleaning source is activated to supply a cleaning agent to a deposition chamber and a foreline cleaning source disposed downstream of the deposition is activated to supply the cleaning agent to a foreline. The transmission recovery of an optical sensor disposed in the foreline is monitored. The optical sensor is disposed in the foreline at a location downstream of the foreline cleaning source. At least one of a foreline clean endpoint and a chamber clean endpoint is detected based on the monitored transmission recovery.
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公开(公告)号：US11854839B2
公开(公告)日：2023-12-26
申请号：US16849871
申请日：2020-04-15
Applicant: MKS Instruments, Inc.
Inventor： Andrew B. Cowe , Gordon Hill
CPC classification number: H01L21/67017 , B08B5/00 , C23C16/4405 , F16K3/0227 , F16K3/16 , F16K3/18 , H01J37/32357 , H01J2237/335
Abstract: An isolation valve assembly including a valve body having an inlet and an outlet. The isolation valve includes a seal plate disposed within an interior cavity of the valve body. The seal plate is movable between a first position allowing gas flow from the inlet to the outlet, and a second position preventing gas flow from the inlet to the outlet. The isolation valve includes a closure element disposed within the valve body. The closure element is configured to retain the seal plate stationary in the first position or the second position. The closure element includes a first sealing element positioned adjacent to a first surface of the seal plate. A working surface of the first sealing element is substantially obscured from the gas flow when the seal plate is stationary.
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Patent Agency Ranking
公开(公告)号：US10649471B2
公开(公告)日：2020-05-12
申请号：US15887447
申请日：2018-02-02
Applicant: MKS Instruments, Inc.
Inventor： Junhua Ding , Michael L'Bassi , Gordon Hill
Abstract: A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.
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公开(公告)号：US20200075298A1
公开(公告)日：2020-03-05
申请号：US16679640
申请日：2019-11-11
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号：US20190271410A1
公开(公告)日：2019-09-05
申请号：US16408752
申请日：2019-05-10
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , David F. Broyer , David C. Neumeister , Bradly Raymond Lefevre
Abstract: A cooled isolation valve includes a valve body, a stationary element coupled to the valve body, and a movable closure element movable with respect to the stationary element between a closed position in which the movable closure element and the stationary element are brought together and an open position. One of the movable closure element and the stationary element includes a sealing element. In the closed position of the movable closure element, the sealing element provides a seal between the movable closure element and the stationary element. A fluid channel is formed in contact with the movable closure element and movable with the movable closure element with respect to the stationary element, such that a fluid in the fluid channel effects heat transfer in the movable closure element. A bellows of the isolation valve can include a metallic substrate with a ceramic coating.
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公开(公告)号：US10337105B2
公开(公告)日：2019-07-02
申请号：US14994668
申请日：2016-01-13
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill
Abstract: A valve assembly is provided that comprises a vacuum valve including a body and an electrically grounded surface on at least a surface of the body and an electrode extending substantially parallel to the electrically grounded surface and adjacent to the vacuum valve. The vacuum valve assembly also includes a barrier dielectric, a least a portion of which is located between the electrode and the electrically grounded surface. The vacuum valve assembly further includes a dielectric barrier discharge structure formed from the electrically grounded surface, the electrode, and the barrier dielectric. The dielectric barrier discharge structure is adapted to generate a plasma on the electrically grounded surface to clean at least a portion of the vacuum valve.
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公开(公告)号：US09133960B2
公开(公告)日：2015-09-15
申请号：US13753019
申请日：2013-01-29
Applicant: MKS Instruments, Inc.
Inventor： Paul D. Lucas , Gordon Hill , Jaroslaw Wojciech Pisera
CPC classification number: F16K49/00 , F16K1/2261 , F16K3/10 , F16K49/007 , Y10T137/0419 , Y10T137/6416
Abstract: A valve assembly comprises: a valve body including a passageway through which a first gas can be transmitted through the valve assembly; a valve flow control element movable relative to the valve body between an opened position wherein flow through the passageway is at a maximum flow, and a closed position wherein flow through the passageway is at a minimum flow, the valve flow control element is shaped so that a control gap is provided between the valve body and valve flow control element through which the first gas can flow, and the dimensions of the control gap vary depending on the position of the valve flow control element relative to the valve body; and a gas injector arrangement for selectively injecting a second gas into the control gap when the valve assembly is used to control the flow of the first gas through the passageway. The injection of the second gas when the valve flow control element is at or near its closed position helps minimize condensate being deposited on the valve flow control element, as well as reduce the closed conductance of the valve.
Abstract translation: 阀组件包括：阀体，其包括通道，第一气体可以穿过所述通道穿过所述阀组件; 阀流量控制元件，其可相对于阀体在打开位置之间移动，打开位置，其中通过通道的流动处于最大流动，以及关闭位置，其中流过通道的流动处于最小流量，阀流量控制元件的形状使得 在阀体和阀流量控制元件之间提供控制间隙，第一气体可以通过该控制间隙流动，并且控制间隙的尺寸根据阀流量控制元件相对于阀体的位置而变化; 以及气体喷射器装置，用于当阀组件用于控制通过通道的第一气体的流动时，将第二气体选择性地喷射到控制间隙中。 当阀流量控制元件处于或接近其关闭位置时，第二气体的注入有助于最小化沉积在阀流量控制元件上的冷凝物，并且减小阀的闭合电导。
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