公开(公告)号：US06884635B2

公开(公告)日：2005-04-26

申请号：US10244417

申请日：2002-09-17

Applicant: Richard Parsons

Inventor： Richard Parsons

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/00 ,  C23C16/00 ,  H00H1/00

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32532

Abstract: An RF power supply system (200) for use with an electrode (60) in a plasma reactor system (10) capable of supporting a plasma (32) with a plasma load impedance (ZR), wherein the electrode comprises a plurality of electrode segments (62a,62b, . . . , 62n). The system comprises a master oscillator (210), and a plurality of RF power supply subsystems (220a, 220b, . . . 220n) each electronically connected thereto, and to respective ones of the electrode segments. Each RF power supply subsystem includes a phase shifter (224), an amplifier/power supply (230), a circulator (236), a directional coupler (242), and a match network (MN/L). The latter has a match network impedance. The system further includes a control system (184) electronically connected to each RF power supply subsystem. The control system dynamically changes the match network impedance for each subsystem to match the plasma load impedance, and also adjusts one or more of the phase shifters in response to an electrode segment receiving power from other electrode segments. A method of controlling the RF power supply system is disclosed, as is a method for processing a substrate (40) with a plasma processing system having the RF power supply system of the present invention.

Abstract translation: 一种与等离子体反应器系统（10）中的电极（60）一起使用的能够支持具有等离子体负载阻抗（Z SUB）的等离子体（32）的RF电源系统（200），其中 电极包括多个电极段（62a，62b，...，62n）。 该系统包括主振荡器（210）和多个电子连接到其上的多个RF电源子系统（220a，220b，...，n2n）以及相应的电极段。 每个RF电源子系统包括移相器（224），放大器/电源（230），循环器（236），定向耦合器（242）和匹配网络（MN / L）。 后者具有匹配网络阻抗。 该系统还包括电连接到每个RF电源子系统的控制系统（184）。 控制系统动态地改变每个子系统的匹配网络阻抗以匹配等离子体负载阻抗，并且还响应于从其它电极段接收功率的电极段调整一个或多个移相器。 公开了一种控制RF电源系统的方法，以及使用具有本发明的RF电源系统的等离子体处理系统来处理衬底（40）的方法。

公开(公告)号：US20050020406A1

公开(公告)日：2005-01-27

申请号：US10624250

申请日：2003-07-22

Applicant: William Aldrich ,  Glenn O'Connell ,  Michael Velliky ,  Leonard Wozniak ,  Richard Parsons

Inventor： William Aldrich ,  Glenn O'Connell ,  Michael Velliky ,  Leonard Wozniak ,  Richard Parsons

IPC: F02D31/00 ,  F02D41/02 ,  F02D41/08 ,  B60K41/04

CPC classification number: F02D41/0215 ,  F02D31/003 ,  F02D41/083 ,  Y10T477/675 ,  Y10T477/679 ,  Y10T477/68

Abstract: An idle speed compensation system for a vehicle includes an idle speed control system that varies airflow to an engine at idle and a transmission driven by the engine. A controller communicates with the idle speed control system, the engine, and the transmission. The controller generates an idle speed compensation signal based on a transmission load.

Abstract translation: 用于车辆的怠速补偿系统包括怠速控制系统，该怠速控制系统在怠速时改变发动机的气流和由发动机驱动的变速器。 控制器与怠速控制系统，发动机和变速器通信。 控制器基于传输负载产生怠速补偿信号。

公开(公告)号：US07177781B2

公开(公告)日：2007-02-13

申请号：US10521118

申请日：2003-07-23

Applicant: Eric J. Strang ,  Richard Parsons ,  Jody Goldfield

Inventor： Eric J. Strang ,  Richard Parsons ,  Jody Goldfield

IPC: G06F11/30

CPC classification number: H01J37/32192 ,  H01J37/32935 ,  H01J37/3299

Abstract: The present invention provides a diagnostic system for plasma processing, wherein the diagnostic system comprises a multi-modal resonator, a power source, a detector, and a controller. The controller is coupled to the power source and the detector and it is configured to provide a man-machine interface for performing several monitoring and controlling functions associated with the diagnostic system including: a Gunn diode voltage monitor, a Gunn diode current monitor, a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonance lock-on control, a graphical user control, and an electron density monitor. The diagnostic system can further provide a remote controller coupled to the controller and configured to provide a remote man-machine interface. The remote man-machine interface. The remote man-machine interface can provide a graphical user interface in order to permit remote control of the diagnostic system by an operator. In addition, the present invention provides several methods of controlling the diagnostic system in order to perform both monitor and control functions.

Abstract translation: 本发明提供了一种用于等离子体处理的诊断系统，其中诊断系统包括多模谐振器，电源，检测器和控制器。 控制器耦合到电源和检测器，并且其被配置为提供用于执行与诊断系统相关联的多个监视和控制功能的人机接口，包括：耿氏二极管电压监视器，耿氏二极管电流监视器，变容二极管 二极管电压监视器，检测器电压监视器，变容二极管电压控制，变容二极管电压扫描控制，共振锁定控制，图形用户控制和电子密度监视器。 诊断系统还可以提供耦合到控制器并被配置为提供远程人机界面的遥控器。 远程人机界面。 远程人机界面可以提供图形用户界面，以便允许操作者对诊断系统进行远程控制。 此外，本发明提供了几种控制诊断系统以便执行监视和控制功能的方法。

公开(公告)号：US07164236B2

公开(公告)日：2007-01-16

申请号：US10793253

申请日：2004-03-05

Applicant: Andrej S. Mitrovic ,  Eric J. Strang ,  Murray D. Sirkis ,  Bill H. Quon ,  Richard Parsons ,  Yuji Tsukamoto

Inventor： Andrej S. Mitrovic ,  Eric J. Strang ,  Murray D. Sirkis ,  Bill H. Quon ,  Richard Parsons ,  Yuji Tsukamoto

IPC: H05B31/26 ,  C23F1/00

CPC classification number: H01J37/32082 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/32532 ,  H01J37/32935

Abstract: A method and apparatus for generating and controlling a plasma (130) formed in a capacitively coupled plasma system (100) having a plasma electrode (140) and a bias electrode in the form of a workpiece support member (170), wherein the plasma electrode is unitary and has multiple regions (Ri) defined by a plurality of RF power feed lines (156) and the RF power delivered thereto. The electrode regions may also be defined as electrode segments (420) separated by insulators (426). A set of process parameters A={n, τi, Φi, Pi, S; Li} is defined; wherein n is the number of RF feed lines connected to the electrode upper surface at locations Li, τi is the on-time of the RF power for the ith RF feed line, Φi is the phase of the ith RF feed line relative to a select one of the other RF feed lines, Pi is the RF power delivered to the electrode through the ith RF feed line at location Li, and S is the sequencing of RF power to the electrode through the RF feed lines. One or more of these parameters are adjusted so that operation of the plasma system results in a workpiece (176) being processed with a desired amount or degree of process uniformity.

Abstract translation: 一种用于产生和控制形成在电容耦合等离子体系统（100）中的等离子体（130）的方法和装置，其具有工件支撑构件（170）形式的等离子体电极（140）和偏置电极，其中等离子体电极 是单一的并且具有由多个RF馈电线（156）限定的多个区域（RF）和传递给其的RF功率。 电极区域也可以被定义为由绝缘体（426）分离的电极段（420）。 一组过程参数A = {n，τi，i，P i， 被定义; 其中n是在位置L i1处连接到电极上表面的RF馈送线的数量，τi是针对i 是相对于其他RF馈线中选择的一个RF馈线的第i个RF馈线的相位，P < SUB> i 是通过位置L i i处的第i个RF馈线传送到电极的RF功率，S是RF功率到 电极通过RF馈线。 调整这些参数中的一个或多个，使得等离子体系统的操作导致以期望的量或程度的均匀度处理工件（176）。

公开(公告)号：US20060032287A1

公开(公告)日：2006-02-16

申请号：US10521118

申请日：2003-07-23

Applicant: Eric Strang ,  Richard Parsons ,  Jody Goldfield

Inventor： Eric Strang ,  Richard Parsons ,  Jody Goldfield

IPC: G01N19/02 ,  G01N3/56

CPC classification number: H01J37/32192 ,  H01J37/32935 ,  H01J37/3299

Abstract: The present invention provides a diagnostic system for plasma processing, wherein the diagnostic system comprises a multi-modal resonator, a power source, a detector, and a controller. The controller is coupled to the power source and the detector and it is configured to provide a man-machine interface for performing several monitoring and controlling functions associated with the diagnostic system including: a Gunn diode voltage monitor, a Gunn diode current monitor, a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonance lock-on control, a graphical user control, and an electron density monitor. The diagnostic system can further provide a remote controller coupled to the controller and configured to provide a remote man-machine interface. The remote man-machine interface. The remote man-machine interface can provide a graphical user interface in order to permit remote control of the diagnostic system by an operator. In addition, the present invention provides several methods of controlling the diagnostic system in order to perform both monitor and control functions.

Abstract translation: 本发明提供了一种用于等离子体处理的诊断系统，其中诊断系统包括多模谐振器，电源，检测器和控制器。 控制器耦合到电源和检测器，并且其被配置为提供用于执行与诊断系统相关联的多个监视和控制功能的人机接口，包括：耿氏二极管电压监视器，耿氏二极管电流监视器，变容二极管 二极管电压监视器，检测器电压监视器，变容二极管电压控制，变容二极管电压扫描控制，共振锁定控制，图形用户控制和电子密度监视器。 诊断系统还可以提供耦合到控制器并被配置为提供远程人机界面的遥控器。 远程人机界面。 远程人机界面可以提供图形用户界面，以便允许操作者对诊断系统进行远程控制。 此外，本发明提供了几种控制诊断系统以便执行监视和控制功能的方法。

公开(公告)号：US06535785B2

公开(公告)日：2003-03-18

申请号：US09984760

申请日：2001-10-31

Applicant: Wayne Johnson ,  Richard Parsons

Inventor： Wayne Johnson ,  Richard Parsons

IPC: G06F1900

CPC classification number: H01J37/32082 ,  H01J37/32137 ,  H01J37/32146 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/332 ,  H01J2237/334

Abstract: A system and method for monitoring the conditions in a gas plasma processing system while varying or modulating the RF power supplied to the system, so that resulting signals of the electrical circuits of the system provide information regarding operational parameters of the system or the state of a process. Significant improvements in sensitivity and accuracy over conventional techniques are thereby achieved. In addition, the plasma processing system can be thoroughly tested and characterized before delivery, to allow more accurate monitoring of and greater control over a process, thereby improving quality control/assurance of substrates being produced by the system. The information obtained by the modulation technique can be displayed on a monitor screen, in order to allow an operator to accurately monitor the system/process and diagnose any problems with the system/process.

公开(公告)号：US06332961B1

公开(公告)日：2001-12-25

申请号：US09508102

申请日：2000-06-02

Applicant: Wayne L. Johnson ,  Richard Parsons

Inventor： Wayne L. Johnson ,  Richard Parsons

IPC: C23C1434

CPC classification number: H01J37/32082 ,  H01J37/32174 ,  H01J2237/0206

Abstract: A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occurring during a processing run. Information can be obtained regarding location, severity, and frequency of arcing events. The system and method better diagnose the causes of arcing and provide improved protection against undesirable arcing, which can cause damage to the system and the workpiece.

Abstract translation: 一种用于检测和防止等离子体处理系统中的电弧的系统和方法。 通过测量和分析来自耦合到等离子体的电路的电信号来检测和表征电弧。 在表征之后，电信号可以与在处理运行期间发生的电弧事件相关联。 可以获取关于电弧事件的位置，严重性和频率的信息。 该系统和方法更好地诊断电弧的原因，并提供改进的防止不希望的电弧的保护，这可能会对系统和工件造成损害。

公开(公告)号：US07732227B2

公开(公告)日：2010-06-08

申请号：US11517389

申请日：2006-09-08

Applicant: Eric J. Strang ,  Richard Parsons

Inventor： Eric J. Strang ,  Richard Parsons

IPC: H01L21/66 ,  G01R31/26 ,  C23C14/54 ,  C23F1/00

CPC classification number: H01L21/67253 ,  G01B15/02 ,  H01J37/32192 ,  H01J37/32275 ,  H01J37/3299 ,  H01L21/67069

Abstract: A wall film monitoring system includes first and second microwave mirrors in a plasma processing chamber each having a concave surface. The concave surface of the second mirror is oriented opposite the concave surface of the first mirror. A power source is coupled to the first mirror and configured to produce a microwave signal. A detector is coupled to at least one of the first mirror and the second mirror and configured to measure a vacuum resonance voltage of the microwave signal. A control system is connected to the detector that compares a first measured voltage and a second measured voltage and determines whether the second voltage exceeds a threshold value. A method of monitoring wall film in a plasma chamber includes loading a wafer in the chamber, setting a frequency of a microwave signal output to a resonance frequency, and measuring a first vacuum resonance voltage of the microwave signal. The method includes processing the wafer, measuring a second vacuum resonance voltage of the microwave signal, and determining whether the second measured voltage exceeds a threshold value using the first measured voltage as a reference value.

Abstract translation: 墙膜监测系统包括等离子体处理室中的具有凹面的第一和第二微波反射镜。 第二反射镜的凹面与第一反射镜的凹面相对。 电源耦合到第一反射镜并且被配置为产生微波信号。 检测器耦合到第一反射镜和第二反射镜中的至少一个并且被配置为测量微波信号的真空谐振电压。 控制系统连接到检测器，该检测器比较第一测量电压和第二测量电压，并确定第二电压是否超过阈值。 一种监测等离子体室中的壁膜的方法包括将晶片装载在室中，将微波信号输出的频率设定为谐振频率，以及测量微波信号的第一真空谐振电压。 该方法包括处理晶片，测量微波信号的第二真空谐振电压，以及使用第一测量电压作为参考值来确定第二测量电压是否超过阈值。

公开(公告)号：US07216067B2

公开(公告)日：2007-05-08

申请号：US10747087

申请日：2003-12-30

Applicant: Bill H. Quon ,  Richard Parsons

Inventor： Bill H. Quon ,  Richard Parsons

IPC: G06G7/48 ,  G06F17/10

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32935

Abstract: A non-linear test load is provided for calibrating a plasma system. The test load is a substrate for modeling the electrical characteristics of the plasma such that multi frequency testing can be performed in the absence of a plasma reaction. An exemplary substrate includes a first semiconductor junction for providing a non-linear response to the multi-frequency RF source provided from the anode. The first semiconductor junction exhibits a first capacitance for modeling a first plasma sheath of the anode. A plasma component is responsive to the first semiconductor junction and exhibits a resistance for modeling a resistance of the plasma, an inductance for modeling an inductance of the plasma, and a gap capacitance for modeling capacitance of the plasma. A second semiconductor junction is responsive to the plasma component for providing a non-linear response to the multi-frequency RF source provided from the plasma component, the second semiconductor junction exhibits a second capacitance for modeling a second plasma sheath of the cathode.

Abstract translation: 提供用于校准等离子体系统的非线性测试负载。 测试负载是用于对等离子体的电特性进行建模的衬底，使得可以在不存在等离子体反应的情况下进行多频测试。 示例性衬底包括用于向从阳极提供的多频RF源提供非线性响应的第一半导体结。 第一半导体结显示用于对阳极的第一等离子体护套进行建模的第一电容。 等离子体元件响应于第一半导体结并且显示用于对等离子体的电阻进行建模的电阻，用于对等离子体的电感建模的电感以及用于建模等离子体的电容的间隙电容。 第二半导体结对等离子体部件响应，以向从等离子体部件提供的多频RF源提供非线性响应，第二半导体结表现出用于对阴极的第二等离子体鞘进行建模的第二电容。

公开(公告)号：US07154256B2

公开(公告)日：2006-12-26

申请号：US10504159

申请日：2003-02-27

Applicant: Richard Parsons ,  Robert Jackson ,  Deana R. Delp

Inventor： Richard Parsons ,  Robert Jackson ,  Deana R. Delp

IPC: G01R31/02

CPC classification number: G01R27/2647 ,  H01J37/32174 ,  H01J37/32935

Abstract: Integrated voltage and current (VI) probe (18) for integration inside a transmission line (17) having inner (3) and an outer (4) conductors. Current probes, often implemented as loop antennas, can be coupled to the outer conductor. The probes can either be built onto the same panel or on different panels.

Abstract translation: 用于集成在具有内（3）和外（4）导体的传输线（17）内的集成电压和电流（VI）探针（18）。 通常实现为环形天线的电流探头可以耦合到外部导体。 探头可以构建在同一个面板上或不同的面板上。