Memory device having fault detection functionality and control system including the same

    公开(公告)号:US11037620B1

    公开(公告)日:2021-06-15

    申请号:US16916280

    申请日:2020-06-30

    Abstract: A memory device having fault detection functionality for improving functional safety and a control system including the memory device are provided. The memory device includes a first memory cell array configured to store input data and output the input data as output data and a second memory cell array configured to store bit values of a row address and a column address of the first memory cell array in which the input data is stored, and output the bit values of the row address and the column address as an internal row address and an internal column address. The row/column address designating a read operation may be compared to the internal row/column address, and an address comparison signal as a result of the comparison may be output. The address comparison signal may provide fault detection functionality for a data error of an automotive electronic system.

    SEMICONDUCTOR DEVICE HAVING METAL BUMP AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20190206816A1

    公开(公告)日:2019-07-04

    申请号:US16151724

    申请日:2018-10-04

    Abstract: Provided are a semiconductor device and a method of manufacturing the same. The semiconductor device includes a metal line layer on a semiconductor substrate, and a metal terminal on the metal line layer. The metal line layer includes metal lines, and a passivation layer having a non-planarized top surface including flat surfaces on the metal lines and a concave surface between the metal lines. The metal terminal is provided on the passivation layer. Opposite lateral surfaces of the metal terminal facing each other are provided on the flat surfaces of the passivation layer.

    MEMORY DEVICE COMPRISING MEMORY CELLS STORING CALIBRATION DATA AND OPERATING METHOD THEREOF

    公开(公告)号:US20250014620A1

    公开(公告)日:2025-01-09

    申请号:US18754774

    申请日:2024-06-26

    Abstract: A memory device may include a cell array including a first section and a second section that share a plurality of word lines comprising a first set of word lines and a second set of word lines, a first column decoder configured to select at least one bit line of a first set of bit lines connected to the first section, a second column decoder configured to select at least one bit line of a second set of bit lines connected to the second section, and a read circuit configured to output a data signal based on a comparison between an output of the first column decoder and an output of the second column decoder. The first section includes a plurality of first memory cells connected to at least one word line from the first set of word lines and configured to store bits of calibration data for calibrating the memory device, and the second section includes a plurality of second memory cells connected to the at least one word line and configured to store inverted bits of the calibration data.

    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND METHODS OF VERIFYING LAYOUTS OF MASK ROMS

    公开(公告)号:US20240411971A1

    公开(公告)日:2024-12-12

    申请号:US18625456

    申请日:2024-04-03

    Inventor: Chanho Lee

    Abstract: A method of manufacturing a semiconductor device includes generating a target check code by performing target code generation computation on a target ROM code; generating first netlist data and first layout data of a semiconductor device including a mask ROM storing the target ROM code; inserting the target check code into the first netlist data; performing layout-versus-schematic (LVS) verification of the first netlist data and the first layout data, resulting in verified first netlist data; generating a final check code by performing the target code generation computation on a final ROM code of the mask ROM; determining whether the target check code stored in the first netlist data for which the LVS verification has been completed matches the final check code; and performing a mask tape-out operation (MTO) of the first layout data when the target check code matches the final check code.

    Semiconductor device
    18.
    发明授权

    公开(公告)号:US12080348B2

    公开(公告)日:2024-09-03

    申请号:US17820995

    申请日:2022-08-19

    CPC classification number: G11C15/04

    Abstract: A semiconductor device includes a substrate including a first memory cell, a second memory cell adjacent to the first memory cell in a first direction, and a comparator circuit adjacent to the first and second memory cells in a second direction intersecting the first direction; a true bit line and a complementary bit line electrically connected to the first and second memory cells and extending in the first direction from a first wiring layer on the substrate; a first power supply wiring on the first wiring layer, extending in the first direction between the true bit line and the complementary bit line and electrically connected to the first and second memory cells; first and second word lines extending in the second direction from a second wiring layer on the substrate different from the first wiring layer; first word line pads on the first wiring layer and electrically connecting the first memory cell to the first word line; second word line pads on the first wiring layer and electrically connecting the second memory cell to the second word line; and a first ground pad on the first wiring layer, electrically connected to the first and second memory cells, and in a same position as one of the first word line pads and one of the second word line pads in the second direction.

    SEMICONDUCTOR DEVICE
    19.
    发明公开

    公开(公告)号:US20230178151A1

    公开(公告)日:2023-06-08

    申请号:US17820995

    申请日:2022-08-19

    CPC classification number: G11C15/04

    Abstract: A semiconductor device includes a substrate including a first memory cell, a second memory cell adjacent to the first memory cell in a first direction, and a comparator circuit adjacent to the first and second memory cells in a second direction intersecting the first direction; a true bit line and a complementary bit line electrically connected to the first and second memory cells and extending in the first direction from a first wiring layer on the substrate; a first power supply wiring on the first wiring layer, extending in the first direction between the true bit line and the complementary bit line and electrically connected to the first and second memory cells; first and second word lines extending in the second direction from a second wiring layer on the substrate different from the first wiring layer; first word line pads on the first wiring layer and electrically connecting the first memory cell to the first word line; second word line pads on the first wiring layer and electrically connecting the second memory cell to the second word line; and a first ground pad on the first wiring layer, electrically connected to the first and second memory cells, and in a same position as one of the first word line pads and one of the second word line pads in the second direction.

    Semiconductor device having metal bump and method of manufacturing the same

    公开(公告)号:US11037894B2

    公开(公告)日:2021-06-15

    申请号:US16923406

    申请日:2020-07-08

    Abstract: Provided are a semiconductor device and a method of manufacturing the same. The semiconductor device includes a metal line layer on a semiconductor substrate, and a metal terminal on the metal line layer. The metal line layer includes metal lines, and a passivation layer having a non-planarized top surface including flat surfaces on the metal lines and a concave surface between the metal lines. The metal terminal is provided on the passivation layer. Opposite lateral surfaces of the metal terminal facing each other are provided on the flat surfaces of the passivation layer.

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