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公开(公告)号：US20170084300A1
公开(公告)日：2017-03-23
申请号：US15233277
申请日：2016-08-10
Applicant: Seagate Technology LLC
Inventor： ShuaiGang Xiao , XiaoMin Yang , David S. Kuo , Kim Yang Lee , Yautzong Hsu
CPC classification number: G11B5/855 , G11B5/59633 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
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公开(公告)号：US20170025140A1
公开(公告)日：2017-01-26
申请号：US14824995
申请日：2015-04-16
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , David Koichi
CPC classification number: G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
Abstract translation: 本文提供了一种装置，包括对应于图案化记录介质中的数据区的基板的第一区域; 从所述基板的第一区域蚀刻出的第一组突起，其中所述第一组突起的突起是矩形的; 所述衬底的第二区域对应于图案化记录介质中的伺服区域; 以及从衬底的第二区域蚀刻出的第二组突起，其中所述第二组突起包括在从所述衬底蚀刻出的人字形上蚀刻到所述衬底中的径向线。
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13.发明授权Method of fabricating a BPM template using hierarchical BCP density patterns 有权使用分层BCP密度模式制作BPM模板的方法公开(公告)号：US09489974B2
公开(公告)日：2016-11-08
申请号：US14251303
申请日：2014-04-11
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Kim Y. Lee , Koichi Wago , Philip Steiner
CPC classification number: G11B5/746 , G03F7/0002 , G11B5/855
Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
Abstract translation: 实施方案公开了一种方法，其包括使用第一定向自组装使用第一和第二图案在第一图案和第二图案中分层嵌段共聚物密度图案在不同区域中图案化模板基底以具有不同的密度，以使用第一 嵌段共聚物材料，并且使用第二定向自组装来使用第二嵌段共聚物材料在基材中图案化第二区域。
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公开(公告)号：US09424872B1
公开(公告)日：2016-08-23
申请号：US14815855
申请日：2015-07-31
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Hongying Wang
CPC classification number: G11B5/746 , G03F7/0002 , G11B5/855
Abstract: Provided herein is an apparatus including a rectangular array of rectangular protrusions in a first region corresponding to a data region; and a hexagonal array of circular protrusions in a second region corresponding to a servo region, wherein a first global protrusion density for the first region is greater than a second global protrusion density for the second region. Also provided herein is a method including forming a first template; forming a second template; and cross-imprinting the first template and the second template to form a third template corresponding to the foregoing apparatus.
Abstract translation: 本文提供了一种在对应于数据区域的第一区域中包括矩形突起的矩形阵列的装置; 以及在对应于伺服区域的第二区域中的圆形突起的六边形阵列，其中第一区域的第一全局突出密度大于第二区域的第二全局突出密度。 本文还提供了包括形成第一模板的方法; 形成第二个模板; 并交叉印刷第一模板和第二模板以形成与上述装置相对应的第三模板。
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公开(公告)号：US09171703B2
公开(公告)日：2015-10-27
申请号：US14137792
申请日：2013-12-20
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , David Kuo , Kim Y. Lee , XiaoMin Yang , Justin Hwu
CPC classification number: H01J37/32651 , C23C14/34 , C23C16/01 , G03F7/0002 , G03F7/40 , H01J2237/0203 , H01J2237/026 , H01J2237/3341 , H01L21/0337
Abstract: Provided herein is an apparatus, including a patterned resist overlying a substrate; a number of features of the patterned resist, wherein the number of features respectively includes a number of sidewalls; and a sidewall-protecting material disposed about the number of sidewalls, wherein the sidewall-protecting material is characteristic of a conformal, thin-film deposition, and wherein the sidewall-protecting material facilitates a high-fidelity pattern transfer of the patterned resist to the substrate during etching.
Abstract translation: 本文提供了一种装置，包括覆盖衬底的图案化抗蚀剂; 图案化抗蚀剂的许多特征，其中特征的数量分别包括多个侧壁; 以及围绕所述侧壁数量设置的侧壁保护材料，其中所述侧壁保护材料是共形的薄膜沉积的特征，并且其中所述侧壁保护材料促进所述图案化抗蚀剂的高保真图案转移到 衬底。
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Patent Agency Ranking
16.发明申请IMPRINT PATTERN GUIDED SELF-ASSEMBLY OF LAMELLAR BLOCK COPOLYMER FOR BPM 有权印刷图案用于BPM的LAMELLAR块状共聚物的自组装公开(公告)号：US20150206548A1
公开(公告)日：2015-07-23
申请号：US14158611
申请日：2014-01-17
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , HongYing Wang , Kim Y. Lee
IPC: G11B5/84
CPC classification number: G11B5/855 , G03F7/0002
Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
Abstract translation: 实施方案公开了使用修剪的印迹抗蚀剂和化学对比图案来引导预定层状嵌段共聚物（BCP）的定向自组装（DSA）的方法，其中使用BCP和DSA形成铬（Cr）层状引导线 干Cr剥离工艺，并将Cr层状引导线图案蚀刻到衬底中以制造压印模板。
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公开(公告)号：US20150179414A1
公开(公告)日：2015-06-25
申请号：US14137792
申请日：2013-12-20
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , David Kuo , Kim Y. Lee , XiaoMin Yang , Justin Hwu
CPC classification number: H01J37/32651 , C23C14/34 , C23C16/01 , G03F7/0002 , G03F7/40 , H01J2237/0203 , H01J2237/026 , H01J2237/3341 , H01L21/0337
Abstract: Provided herein is an apparatus, including a patterned resist overlying a substrate; a number of features of the patterned resist, wherein the number of features respectively includes a number of sidewalls; and a sidewall-protecting material disposed about the number of sidewalls, wherein the sidewall-protecting material is characteristic of a conformal, thin-film deposition, and wherein the sidewall-protecting material facilitates a high-fidelity pattern transfer of the patterned resist to the substrate during etching.
Abstract translation: 本文提供了一种装置，包括覆盖衬底的图案化抗蚀剂; 图案化抗蚀剂的许多特征，其中特征的数量分别包括多个侧壁; 以及围绕所述侧壁数量设置的侧壁保护材料，其中所述侧壁保护材料是共形的薄膜沉积的特征，并且其中所述侧壁保护材料促进所述图案化抗蚀剂的高保真图案转移到 衬底。
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18.发明申请BLOCK COPOLYMER SELF-ASSEMBLY FOR PATTERN DENSITY MULTIPLICATION AND RECTIFICATION 有权嵌段共聚物自组装图形密度多重和修复公开(公告)号：US20150118625A1
公开(公告)日：2015-04-30
申请号：US14588865
申请日：2015-01-02
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Zhaoning Yu , Kim Yang Lee , Michael Feldbaum , Yautzong Hsu , Wei Hu , Shuaigang Xiao , Henry Yang , HongYing Wang , Rene Johannes Marinus van de Veerdonk , David Kuo
CPC classification number: G11B5/855 , B05D1/005 , B32B3/30 , B32B27/283 , B32B27/302 , B32B27/308 , B32B27/36 , B32B2457/14 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , C23F4/00 , G03F7/0002 , G03F7/0035 , G03F7/165 , G03F7/2022 , G03F7/203 , G03F7/2059 , G03F7/40 , H01L21/02112 , H01L21/0274 , H01L21/3065 , Y10T428/24612
Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.
Abstract translation: 本文提供了一种方法，包括：a）将初始模板的初始图案转移到衬底; b）以密度倍增因子k在衬底上进行嵌段共聚物自组装; c）使用密度倍增因子k在后续模板中创建后续模式; 和d）重复步骤a）-c），随后的模板作为初始模板，直到满足关于模式密度和模式分辨率的后续模式的设计规范。
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公开(公告)号：US08941938B1
公开(公告)日：2015-01-27
申请号：US14255280
申请日：2014-04-17
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , David S. Kuo , Kim Y. Lee , Koichi Wago , Yautzong Hsu
IPC: G11B5/09
CPC classification number: G11B5/746 , G11B5/59655
Abstract: Provided herein is an apparatus, including a first region corresponding to a data region in a patterned recording medium; a first set of features in the first region; a second region corresponding to a servo region in a patterned recording medium; and a second set of features in the second region including rhomboidal protrusions, wherein the first set of features and the second set of features are circumferentially aligned in accordance with concentrically circular lines etched into the apparatus across the first region and the second region.
Abstract translation: 本文提供的装置包括对应于图案化记录介质中的数据区域的第一区域; 第一个区域的第一组特征; 对应于图案化记录介质中的伺服区域的第二区域; 以及第二区域中的第二组特征，包括菱形突起，其中第一组特征和第二组特征根据在整个第一区域和第二区域上蚀刻到该装置中的同心圆形线沿周向对准。
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公开(公告)号：US20240185885A1
公开(公告)日：2024-06-06
申请号：US18516140
申请日：2023-11-21
Applicant: Seagate Technology LLC
Inventor： Shuaigang Xiao , Thomas Chang , Kim Yang Lee , XiaoMin Yang , Jiansheng Wu
Abstract: A method of forming patterned magnetic media disclosed herein includes patterning a guiding layer on a substrate to form a nucleation guiding pattern. A layer of magnetic material is formed over the nucleation guiding pattern. The magnetic material may comprise a non-magnetic segregant. Magnetic grains are grown in a down-track direction and in a cross-track direction responsive to the nucleation guiding pattern and the non-magnetic segregant forms grain boundaries between the magnetic grains.
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