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24 条记录 (耗时 0.033 秒)

    Process of controlling particle size of naphthoquinone diazide esters
    13.
    发明授权
    Process of controlling particle size of naphthoquinone diazide esters 失效
    控制萘醌二叠氮酯的粒度控制方法

    公开(公告)号：US06077942A

    公开(公告)日：2000-06-20

    申请号：US995509

    申请日：1997-12-22

    申请人： Joseph E. Oberlander

    发明人： Joseph E. Oberlander

    IPC分类号： C07C303/44 ,  C07C309/76 ,  G03F7/022 ,  C07C245/00

    CPC分类号： G03F7/022 ,  C07C303/44

    摘要： A process for producing a naphthoquinone diazide ester of a phenolic compound that is useful in a photoresist composition, which process comprises providing a naphthoquinone diazide ester solution in an organic polar solvent; adding the resulting naphthoquinone diazide ester solution to a precipitation bath that is maintained at a temperature of from about 0.degree. C. to about -30.degree. C.; and filtering the resulting naphthoquinone diazide ester.

    摘要翻译： 一种可用于光致抗蚀剂组合物的酚类化合物的萘醌二叠氮化物酯的制造方法，该方法包括在有机极性溶剂中提供萘醌二叠氮酯溶液; 将所得的萘醌二叠氮化物酯溶液加入到保持在约0℃至约-30℃的温度的沉淀浴中; 并过滤得到的萘醌二叠氮化物酯。

    Photoresist compositions comprising acetals and ketals as solvents
    17.
    发明授权
    Photoresist compositions comprising acetals and ketals as solvents 失效
    包含缩醛和缩酮作为溶剂的光致抗蚀剂组合物

    公开(公告)号：US06911293B2

    公开(公告)日：2005-06-28

    申请号：US10120952

    申请日：2002-04-11

    申请人： Stanley F. Wanat ,  Joseph E. Oberlander ,  Robert R. Plass ,  Douglas McKenzie

    发明人： Stanley F. Wanat ,  Joseph E. Oberlander ,  Robert R. Plass ,  Douglas McKenzie

    IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03F7/30

    CPC分类号： G03F7/0048 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/111

    摘要： Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

    摘要翻译： 公开了一种光致抗蚀剂组合物，其包含：a）至少一种选自酚醛清漆树脂和聚羟基苯乙烯的成膜树脂; b）至少一种光敏化合物或光酸产生剂; 和c）包含至少一种选自缩醛和缩酮的溶剂的溶剂组合物。 还公开了一种光致抗蚀剂组合物，其包含聚碳酸酯树脂和包含至少一种选自缩醛和缩酮的溶剂的溶剂组合物。 还公开了一种用于对光致抗蚀剂组合物进行成像的方法，包括以下步骤：a）用任何上述光致抗蚀剂组合物涂覆合适的基材; b）烘烤基材以基本上除去溶剂; c）成像照射光刻胶膜; 以及d）用合适的显影剂除去成像曝光或替代地涂覆的基底的未曝光区域。

    Process for producing acid sensitive liquid composition containing a carbonate
    18.
    发明授权
    Process for producing acid sensitive liquid composition containing a carbonate 失效

    公开(公告)号：US06531267B2

    公开(公告)日：2003-03-11

    申请号：US09833224

    申请日：2001-04-11

    申请人： Joseph E. Oberlander

    发明人： Joseph E. Oberlander

    IPC分类号： G03F732

    CPC分类号： B01J20/2803 ,  B01J20/28004 ,  B01J20/28028 ,  B01J20/28033 ,  B01J20/28085 ,  B01J47/018 ,  B01J47/133 ,  G03F7/162 ,  G03F7/168

    摘要： Disclosed is a method for producing an acid sensitive liquid composition. The method involves passing an acid sensitive liquid composition containing a carbonate represented by the formula ROC(═O)OR1 wherein R and R1 independently are a hydrocarbyl group of 1 to about 10 carbon atoms, through at least one of the following two filter sheets: (a) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin having an average particle size of from about 2 to about 10 microns, wherein the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and/or (b) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin, and having an average pore size of about 0.05 to 0.5 &mgr;m. Also disclosed is a method for treating a film of a photoresist composition disposed on a surface, which involves contacting the photoresist composition with an acid sensitive liquid composition prepared by the aforementioned method, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the film surface.

    Photosensitive composition and use thereof
    20.
    发明授权
    Photosensitive composition and use thereof 失效
    感光组合物及其用途

    公开(公告)号：US07078157B2

    公开(公告)日：2006-07-18

    申请号：US10376356

    申请日：2003-02-27

    申请人： Hong Zhuang ,  Joseph E. Oberlander ,  Ping-Hung Lu ,  Stanely F. Wanat ,  Robert R. Plass

    发明人： Hong Zhuang ,  Joseph E. Oberlander ,  Ping-Hung Lu ,  Stanely F. Wanat ,  Robert R. Plass

    IPC分类号： G03C1/73 ,  G03F7/028 ,  G03F7/20 ,  G03F7/30 ,  G03F7/42

    CPC分类号： G03F7/033 ,  Y10S430/117

    摘要： A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.

    摘要翻译： 一种组合物，其包含含有至少两个侧链不饱和基团的光聚合化合物; 至少一种烯键式不饱和光聚合聚环氧烷亲水单体; 至少一种非离子表面活性剂; 并提供至少一种光引发剂。 组合物还优选含有至少一种胺改性的丙烯酸低聚物和染料。 其他常规光致抗蚀剂组分如光敏剂，粘合促进剂，流平剂和溶剂也可以包括在组合物中。 这样的组合物可用于在基底上形成图案，例如在基底上图案化微光刻电路。