Abstract:
The invention is a polyrotaxane monomer (A) having a composite molecular structure composed of cyclic molecules and an axial molecule that skewer-like threads through the rings of the cyclic molecules and has a bulky group at both ends thereof so as not to dethread the rings, and the polyrotaxane monomer has a polymerizable functional group in the molecule and has a water content of 5000 ppm or less. According to the present invention, there can be provided a polyrotaxane monomer having a high productivity and capable of producing a high-quality material at a high yield, while maintaining excellent mechanical characteristics of the polyrotaxane monomer.
Abstract:
A curable composition having excellent storage stability and capable of forming a cured product having excellent scratch resistance.The composition comprises a silsesquioxane monomer having a radically polymerizable group in the molecule and a content of a component having a molecular weight measured by gel permeation chromatography (GPC) of not less than 10,000 of less than 9 mass % and a bifunctional polymerizable monomer represented by the following formula (1). (wherein B and B′ are each an linear or branched alkylene group having 2 to 15 carbon atoms, “c” is an average value of 1 to 20, when a plurality of B's are existent, B's may be the same or different, and R5 and R6 are each a hydrogen atom or methyl group.)
Abstract:
The fine hollow particle of the present invention is a fine hollow particle composed of a resin film comprising a melamine-based resin, in which the resin film is composed of a plurality of small piece-shaped portions and a bonding portion for bonding the plurality of small piece-shaped portions. According to the present invention, it is possible to provide stable fine hollow particles having excellent solvent resistance and heat resistance, good dispersibility, and a large particle diameter.
Abstract:
The present invention relates to a curable composition containing (A) a cyclic molecule that contains three or more side chains each having at a terminal thereof an active hydrogen-containing group, (B) a urethane prepolymer having an iso(thio)cyanate group on each of both terminals of a molecule, (C) a diol, and (D) an amino group-containing monomer. According to the present invention, it is possible to provide a curable composition that gives a cured product having a high abrasion resistance and capable of exhibiting superior mechanical properties, in particular, a curable composition that can give a cured product capable of being suitably used in a polishing pad.
Abstract:
The hollow microballoons of the invention are hollow microballoons formed of a resin produced by polymerizing a polymerizing composition that contains a polyrotaxane monomer having at least two polymerizable functional groups in the molecule and a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in the molecule. Using the hollow microballoons of the invention, a CMP polishing pad having excellent polishing characteristics and durability can be provided.
Abstract:
A photochromic curable composition comprising (A) a polymerizable monomer component that contains a (meth)acrylic polymerizable monomer (X), and (B) a photochromic compound, wherein the (meth)acrylic polymerizable monomer (X) is constituted by 80 to 97 parts by mass of a polyfunctional monomer (Xp) having not less than two (meth)acrylic groups in a molecule thereof, and 3 to 20 parts by mass of a monofunctional monomer (Xm) having one (meth)acrylic group in a molecule thereof, the monofunctional polymerizable monomer (Xm) is constituted by an epoxy group-containing monomer (Xm1) and an isocyanate group-containing monomer (Xm2), and the isocyanate group-containing monomer (Xm2) and the epoxy group-containing monomer (Xm1) are contained at a mass ratio of Xm2/Xm1=3 to 40.
Abstract:
A curable composition which comprises a carbonate-based polymerizable monomer represented by the following formula, other polymerizable monomers and a photochromic compound, can be used even under high-temperature and high-humidity conditions without any problems and provides a cured product having excellent photochromic properties. wherein A and A′ are each a linear or branched alkylene group having 2 to 15 carbon atoms, “a” is an average value of 1 to 20, when there are a plurality of A's, A's may be the same or different, R1 is a hydrogen atom or methyl group, and R2 is a (meth)acryloyloxy group or hydroxyl group.
Abstract:
A microballoon according to the present invention contains, in a surface layer of the microballoon, a polymerizable functional group having reactivity with an iso(thio)cyanate group, and the microballoon has a particle diameter of 10 μm to 200 μm. When the microballoon according to the present invention is used in a CMP polishing pad, excellent polishing characteristics and excellent durability of the polishing pad can be exhibited.
Abstract:
The CMP laminated polishing pad of the present invention includes at least a polishing layer and an under layer, wherein the under layer contains a resin obtained by polymerizing a polymerizable composition containing: (A) a polyrotaxane monomer having at least two polymerizable functional groups in a molecule; and (B) a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in a molecule. According to the present invention, a polishing pad having not only good wear resistance but also excellent polishing characteristics (high polishing rate, low scratch property, and high flatness) can be provided.
Abstract:
The hollow microballoons for CMP polishing pad of the invention are formed of at least one resin selected from the group consisting of a melamine resin, a urea resin and an amide resin and have an average particle size of 1 to 100 μm. According to the invention, there can be provided hollow microballoons for CMP polishing pad, which, when used in CMP polishing pad, exhibit excellent polishing characteristics, and can stably produce CMP polishing pad even in production of CMP polishing pad.