摘要:
A semiconductor latch circuit formed of a plurality of integrated injection logic (abbreviated as "IIL") units each comprising a switching transistor acting as a switching element and an injector transistor acting as an injector, wherein a Schottky diode is connected to the base of the switching transistor.
摘要:
An integrated injection logic circuit includes a plurality of integrated injection logic gates each having a PNP transistor for injector and NPN transistor for signal inversion, and an injector common line to which the respective injector PNP transistors are commonly connected. A test pad for electric probing is provided at least one location of the injector common line.
摘要:
A semiconductor device comprises a P type semiconductor substrate; an N type layer buried in the P type substrate; and an N type isolating region extending from the surface of the P type substrate to the N type buried region to provide a P type isolated region in the P type substrate. In the P type isolated region marked off by the N type isolating region is formed a first N type region so as not to contact the N type isolating region and buried region and a P type second region is diffused in the first N type region. A logic circuit is constituted by a first vertical PNP transistor formed of the P type second region, first N type region and P type isolated region and a second vertical NPN transistor formed of the first N type region, P type isolated region and N type buried region.
摘要:
In the semiconductor device, a P.sup.- conductivity type semiconductor layer is formed on an N.sup.+ conductivity type semiconductor substrate by vapor phase growth technique, and a first N conductivity type region is formed in the P.sup.- conductivity type layer by diffusion to extend into the N.sup.+ conductivity type substrate and to surround a portion of the P.sup.- conductivity type semiconductor layer thereby isolating that portion from the remainder. A second conductivity type region is formed in the first region by diffusion and a third N conductivity type region is formed on the isolated region of the P.sup.- conductivity type layer. At least one metal region is bonded to the isolated region and at least one metal region is bonded to the third region to form respective metal-semiconductor contact diodes. The second region, the first region and the P.sup.- conductivity type layer constitute a lateral PNP transistor while the third region, the P.sup.- conductivity type semiconductor layer and the N.sup.+ conductivity type semiconductor substrate constitute a vertical NPN transistor.
摘要:
In a clutch manufacturing method, inner peripheral portions of drum members, of two clutches are connected to a sleeve member, and a piston, a seal plate and a return spring are provided between the drum members, an insulator to apply electric isolation between the piston and the drum member or between the seal plate and another drum member is attached to either the piston or the seal plate. Then, the drum member, to which the electric isolation with the insulator is not applied, is connected to the sleeve member. Then, the piston, return sprig and seal plate are assembled to the sleeve member to which the drum member has been connected. Finally, the drum member, to which the electric isolation with the insulator has been applied, is connected to the sleeve member with electric welding.
摘要:
A superabrasive wire saw-wound structure includes a superabrasive wire saw (10) formed with an average diameter D and a reel (1). The superabrasive wire saw (10) includes a core wire (11), a bonding material (12) surrounding a surface of the core wire (11), and a plurality of superabrasive grains (13) bonded to the surface of the core wire (11) with the bonding material (12). The reel (1) includes a peripheral surface (2) having one end (3) and the other end (4). The superabrasive wire saw (10) which is to be unreeled successively toward a workpiece is wound around the peripheral surface (2) reciprocatingly between the one end (3) and the other end (4) to be multi-layered. A pitch P for winding the superabrasive wire saw (10) around the peripheral surface (2) between the one end (3) and the other end (4) satisfies a relation of D
摘要:
A buffer circuit is provided wherein bipolar transistors are connected to the output terminal of an IIL gate. The buffer circuit includes an IIL gate having a plurality of output terminals. The output terminals of the IIL gate are respectively connected to the bases of the bipolar transistors of which the emitter-collector paths are connected in series between a buffer output terminal and a reference voltage terminal.
摘要:
A superabrasive wire saw-wound structure includes a superabrasive wire saw (10) formed with an average diameter D and a reel (1). The superabrasive wire saw (10) includes a core wire (11), a bonding material (12) surrounding a surface of the core wire (11), and a plurality of superabrasive grains (13) bonded to the surface of the core wire (11) with the bonding material (12). The reel (1) includes a peripheral surface (2) having one end (3) and the other end (4). The superabrasive wire saw (10) which is to be unreeled successively toward a workpiece is wound around the peripheral surface (2) reciprocatingly between the one end (3) and the other end (4) to be multi-layered. A pitch P for winding the superabrasive wire saw (10) around the peripheral surface (2) between the one end (3) and the other end (4) satisfies a relation of D
摘要:
This invention provides a fluorocarbon resin aqueous coating composition comprising:(a) a fluorocarbon resin, and based on the amount by weight of the resin(b) about 1 to about 10% by weight of a silicone emulsion (calculated as silicone oil contained),(c) about 1 to about 40% by weight of a flaky inorganic material, and(d) about 3 to about 10% by weight of a nonionic surfactant, or a mixture of nonionic surfactant and anionic surfactant,the composition containing about 25 to about 75% by weight of water based on the whole composition.
摘要:
An integrated injection logic having a first semiconductor region of first conductivity type, a second semiconductor region of second conductivity type formed in the first semiconductor region, a plurality of third semiconductor regions of first conductivity type formed in the second semiconductor region, and a fourth semiconductor region of second conductivity type formed in the first semiconductor region. A fifth semiconductor region of second conductivity type is formed in the first semiconductor region and in the vicinity of the second semiconductor region and is connected to one of the plurality of third semiconductor regions in order to eliminate minority carriers stored in the first semiconductor region and the second semiconductor region.