公开(公告)号：US20070126314A1

公开(公告)日：2007-06-07

申请号：US11566377

申请日：2006-12-04

申请人： Hitoshi Ohmori ,  Yutaka Watanabe ,  Shinya Morita ,  Yoshihiro Uehara ,  Weimin Lin ,  Kazutoshi Katahira

发明人： Hitoshi Ohmori ,  Yutaka Watanabe ,  Shinya Morita ,  Yoshihiro Uehara ,  Weimin Lin ,  Kazutoshi Katahira

IPC分类号： H01L41/00

CPC分类号： G01B7/012 ,  G01B3/008 ,  G01B5/012 ,  G01B11/007

摘要： There is disclosed a micro surface shape measurement probe including a probe shaft 4 having at a distant end thereof a probe member 2 for contacting an object 1 to be measured, a probe body 21 provided with support means for movably supporting the probe shaft 4 in a non-contact manner, a pressing device for pressing and moving the probe shaft 4 toward the object 1 to be measured, a piezoelectric sensor 8a incorporated in the probe body 21 so that a reactive force acts to a pressing force applied to the probe shaft by the pressing device, a load detecting device 8b to measure a load acting on the piezoelectric sensor, a control device 9 for adjusting the pressing force applied by the pressing device based on the load detected by the load detecting device, and a displacement amount measuring device for measuring a position of the probe member 2 in contact with the object 1 to be measured by the pressing force adjusted by the control device 9.

摘要翻译： 公开了一种微型表面形状测量探针，其包括探针轴4，探针轴4的远端具有用于接触被测量物体1的探针构件2，探针体21，其设置有用于将探针轴4可移动地支撑在一起的支撑装置 用于将探针轴4朝向待测量物体1按压并移动的按压装置，结合在探针体21中的压电传感器8，使得反作用力作用于施加到探针轴的压力 通过按压装置，用于测量作用在压电传感器上的负载的负载检测装置8b，用于基于由负载检测装置检测到的负载来调整由加压装置施加的按压力的控制装置9和位移量 测量装置，用于通过由控制装置9调节的按压力来测量与待测量物体1接触的探针构件2的位置。

公开(公告)号：US20050225346A1

公开(公告)日：2005-10-13

申请号：US11148386

申请日：2005-06-09

申请人： Noboru Saito ,  Hiroyuki Takahashi ,  Noriyuki Igarashi ,  Keiichi Fukumoto ,  Hiroto Nakamura ,  Yutaka Watanabe ,  Kenichi Shimada

发明人： Noboru Saito ,  Hiroyuki Takahashi ,  Noriyuki Igarashi ,  Keiichi Fukumoto ,  Hiroto Nakamura ,  Yutaka Watanabe ,  Kenichi Shimada

IPC分类号： G01R31/26 ,  G01R1/04 ,  G01R31/00 ,  G01R31/01 ,  G01R31/02 ,  G01R31/28 ,  G01R31/303

CPC分类号： G01R31/01 ,  G01R1/0458 ,  G01R31/2806 ,  G01R31/2862 ,  G01R31/2863 ,  G01R31/2868 ,  G01R31/2877

摘要： A device testing apparatus including a connection terminal to which an electronic device under test is detachably attached, a pusher for pushing the electronic device in the direction of the connection terminal so as to connect the electronic device to the connection terminal, and a cooling unit for cooling the electronic device. As the cooling unit, an element cooling the device using electricity is for example used. The cooling unit includes a cooling medium blower for blowing a cooling medium around the electronic device and heat exchange projections or depressions for raising the cooling efficiency by blowing a cooling medium. In the device testing apparatus, even if the electronic device generates heat on its own during testing, the electronic device is cooled through the pusher, connection terminals, or socket, so the effect of the heat generated by the electronic device is canceled out and the electronic device can be tested at the predetermined temperature as prescribed in the specification.

摘要翻译： 一种装置测试装置，包括可拆卸地安装有被测试的电子设备的连接端子，用于沿着连接端子的方向推动电子设备以将电子设备连接到连接端子的推动器，以及用于 冷却电子设备。 作为冷却单元，例如使用电力冷却装置的元件。 冷却单元包括用于吹送电子设备周围的冷却介质的冷却介质鼓风机和通过吹送冷却介质而提高冷却效率的热交换突起或凹部。 在设备测试装置中，即使电子设备在测试期间自身产生热量，电子设备通过推动器，连接端子或插座被冷却，因此电子设备产生的热量的影响被消除，并且 电子设备可以按照说明书中规定的预定温度进行测试。

公开(公告)号：US06947519B2

公开(公告)日：2005-09-20

申请号：US09951456

申请日：2001-09-14

申请人： Kenji Itoga ,  Shunichi Uzawa ,  Yutaka Watanabe ,  Toyoki Kitayama

发明人： Kenji Itoga ,  Shunichi Uzawa ,  Yutaka Watanabe ,  Toyoki Kitayama

IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K1/06 ,  G21K1/10 ,  G21K5/02 ,  G21K5/04 ,  H01L21/027 ,  H05H13/04 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F7/70008 ,  G03F7/70191 ,  G03F7/70941 ,  G21K1/06

摘要： An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.

摘要翻译： X射线曝光装置通过包括X射线反射镜的光路从同步加速器辐射源的称为同步加速器辐射的光提取曝光X射线，并使用所提取的X射线进行曝光。 X射线镜含有在波长范围小于0.45nm，波长范围超过0.7nm的吸收边缘的材料，从而使用在0.45nm〜0.7nm的范围内的X射线进行曝光 。 X射线镜包含选自铁，钴，镍，铜，锰，铬及其合金，氮化物，碳化物和硼化物中的至少一种材料。

公开(公告)号：US06919734B2

公开(公告)日：2005-07-19

申请号：US10716613

申请日：2003-11-20

申请人： Noboru Saito ,  Hiroyuki Takahashi ,  Noriyuki Igarashi ,  Keiichi Fukumoto ,  Hiroto Nakamura ,  Yutaka Watanabe ,  Kenichi Shimada

发明人： Noboru Saito ,  Hiroyuki Takahashi ,  Noriyuki Igarashi ,  Keiichi Fukumoto ,  Hiroto Nakamura ,  Yutaka Watanabe ,  Kenichi Shimada

IPC分类号： G01R31/26 ,  G01R1/04 ,  G01R31/00 ,  G01R31/01 ,  G01R31/02 ,  G01R31/28 ,  G01R31/303

CPC分类号： G01R31/01 ,  G01R1/0458 ,  G01R31/2806 ,  G01R31/2862 ,  G01R31/2863 ,  G01R31/2868 ,  G01R31/2877

摘要： A device testing apparatus including a connection terminal to which an electronic device under test is detachably attached, a pusher for pushing the electronic device in the direction of the connection terminal so as to connect the electronic device to the connection terminal, and a cooling unit for cooling the electronic device. As the cooling unit, an element cooling the device using electricity is for example used. The cooling unit includes a cooling medium blower for blowing a cooling medium around the electronic device and heat exchange projections or depressions for raising the cooling efficiency by blowing a cooling medium. In the device testing apparatus, even if the electronic device generates heat on its own during testing, the electronic device is cooled through the pusher, connection terminals, or socket, so the effect of the heat generated by the electronic device is canceled out and the electronic device can be tested at the predetermined temperature as prescribed in the specification.

公开(公告)号：US20050096183A1

公开(公告)日：2005-05-05

申请号：US10504818

申请日：2003-10-10

申请人： Yutaka Watanabe ,  Hiroshi Watanabe ,  Yasushi Tokuda

发明人： Yutaka Watanabe ,  Hiroshi Watanabe ,  Yasushi Tokuda

IPC分类号： B60K31/04 ,  B60T7/12 ,  B60T8/24 ,  B60K41/20

CPC分类号： B60T8/245 ,  B60K31/04 ,  B60T7/12 ,  B60T7/122 ,  B60T2201/04 ,  B60W2540/10 ,  B60W2540/12 ,  B60W2550/142 ,  Y10T477/80 ,  Y10T477/816

摘要： The invention is intended to provide a downhill speed control system which employs a method of setting a target vehicle speed in advance, thereby improving controllability when a vehicle runs down a slope, and giving an operator improved operability in setting of the target vehicle speed. Brakes are controlled so that, when the vehicle runs down the slope, an actual vehicle speed is matched with a target speed set by a switch which can set the target speed by selectively or continuously changing plural preset speeds. Also, control constants for PID control are modified depending on settings of a downslope gradient setting switch and a load setting switch. When an acceleration computed from the actual vehicle speed is larger than a target acceleration, the strength of applied brake is increased.

摘要翻译： 本发明旨在提供一种采用预先设定目标车速的方法的下坡速度控制系统，从而提高了当车辆向下坡度时的可控性，并且提高了操作者在设定目标车速方面的可操作性。 制动器被控制，使得当车辆沿着斜坡行驶时，实际车辆速度与由开关设置的目标速度相匹配，该开关可以通过选择性地或连续地改变多个预设速度来设定目标速度。 此外，PID控制的控制常数根据下坡梯度设置开关和负载设置开关的设置进行修改。 当从实际车速计算的加速度大于目标加速度时，施加制动器的强度增加。

公开(公告)号：US06647086B2

公开(公告)日：2003-11-11

申请号：US09859043

申请日：2001-05-17

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K5/04 ,  H05G2/00 ,  H05G2/008

摘要： A proximity X-ray exposure apparatus for irradiating a reticle with X-rays generated from an X-ray source and irradiating a substrate with X-rays that have passed through the reticle. The apparatus includes a plasma X-ray source for generating X-rays by producing plasma, and a control device for controlling X-ray intensity distribution by controlling production of the plasma so that the plasma is produced at a plurality of positions in one irradiating operation of the substrate with the X-rays. The control device controls the X-ray intensity distribution in order to control the plurality of positions so that a required amount of defocusing, which is a size of a projection image corresponding to one point on the reticle formed by irradiating the reticle with X-rays generated at the plurality of positions, can be obtained.

摘要翻译： 一种接近X射线曝光装置，用于用X射线源产生的X射线照射掩模版，并且通过已经通过掩模版的X射线照射衬底。 该装置包括：通过产生等离子体产生X射线的等离子体X射线源;以及控制装置，用于通过控制等离子体的产生来控制X射线强度分布，使得在一次照射操作中在多个位置产生等离子体 的X射线。 控制装置控制X射线强度分布，以便控制多个位置，使得所需量的散焦，其是通过用X射线照射掩模版而形成的与掩模版上的一个点相对应的投影图像的尺寸 在多个位置产生。

公开(公告)号：US06272202B1

公开(公告)日：2001-08-07

申请号：US09426945

申请日：1999-10-26

申请人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： G03F7/70325 ,  G03F1/22 ,  G03F1/50 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/7035 ,  G03F7/70466

摘要： An exposure method for printing a pattern onto a workpiece to be exposed, includes a first exposure step for forming, on the workpiece and by exposure, a transferred image of a first absorbing material pattern formed on a mask and having no periodic structure, and a second exposure step for printing, on the workpiece and by exposure, a diffraction pattern to be produced through Fresnel diffraction due to a second absorbing material pattern formed on the mask and having a periodic structure, the diffraction pattern having a period corresponding to 1/n of a period of the transferred image of the periodic structure pattern, where n is an integer not less than 2, and wherein the first and second exposure steps are performed simultaneously.

摘要翻译： 一种用于将图案印刷到要曝光的工件上的曝光方法包括：第一曝光步骤，用于在工件上形成并且通​​过曝光形成在掩模上形成并且不具有周期性结构的第一吸收材料图案的转印图像，以及 第二曝光步骤，用于在工件上和通过曝光印刷由于在掩模上形成的具有周期性结构的第二吸收材料图案而通过菲涅耳衍射产生的衍射图案，衍射图案具有对应于1 / n的周期 其中n是不小于2的整数，并且其中同时执行第一和第二曝光步骤。

公开(公告)号：US6122598A

公开(公告)日：2000-09-19

申请号：US65064

申请日：1998-04-27

申请人： Yasuo Tanaka ,  Yutaka Watanabe ,  Yoshinori Furuno ,  Takashi Yagyu ,  Yukihiko Sugiyama

发明人： Yasuo Tanaka ,  Yutaka Watanabe ,  Yoshinori Furuno ,  Takashi Yagyu ,  Yukihiko Sugiyama

IPC分类号： E02F3/42 ,  E02F3/43 ,  E02F9/20 ,  E02F9/26 ,  E21C41/26 ,  G06F19/00

CPC分类号： E02F9/205 ,  E02F3/308 ,  E02F3/435 ,  E02F9/2029 ,  E02F9/2045 ,  E02F9/26

摘要： This invention relates to a measuring and display system for loads applied upon digging blasted earth, which can contribute to accurate blasting. An operating direction of a bucket of an excavator is detected by pressure switches 15,16, while a pressure P.sub.B in a bottom compartment 6S.sub.B of a bucket cylinder is detected by a pressure sensor 17. A processor 23 computes a digging position based on signals from a boom angle sensor 18, an arm angle sensor 19, GPS 20 and a magnetic direction sensor 21, integrates pressures P.sub.B during an ON period of the pressure switch 15, and transmits the thus-integrated pressure together with the digging position to a computer 30. The computer 30 displays a map of a lot under blasting and blasting positions on a display, and on the map, also displays the thus-transmitted digging position by a mark X and the integrated pressure by a numeral. With reference to this integrated pressure, a determination is made as to whether the blasting was proper or improper. The results of this determination are used for the next blasting.

摘要翻译： PCT No.PCT / JP97 / 02968 Sec。 371日期：1998年5月27日 102（e）日期1998年4月27日PCT 1997年8月26日PCT公布。 第WO98 / 09026号公报。 日期：1998年3月5日本发明涉及一种用于挖掘爆破土的载荷测量和显示系统，可有助于精确的爆破。 挖掘机的铲斗的操作方向由压力开关15,16检测，而铲斗缸的底部隔间6SB中的压力PB由压力传感器17检测。处理器23基于来自 悬臂角度传感器18，臂角传感器19，GPS 20和磁方向传感器21在压力开关15的接通时段期间积分压力PB，并将这样一体化的压力与挖掘位置一起传递到计算机30 计算机30在显示器上显示爆破和爆破位置下的批次的地图，并且在地图上还通过标记X和积分压力以数字显示如此传送的挖掘位置。 关于这种一体化的压力，确定爆破是否适当或不正确。 该测定的结果用于下一次爆破。

公开(公告)号：US5995886A

公开(公告)日：1999-11-30

申请号：US914235

申请日：1997-08-19

申请人： Yasuo Tanaka ,  Yoshinori Furuno ,  Yutaka Watanabe ,  Takashi Yagyu ,  Yukihiko Sugiyama

发明人： Yasuo Tanaka ,  Yoshinori Furuno ,  Yutaka Watanabe ,  Takashi Yagyu ,  Yukihiko Sugiyama

IPC分类号： F02D29/00 ,  B60K15/077 ,  E02F9/26 ,  F02D29/02 ,  F02D29/04 ,  G07C5/10 ,  G06G7/70

CPC分类号： G07C5/10 ,  B60K15/077 ,  E02F9/26 ,  Y02T10/84

摘要： A system for the estimation of residual service time of a work vehicle includes an arithmetic and logic unit which is inputted with an engine speed and a speed difference from a controller for an engine, with a signal, which indicates whether or not at least one of several control levers has been operated, from a lever position detector, and also with a residual fuel quantity in a fuel tank from a converting device. The residual fuel quantity is determined at intervals of about 1 hour at the arithmetic and logic unit. Upon an elapse of each short period of time, a quantity of fuel consumed during said short time, said quantity being obtained based on a difference in engine speed, is subtracted from the residual fuel quantity, whereby a calculated residual fuel quantity is obtained. A quantity of fuel consumed from a preceding residual fuel quantity measurement period to a current residual fuel quantity measurement period is divided by the calculated residual fuel quantity to obtain a value. The residual fuel quantity is then divided by this value to compute a residual service time, which is then displayed on a display.

摘要翻译： 用于估计作业车辆的剩余使用时间的系统包括输入了与发动机的控制器的发动机转速和速度差的算术和逻辑单元，该信号指示是否至少有一个 几个控制杆已经从杠杆位置检测器操作，并且还具有来自转换装置的燃料箱中的残余燃料量。 在算术和逻辑单元上以约1小时的间隔确定剩余燃料量。 在短时间内经过时，从剩余燃料量中减去在所述短时间内消耗的燃料量，基于发动机转速的差异得到的燃料量，得到计算出的剩余燃料量。 将从前一个剩余燃料量测量周期消耗的燃料量减少到当前剩余燃料量测量周期，除以所计算的剩余燃料量以得到一个值。 然后将剩余燃料量除以该值以计算剩余使用时间，然后显示在显示器上。

公开(公告)号：US5835560A

公开(公告)日：1998-11-10

申请号：US963874

申请日：1997-11-04

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G03F7/708 ,  G21K1/06 ,  G21K5/02

摘要： An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the position of the mirror with respect to the radiation light on the basis of an output of the detector, and a reference table for positioning the driving mechanism and the detector with respect to the same reference.

摘要翻译： 曝光装置包括用于反射来自光源的辐射光的反射镜，用于保持和振荡反射镜的驱动机构，用于检测投射在反射镜上的辐射光束的位置的检测器，用于调节位置的调节机构 基于检测器的输出相对于辐射光的反射镜，以及用于相对于相同基准定位驱动机构和检测器的参考表。