EQUIPMENT AND METHOD FOR DIAGNOSING SLIDING CONDITION OF ROTATING ELECTRICAL MACHINE
    11.
    发明申请
    EQUIPMENT AND METHOD FOR DIAGNOSING SLIDING CONDITION OF ROTATING ELECTRICAL MACHINE 有权
    用于诊断旋转电机滑动条件的设备和方法

    公开(公告)号:US20140118746A1

    公开(公告)日:2014-05-01

    申请号:US14065531

    申请日:2013-10-29

    Applicant: HITACHI, LTD.

    Abstract: Disclosed are equipment and method for diagnosing the sliding condition of a rotating electrical machine that make it possible to achieve early detection of abnormal sliding with a simple configuration containing flexibly arranged elements and reduce the downtime and maintenance cost of the rotating electrical machine. The equipment for diagnosing the sliding condition of a rotating electrical machine includes a light source that emits light onto the sliding surface of a collecting brush relative to the surface of a rotating body of the rotating electrical machine, a light-receiving section that receives the light reflected from the sliding surface, and a determination section that processes a signal from the light-receiving section. The determination section detects an increase in a specific wavelength component of the reflected light to determine whether the sliding condition of the rotating body surface of the rotating electrical machine is abnormal.

    Abstract translation: 公开了用于诊断旋转电机的滑动状态的设备和方法,其能够以包含灵活布置的元件的简单配置来实现异常滑动的早期检测,并且减少了旋转电机的停机时间和维护成本。 用于诊断旋转电机的滑动状态的设备包括:相对于旋转电机的旋转体的表面将光发射到集电刷的滑动面上的光源;受光部,其接收光 从滑动面反射的判定部和处理来自受光部的信号的判定部。 确定部分检测反射光的特定波长分量的增加,以确定旋转电机的旋转体表面的滑动状态是否异常。

    Biochemical analyzer
    14.
    发明授权
    Biochemical analyzer 有权
    生化分析仪

    公开(公告)号:US07978325B2

    公开(公告)日:2011-07-12

    申请号:US12121120

    申请日:2008-05-15

    Abstract: A light amount is increased and an analyzing accuracy can be kept in accordance with an enlargement of a load angle, however, a scattered light tends to be loaded in an analysis accompanying the scattered light and a dynamic range of a concentration which can be measured becomes narrow. A light is dispersed by a light dispersing portion, a load angle of the received light is changed per wavelength, the load angle is made larger in the light of a wavelength having a small light amount, and the load angle is made smaller in the light a wavelength having a large light amount and used for an analysis accompanying a scattered light. Accordingly, it is possible to gain a dynamic range of a concentration which can be measured in the analysis accompanying the scattered light, while increasing the light amount and maintaining the analyzing accuracy.

    Abstract translation: 光量增加,并且可以根据负载角的放大来保持分析精度,然而,伴随散射光的分析倾向于加载散射光,并且可测量的浓度的动态范围变为 狭窄。 通过光分散部分散射光,每波长改变接收光的负载角度,在具有小光量的波长的光中使负载角变大,并且使光的负载角变小 具有大光量的波长并用于伴随散射光的分析。 因此,在增加光量并保持分析精度的同时,可以获得在伴随散射光的分析中可以测量的浓度的动态范围。

    Dual Beam Set-Up for Parousiameter
    15.
    发明申请
    Dual Beam Set-Up for Parousiameter 有权
    双梁设置可调直径

    公开(公告)号:US20080192258A1

    公开(公告)日:2008-08-14

    申请号:US12063126

    申请日:2006-08-04

    Applicant: Sipke Wadman

    Inventor: Sipke Wadman

    Abstract: A scatterometer or parousiameter having a dual beam setup and method for use thereof is provided for producing measurements of optical parameters. The dual beam parousiameter includes a hemispherical dome enclosure (318) sealed at the bottom with a base (320). A radiation source (302) produces radiation in two beams, an illumination beam (304) for illuminating a sample surface (308) and a calibration beam (330) for providing optical characterization information about the illumination beam (304). Each beam is guided into the hemispherical dome enclosure (318) via separate optical paths. An optical imaging device (324) is positioned to acquire an image of scatter radiation (314) scattered by the sample surface (308) illuminated by the illumination beam (304), and acquire an image of the calibration beam, simultaneously. The calibration beam image is used to compensate for variability in optical output of the radiation source (302) when analyzing the scatter radiation data.

    Abstract translation: 提供了具有双光束设置的散射仪或观测器及其使用方法,用于产生光学参数的测量。 所述双光束测光仪包括在底部与底部(320)密封的半球形圆顶罩(318)。 辐射源(302)产生两个光束的辐射,用于照射样品表面(308)的照明光束(304)和用于提供关于照明光束(304)的光学表征信息的校准光束(330)。 每个光束通过分开的光路被引导到半球形圆顶壳体(318)中。 定位光学成像装置(324)以获取被照明光束(304)照射的样品表面(308)散射的散射辐射(314)的图像,同时获取校准光束的图像。 当分析散射辐射数据时,校准光束图像用于补偿辐射源(302)的光输出的变化。

    Blood coagulation analyzer and blood coagulation analyzing method
    16.
    发明申请
    Blood coagulation analyzer and blood coagulation analyzing method 审中-公开
    凝血分析仪和血液凝固分析方法

    公开(公告)号:US20080044912A1

    公开(公告)日:2008-02-21

    申请号:US11889250

    申请日:2007-08-10

    Abstract: A blood coagulation analyzer and analyzing method perform following: (a) preparing a measurement specimen by dispensing a blood specimen and a reagent into a reaction container; (b) emitting light of a plurality of wavelengths to the measurement specimen in the reaction container, the wavelengths comprising a first wavelength for use in a measurement by a blood coagulation time method, and at least one of a second wavelength for use in a measurement by a synthetic substrate method and a third wavelength for use in a measurement by an immunoturbidimetric method; (c) detecting light of a plurality of wavelengths corresponding to the light emitted in (b), from the measurement specimen, by a light receiving element, and acquiring data corresponding to each wavelength; and (d) conducting an analysis based on the data corresponding to one of the wavelengths among the acquired data, and acquiring a result of the analysis.

    Abstract translation: 凝血分析仪和分析方法执行以下操作:(a)通过将血液样本和试剂分配到反应容器中来制备测量样本; (b)将多个波长的光发射到所述反应容器中的测定试样,所述波长包含用于通过凝血时间法测定的第一波长,以及用于测定的第二波长中的至少一个 通过合成底物法和第三波长,用于通过免疫比浊法测定; (c)通过光接收元件从所述测量样本中检测与(b)中发射的光相对应的多个波长的光,并获取对应于每个波长的数据; 以及(d)基于与所获取的数据中的一个波长对应的数据进行分析,并获取分析结果。

    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
    17.
    发明申请
    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected 失效
    半导体基板的制造方法以及检查被检查体的图案的缺陷的方法和装置

    公开(公告)号:US20070070336A1

    公开(公告)日:2007-03-29

    申请号:US11605242

    申请日:2006-11-29

    Abstract: A method of inspecting a specimen, including: emitting a light from a lamp of a light source; illuminating a specimen on which plural patterns are formed with the light emitted from the light source and, passed through an objective lens; forming an optical image of the specimen by collecting light reflected from the specimen by the illuminating and passed through the objective lens and a image forming lens; detecting the optical image with a TDI image sensor; and processing a signal outputted from the TDI image sensor and detecting a defect of a pattern among the plural patterns formed on the specimen, wherein the image detected by the TDI image sensor is formed with light having a wavelength selected from the wavelengths of the light emitted from the light source.

    Abstract translation: 一种检查样本的方法,包括:从光源的灯发射光; 用从光源发射的光照射形成有多个图案的样本,并通过物镜; 通过照射通过收集从样本反射的光并通过物镜和成像透镜来形成样本的光学图像; 用TDI图像传感器检测光学图像; 并处理从TDI图像传感器输出的信号,并且检测在样本上形成的多个图案之间的图案的缺陷,其中由TDI图像传感器检测到的图像由具有选自发射的光的波长的波长的光形成 从光源。

    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
    18.
    发明授权
    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected 失效
    半导体基板的制造方法以及检查被检查体的图案的缺陷的方法和装置

    公开(公告)号:US07180584B2

    公开(公告)日:2007-02-20

    申请号:US10686584

    申请日:2003-10-17

    Abstract: A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect which occurs on the pattern.

    Abstract translation: 一种用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法及其装置以及以高产率制造半导体晶片等半导体基板的半导体基板的制造方法和系统。 通过将通过物镜的环形照明照射到安装在台架上的晶片上,检查被检查物体上的微细图案,晶片上具有微细精细图案。 照明光可以根据在物镜的光瞳上检测到的图像而被圆形或椭圆偏振并且被控制,并且通过检测来自晶片的反射光来获得图像信号。 将图像信号与参考图像信号进行比较,并且检测出显示不一致的图案的一部分作为缺陷,从而同时以高分辨率检测微细微图案或微细图案上的缺陷。 此外,通过分析缺陷的原因和在图案上发生的缺陷因素来控制生产线的工艺条件。

    Method and system for wide-area ultraviolet detection of forensic evidence
    19.
    发明申请
    Method and system for wide-area ultraviolet detection of forensic evidence 有权
    广泛紫外检测方法和系统的法医证据

    公开(公告)号:US20060133643A1

    公开(公告)日:2006-06-22

    申请号:US11014524

    申请日:2004-12-16

    Abstract: The present invention comprises a method for detecting and analyzing forensic evidence. A digital image is taken of background radiation from a suspected-evidence area suspected to contain evidence. The suspected-evidence area is exposed to a high-intensity pulse of ultraviolet radiation. Another digital image is taken of the fluorescence within the exposed suspected-evidence area. The digital images are processed to create a composite digital image showing regions of evidence. The composite digital image is analyzed to determine the wavelength of the fluorescent radiation emitted by the regions of evidence. The composite evidence image and the analysis results are displayed. The present invention also comprises a forensic evidence detection and analysis system that includes a digital camera, an ultraviolet light source, a computer and display, and a computer program installed on the computer.

    Abstract translation: 本发明包括检测和分析法医证据的方法。 数字图像是从怀疑含有证据的疑似证据区域拍摄的背景辐射。 疑似证据区域暴露于高强度的紫外线脉冲。 在暴露的疑似证据区域内拍摄另一个数字图像。 处理数字图像以创建显示证据区域的复合数字图像。 分析复合数字图像以确定由证据区域发射的荧光辐射的波长。 显示复合证据图像和分析结果。 本发明还包括一种法医证据检测和分析系统,其包括数字照相机,紫外光源,计算机和显示器以及安装在计算机上的计算机程序。

    System for identifying defects in a composite structure
    20.
    发明申请
    System for identifying defects in a composite structure 有权
    用于识别复合结构中的缺陷的系统

    公开(公告)号:US20040031567A1

    公开(公告)日:2004-02-19

    申请号:US10217805

    申请日:2002-08-13

    Abstract: The present invention provides an improved system for identifying defects in a composite structure by providing a light source such that defects, and in particular dark defects on a dark background and/or light defects on a light background, can be identified by capturing images of the illuminated composite structure. In particular, the improved system for identifying defects in a composite structure may provide a reflective surface, dispersion elements, and multiple and/or moveable light source(s) and/or camera(s) in order to ensure that the most accurate images of any area of the composite structure, even curved or contoured areas, are captured and processed. As a result, the system of the present invention permits the operator to quickly identify and correct defects which would otherwise create structural flaws or inconsistencies that may affect the integrity of the composite structure.

    Abstract translation: 本发明提供了一种用于通过提供光源来识别复合结构中的缺陷的改进的系统,使得可以通过捕获图像的图像来识别缺陷,特别是暗背景上的暗缺陷和/或光背景上的光缺陷 照明复合结构。 特别地,用于识别复合结构中的缺陷的改进的系统可以提供反射表面,色散元件以及多个和/或可移动的光源和/或照相机,以便确保最准确的图像 复合结构的任何区域,甚至弯曲或轮廓区域被捕获和处理。 结果,本发明的系统允许操作者快速地识别和纠正否则将产生可能影响复合结构的完整性的结构缺陷或不一致的缺陷。

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