公开(公告)号：US08558198B2

公开(公告)日：2013-10-15

申请号：US13177621

申请日：2011-07-07

Applicant: Boon-Chau Tong

Inventor： Boon-Chau Tong

IPC: G21G5/00

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/31703 ,  H01J2237/31705

Abstract: A beam line system includes a hollow tube and a plurality of protruding structures. The hollow tube has an inlet and an outlet. An ion beam emitted by the ion implanter is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet. The protruding structures are formed on an inner wall of the hollow tube. Each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.

Abstract translation: 束线系统包括中空管和多个突出结构。 中空管具有入口和出口。 由离子注入机发射的离子束通过入口引入中空管，并通过出口从中空管中排出。 突出结构形成在中空管的内壁上。 每个突出结构具有用于反射离子束的一部分的反射表面。

公开(公告)号：US08158937B2

公开(公告)日：2012-04-17

申请号：US12546069

申请日：2009-08-24

Applicant: Mitsuru Koizumi ,  Hidetoshi Nishiyama

Inventor： Mitsuru Koizumi ,  Hidetoshi Nishiyama

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/2004 ,  H01J2237/2608

Abstract: A particle beam system is offered which can prevent contamination of the inside of the objective lens, the objective lens being located at the front end of the optical column. The particle beam system has an optical column equipped with a particle beam source for emitting a particle beam and a beam passage pipe through which the beam passes. The system further includes a vacuum chamber connected with the front end portion of the column. The beam passed through the pipe is released from the front end of the column. An inner pipe is detachably disposed inside the beam passage pipe located at the front-end side of the column.

Abstract translation: 提供一种粒子束系统，其可以防止物镜内部的污染，物镜位于光学柱的前端。 粒子束系统具有装备有用于发射粒子束的粒子束源和光束通过的射束通过管的光学柱。 该系统还包括与柱的前端部连接的真空室。 通过管道的梁从柱的前端释放。 内管可拆卸地设置在位于塔的前端侧的梁通道管内。

公开(公告)号：US5455426A

公开(公告)日：1995-10-03

申请号：US259809

申请日：1994-06-15

Applicant: Christian K. Forgey ,  Darryl A. Bennett

Inventor： Christian K. Forgey ,  Darryl A. Bennett

IPC: H01J37/30 ,  H01J37/20

CPC classification number: H01J37/3002 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/31701

Abstract: A system for removal of contaminating particles from a target chamber (1) which comprises the target chamber having an aperture (3) for entry of an ion beam (2) therein, an orienting device (7, 9, 13, 15) within the target chamber for orienting a wafer (11) with respect to the ion beam and a reusable, removable shield (23), preferably of stainless steel, disposed along the interior walls of the target chamber and secured to the interior walls. A securing device (24) is provided for releasably securing the shield to the interior walls of the target chamber.

Abstract translation: 一种用于从目标室（1）去除污染颗粒的系统，其包括所述目标室，所述目标室具有用于在其中进入离子束（2）的孔（3），所述定向装置（7,9,13,15） 目标室，用于相对于离子束定向晶片（11），以及可重复使用的可移除的屏蔽（23），优选地为不锈钢，沿着靶室的内壁设置并固定到内壁。 提供固定装置（24），用于将屏蔽件可释放地固定到目标室的内壁。

公开(公告)号：US10002740B2

公开(公告)日：2018-06-19

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Ryo Tajima ,  Kenichi Suematsu ,  Kenji Watanabe ,  Yasushi Toma ,  Kenji Terao ,  Takeshi Murakami

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0268 ,  H01J2237/16 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US09543110B2

公开(公告)日：2017-01-10

申请号：US14135754

申请日：2013-12-20

Applicant: Axcelis Technologies, Inc.

Inventor： Neil Colvin ,  Tseh-Jen Hsieh

IPC: H01J27/20 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/082 ,  H01J2237/31705

Abstract: An ion source chamber for ion implantation system includes a housing that at least partially bounds an ionization region through which high energy electrons move from a cathode to ionize gas molecules injected into an interior of the housing; a liner section defining one or more interior walls of the housing interior, wherein each liner section includes a interiorly facing surface exposed to the ionization region during operation the ion implantation system; a cathode shield disposed about the cathode; a repeller spaced apart from the cathode; a plate including a source aperture for discharging ions from the ion source chamber; wherein at least one of the repeller, the liner section, the cathode shield; the plate, or an insert in the plate defining the source aperture comprise silicon carbide, wherein the silicon carbide is a non-stoichiometric sintered material having excess carbon.

Abstract translation: 用于离子注入系统的离子源室包括壳体，该壳体至少部分地界定电离区域，高能电子通过该电离区域从阴极移动到电离注入壳体内部的气体分子; 限定所述壳体内部的一个或多个内壁的衬里部分，其中每个衬里部分包括在所述离子注入系统的操作期间暴露于所述电离区域的面向内的表面; 围绕阴极设置的阴极屏蔽; 与阴极间隔开的推斥器; 包括用于从离子源室排出离子的源孔的板; 其中所述推斥板，所述衬套部分，所述阴极罩中的至少一个; 该板或限定源孔的板中的插入物包括碳化硅，其中碳化硅是具有过量碳的非化学计量烧结材料。

公开(公告)号：US07863563B2

公开(公告)日：2011-01-04

申请号：US11683596

申请日：2007-03-08

Applicant: Lonn E. Moore ,  Rajinder S. Dhaliwal ,  Maris A. Sturans

Inventor： Lonn E. Moore ,  Rajinder S. Dhaliwal ,  Maris A. Sturans

IPC: G01N23/00 ,  G21K7/00 ,  A61N5/00 ,  G21G5/00

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0268 ,  H01J2237/16

Abstract: Embodiments of the present invention provide an apparatus employing an electron beam to expose the structure of a micro device and produce an image of the structure. The apparatus includes an electron gun producing the electron beam; an electron beam column having one or more segments that shape, focus and/or deflect the electron beams; and one or more center tubes along the electron beam column that provides a high vacuum environment for and guiding the electron beam to a target object coated with an electron sensitive resist. At least one of the center tubes is a carbon tube made of solid carbon material.

Abstract translation: 本发明的实施例提供一种使用电子束来暴露微器件的结构并产生该结构的图像的装置。 该装置包括产生电子束的电子枪; 具有一个或多个使电子束成形，聚焦和/或偏转的段的电子束柱; 以及沿着电子束柱的一个或多个中心管，其提供高真空环境并将电子束引导到涂覆有电子敏感抗蚀剂的目标物体。 至少一个中心管是由固体碳材料制成的碳管。

公开(公告)号：US20100051803A1

公开(公告)日：2010-03-04

申请号：US12546069

申请日：2009-08-24

Applicant: Mitsuru Koizumi ,  Hidetoshi Nishiyama

Inventor： Mitsuru Koizumi ,  Hidetoshi Nishiyama

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/2004 ,  H01J2237/2608

Abstract: A particle beam system is offered which can prevent contamination of the inside of the objective lens, the objective lens being located at the front end of the optical column. The particle beam system has an optical column equipped with a particle beam source for emitting a particle beam and a beam passage pipe through which the beam passes. The system further includes a vacuum chamber connected with the front end portion of the column. The beam passed through the pipe is released from the front end of the column. An inner pipe is detachably disposed inside the beam passage pipe located at the front-end side of the column.

Abstract translation: 提供一种粒子束系统，其可以防止物镜内部的污染，物镜位于光学柱的前端。 粒子束系统具有装备有用于发射粒子束的粒子束源和光束通过的射束通过管的光学柱。 该系统还包括与柱的前端部连接的真空室。 通过管道的梁从柱的前端释放。 内管可拆卸地设置在位于塔的前端侧的梁通道管内。

公开(公告)号：US20090166565A1

公开(公告)日：2009-07-02

申请号：US12003852

申请日：2008-01-02

Applicant: Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

Inventor： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC: G21K5/00

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in the ion beam. This entrained material is a source of contamination. The present invention provides such components with a chamber having an elongate slot opening defined by edges, and operating the ion implanter such that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

Abstract translation: 本发明涉及离子注入机中的组件，其可以看到离子束的入射，例如光束倾倒或光束停止。 这些组分将倾向于从它们的表面离子溅射材料，并且溅射的材料可能被夹带在离子束中。 这种夹带的材料是污染源。 本发明提供了这样一些组件，其具有由边缘限定的细长狭槽开口的腔室，并操作离子注入机，使得离子束的中心部分通过开口进入组件，边缘至少夹住离子的周边部分 光束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。

公开(公告)号：US20080295872A1

公开(公告)日：2008-12-04

申请号：US11857975

申请日：2007-09-19

Applicant: Martin Riker ,  Wei W. Wang

Inventor： Martin Riker ,  Wei W. Wang

IPC: B08B5/00

CPC classification number: H01J37/32724 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32871 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/2001 ,  H01J2237/335 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67207 ,  Y10T29/49826

Abstract: A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas inlet channel of a substrate cleaning chamber. The substrate heating pedestal comprises an annular plate having a substrate receiving surface with a plurality of ceramic balls positioned in an array of recesses. A process kit comprises a top plate, top liner, gas distributor plate, bottom liner, and focus ring.

Abstract translation: 衬底清洁室包括各种部件，例如可消耗陶瓷衬垫，衬底加热基座和处理套件。 消耗性陶瓷衬套用于将远程气体激发器的气体出口通道连接到衬底清洁室的气体入口通道。 基板加热基座包括具有基板接收表面的环形板，多个陶瓷球定位在凹槽阵列中。 处理套件包括顶板，顶衬，气体分配器板，底衬和聚焦环。

公开(公告)号：US20070134894A1

公开(公告)日：2007-06-14

申请号：US11422092

申请日：2006-06-05

Applicant: Alan Chandler ,  Tushar Desai ,  Ellis Hayford ,  Nicholas Mone ,  James Nakos

Inventor： Alan Chandler ,  Tushar Desai ,  Ellis Hayford ,  Nicholas Mone ,  James Nakos

IPC: H01L21/04 ,  H01L23/58

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268

Abstract: An improved performance charged beam apparatus and method of improving the performance of charged beam apparatus. The apparatus including: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.

Abstract translation: 一种改进的性能带电束装置和改善带电束装置性能的方法。 该装置包括：具有内表面的室; 用于抽空室的泵口; 腔室内的衬底保持器; 室内的带电粒子束，由源产生的带电束和带电粒子束撞击衬底; 以及与室的内表面的一个或多个不同区域接触的一个或多个衬垫，衬垫防止由带电束和衬底的相互作用产生的材料涂覆室的内表面的一个或多个不同区域 。