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    Aberration-correcting cathode lens microscopy instrument
    17.
    发明申请
    Aberration-correcting cathode lens microscopy instrument 有权
    畸变校正阴极透镜显微镜仪器

    公开(公告)号：US20070200070A1

    公开(公告)日：2007-08-30

    申请号：US11364299

    申请日：2006-02-28

    Applicant: Rudolf Tromp

    Inventor： Rudolf Tromp

    IPC: H01J37/153 ,  G01N23/225 ,  G01N23/227 ,  H01J37/05 ,  H01J37/26 ,  H01J49/46

    CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/252 ,  H01J37/295 ,  H01J2237/055 ,  H01J2237/1534 ,  H01J2237/2538 ,  H01J2237/2544

    Abstract: An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first magnetic deflector is also configured for projection of a first energy dispersed electron diffraction pattern in an exit plane of the first magnetic deflector. The instrument also has an electrostatic lens disposed in the exit plane of a first magnetic deflector, as well as a second magnetic deflector substantially identical to the first magnetic deflector. The second magnetic deflector is disposed for reception of the first energy dispersed electron diffraction pattern from the electrostatic lens. The second magnetic deflector is also configured for projection of a second non-dispersed electron diffraction pattern in a first exit plane of the second magnetic deflector. The instrument also has an electron mirror configured for correction of one or more aberrations in the second non-dispersed electron diffraction pattern. The electron mirror is disposed for reflection of the second non-dispersed electron diffraction pattern to the second magnetic deflector for projection of a second energy dispersed electron diffraction pattern in a second exit plane of the second magnetic deflector.

    Abstract translation: 提供了一种像差校正显微镜仪器。 仪器具有设置用于接收第一非分散电子衍射图案的第一磁偏转器。 第一磁偏转器还被配置用于在第一磁偏转器的出射平面中投射第一能量分散电子衍射图案。 仪器还具有设置在第一磁偏转器的出射平面中的静电透镜以及与第一磁偏转器基本相同的第二磁偏转器。 第二磁偏转器被设置用于从静电透镜接收第一能量分散电子衍射图案。 第二磁偏转器还被配置用于在第二磁偏转器的第一出射平面中投射第二非分散电子衍射图案。 仪器还具有配置用于校正第二非分散电子衍射图案中的一个或多个像差的电子反射镜。 电子反射镜被设置用于将第二非分散电子衍射图案反射到第二磁偏转器，用于在第二磁偏转器的第二出射平面中投射第二能量分散电子衍射图案。

    Spectrometer for surface analysis and method therefor
    19.
    发明申请
    Spectrometer for surface analysis and method therefor 有权
    用于表面分析的光谱仪及其方法

    公开(公告)号：US20070115468A1

    公开(公告)日：2007-05-24

    申请号：US11588689

    申请日：2006-10-27

    Applicant: Bryan Barnard

    Inventor： Bryan Barnard

    IPC: G01J3/00

    CPC classification number: H01J37/29 ,  H01J37/228 ,  H01J37/252

    Abstract: A spectrometer (10) for sample surface analysis by irradiation of the surface by primary particles and a corresponding method of surface analysis spectroscopy. The spectrometer (10) provides sample viewing and secondary charged particle collection substantially normal to the sample surface. A collection chamber (22) comprises a secondary charged particle lens arrangement (20) to focus the emitted particles in a downstream direction along a first normal axis (24) and thereby to define a charged particle optical crossover location (25); and a light-reflecting optical element (50) downstream of the lens arrangement and arranged to receive image light (41) and reflect it away from a second normal axis (42) for providing a viewable image of the surface. The optical element (50) is positioned at, or near to, the crossover location (25) and comprises an opening (52) therethrough, such that the focused particles pass through the opening for downstream spectroscopic analysis substantially without obstruction by the optical element.

    Abstract translation: 用于通过初级粒子照射表面进行样品表面分析的光谱仪（10）和相应的表面分析光谱法。 光谱仪（10）提供基本上垂直于样品表面的样品观察和二次带电粒子收集。 收集室（22）包括二次带电粒子透镜装置（20），以沿着第一法线轴线（24）沿下游方向聚焦发射的颗粒，从而限定带电粒子光学交叉位置（25）; 以及在所述透镜装置的下游的光反射光学元件（50），并被布置成接收图像光（41）并将其反射离开第二法线轴（42），以提供所述表面的可视图像。 光学元件（50）位于交叉位置（25）处或附近，并且包括通过其的开口（52），使得聚焦的微粒基本上不受光学元件的阻碍而穿过开口进行下游光谱分析。

    Insulating film measuring device, insulating film measuring method, insulating film evaluating device, insulating film evaluating method, substrate for electric discharge display element, and plasma display panel
    20.
    发明申请
    Insulating film measuring device, insulating film measuring method, insulating film evaluating device, insulating film evaluating method, substrate for electric discharge display element, and plasma display panel 审中-公开
    绝缘膜测定装置，绝缘膜测定方法，绝缘膜评价装置，绝缘膜评价方法，放电显示元件用基板，等离子体显示面板

    公开(公告)号：US20060250147A1

    公开(公告)日：2006-11-09

    申请号：US10568985

    申请日：2004-08-23

    Applicant: Yukihiro Morita ,  Mikihiko Nishitani ,  Masatoshi Kitagawa ,  Takaharu Nagotomi

    Inventor： Yukihiro Morita ,  Mikihiko Nishitani ,  Masatoshi Kitagawa ,  Takaharu Nagotomi

    IPC: G01R31/305

    CPC classification number: G01N23/2251 ,  H01J37/252 ,  H01J2211/40

    Abstract: A measuring device, a measuring method, and an evaluating device for easily and accurately obtaining information suitable to evaluate, for example, the discharge characteristic of an insulating film such as an MgO protective layer of a plasma display are provided. An MgO film surface, a sample to be measured, is irradiated with electrons or ions emitted from an electron gun (130) or an ion gun (140). The energy distribution of the secondary electrons emitted from the sample is measured by an electron spectrograph (150), and the spectrum data on the measured secondary electrons is supplied to an analyzing device (200). The analyzing device (200) analyzes the spectrum data and determines information (evaluation values) to evaluate the properties of the sample to be measured.

    Abstract translation: 提供了一种测量装置，测量方法和评估装置，用于容易且准确地获得适合于评价例如等离子体显示器的MgO保护层等绝缘膜的放电特性的信息。 用从电子枪（130）或离子枪（140）发射的电子或离子照射待测量的样品的MgO膜表面。 通过电子光谱仪（150）测量从样品发射的二次电子的能量分布，并将测量的二次电子的光谱数据提供给分析装置（200）。 分析装置（200）分析频谱数据并确定信息（评估值），以评估待测样品的性质。

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