公开(公告)号：US6050631A

公开(公告)日：2000-04-18

申请号：US793537

申请日：1997-05-30

Applicant: Naoyuki Suzuki ,  Katsutoshi Ishikawa ,  Ryoji Nakahama ,  Hajime Tsuchihara ,  Ryosuke Yamamoto ,  Ikumasa Moriyasu

Inventor： Naoyuki Suzuki ,  Katsutoshi Ishikawa ,  Ryoji Nakahama ,  Hajime Tsuchihara ,  Ryosuke Yamamoto ,  Ikumasa Moriyasu

IPC: B60R13/02 ,  B60R13/06 ,  B60R21/04 ,  B60R22/20 ,  B62D25/04

CPC classification number: B60R13/0206 ,  B60R13/025 ,  B60R21/04 ,  B60R22/201 ,  B60R13/06 ,  B60R2021/0414 ,  B60R2021/0435

Abstract: This invention relates to an impact energy absorbing structure for a cabin of an automotive vehicle. The impact energy absorbing structure is provided with a trim member (10) covering an inboard side of a structural member which constitutes the cabin of the automotive vehicle. An impact absorbing member is interposed between the inboard side of the structural member and the trim member (10), so that impact energy directed from a surface of the trim member (10) toward the structural member can be absorbed. When an occupant of the cabin is about to hit the structural member, impact energy is damped so that the occupant can be protected. The structural member includes a pillar (1) or the like, which constitutes the cabin of the automotive vehicle. The trim member (10) is arranged to cover an inboard side of the pillar (1) or the like. Resin-made ribs (11) or the like can be mentioned as the impact absorbing member. It is possible to design the structure so that impact energy directed from the surface of the trim member (10) toward the pillar (1) or the like can be absorbed through deformation or destruction of these resin-made ribs (11).

Abstract translation: PCT No.PCT / JP95 / 01678 Sec。 371日期1997年5月30日 102（e）日期1997年5月30日PCT提交1995年8月24日PCT公布。 公开号WO96 / 05984 日期：1996年2月29日本发明涉及一种用于机动车辆的客舱的冲击能量吸收结构。 冲击能量吸收结构设置有覆盖构成机动车辆的舱室的结构构件的内侧的装饰构件（10）。 冲击吸收构件插入在结构构件的内侧和装饰构件（10）之间，使得能够吸收从装饰构件（10）的表面引向结构构件的冲击能量。 当客舱的乘客即将撞到结构构件时，冲击能量被阻尼，从而可以保护乘客。 结构构件包括构成机动车辆的舱室的支柱（1）等。 装饰构件（10）布置成覆盖柱（1）的内侧等。 可以提及树脂制的肋（11）等作为冲击吸收件。 可以设计结构，使得能够通过这些树脂制成的肋（11）的变形或破坏来吸收从装饰构件（10）的表面向柱（1）等引导的冲击能。

公开(公告)号：US08956560B2

公开(公告)日：2015-02-17

申请号：US13423543

申请日：2012-03-19

Applicant: Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

Inventor： Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

IPC: H01L21/00 ,  B29C33/38 ,  G11B5/855

CPC classification number: B29C33/3857 ,  G11B5/855

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract translation: 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

公开(公告)号：US08916053B2

公开(公告)日：2014-12-23

申请号：US13528348

申请日：2012-06-20

Applicant: Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

Inventor： Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

IPC: C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  B44C3/08 ,  B44C5/04 ,  B81C1/00 ,  B44C1/22 ,  H01L21/033 ,  G03F7/00 ,  B41M5/00

CPC classification number: B44C1/227 ,  B41M5/00 ,  B81C1/0046 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T156/1041

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract translation: 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

公开(公告)号：US20090196148A1

公开(公告)日：2009-08-06

申请号：US12362322

申请日：2009-01-29

Applicant: Keiichiro YUSU ,  Masahiro SAITO ,  Kazuto KURODA ,  Takashi USUI ,  Kazuo WATABE ,  Chosaku NODA ,  Nobuaki KAJI ,  Masaaki MATSUMARU ,  Ryosuke YAMAMOTO

Inventor： Keiichiro YUSU ,  Masahiro SAITO ,  Kazuto KURODA ,  Takashi USUI ,  Kazuo WATABE ,  Chosaku NODA ,  Nobuaki KAJI ,  Masaaki MATSUMARU ,  Ryosuke YAMAMOTO

IPC: G11B7/135

CPC classification number: G11B7/261

Abstract: According to one embodiment, the invention provides a master recording apparatus and method which can form a pit having a symmetrical pit shape with excellent reproducibility. An embodiment of the invention is a master recording apparatus where a resist film on a master for an optical disk is irradiated with irradiation light from a semiconductor laser to record information on the resist film, where the resist film is formed as an inorganic resist film, and means for outputting the irradiation light from the semiconductor laser as a short pulse laser with a pulse width between 200 ps and 1 ns is provided.

Abstract translation: 根据一个实施例，本发明提供一种主记录装置和方法，该主记录装置和方法可以形成具有良好重复性的对称凹坑形状的凹坑。 本发明的一个实施例是一种主记录装置，其中用于光盘的主机上的抗蚀剂膜用来自半导体激光器的照射光照射以将抗蚀剂膜上的信息记录在抗蚀剂膜上，其中形成抗蚀剂膜作为无机抗蚀剂膜， 并且提供用于输出来自半导体激光器的照射光作为脉冲宽度在200ps和1ns之间的短脉冲激光器的装置。

公开(公告)号：US07477586B2

公开(公告)日：2009-01-13

申请号：US11018152

申请日：2004-12-22

Applicant: Ryosuke Yamamoto ,  Sumio Ashida

Inventor： Ryosuke Yamamoto ,  Sumio Ashida

IPC: G11B7/004

CPC classification number: G11B19/127 ,  G11B7/00736 ,  G11B7/24038 ,  G11B2007/0006

Abstract: The present invention provides an optical disk apparatus in which a first, second, third, and fourth optical disks are selectively installed, the first and second optical disks having different recording film characteristics and both having a single-layer recording layer, the third and fourth optical disks having different recording film characteristics and both having a double-layer recording layer. A control section determines which of the first to fourth optical disks has been installed, on the basis of the level of a reproduction signal from an optical head. Recording media serving as the optical disks are formed so that the light reflectances of a single-layer L-H medium in an initialized state, an L0 layer of a double-layer H-L medium in the initialized state, and an L0 layer of a double-layer L-H medium in an uninitialized state do not overlap the light reflectance of a single-layer H-L medium in the initialized state.

Abstract translation: 本发明提供一种光盘装置，其中选择性地安装第一，第二，第三和第四光盘，第一和第二光盘具有不同的记录膜特性，并且都具有单层记录层，第三和第四 具有不同记录膜特性并且具有双层记录层的光盘。 基于来自光学头的再现信号的电平，控制部分确定已经安装了第一至第四光盘中的哪一个。 形成作为光盘的记录介质，使得处于初始化状态的单层LH介质的光反射率，初始化状态下的双层HL介质的L0层和双层的L0层 未初始化状态的LH介质与初始化状态下的单层HL介质的光反射率不重叠。

公开(公告)号：US20080013440A1

公开(公告)日：2008-01-17

申请号：US11768499

申请日：2007-06-26

Applicant: Ryosuke YAMAMOTO ,  Masaaki Matsumaru ,  Kazuyo Umezawa ,  Koji Takazawa ,  Seiji Morita ,  Naomasa Nakamura ,  Hideo Ando

Inventor： Ryosuke YAMAMOTO ,  Masaaki Matsumaru ,  Kazuyo Umezawa ,  Koji Takazawa ,  Seiji Morita ,  Naomasa Nakamura ,  Hideo Ando

IPC: G11B7/24

CPC classification number: G11B7/24038 ,  G11B7/00736 ,  G11B7/24079 ,  G11B7/24082 ,  G11B20/1217 ,  G11B2007/0013 ,  G11B2220/235 ,  G11B2220/2537

Abstract: According to one embodiment, an information recording medium has two or more recording layers, the track pitch falls within the range from 250 to 500 nm, and the half maximum full-width of the groove of the substrate falls within the range from 47.5% to 72.5%.

公开(公告)号：US20070295428A1

公开(公告)日：2007-12-27

申请号：US11661000

申请日：2004-08-23

Applicant: Showa Tachisato ,  Ryosuke Yamamoto

Inventor： Showa Tachisato ,  Ryosuke Yamamoto

IPC: C23C8/20

CPC classification number: C23C8/22 ,  C23C8/20

Abstract: A carburizing apparatus that can reduce cost and shorten the carburizing time is provided. A single coil for raising temperature, a plurality of coils for soaking, and a conveying mechanism that conveys a treatment object from a position of induction heating with the coil for raising temperature to positions of induction heating with the coils for soaking are provided inside a container for carburization treatment. The rated capacity of a power source for raising temperature that is connected to the coil for raising temperature is higher than the rated capacity of a power source for soaking connected to the coil for soaking.

Abstract translation: 提供了可以降低成本并缩短渗碳时间的渗碳装置。 用于升高温度的单个线圈，用于浸泡的多个线圈以及将用于升高温度的线圈的感应加热位置的处理对象与用于浸泡的线圈进行感应加热的位置一起的输送机构设置在容器 用于渗碳处理。 用于升高连接到线圈上升温度的电源的额定容量高于连接到用于浸泡的线圈的用于浸泡的电源的额定容量。

公开(公告)号：US09190288B2

公开(公告)日：2015-11-17

申请号：US14550637

申请日：2014-11-21

Applicant: Hiroki Tanaka ,  Ryosuke Yamamoto ,  Naoko Kihara

Inventor： Hiroki Tanaka ,  Ryosuke Yamamoto ,  Naoko Kihara

IPC: H01L21/302 ,  H01L21/461 ,  C03C15/00 ,  C03C25/68 ,  B44C1/22 ,  C08F2/00 ,  C08F4/00 ,  H01L21/308 ,  B82Y10/00 ,  G11B5/74 ,  G11B5/82 ,  G11B5/855 ,  B81C1/00 ,  H01L21/027 ,  H01L21/306

CPC classification number: H01L21/3086 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0271 ,  H01L21/30604 ,  H01L21/3081

Abstract: A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymers, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately. The bond is broken, then selectively dissolving-removing either domain by a solvent to provide a polymer pattern of a remainder domain.

公开(公告)号：US20130075361A1

公开(公告)日：2013-03-28

申请号：US13528348

申请日：2012-06-20

Applicant: Yoshiaki KAWAMONZEN ,  Yasuaki OOTERA ,  Akiko YUZAWA ,  Naoko KIHARA ,  Yoshiyuki KAMATA ,  Hiroyuki HIEDA ,  Norikatsu SASAO ,  Ryosuke YAMAMOTO ,  Takeshi OKINO ,  Tomoyuki MAEDA ,  Takuya SHIMADA

Inventor： Yoshiaki KAWAMONZEN ,  Yasuaki OOTERA ,  Akiko YUZAWA ,  Naoko KIHARA ,  Yoshiyuki KAMATA ,  Hiroyuki HIEDA ,  Norikatsu SASAO ,  Ryosuke YAMAMOTO ,  Takeshi OKINO ,  Tomoyuki MAEDA ,  Takuya SHIMADA

IPC: B44C1/22

CPC classification number: B44C1/227 ,  B41M5/00 ,  B81C1/0046 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T156/1041

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract translation: 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

公开(公告)号：US20130069272A1

公开(公告)日：2013-03-21

申请号：US13423543

申请日：2012-03-19

Applicant: Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

Inventor： Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

IPC: B29C41/22 ,  G11B5/84 ,  B44C1/22

CPC classification number: B29C33/3857 ,  G11B5/855

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract translation: 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。