Abstract:
A method for making n-type semiconducting diamond by use of CVD in which n-type impurities are doped simultaneously with the deposition of diamond. As the n-type impurities, an Li compound and a B compound, both, are used at once. After doping, a diamond film thus obtained is etched to peel off its surface. The n-type semiconducting diamond is superior in specific resistivity, 10.sup.-2 .OMEGA.cm or less.
Abstract:
A circuit board includes a semiconductor chip having an upper surface and side surfaces connected to the upper surface. A bonding pad is disposed on the upper surface of the semiconductor chip. A bump is disposed on the bonding pad and projects from the bonding pad by a predetermined height. A circuit board body has a recess part, and the semiconductor chip is positioned in the recess part so that the circuit board body covers the upper surface and the side surfaces of the semiconductor chip while exposing an end of the bump. A wiring line is disposed on the circuit board body and part of the wiring line is positioned over the bump. An opening is formed in a portion of the part of the wiring line over the bump to expose the bump. A reinforcing member physically and electrically connects the exposed bump and the wiring line.
Abstract:
A substrate for embodying multi-package comprises an underlying layer has a polymer material containing a conductive filler and provided with a step-like groove divided into step part and bottom part; a coating layer formed over the underlying layer, the coating layer is formed so that it may define a metal-wire forming area on the step part and the bottom part of the step-like groove and the conductive filler in the metal-wire forming area is exposed; and a metal wire formed via a plating process using the exposed conductive filler in the metal-wire forming area defined by the coating layer as a seed layer.
Abstract:
A semiconductor package includes a semiconductor chip having a plurality of bonding pads. Through-electrodes are formed in the semiconductor chip and are electrically connected to the bonding pads. The through electrodes comprise a plurality of conductors and a plurality of voids that are defined by the conductors. Each conductor may include a plurality of nanowires grouped into a spherical shape having a plurality of voids, a plurality of nanowires grouped into a polygonal shape having a plurality of voids, or the conductors may include a plurality of micro solder balls. The voids of the through electrode absorb stress caused when head is generated during the driving of the semiconductor package.
Abstract:
Disclosed herein is a method of bonding solder pads of a flip-chip package. This invention relates to a method of bonding solder pads having different sizes to each other, when a bonding operation is executed between a chip and a PCB, between chips, or between PCBs. On a side having a larger solder pad, a general solder ball is used. Conversely, on a side having a smaller solder pad, a solder ball having a core is used. The core serves to maintain a predetermined interval between the chip and the PCB or between the chips, after the bonding operation has been completed. The solder bonded parts are aligned with each other so as to perform a final bonding operation. In a conventional flip-chip package, solder pads provided on a bonded part must have the same or similar size. According to this invention, even if the size difference between the solder pads is large, bonding is possible, thus ensuring electrical and mechanical reliability.
Abstract:
A substrate for embodying multi-package comprises an underlying layer has a polymer material containing a conductive filler and provided with a step-like groove divided into step part and bottom part; a coating layer formed over the underlying layer, the coating layer is formed so that it may define a metal-wire forming area on the step part and the bottom part of the step-like groove and the conductive filler in the metal-wire forming area is exposed; and a metal wire formed via a plating process using the exposed conductive filler in the metal-wire forming area defined by the coating layer as a seed layer.