公开(公告)号：US11487209B2

公开(公告)日：2022-11-01

申请号：US16762616

申请日：2018-11-15

申请人： ASML NETHERLANDS B.V.

发明人： Frank Staals

IPC分类号： G03F7/20

摘要： A method for controlling a lithographic apparatus, and associated apparatuses. The method is configured to provide product structures to a substrate in a lithographic process and includes determining optimization data. The optimization data includes measured and/or simulated data of at least one performance parameter associated with the product structures and/or their arrangement which are to be applied to the substrate in the lithographic process. Substrate specific metrology data as measured and/or modeled before the providing of product structures to the substrate is determined, the substrate specific metrology data including metrology data relating to a characteristic of the substrate to which the structures are being applied and/or the state of the lithographic apparatus at the time that the structures are applied to the substrate. The method further includes optimizing control of the lithographic apparatus during the lithographic process based on the optimization data and the substrate specific metrology data.

公开(公告)号：US11314174B2

公开(公告)日：2022-04-26

申请号：US16645672

申请日：2018-08-03

申请人： ASML Netherlands B.V.

发明人： Laurentius Cornelius De Winter ,  Roland Pieter Stolk ,  Frank Staals ,  Anton Bernhard Van Oosten ,  Paul Christiaan Hinnen ,  Marinus Jochemsen ,  Thomas Theeuwes ,  Eelco Van Setten

IPC分类号： G03F7/20 ,  G03F1/24 ,  G03F1/44

摘要： Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.

公开(公告)号：US11067902B2

公开(公告)日：2021-07-20

申请号：US16635584

申请日：2018-07-11

申请人： ASML NETHERLANDS B.V.

发明人： Patrick Warnaar ,  Patricius Aloysius Jacobus Tinnemans ,  Grzegorz Grzela ,  Everhardus Cornelis Mos ,  Wim Tjibbo Tel ,  Marinus Jochemsen ,  Bart Peter Bert Segers ,  Frank Staals

IPC分类号： G03F7/20

摘要： A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.

公开(公告)号：US10816904B2

公开(公告)日：2020-10-27

申请号：US16461044

申请日：2018-05-23

申请人： ASML NETHERLANDS B.V.

发明人： Davit Harutyunyan ,  Fei Jia ,  Frank Staals ,  Fuming Wang ,  Hugo Thomas Looijestijn ,  Cornelis Johannes Rijnierse ,  Maxim Pisarenco ,  Roy Werkman ,  Thomas Theeuwes ,  Tom Van Hemert ,  Vahid Bastani ,  Jochem Sebastiaan Wildenberg ,  Everhardus Cornelis Mos ,  Erik Johannes Maria Wallerbos

IPC分类号： G03F7/20 ,  G05B13/04 ,  H01L21/66

摘要： A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：US10691030B2

公开(公告)日：2020-06-23

申请号：US16192853

申请日：2018-11-16

申请人： ASML NETHERLANDS B.V.

发明人： Frank Staals ,  Eric Jos Anton Brouwer ,  Carlo Cornelius Maria Luijten ,  Jean-Pierre Agnes Henricus Marie Vaessen

IPC分类号： G03F7/20 ,  G01N21/956 ,  G01N21/47

摘要： A focus metrology target includes one or more periodic arrays of features. A measurement of focus performance of a lithographic apparatus is based at least in part on diffraction signals obtained from the focus metrology target. Each periodic array of features includes a repeating arrangement of first zones interleaved with second zones, a feature density being different in the first zones and the second zones. Each first zone includes a repeating arrangement of first features. A minimum dimension of each first feature is close to but not less than a resolution limit of the printing by the lithographic apparatus, so as to comply with a design rule in a given a process environment. A region of high feature density may further include a repeating arrangement of larger features.

公开(公告)号：US09696638B2

公开(公告)日：2017-07-04

申请号：US14965467

申请日：2015-12-10

申请人： ASML NETHERLANDS B.V.

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：US09229340B2

公开(公告)日：2016-01-05

申请号：US14036991

申请日：2013-09-25

申请人： ASML NETHERLANDS B.V.

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：US11513442B2

公开(公告)日：2022-11-29

申请号：US16644206

申请日：2018-08-22

申请人： ASML NETHERLANDS B.V.

发明人： Wim Tjibbo Tel ,  Mark John Maslow ,  Koenraad Van Ingen Schenau ,  Patrick Warnaar ,  Abraham Slachter ,  Roy Anunciado ,  Simon Hendrik Celine Van Gorp ,  Frank Staals ,  Marinus Jochemsen

IPC分类号： G03F7/00 ,  G03F1/00 ,  G06T7/00 ,  H01L21/00 ,  G06F30/20 ,  G21K5/00 ,  G03F7/20 ,  H01L21/66 ,  G06F119/18

摘要： A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.

公开(公告)号：US11480884B2

公开(公告)日：2022-10-25

申请号：US16936867

申请日：2020-07-23

申请人： ASML NETHERLANDS B.V.

发明人： Everhardus Cornelis Mos ,  Jochem Sebastiaan Wildenberg ,  Erik Johannes Maria Wallerbos ,  Maurits Van Der Schaar ,  Frank Staals ,  Franciscus Hendricus Arnoldus Elich

IPC分类号： G03F7/20

摘要： A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.

公开(公告)号：US11378891B2

公开(公告)日：2022-07-05

申请号：US17023474

申请日：2020-09-17

申请人： ASML NETHERLANDS B.V.

发明人： Davit Harutyunyan ,  Fei Jia ,  Frank Staals ,  Fuming Wang ,  Hugo Thomas Looijestijn ,  Cornelis Johannes Rijnierse ,  Maxim Pisarenco ,  Roy Werkman ,  Thomas Theeuwes ,  Tom Van Hemert ,  Vahid Bastani ,  Jochem Sebastiaan Wildenberg ,  Everhardus Cornelis Mos ,  Erik Johannes Maria Wallerbos

IPC分类号： G03F7/20 ,  G05B13/04 ,  H01L21/66

摘要： A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.