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公开(公告)号：US06248287B1
公开(公告)日：2001-06-19
申请号：US09449676
申请日：1999-11-30
IPC分类号： C21D900
CPC分类号： C21D1/30 , C21D1/26 , C21D1/40 , C21D1/42 , C21D1/673 , C21D9/40 , F16C33/30 , Y02P10/253 , Y10S148/906
摘要： In a corrective tempering method and apparatus for a rolling element in which the thermal deformation of the rolling element is corrected within an extremely short time by utilizing plasticity exhibited during a metallic structure transforming process brought about by low-temperature tempering of the rolling element made of steel, the hardened rolling element is heated and pressured to a maximum temperature within a range of from 250 to 500° C. by a heating device while set in correcting molds to correct the deformation of the rolling element at a degree of working within a range not exceeding an elastic deformation range of the rolling element at a room temperature. The rolling element can be heated also by an induction heating device in addition to a conduction heating device. A product whose inner/outer diameter correcting degree of deformation is 60% or more, dimension standardizing rate is 30% or more, surface roughness is less than Ra 0.2 &mgr;m, and surface hardness is HRC 56 or more can be obtained for a correction time within 6 minutes and an induction heating time within 30 seconds.
摘要翻译： 在一种用于滚动元件的矫正回火方法和装置中，通过利用在通过低温回火引起的金属结构转化过程中所发生的塑性，在极短的时间内校正滚动元件的热变形， 通过加热装置将淬火的滚动元件加热并加压到250-500℃的最高温度，同时设置在校正模具中以在一定范围内的加工程度校正滚动元件的变形 在室温下不超过滚动体的弹性变形范围。 除了传导加热装置之外，滚动体也可以通过感应加热装置加热。 其外径矫正度的变形量为60％以上，尺寸标准化率为30％以上，表面粗糙度小于Ra0.2μm，并且可以获得表面硬度为HRC 56以上的校正时间 在6分钟内，感应加热时间在30秒以内。
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22.发明授权
公开(公告)号：US6110598A
公开(公告)日：2000-08-29
申请号：US178534
申请日：1998-10-26
申请人： Akitoshi Maeda , Hideo Murata , Eiji Hirakawa
发明人： Akitoshi Maeda , Hideo Murata , Eiji Hirakawa
IPC分类号： G02F1/136 , C23C14/06 , C23C14/18 , C23C14/34 , G02F1/1343 , H01B5/14 , H01B13/00 , H01L21/00 , H01L21/02 , H01L21/28 , H01L21/285 , H01L21/316 , H01L21/3205 , H01L21/336 , H01L21/768 , H01L23/52 , B32B9/00
CPC分类号： C23C14/0641 , C23C14/185 , H01L21/28008 , H01L21/76841 , H01L29/66765 , H01L28/75
摘要： A method for forming a lamination structure of a tantalum nitride film and a tantalum thin film free of nitrogen overlying the tantalum nitride film, which have reduced resistivities, wherein a gas pressure during sputtering for growing the tantalum nitride film is limited to a predetermined value not more than about 0.5 pa so that the tantalum nitride film has a hexagonal crystal structure and the tantalum thin film free of nitrogen has a BCC structure with lattice spacing close to that of the tantalum nitride film hexagonal crystal structure.
摘要翻译： 一种用于形成氮化钽膜和不含覆盖氮化钽膜的氮的钽薄膜的叠层结构的方法，其具有降低的电阻率，其中用于生长氮化钽膜的溅射期间的气体压力被限制在预定值 大于约0.5Pa，使得氮化钽膜具有六方晶体结构，并且不含氮的钽薄膜具有晶格间距接近于氮化钽膜六方晶体结构的BCC结构。
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公开(公告)号：US5118661A
公开(公告)日：1992-06-02
申请号：US616241
申请日：1990-11-20
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： C23C14/34 , H01L21/285 , H01L39/24
CPC分类号： H01J37/3429 , C23C14/3414 , H01L39/2435 , Y10S505/731
摘要： A sputtering target for forming a thin film of an alloy on a substrate includes a first component having a first mass number and a second component having a second mass number larger than the first mass number. The weight percentage of the first component increases with depth from the surface of the target.
摘要翻译： 用于在基板上形成合金薄膜的溅射靶包括具有第一质量数的第一部件和具有大于第一质量数的第二质量数的第二部件。 第一组分的重量百分比随距离目标表面的深度增加。
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公开(公告)号：US08454241B2
公开(公告)日：2013-06-04
申请号：US12302430
申请日：2007-05-31
申请人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
发明人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
IPC分类号： F16C33/62
CPC分类号： G03G15/0935 , B65G39/09 , C23C28/021 , C23C28/023 , C23C28/025 , F16C13/06 , F16C19/52 , F16C23/082 , F16C33/32 , F16C33/34 , F16C33/64 , F16C2204/34 , F16C2204/36 , F16C2204/50 , F16C2223/08 , F16C2223/80 , F16C2240/60 , F16C2300/42 , G03G15/0233 , G03G15/0808 , G03G15/0818 , G03G15/2053 , G03G15/751
摘要： A rolling device in which rust development or damage on a raceway surface or rolling surface is hard to occur even if water and the like intrude is provided. A self-aligning roller bearing comprises an inner ring 1, an outer ring 2, and a plurality of rolling elements 3 disposed rotatably between a raceway surface 1a of the inner ring 1 and a raceway surface 2a of the outer ring 2. At least any one of the inner ring 1, the outer ring 2, and the rolling elements 3 is provided with a metal coating formed by shot peening of a powder of metal less noble than iron at least on a part of its surface.
摘要翻译： 即使在水等侵入的情况下也难以发生生锈或轨道面或滚动面的损伤的滚动装置。 自调心滚子轴承包括内圈1，外圈2和可旋转地设置在内圈1的滚道表面1a和外圈2的滚道表面2a之间的多个滚动元件3。 内圈1，外圈2和滚动元件3中的一个设置有金属涂层，该金属涂层至少在其表面的一部分上通过对比金属更低的金属的粉末喷丸硬化而形成。
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公开(公告)号：US07940362B2
公开(公告)日：2011-05-10
申请号：US11523616
申请日：2006-09-20
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F1/133345 , G02F1/136227
摘要： A display portion is divided by scan lines and signal lines into sections where pixels are provided. Contact holes each for connecting common wiring and a common electrode together are not formed for all the pixels, but decimated so as to be arranged in zigzags.
摘要翻译： 显示部分被扫描线和信号线划分成设置像素的部分。 对于所有像素，不形成用于将公共布线和公共电极连接在一起的接触孔，而是以Z字形排列。
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公开(公告)号：US07626671B2
公开(公告)日：2009-12-01
申请号：US11152422
申请日：2005-06-14
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1345
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.
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公开(公告)号：US07110058B2
公开(公告)日：2006-09-19
申请号：US11133315
申请日：2005-05-20
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2202/104 , H01L27/124 , H01L27/1248 , H01L27/14621
摘要： The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.
摘要翻译： 制造液晶显示装置的方法包括以下步骤：（a）在基板上制造开关装置，（b）在基板上形成层间绝缘膜，使得开关装置被层间绝缘膜覆盖，以及（ c）在层间绝缘膜上形成透明电极，透明电极通过层间绝缘膜与开关器件电连接，步骤（c）包括（c1）在层间绝缘膜上沉积导电，透明和非晶材料 ，（c2）将材料图案化成透明电极，（c3）通过在形成取向膜之后进行的热退火将透明电极转换成多晶硅。
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公开(公告)号：US07012657B2
公开(公告)日：2006-03-14
申请号：US10692736
申请日：2003-10-27
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2202/104 , H01L27/124 , H01L27/1248 , H01L27/14621
摘要： The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.
摘要翻译： 制造液晶显示装置的方法包括以下步骤：（a）在基板上制造开关装置，（b）在基板上形成层间绝缘膜，使得开关装置被层间绝缘膜覆盖，以及（ c）在所述层间绝缘膜上形成透明电极，所述透明电极通过所述层间绝缘膜与所述开关器件电连接，所述步骤（c）包括（c 1）在所述层间绝缘膜上沉积导电，透明和非晶材料 薄膜，（c 2）将材料图案化成透明电极，（c 3）通过在形成取向膜之后进行的热退火将透明电极转变成多晶硅。
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29.发明申请公开(公告)号：US20050175792A1
公开(公告)日：2005-08-11
申请号：US11105418
申请日：2005-04-14
IPC分类号： G02F1/1337 , G02F1/1335 , G02F1/1343 , G02F1/1368 , C09K19/00
CPC分类号： G02F1/133553 , G02F1/133504 , G02F1/133555 , G02F1/136227 , Y10T428/1036
摘要： A liquid crystal display panel of the type having reflection electrodes tends to have an image-forming plane undesirably yellowed due to the wavelength dependency of transparency observed in an orientation layer on the reflection electrodes; aluminum-neodymium alloy, which has neodymium content between 5 weight % to 10 weight %, is deposited on an inter-layered insulating layer at the substrate temperature equal to or less than 170 degrees in centigrade for the reflection electrodes so that the surface morphology is represented by average pitches equal to or less than 1 micron; even though the orientation layer has the wavelength dependency of transparency, the reflection electrodes make the optical path in the orientation layer equalized so that the image-forming plane is not yellowed.
摘要翻译： 由于在反射电极上的取向层中观察到的透明度的波长依赖性，具有反射电极的类型的液晶显示面板往往具有不希望的黄色的图像形成面; 钕含量在5重量％至10重量％之间的铝 - 钕合金在反应电极的基板温度等于或小于摄氏170度的层间绝缘层上沉积，使得表面形态为 由等于或小于1微米的平均间距表示; 即使取向层具有透明度的波长依赖性，反射电极也使取向层中的光路平坦化，使得成像面不变黄。
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公开(公告)号：US06890783B2
公开(公告)日：2005-05-10
申请号：US10242011
申请日：2002-09-12
申请人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
发明人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
IPC分类号： G02F1/1343 , G02F1/136 , G02F1/1368 , G09F9/30 , H01L21/00 , H01L21/3205 , H01L21/336 , H01L21/84 , H01L23/52 , H01L29/423 , H01L29/43 , H01L29/49 , H01L29/786 , H01L31/036
CPC分类号： G02F1/134363
摘要： An active matrix substrate plate having superior properties is manufactured at high yield using four photolithographic fabrication steps. In step 1, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. In step 2, the gate insulation layer and the semiconductor layer comprised by amorphous silicon layer and n+ amorphous silicon layer is laminated to provide the semiconductor layer for the TFT section. In step 3, the transparent conductive layer and the metallic layer are laminated, and the signal line, the drain electrode extending from the signal line, the pixel electrode and the source electrode extending from the pixel electrode are formed, and the n+ amorphous silicon layer of the channel gap is removed by etching. In step 4, the protective insulation layer is formed, and the protective insulation layer and the metal layer above the pixel electrode are removed by etching.
摘要翻译： 使用四个光刻制造步骤以高产率制造具有优异性能的有源矩阵基板。 在步骤1中，扫描线和从扫描线延伸的栅电极形成在玻璃板中。 在步骤2中，层叠由非晶硅层和n + +非晶硅层构成的栅绝缘层和半导体层，以提供TFT部分的半导体层。 在步骤3中，层叠透明导电层和金属层，形成信号线，从信号线延伸的漏极，从像素电极延伸的像素电极和源电极， 通过蚀刻除去沟道间隙的+非晶硅层。 在步骤4中，形成保护绝缘层，通过蚀刻除去保护绝缘层和像素电极上方的金属层。
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