Broad spectrum ultraviolet inspection systems employing catadioptric imaging
    21.
    发明授权
    Broad spectrum ultraviolet inspection systems employing catadioptric imaging 失效
    使用反射折射成像的广谱紫外检测系统

    公开(公告)号:US06956694B2

    公开(公告)日:2005-10-18

    申请号:US10005732

    申请日:2001-11-06

    摘要: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 μm), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.

    摘要翻译: 紫外线(UV)反折射成像系统具有对延伸到深紫外(短至约0.16μm)的波长的初级和残留,纵向和横向色差的广谱校正,包括具有多个透镜元件的聚焦透镜组, 提供对所选波长带上的像差的两个像差和色度变化的高水平校正,由具有至少两种不同折射材料的透镜元件形成的场透镜组,例如二氧化硅和氟化物玻璃,以及包括 提供系统的大部分聚焦功能的凹面反射表面以及与聚焦透镜组组合提供原色校正的厚透镜。 场透镜组位于由聚焦透镜组提供的中间图像附近,并且用于校正残余色差。 该系统的特征在于高数值孔径(典型值大于0.7)和大平坦场(尺寸约为0.5毫米)。 宽带色彩校正允许在多个波长下的广泛范围的可能的UV成像应用。

    Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
    23.
    发明授权
    Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system 有权
    宽带深紫外/真空紫外线反射折射成像系统

    公开(公告)号:US06512631B2

    公开(公告)日:2003-01-28

    申请号:US09349036

    申请日:1999-07-07

    IPC分类号: G02B1314

    摘要: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.

    摘要翻译: 提供了用于检查样品的设计,例如光掩模,用于不想要的颗粒和诸如图案缺陷的特征。 该系统不提供中心遮蔽,用于打开和傅立叶滤波的外部光瞳,以及相对放松的制造公差,并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。 在许多情况下,所使用的透镜可以使用单一材料来制造或制造。 公开了物镜设计的多个实施例,全部包括至少一个小折叠镜和Mangin镜。 系统离轴实现,使得返回的第二图像从第一图像横向移位,使得横向分离允许分别对每个图像进行光学接收和操纵。 所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴,或具有一个九十度光线弯曲的直列或直线物镜。

    Broad spectrum ultraviolet inspection methods employing catadioptric imaging
    24.
    发明授权
    Broad spectrum ultraviolet inspection methods employing catadioptric imaging 有权
    使用反射折射成像的广谱紫外线检测方法

    公开(公告)号:US06313467B1

    公开(公告)日:2001-11-06

    申请号:US09596540

    申请日:2000-06-16

    IPC分类号: G01N2164

    摘要: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 &mgr;m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.

    摘要翻译: 紫外线(UV)反折射成像系统具有对延伸到深紫外(短至约0.16μm)的波长的初级和残留,纵向和横向色差的广谱校正,包括具有多个透镜元件的聚焦透镜组, 提供对所选波长带上的像差的两个像差和色度变化的高水平校正,由具有至少两种不同折射材料的透镜元件形成的场透镜组,例如二氧化硅和氟化物玻璃,以及包括 提供系统的大部分聚焦功能的凹面反射表面以及与聚焦透镜组组合提供原色校正的厚透镜。 场透镜组位于由聚焦透镜组提供的中间图像附近,并且用于校正残余色差。 该系统的特征在于高数值孔径(典型值大于0.7)和大平坦场(尺寸约为0.5毫米)。 宽带色彩校正允许在多个波长下的广泛范围的可能的UV成像应用。

    TDI sensor modules with localized driving and signal processing circuitry for high speed inspection
    26.
    发明授权
    TDI sensor modules with localized driving and signal processing circuitry for high speed inspection 有权
    具有局部驱动和信号处理电路的TDI传感器模块,用于高速检测

    公开(公告)号:US08624971B2

    公开(公告)日:2014-01-07

    申请号:US12575376

    申请日:2009-10-07

    IPC分类号: H04N7/18

    摘要: An inspection system for inspecting a surface of a wafer/mask/reticle can include a modular array. The modular array can include a plurality of time delay integration (TDI) sensor modules, each TDI sensor module having a TDI sensor and a plurality of localized circuits for driving and processing the TDI sensor. At least one of the localized circuits can control a clock associated with the TDI sensor. At least one light pipe can be used to distribute a source illumination to the plurality of TDI sensor modules. The plurality of TDI sensor modules can be positioned capture a same inspection region or different inspection regions. The plurality of TDI sensor modules can be identical or provide for different integration stages. Spacing of the modules can be arranged to provide 100% coverage of the inspection region in one pass or for fractional coverage requiring two or more passes for complete coverage.

    摘要翻译: 用于检查晶片/掩模/掩模版的表面的检查系统可以包括模块阵列。 模块化阵列可以包括多个时间延迟积分(TDI)传感器模块,每个TDI传感器模块具有TDI传感器和用于驱动和处理TDI传感器的多个局部电路。 至少一个局部电路可以控制与TDI传感器相关的时钟。 可以使用至少一个光管来将源照明分配给多个TDI传感器模块。 多个TDI传感器模块可以被定位成捕获相同的检查区域或不同的检查区域。 多个TDI传感器模块可以相同或提供不同的集成阶段。 可以设置模块的间隔,以便在一次通过中提供100%的检查区域覆盖,或者为了完全覆盖而需要两次或更多次通过的分数覆盖。

    Cell For Light Source
    27.
    发明申请
    Cell For Light Source 有权
    光源单元

    公开(公告)号:US20110205529A1

    公开(公告)日:2011-08-25

    申请号:US13119571

    申请日:2011-02-17

    摘要: A cell for a vacuum ultraviolet plasma light source, the cell having a closed sapphire tube containing at least one noble gas. Such a cell does not have a metal housing, metal-to-metal seals, or any other metal flanges or components, except for the electrodes (in some embodiments). In this manner, the cell is kept to a relatively small size, and exhibits a more uniform heating of the gas and cell than can be readily achieved with a hybridized metal/window cell design. These designs generally result in higher plasma temperatures (a brighter light source), shorter wavelength output, and lower optical noise due to fewer gas convection currents created between the hotter plasma regions and surrounding colder gases. These cells provide a greater amount of output with wavelengths in the vacuum ultraviolet range than do quartz or fused silica cells. These cells also produce continuous spectral emission well into the infrared range, making them a broadband light source.

    摘要翻译: 一种用于真空紫外线等离子体光源的电池,该电池具有包含至少一种惰性气体的封闭蓝宝石管。 除了电极(在一些实施例中),这种电池不具有金属外壳,金属对金属密封件或任何其它金属法兰或部件。 以这种方式,电池被保持为相对小的尺寸,并且表现出比使用杂化金属/窗口电池设计容易实现的气体和电池的更均匀的加热。 这些设计通常导致更高的等离子体温度(较亮的光源),更短的波长输出和更低的光学噪声,这是由于较热的等离子体区域和周围较冷的气体之间产生的较小的气体对流电流。 这些电池在真空紫外线范围内提供比石英或熔融石英电池更大的输出量。 这些细胞还能够在红外范围内产生连续的光谱发射,使其成为宽带光源。

    Small ultra-high NA catadioptric objective using aspheric surfaces
    28.
    发明授权
    Small ultra-high NA catadioptric objective using aspheric surfaces 有权
    使用非球面表面的小超高NA反射折射物镜

    公开(公告)号:US07869121B2

    公开(公告)日:2011-01-11

    申请号:US11375316

    申请日:2006-03-13

    IPC分类号: G02B5/08

    CPC分类号: G02B21/04 G02B17/0856

    摘要: A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.

    摘要翻译: 提供了用于成像试样的相对较高的NA目标。 该目的包括具有至少一个聚焦透镜的透镜组,该至少一个聚焦透镜被配置为接收光能并形成中间图像,定向成接收中间图像并提供中间光能的至少一个场透镜,以及定位成接收中间图像的中间图像 光能并向样品施加光能。 一个或多个元件可以采用非球面。 该目的可以提供高达约193至266纳米的未校正的光谱带宽和超过0.9的数值孔径。 元素的直径小于100毫米,并且可以适合标准显微镜。 场透镜可以包括多于一个透镜,并且可以由与物镜中的至少一个其它透镜不同的材料形成。

    Inspection system using small catadioptric objective
    29.
    发明授权
    Inspection system using small catadioptric objective 有权
    检验系统采用小反射折射目标

    公开(公告)号:US07639419B2

    公开(公告)日:2009-12-29

    申请号:US10615512

    申请日:2003-07-07

    IPC分类号: G02B17/08

    摘要: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.

    摘要翻译: 公开了一种用于减小尺寸反射折射率物镜的系统。 包括缩小尺寸物镜的系统包括允许增强成像的各种子系统,子系统包括照明,成像,自动对焦,定位,传感器,数据采集和数据分析。 该目的可以通过红外光范围具有在约190纳米范围内的波长的光能,并且物镜的元件的直径小于100mm。 该目的包括聚焦透镜组和至少一个定位成从聚焦透镜组接收聚焦光能并提供中间光能的场透镜。 目的还包括一个Mangin镜面布置。 该设计为成像目的赋予数值孔径超过0.65并且高达约0.90的受控光能,并且该设计可用于各种环境中。

    Non-critical phase matching in CLBO to generate sub-213nm wavelengths
    30.
    发明授权
    Non-critical phase matching in CLBO to generate sub-213nm wavelengths 有权
    CLBO中的非临界相位匹配产生亚213nm波长

    公开(公告)号:US07627007B1

    公开(公告)日:2009-12-01

    申请号:US11346021

    申请日:2006-03-10

    IPC分类号: H01S3/10

    摘要: A laser illuminator and illumination method for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The design comprises generating fundamental frequency laser energy at different fundamental wavelengths, such as 998 nm, converting a portion of the fundamental frequency laser energy to 2nd harmonic frequency laser energy, further converting the 2nd harmonic frequency laser energy to 4th harmonic frequency laser energy, and mixing the 4th harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce laser energy at a sum frequency. Mixing is accomplished by non-critical phase matching in a crystal of Cesium Lithium Borate (CLBO). Alternately, the design may employ shifting a portion of the fundamental frequency laser energy to laser energy at a Raman line and/or mixing the 2nd harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce 3rd harmonic frequency laser energy.

    摘要翻译: 提供了一种用于检查系统中的激光照明器和照明方法,例如半导体晶片检查系统或光掩模检查系统。 该设计包括在不同的基本波长(如998nm)产生基频激光能量,将基频激光能量的一部分转换为二次谐波激光能量,进一步将二次谐波激光能量转换为四次谐波激光能量, 将第四谐波激光能量与基频激光能量的一部分混合,以产生激发能量的和频。 在硼酸铯(CLBO)的晶体中通过非关键相位匹配来实现混合。 或者,该设计可以采用将基频激光能量的一部分转换成拉曼线上的激光能量和/或将二次谐波频率激光能量与基频激光能量的一部分混合以产生三次谐波激光能量。