公开(公告)号：US20140178806A1

公开(公告)日：2014-06-26

申请号：US14193183

申请日：2014-02-28

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Takeshi INASAKI

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  G03F1/68 ,  G03F1/76 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/2063 ,  G03F7/30

Abstract: As a negative actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in sensitivity, resolution and pattern profile and reduced in line edge roughness (LER), scum and development defect, a negative actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a polymer compound containing (a) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation and (b) a repeating unit having a phenolic hydroxyl group, and (B) a crosslinking agent, is provided.

Abstract translation: 作为能够形成灵敏度，分辨率和图案轮廓优异且线边缘粗糙度（LER），浮渣和显影缺陷降低的图案的负光敏射线敏感或辐射敏感性树脂组合物， 敏感性树脂组合物，其包含（A）含有（a）在用光化射线或辐射照射时能够产生酸的重复单元的聚合物化合物和（b）具有酚羟基的重复单元，和（B）交联剂 ，被提供。

公开(公告)号：US20240201589A1

公开(公告)日：2024-06-20

申请号：US18418331

申请日：2024-01-21

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Minoru UEMURA ,  Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C311/09 ,  C07C381/12 ,  C07D295/26 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C311/09 ,  C07C381/12 ,  C07D295/26 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing a compound (I) that generates an acid upon irradiation with actinic rays or radiation, the compound (I) having at least two acid anionic groups and cationic groups equal in number to the acid anionic groups. At least one of the acid anionic groups and at least one of the cationic groups are linked via covalent bonding, and at least two acid groups generated from the compound (I) upon irradiation with the actinic rays or radiation include at least two acid groups having different acid dissociation constants (pKa).

公开(公告)号：US20240192592A1

公开(公告)日：2024-06-13

申请号：US18421949

申请日：2024-01-24

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Minoru UEMURA ,  Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C311/09 ,  C07C381/12 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C311/09 ,  C07C381/12 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (I) that generates an acid upon irradiation with actinic rays or radiation and has an ionic structure and a zwitterionic structure. A pattern forming method contains forming an actinic ray-sensitive or radiation-sensitive film on a substrate using the actinic ray-sensitive or radiation-sensitive resin composition, exposing the actinic ray-sensitive or radiation-sensitive film to light; and developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer.

公开(公告)号：US20180321589A1

公开(公告)日：2018-11-08

申请号：US16039450

申请日：2018-07-19

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Akihiro KANEKO ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/40 ,  H01L21/027 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  C08F212/14 ,  C08F220/58 ,  C08F220/16 ,  C08F212/32 ,  G03F7/039 ,  G03F7/38

CPC classification number: G03F7/038 ,  C08F212/12 ,  C08F212/14 ,  C08F212/32 ,  C08F220/16 ,  C08F220/58 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

Abstract: The pattern forming method includes (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) a step of exposing the film with actinic rays or radiation, and (3) a step of developing the exposed film using a developer containing an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains an acid-decomposable resin (1) having a repeating unit (a) having an aromatic ring and a repeating unit (b) represented by a specific general formula, and the content of the repeating unit (a) is 55% by mole or more with respect to all the repeating units of the acid-decomposable resin (1). The method for manufacturing an electronic device includes the pattern forming method.

公开(公告)号：US20180267404A1

公开(公告)日：2018-09-20

申请号：US15987433

申请日：2018-05-23

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Tomotaka TSUCHIMURA ,  Shuji HIRANO ,  Hideaki TSUBAKI ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  C08F212/14 ,  C08F220/16 ,  C08F220/28 ,  G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F212/145 ,  C08F212/32 ,  C08F220/16 ,  C08F220/28 ,  C08F2220/1841 ,  C08F2220/283 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/32 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274 ,  C08F226/12

Abstract: Provided are a pattern forming method for obtaining a pattern which is excellent in etching resistance and in which occurrence of pattern collapse can be suppressed, and a method for manufacturing an electronic device including the pattern forming method. The pattern forming method includes a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin A having a repeating unit represented by General Formula (I) and a repeating unit represented by General Formula (BII), a step of exposing the film, and a step of developing the exposed film using a developer containing an organic solvent, to form a pattern.

公开(公告)号：US20160342090A1

公开(公告)日：2016-11-24

申请号：US15229896

申请日：2016-08-05

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA

IPC: G03F7/32 ,  G03F1/76 ,  G03F7/20 ,  G03F7/039 ,  G03F1/50

CPC classification number: G03F7/322 ,  C08F12/20 ,  C08F12/22 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F1/76 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/2063 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by specific General Formula (I), and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物包含（A）具有酚羟基的氢原子被具体通式（I）表示的基团所取代的结构的高分子化合物，（B）a 能够在用光化射线或辐射照射时产生酸的化合物。

公开(公告)号：US20160280675A1

公开(公告)日：2016-09-29

申请号：US15176810

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: C07D307/33 ,  G03F7/32 ,  G03F7/20 ,  G03F1/50 ,  G03F7/038

CPC classification number: C07D307/33 ,  C08F12/22 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/322 ,  C08F212/32 ,  C08F212/08

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物包括具有极性转换基团和碱溶性树脂的交联剂，其中极性转换基团是能够通过碱性水溶液的作用分解的基团，以产生 羧酸或磺酸在具有交联基团的一侧。

公开(公告)号：US20150086911A1

公开(公告)日：2015-03-26

申请号：US14560650

申请日：2014-12-04

Applicant: FUJIFILM Corporation

Inventor： Takuya TSURUTA ,  Tomotaka TSUCHIMURA ,  Tadeteru YATSUO

IPC: G03F7/027 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C381/12 ,  C07C2601/14 ,  C07D327/08 ,  C07D333/46 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/2037 ,  G03F7/325

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括： 通过用光化射线或辐射照射产生酸的化合物（A），其中所述酸通过共价键与由以下通式（M）表示的基团连接。 在该式中，Y1和Y2各自独立地表示氢原子，烷基，环烷基，烯基，炔基，芳基或酰基。 Z表示氢原子或取代基。 *表示与化合物（A）的残基的连接位点，

公开(公告)号：US20150072274A1

公开(公告)日：2015-03-12

申请号：US14540454

申请日：2014-11-13

Applicant: FUJIFILM CORPORATION

Inventor： Tomotaka TSUCHIMURA ,  Koutarou TAKAHASHI

IPC: G03F7/038 ,  G03F7/30 ,  G03F1/00

CPC classification number: G03F7/0382 ,  C08F212/14 ,  G03F1/00 ,  G03F1/20 ,  G03F1/22 ,  G03F1/50 ,  G03F1/56 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/30 ,  G03F7/322 ,  G03F7/325

Abstract: A chemical amplification resist composition according to the present invention includes (A) a compound including a triarylsulfonium cation having one or more fluorine atoms and capable of generating an acid with a volume of 240 Å3 or higher by irradiation of active rays or radiation; and (B) a compound including a phenolic hydroxyl group.

Abstract translation: 根据本发明的化学增幅抗蚀剂组合物包括（A）包含具有一个或多个氟原子的三芳基锍阳离子并且能够通过活性射线或辐射的照射产生体积为240或更高的酸的化合物; 和（B）包含酚羟基的化合物。

公开(公告)号：US20140349224A1

公开(公告)日：2014-11-27

申请号：US14451901

申请日：2014-08-05

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Tomotaka TSUCHIMURA ,  Takeshi KAWABATA ,  Takuya TSURUTA

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用含有（A）含有酸可分解重复单元的树脂并且能够降低溶解度的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 对于含有机溶剂的显影剂，通过酸的作用，（B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）能够通过酸的作用分解以产生酸的化合物， 酸，和（D）溶剂; （2）通过使用光化射线或辐射使膜曝光的步骤，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。