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21.发明申请公开(公告)号：US20150337432A1
公开(公告)日：2015-11-26
申请号：US14816697
申请日：2015-08-03
Applicant: Intermolecular Inc.
Inventor： Guizhen Zhang , Jeremy Cheng , Guowen Ding , Minh Huu Le , Daniel Schweigert , Yu Wang
CPC classification number: C23C14/22 , C03C17/36 , C03C17/3605 , C03C17/3618 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C23C14/0036 , C23C14/042 , C23C14/14 , C23C14/34 , G02B1/12 , G02B1/14 , Y10T428/12542 , Y10T428/12549 , Y10T428/12611 , Y10T428/12778 , Y10T428/31678
Abstract: Provided is High Productivity Combinatorial (HPC) testing methodology of semiconductor substrates, each including multiple site isolated regions. The site isolated regions are used for testing different compositions and/or structures of barrier layers disposed over silver reflectors. The tested barrier layers may include all or at least two of nickel, chromium, titanium, and aluminum. In some embodiments, the barrier layers include oxygen. This combination allows using relative thin barrier layers (e.g., 5-30 Angstroms thick) that have high transparency yet provide sufficient protection to the silver reflector. The amount of nickel in a barrier layer may be 5-10% by weight, chromium—25-30%, titanium and aluminum—30%-35% each. The barrier layer may be co-sputtered in a reactive or inert-environment using one or more targets that include all four metals. An article may include multiple silver reflectors, each having its own barrier layer.
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公开(公告)号：US20150191815A1
公开(公告)日：2015-07-09
申请号：US14661958
申请日：2015-03-18
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Jeremy Cheng , Muhammad Imran , Jingyu Lao , Minh Huu Le , Daniel Schweigert , Zhi-Wen Wen Sun , Yu Wang , Yongli Xu , Guizhen Zhang
IPC: C23C14/08
CPC classification number: C23C14/08 , C03C17/36 , C03C17/3618 , C03C17/3644 , C03C17/366 , C03C17/3681 , C23C14/0036 , C23C14/083 , C23C14/185 , C23C14/3464 , G02B5/0875 , G02B5/208 , Y10T428/12611
Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include a ternary alloy of nickel, titanium, and niobium, which showed improvements in overall performance than those from binary barrier results. The percentage of nickel can be between 5 and 15 wt %. The percentage of titanium can be between 30 and 50 wt %. The percentage of niobium can be between 40 and 60 wt %.
Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括镍，钛和铌的三元合金，其显示出比来自二元屏障结果的整体性能的改善。 镍的百分比可以在5和15重量％之间。 钛的百分比可以在30-50重量％之间。 铌的百分比可以在40至60重量％之间。
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23.发明申请Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers 有权银色反射涂层屏障层和HPC工作流程，用于快速筛选这种阻挡层的材料公开(公告)号：US20150104569A1
公开(公告)日：2015-04-16
申请号：US14574755
申请日：2014-12-18
Applicant: Intermolecular Inc.
Inventor： Guizhen Zhang , Jeremy Cheng , Guowen Ding , Minh Huu Le , Daniel Schweigert , Yu Wang
CPC classification number: C23C14/22 , C03C17/36 , C03C17/3605 , C03C17/3618 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C23C14/0036 , C23C14/042 , C23C14/14 , C23C14/34 , G02B1/12 , G02B1/14 , Y10T428/12542 , Y10T428/12549 , Y10T428/12611 , Y10T428/12778 , Y10T428/31678
Abstract: Provided is High Productivity Combinatorial (HPC) testing methodology of semiconductor substrates, each including multiple site isolated regions. The site isolated regions are used for testing different compositions and/or structures of barrier layers disposed over silver reflectors. The tested barrier layers may include all or at least two of nickel, chromium, titanium, and aluminum. In some embodiments, the barrier layers include oxygen. This combination allows using relative thin barrier layers (e.g., 5-30 Angstroms thick) that have high transparency yet provide sufficient protection to the silver reflector. The amount of nickel in a barrier layer may be 5-10% by weight, chromium—25-30%, titanium and aluminum—30%-35% each. The barrier layer may be co-sputtered in a reactive or inert-environment using one or more targets that include all four metals. An article may include multiple silver reflectors, each having its own barrier layer.
Abstract translation: 提供了半导体衬底的高生产率组合（HPC）测试方法，每个包括多个现场隔离区域。 位置隔离区域用于测试布置在银反射器上的阻挡层的不同组成和/或结构。 经测试的阻挡层可以包括镍，铬，钛和铝中的全部或至少两种。 在一些实施例中，阻挡层包括氧。 该组合允许使用具有高透明度的相对薄的阻挡层（例如5-30埃厚），同时为银反射器提供足够的保护。 阻挡层中的镍的量可以是5-10重量％，铬25-30％，钛和铝30％-35％。 阻挡层可以在反应性或惰性环境中使用包括所有四种金属的一种或多种目标共溅射。 物品可以包括多个银反射器，每个具有其自己的阻挡层。
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24.发明申请SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY 有权低合金玻璃生产涂层的系统，方法和装置，包括三次合金公开(公告)号：US20140268316A1
公开(公告)日：2014-09-18
申请号：US14139350
申请日：2013-12-23
Applicant: Intermolecular Inc.
Inventor： Guizhen Zhang , Brent Boyce , Jeremy Cheng , Guowen Ding , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yongli Xu
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
Abstract translation: 本文公开了用于形成低辐射率面板的系统，方法和装置，其可以包括衬底和形成在衬底上的反射层。 低发射率面板还可以包括在反射层上形成的顶部电介质层，使得反射层形成在顶部电介质层和衬底之间。 顶部介电层可以包括三元金属氧化物，例如锌锡氧化铝。 顶部电介质层也可以包括铝。 铝的浓度可以在约1原子％至15原子％之间或约2原子％至10原子％之间。 顶部电介质层中锌与锡的原子比可以在约0.67至约1.5之间或约0.9至约1.1之间。
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25.发明申请Electrochromic Device with Improved Transparent Conductor and Method for Forming the Same 审中-公开具有改进的透明导体的电致变色装置及其形成方法公开(公告)号：US20140092462A1
公开(公告)日：2014-04-03
申请号：US14102768
申请日：2013-12-11
Applicant: Intermolecular, Inc.
Inventor： Minh Huu Le , Thai Cheng Chua , Guowen Ding , Minh Anh Nguyen , Yu Wang , Guizhen Zhang
IPC: G02F1/155
CPC classification number: G02F1/155
Abstract: Embodiments provided herein describe electrochromic devices and methods for forming electrochromic devices. The electrochromic devices include a transparent substrate, a transparent conducting oxide layer coupled to the transparent substrate, and a layer of electrochromic material coupled to the transparent conducting oxide layer. The transparent conducting oxide layer includes indium and zinc.
Abstract translation: 本文提供的实施例描述了用于形成电致变色器件的电致变色器件和方法。 电致变色器件包括透明衬底，耦合到透明衬底的透明导电氧化物层和耦合到透明导电氧化物层的电致变色材料层。 透明导电氧化物层包括铟和锌。
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Patent Agency Ranking
26.发明授权公开(公告)号：US09703024B2
公开(公告)日：2017-07-11
申请号：US15346884
申请日：2016-11-09
Applicant: Intermolecular Inc. , Guardian Industries Corp.
Inventor： Guizhen Zhang , Brent Boyce , Jeremy Cheng , Guowen Ding , Muhammad Imran , Daniel Schweigert , Yongli Xu
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
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27.发明授权Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy 有权包括三元合金在内的低辐射玻璃生产涂料的系统，方法和装置公开(公告)号：US09499899B2
公开(公告)日：2016-11-22
申请号：US14139350
申请日：2013-12-23
Applicant: INTERMOLECULAR INC. , Guardian Industries Corp.
Inventor： Guizhen Zhang , Brent Boyce , Jeremy Cheng , Guowen Ding , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yongli Xu
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
Abstract translation: 本文公开了用于形成低辐射率面板的系统，方法和装置，其可以包括衬底和形成在衬底上的反射层。 低发射率面板还可以包括在反射层上形成的顶部电介质层，使得反射层形成在顶部电介质层和衬底之间。 顶部介电层可以包括三元金属氧化物，例如锌锡氧化铝。 顶部电介质层也可以包括铝。 铝的浓度可以在约1原子％至15原子％之间或约2原子％至10原子％之间。 顶部电介质层中锌与锡的原子比可以在约0.67至约1.5之间或约0.9至约1.1之间。
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公开(公告)号：US09481924B2
公开(公告)日：2016-11-01
申请号：US14293126
申请日：2014-06-02
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Tong Ju , Minh Huu Le , Daniel Schweigert , Guizhen Zhang
CPC classification number: C23C14/024 , C03C17/00 , C03C17/36 , C03C17/3639 , C03C17/3652 , C03C17/366 , C03C17/3681 , C23C14/0652 , Y10T428/26
Abstract: Methods, and coated panels fabricated from the methods, are disclosed to form multiple coatings, (e.g., one or more infrared reflective layers), with minimal color change before and after heat treatments. For example, by adding appropriate seed layers between the IR reflective layers and the base oxide layers, the color performance can be maintained regardless of high temperature processes. The optical filler layers can include a metal oxide layer. In some embodiments, the seed layer can include nickel, titanium, and niobium, forming a nickel titanium niobium alloy such as NiTiNb.
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公开(公告)号：US20160102013A1
公开(公告)日：2016-04-14
申请号：US14512644
申请日：2014-10-13
Applicant: Intermolecular Inc.
Inventor： Guizhen Zhang , Jeremy Cheng , Guowen Ding , Tong Ju , Minh Huu Le , Daniel Schweigert
CPC classification number: C03C17/3411 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/366 , C23C14/0036 , C23C14/083 , C23C14/086 , C23C14/185 , C23C14/3464 , G02B1/10 , G02B5/208 , G02B5/282
Abstract: Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A metal oxide layer is formed between the transparent substrate and the reflective layer. A base layer is formed between transparent substrate and the metal oxide layer. The base layer has a first refractive index. A dielectric layer is formed between the base layer and the metal oxide layer. The dielectric layer has a second refractive index.
Abstract translation: 本文提供的实施例描述了用于形成低e板的低e板和方法。 提供透明基板。 在透明基板的上方形成反射层。 在透明基板和反射层之间形成金属氧化物层。 在透明基板和金属氧化物层之间形成基层。 基层具有第一折射率。 在基底层和金属氧化物层之间形成介电层。 电介质层具有第二折射率。
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30.发明授权Systems, methods, and apparatus for production coatings of low-emissivity glass 有权低辐射玻璃生产涂料的系统，方法和装置公开(公告)号：US09309149B2
公开(公告)日：2016-04-12
申请号：US14144828
申请日：2013-12-31
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Jeremy Cheng , Jose Ferreira , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yu Wang , Yongli Xu , Guizhen Zhang
CPC classification number: C03C17/366 , C03C17/3435 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3681 , C03C25/226 , C03C2218/155 , C23C14/0036 , C23C14/0652 , C23C14/0688 , C23C14/083 , C23C14/086
Abstract: Disclosed herein are systems, methods, and apparatus for forming a low emissivity panel. In various embodiments, a partially fabricated panel may be provided. The partially fabricated panel may include a substrate, a reflective layer formed over the substrate, and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the substrate and the top dielectric layer. The top dielectric layer may include tin having an oxidation state of +4. An interface layer may be formed over the top dielectric layer. A top diffusion layer may be formed over the interface layer. The top diffusion layer may be formed in a nitrogen plasma environment. The interface layer may substantially prevent nitrogen from the nitrogen plasma environment from reaching the top dielectric layer and changing the oxidation state of tin included in the top dielectric layer.
Abstract translation: 本文公开了用于形成低发射率面板的系统，方法和装置。 在各种实施例中，可以提供部分制造的面板。 部分制造的面板可以包括衬底，在衬底上形成的反射层，以及形成在反射层上的顶部电介质层，使得反射层形成在衬底和顶部电介质层之间。 顶部电介质层可以包括具有+4的氧化态的锡。 界面层可以形成在顶部介电层上。 可以在界面层上形成顶部扩散层。 顶部扩散层可以在氮等离子体环境中形成。 界面层可以基本上防止来自氮等离子体环境的氮到达顶部电介质层并改变顶部电介质层中包含的锡的氧化态。
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