Forming a Micro Electro Mechanical System
    22.
    发明申请
    Forming a Micro Electro Mechanical System 有权
    形成微机电系统

    公开(公告)号:US20110059566A1

    公开(公告)日:2011-03-10

    申请号:US12948477

    申请日:2010-11-17

    IPC分类号: H01L21/02

    摘要: A method of forming a micro-electro mechanical system (MEMS), includes (1) removing material from a first wafer to define a first movable portion corresponding to an x-y accelerometer and a second movable portion corresponding to a z accelerometer, where each movable portion comprises at least one flexure member and at least one proof mass, each proof mass and flexure member being formed by the selective removal of material from a top side and a bottom side of first wafer; (2) bonding the first wafer to a second wafer comprising an electronic circuit, such that a gap is defined between the first wafer and the second wafer. The thickness of the at least one flexure member of the first movable portion is independent of a thickness of the at least one flexure member of the second movable portion and a thickness of the proof mass of the first movable portion is independent of a thickness of the at least one proof mass of the second movable portion.

    摘要翻译: 一种形成微机电系统(MEMS)的方法包括:(1)从第一晶片去除材料以限定对应于xy加速度计的第一可移动部分和对应于z i加速度计的第二可移动部分,其中每个可移动部分包括 至少一个弯曲构件和至少一个检验质量块,通过从第一晶片的顶侧和底侧选择性地去除材料形成每个检验质量和挠曲构件; (2)将第一晶片接合到包括电子电路的第二晶片,使得在第一晶片和第二晶片之间限定间隙。 第一可移动部分的至少一个弯曲部件的厚度与第二可动部分的至少一个弯曲部件的厚度无关,并且第一可移动部分的检验质量块的厚度与 所述第二可动部的至少一个检验质量。

    Display system
    23.
    发明申请
    Display system 失效
    显示系统

    公开(公告)号:US20070076176A1

    公开(公告)日:2007-04-05

    申请号:US11239865

    申请日:2005-09-30

    IPC分类号: G03B21/28

    CPC分类号: G03B21/28

    摘要: One embodiment of a display system includes a first array that defines multiple reflective devices each movable between an inactive position to reflect light to a light dump and an active position to reflect light to an imaging region, a second array that defines multiple reflective devices each movable between an inactive position to reflect light to the light dump and an active position to reflect light to the imaging region, and an activation device that projects an activation beam to the devices to move individual ones of the devices between the active position and the inactive position, wherein the first array, the second array and the activation device are housed within a single vacuum enclosure.

    摘要翻译: 显示系统的一个实施例包括限定多个反射装置的第一阵列,每个反射装置可以在将光反射到光倾倒的非活动位置和将光反射到成像区域的活动位置之间移动;限定多个反射装置的第二阵列, 在反射光到所述光倾倒的非活动位置和将光反射到所述成像区域的活动位置之间;以及激活装置,其将激活光束投影到所述装置以在所述主动位置和所述不活动位置之间移动所述装置中的各个装置 ,其中所述第一阵列,所述第二阵列和所述激活装置容纳在单个真空封壳内。

    Photonic crystal device and methods
    26.
    发明申请
    Photonic crystal device and methods 失效
    光子晶体器件及方法

    公开(公告)号:US20060078268A1

    公开(公告)日:2006-04-13

    申请号:US10962825

    申请日:2004-10-08

    IPC分类号: G02B6/00

    CPC分类号: G02B6/1225 B82Y20/00

    摘要: A photonic crystal device is fabricated by a method comprising steps of providing a substrate, providing a photonic crystal on the substrate, and etching a cavity under at least the photonic crystal, the cavity having an inner wall adapted to reflect light.

    摘要翻译: 通过包括以下步骤的方法制造光子晶体器件,所述方法包括提供衬底,在衬底上提供光子晶体,以及在至少所述光子晶体之下蚀刻空腔,所述腔具有适于反射光的内壁。

    Method of making a getter structure
    27.
    发明授权
    Method of making a getter structure 有权
    制作吸气剂结构的方法

    公开(公告)号:US06988924B2

    公开(公告)日:2006-01-24

    申请号:US10412918

    申请日:2003-04-14

    CPC分类号: H01J7/183

    摘要: A method of manufacturing a getter structure, including forming a support structure having a support perimeter, where the support structure is disposed over a substrate. In addition, the method includes forming a non-evaporable getter layer having an exposed surface area, where the non-evaporable getter layer is disposed over the support structure, and includes forming a vacuum gap between the substrate and the non-evaporable getter layer. The non-evaporable getter layer extends beyond the support perimeter of the support structure increasing the exposed surface area.

    摘要翻译: 一种制造吸气剂结构的方法,包括形成具有支撑周长的支撑结构,其中所述支撑结构设置在衬底上。 此外,该方法包括形成具有暴露表面积的不可蒸发的吸气剂层,其中非蒸发性吸气剂层设置在支撑结构上方,并且包括在衬底和非蒸发性吸气剂层之间形成真空间隙。 不可蒸发的吸气剂层延伸超过支撑结构的支撑周边,增加暴露的表面积。

    Method of making an emitter with variable density photoresist layer
    30.
    发明授权
    Method of making an emitter with variable density photoresist layer 有权
    制造具有可变密度光致抗蚀剂层的发射体的方法

    公开(公告)号:US06558968B1

    公开(公告)日:2003-05-06

    申请号:US10002422

    申请日:2001-10-31

    IPC分类号: H01L2100

    摘要: An emitter has an electron supply layer and a tunneling layer formed on the electron supply layer. Optionally, an insulator layer is formed on the electron supply layer and has openings defined within in which the tunneling layer is formed. A cathode layer is formed on the tunneling layer. A conductive layer is partially disposed on the cathode layer and partially on the insulator layer if present. The conductive layer defines an opening to provide a surface for energy emissions of electrons and/or photons. Preferably but optionally, the emitter is subjected to an annealing process thereby increasing the supply of electrons tunneled from the electron supply layer to the cathode layer.

    摘要翻译: 发射体具有形成在电子供给层上的电子供给层和隧道层。 可选地,在电子供给层上形成绝缘体层,并且在其内形成有形成有隧道层的开口。 在隧道层上形成阴极层。 导电层部分设置在阴极层上,部分地设置在绝缘体层上,如果存在的话。 导电层限定一个开口以提供用于电子和/或光子的能量发射的表面。 优选但是可选地,对发射极进行退火处理,从而增加从电子供给层向阴极层隧穿的电子的供应。