Memristive Device Having a Porous Dopant Diffusion Element
    22.
    发明申请
    Memristive Device Having a Porous Dopant Diffusion Element 有权
    具有多孔掺杂扩散元件的忆阻器件

    公开(公告)号:US20110176353A1

    公开(公告)日:2011-07-21

    申请号:US13120904

    申请日:2008-12-23

    IPC分类号: G11C11/56 H01L45/00

    摘要: A memristive device (400) includes: a first electrode (405); a second electrode (425); a memristive matrix (415) interposed between the first electrode (405) and the second electrode (425); a porous dopant diffusion element (410) in physical contact with the memristive matrix (415) and in proximity to the first electrode (405) and the second electrode (425); and a first mobile dopant species which moves through the porous dopant diffusion element (410) in response to a programming electrical field. A method for using a memristive device (400) having a porous dopant diffusion element (410) includes applying a voltage bias to generate a programming electrical field such that dopants move through the porous dopant diffusion element (410), thereby changing the distribution of dopants within a memristive matrix (415) to form a first state; removing the voltage bias, the dopants being substantially immobile in the absence of the programming electrical field; and applying a reading energy to the memristive device (400) to sense the first state.

    摘要翻译: 忆阻器(400)包括:第一电极(405); 第二电极(425); 插入在第一电极(405)和第二电极(425)之间的忆阻矩阵(415); 与所述忆阻矩阵(415)物理接触并且接近所述第一电极(405)和所述第二电极(425)的多孔掺杂剂扩散元件(410); 以及响应于编程电场而移动通过多孔掺杂剂扩散元件(410)的第一移动掺杂物种类。 使用具有多孔掺杂剂扩散元件(410)的忆阻器(400)的方法包括施加电压偏压以产生编程电场,使得掺杂剂通过多孔掺杂剂扩散元件(410)移动,由此改变掺杂剂的分布 在忆阻矩阵(415)内形成第一状态; 去除电压偏压,掺杂剂在没有编程电场的情况下基本上是不可移动的; 以及将读取能量施加到所述忆阻装置(400)以感测所述第一状态。

    Method of fabricating a mold for imprinting a structure
    23.
    发明授权
    Method of fabricating a mold for imprinting a structure 失效
    制造用于压印结构的模具的方法

    公开(公告)号:US07291282B2

    公开(公告)日:2007-11-06

    申请号:US11070064

    申请日:2005-03-01

    申请人: William M. Tong

    发明人: William M. Tong

    IPC分类号: B44C1/22

    摘要: The present invention provides a method of fabricating an imprint mold for molding a structure. The method includes directing a first and a second flux for forming a first material and a second material, respectively, to a substrate to form a layered structure having alternating layers of the first and the second material. The method also includes controlling a thickness of the first and the second layers by controlling the first and the second flux and cleaving the layered structure to form a cleavage face in which sections of the layers are exposed. The method further includes etching the exposed sections of the layers using a etch procedure that predominantly etches one of the first and the second materials to form the mold having an imprinting surface with at least one indentation for molding the structure. At least one of the fluxes is controlled so that at least one of the layers has a thickness that varies along a portion of a length of the at least one layer.

    摘要翻译: 本发明提供一种制造用于模制结构的压印模具的方法。 该方法包括分别引导用于将第一材料和第二材料形成第一和第二通量到基底以形成具有第一和第二材料的交替层的分层结构。 该方法还包括通过控制第一和第二通量来控制第一和第二层的厚度,并且分解层状结构以形成其中部分层被暴露的解理面。 该方法还包括使用主要蚀刻第一和第二材料之一的蚀刻程序来蚀刻层的暴露部分,以形成具有至少一个用于模制该结构的压痕的压印表面的模具。 控制至少一个焊剂,使得至少一个层具有沿着至少一个层的长度的一部分变化的厚度。

    Sensing alignment of multiple layers
    24.
    发明授权
    Sensing alignment of multiple layers 失效
    感应多层的对齐

    公开(公告)号:US07226797B2

    公开(公告)日:2007-06-05

    申请号:US10995837

    申请日:2004-11-23

    IPC分类号: H01L21/00

    CPC分类号: G06T7/0004

    摘要: Using an imaging system in relation to a plurality of material layers in an initial alignment state is provided, a first of the plurality of material layers at least partially obscuring a second of the plurality of material layers in the initial alignment state. The first material layer is moved from a first position corresponding to the initial alignment state to a second position out of a field of view of the imaging system, and a first image of the second material layer is stored. The first material layer is moved back the first position to restore the initial alignment state. A second image of the first material layer is acquired. The second image and the stored first image are processed to determine the initial alignment state.

    摘要翻译: 提供了在初始对准状态下相对于多个材料层使用成像系统,多个材料层中的第一个在初始对准状态下至少部分地遮蔽多个材料层中的第二个材料层。 第一材料层从对应于初始取向状态的第一位置移动到成像系统的视野外的第二位置,并且存储第二材料层的第一图像。 第一材料层被移回第一位置以恢复初始对准状态。 获取第一材料层的第二图像。 处理第二图像和存储的第一图像以确定初始对准状态。

    Apparatus and methods for electron beam detection
    25.
    发明授权
    Apparatus and methods for electron beam detection 失效
    电子束检测装置及方法

    公开(公告)号:US08692204B2

    公开(公告)日:2014-04-08

    申请号:US13453902

    申请日:2012-04-23

    IPC分类号: G01T1/20

    摘要: One embodiment disclosed relates a method of detecting a patterned electron beam. The patterned electron beam is focused onto a grating with a pattern that has a same pitch as the patterned electron beam. Electrons of the patterned electron beam that pass through the grating un-scattered are detected. Another embodiment relates to focusing the patterned electron beam onto a grating with a pattern that has a second pitch that is different than a first pitch of the patterned electron beam. Electrons of the patterned electron beam that pass through the grating form a Moiré pattern that is detected using a position-sensitive detector. Other embodiments, aspects and features are also disclosed.

    摘要翻译: 公开的一个实施例涉及一种检测图案化电子束的方法。 图案化电子束被聚焦到具有与图案化电子束相同的间距的图案的光栅上。 检测通过光栅不分散的图案化电子束的电子。 另一个实施例涉及将图案化电子束聚焦到具有不同于图案化电子束的第一间距的第二间距的图案的光栅上。 通过光栅的图案化电子束的电子形成使用位置敏感检测器检测的莫尔图案。 还公开了其它实施例,方面和特征。

    Nano-enhanced Raman spectroscopy substrate packaging structure
    26.
    发明授权
    Nano-enhanced Raman spectroscopy substrate packaging structure 有权
    纳米增强拉曼光谱基板封装结构

    公开(公告)号:US08330951B2

    公开(公告)日:2012-12-11

    申请号:US11413516

    申请日:2006-04-28

    摘要: Packaged NERS-active structures are disclosed that include a NERS substrate having a NERS-active structure thereon, and a packaging substrate over the NERS substrate having an opening therethrough, the opening in alignment with the NERS-active structure. A membrane may cover the opening in the packaging substrate. In order to perform nanoenhanced Raman spectroscopy, the membrane may be removed, and an analyte placed on the NERS substrate adjacent the NERS-active structure. The membrane may be replaced with another membrane after the analyte has been placed on the substrate. The membrane may maintain the pristine state of the substrate before it is deployed, and the replacement membrane may preserve the substrate and analyte for archival purposes. Also disclosed are methods for performing NERS with packaged NERS-active structures.

    摘要翻译: 公开了封装的NERS-活性结构,其包括其上具有NERS-活性结构的NERS衬底和在NERS衬底上的具有穿过其中的开口的封装衬底,该开口与NERS-活性结构对准。 膜可以覆盖封装衬底中的开口。 为了进行纳米增强拉曼光谱,可以去除膜,并将分析物放置在邻近NERS-活性结构的NERS衬底上。 在将分析物放置在基底上之后,膜可以用另一膜替代。 膜可以在其被部署之前保持基材的原始状态,并且替换膜可以保留底物和分析物用于归档目的。 还公开了使用封装的NERS-活性结构来执行NERS的方法。

    Method and system of tracking optical beam shift
    27.
    发明授权
    Method and system of tracking optical beam shift 有权
    跟踪光束偏移的方法和系统

    公开(公告)号:US07835647B2

    公开(公告)日:2010-11-16

    申请号:US11975228

    申请日:2007-10-17

    IPC分类号: H04B10/10

    CPC分类号: H04B10/803

    摘要: An optical interconnect includes an optical transmitter having a plurality of optical sources; a light sensing array configured to receive optical beams emitted from the optical sources; and a beam tracking module in communication with the light sensing array. The beam tracking module is configured to calculate a displacement of at least one of the optical beams by extrapolating an extremum from cross-correlation data obtained between at least a portion of a sample reading from the light sensing array and at least a portion of a plurality of shifted versions of a reference reading from the light sensing array. A related method includes calculating a displacement of an optical beam by extrapolating an extremum from cross-correlation data obtained between a sample reading of the optical beam and at least a portion of a plurality of shifted versions of a reference reading from the light sensing array.

    摘要翻译: 光学互连包括具有多个光源的光发射机; 光感测阵列,被配置为接收从所述光源发射的光束; 以及与光感测阵列通信的光束跟踪模块。 光束跟踪模块被配置为通过从在光检测阵列的样本读取的至少一部分和多个部分之间获得的互相关数据外插外部来计算至少一个光束的位移, 从光感测阵列的参考读数的移位版本。 相关方法包括通过从光传感阵列的参考读数的至少一部分移位的光束的样本读取之间获得的互相关数据外推外部来计算光束的位移。

    Nano-imprinted photonic crystal waveguide
    29.
    发明授权
    Nano-imprinted photonic crystal waveguide 失效
    纳米压印光子晶体波导

    公开(公告)号:US07277619B2

    公开(公告)日:2007-10-02

    申请号:US11072657

    申请日:2005-03-04

    摘要: This invention relates to a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film on a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; heating the film; causing the template to press against the heated film such that a portion of the film is deformed by the protrusions; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide. Another embodiment of this invention fulfills these needs by providing a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film upon a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; causing the template to modify a shape of the film; applying a UV light to the film and the template such that the film becomes polymerized; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide.

    摘要翻译: 本发明涉及一种形成纳米压印光子晶体波导的方法,包括以下步骤:在衬底上制备光学膜; 制备具有长度小于500nm的多个突起的模板,使得突起彼此间隔预定距离; 加热薄膜; 使得模板压靠加热的膜,使得膜的一部分由突起变形; 将模板与胶片分开; 并蚀刻该膜以除去该膜的残留层以形成纳米压印的光子晶体波导。 本发明的另一实施例通过提供形成纳米压印光子晶体波导的方法来满足这些需要,包括以下步骤:形成纳米压印光子晶体波导的方法,包括以下步骤:在 基质; 制备具有长度小于500nm的多个突起的模板,使得突起彼此间隔预定距离; 导致模板修改胶片的形状; 对膜和模板施加UV光使得膜变得聚合; 将模板与胶片分开; 并蚀刻该膜以除去该膜的残留层以形成纳米压印的光子晶体波导。