公开(公告)号：US20180037993A1

公开(公告)日：2018-02-08

申请号：US15786358

申请日：2017-10-17

申请人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

发明人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

IPC分类号： C23C16/455 ,  C23C16/32 ,  C23C16/34 ,  H01J37/02 ,  B81B3/00 ,  H01J37/317 ,  C23C16/40 ,  H01J37/12

CPC分类号： C23C16/45529 ,  B81B3/0008 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  H01J37/026 ,  H01J37/06 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/31794

摘要： A digital pattern generator has a MEMS substrate with a plurality of doping layers and a plurality of insulating layers between respective doping layers. A plurality of lenslets are formed as holes through the substrate. A charge drain coating is applied to the inner surfaces of the lenslets. The charge drain coating drains electrons that come into contact with the charge drain coating so that the performance of the digital pattern generator will not be hindered by electron charge build-up. The charge drain coating includes a doping material that coalesces into clusters that are embedded within a high dielectric insulating material.

公开(公告)号：US09824851B2

公开(公告)日：2017-11-21

申请号：US14052610

申请日：2013-10-11

申请人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

发明人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

IPC分类号： H01J37/02 ,  H01J37/06 ,  B81B3/00 ,  H01J37/317 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455 ,  H01J37/12

CPC分类号： C23C16/45529 ,  B81B3/0008 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  H01J37/026 ,  H01J37/06 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/31794

摘要： A system and method associated with a charge drain coating are disclosed. The charge drain coating may be applied to surfaces of an electron-optical device to drain electrons that come into contact with the charge drain coating so that the performance of the electron-optical device will not be hindered by electron charge build-up. The charge drain coating may include a doping material that coalesces into clusters that are embedded within a high dielectric insulating material. The charge drain coating may be deposited onto the inner surfaces of lenslets of the electron-optical device.

公开(公告)号：US20160358742A1

公开(公告)日：2016-12-08

申请号：US14052610

申请日：2013-10-11

申请人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

发明人： William M. Tong ,  Alan D. Brodie ,  Jeffrey Elam ,  Anil Mane

IPC分类号： H01J37/06 ,  H01J37/12 ,  C23C16/32 ,  C23C16/40 ,  C23C16/34 ,  H01J37/317 ,  C23C16/455

CPC分类号： C23C16/45529 ,  B81B3/0008 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  H01J37/026 ,  H01J37/06 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/31794

摘要： A system and method associated with a charge drain coating are disclosed. The charge drain coating may be applied to surfaces of an electron-optical device to drain electrons that come into contact with the charge drain coating so that the performance of the electron-optical device will not be hindered by electron charge build-up. The charge drain coating may include a doping material that coalesces into clusters that are embedded within a high dielectric insulating material. The charge drain coating may be deposited onto the inner surfaces of lenslets of the electron-optical device.

摘要翻译： 公开了一种与电荷放电涂层相关的系统和方法。 可以将电荷漏极涂层施加到电子 - 光学器件的表面以排出与电荷漏极涂层接触的电子，使得电子 - 电子器件的性能不会受到电子电荷积聚的阻碍。 电荷漏极涂层可以包括聚集成嵌入高介电绝缘材料中的簇的掺杂材料。 电荷漏极涂层可以沉积到电子 - 光学器件的小透镜的内表面上。

公开(公告)号：US09487600B2

公开(公告)日：2016-11-08

申请号：US13209190

申请日：2011-08-12

申请人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

发明人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

IPC分类号： C08F8/42

CPC分类号： C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

摘要： A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic features with patterned nanostructures defined by the configuration of the microdomain.

摘要翻译： 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得由微区的构型定义的图案化纳米结构的无机特征。

公开(公告)号：US20120219824A1

公开(公告)日：2012-08-30

申请号：US13036952

申请日：2011-02-28

申请人： Thomas Prolier ,  Jeffrey Elam ,  Jeffrey Klug ,  Michael J. Pellin

发明人： Thomas Prolier ,  Jeffrey Elam ,  Jeffrey Klug ,  Michael J. Pellin

IPC分类号： B05D5/12 ,  B32B15/00

CPC分类号： C23C16/45525 ,  C23C16/42 ,  Y10T428/12 ,  Y10T428/12819

摘要： A method of preparing a superconducting thin film of niobium silicide using atomic layer deposition (ALD) where the superconducting critical temperature of the film is controllable by modulating the thickness of the thin film. The film is formed by exposing a substrate within an ALD reactor to alternating exposures of a niobium halide (NbQx) and a reducing precursor, for example, disilane (Si2H6) or silane (SiH4). A number of ALD cycles are performed to obtain the film thickness and establish the desired superconducting critical temperature between 0.4 K and 3.1 K.

摘要翻译： 使用原子层沉积（ALD）制备硅化铌超导薄膜的方法，其中膜的超导临界温度可通过调节薄膜的厚度来控制。 通过将ALD反应器内的基板暴露于铌卤化物（NbQ x）和还原性前体例如乙硅烷（Si 2 H 6）或硅烷（SiH 4）的交替曝光来形成膜。 执行多个ALD循环以获得膜厚度并建立在0.4K和3.1K之间的所需超导临界温度。

公开(公告)号：US20120046421A1

公开(公告)日：2012-02-23

申请号：US13209190

申请日：2011-08-12

申请人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

发明人： Seth B. Darling ,  Jeffrey Elam ,  Yu-Chih Tseng ,  Qing Peng

IPC分类号： C08F8/42

CPC分类号： C08G83/001 ,  C08F8/42 ,  H01G9/02 ,  H01J9/025 ,  H01L21/0271 ,  H01L51/4213 ,  H01L51/441 ,  H01M2/166 ,  H01M10/0565 ,  H01M2300/0082

摘要： A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

摘要翻译： 通过渗透具有多个自组装的周期性聚合物微畴的嵌段共聚物支架来制备可调谐无机图案化纳米尺度的方法。 该方法可以使用与原子层沉积（ALD）相关的顺序渗透合成（SIS）。 该方法包括选择配置为与限定微区的共聚物单元选择性反应但与该共聚物的另一聚合物单元基本上不反应的金属前体。 选择性地在微区上形成可调谐的无机特征以形成金属前体和共反应物的杂化有机/无机复合材料。 可以任选地除去有机组分以获得具有由微区域的构型限定的图案化纳米结构的无机特征。

公开(公告)号：US20070257265A1

公开(公告)日：2007-11-08

申请号：US11429016

申请日：2006-05-03

申请人： Nevin Naguib ,  James Birrell ,  Jeffrey Elam ,  John Carlisle ,  Orlando Auciello

发明人： Nevin Naguib ,  James Birrell ,  Jeffrey Elam ,  John Carlisle ,  Orlando Auciello

IPC分类号： H01L31/0312 ,  H01L21/00

CPC分类号： B81C1/0038 ,  B81C1/00674 ,  C23C16/0281 ,  C23C16/274 ,  H01L21/02381 ,  H01L21/02422 ,  H01L21/02491 ,  H01L21/02527 ,  H01L21/02587 ,  H01L21/02595 ,  H01L21/0262

摘要： Extremely smooth (6 nm roughness) and continuous ultrananocrystalline diamond (UNCD) thin films were achieved by microwave plasma chemical vapor deposition using a thin 10 nm tungsten (W) interlayer between the silicon (Si) substrate and the diamond film. The W interlayer significantly increased the initial UNCD nucleation density to >1012 sites/cm2, thereby lowering the surface roughness and eliminating interfacial voids. A method is also disclosed to make various articles.

摘要翻译： 通过使用硅（Si）衬底和金刚石膜之间的薄的10nm钨（W）中间层的微波等离子体化学气相沉积，实现非常平滑（6nm粗糙度）和连续的超微晶金刚石（UNCD）薄膜。 W中间层将初始的UNCD成核密度显着地提高到> 10 12个位点/ cm 2，从而降低表面粗糙度并消除界面空隙。 还公开了制造各种制品的方法。

公开(公告)号：US20060222850A1

公开(公告)日：2006-10-05

申请号：US11097603

申请日：2005-04-01

申请人： Xingcheng Xiao ,  John Carlisle ,  Orlando Auciello ,  Jeffrey Elam ,  Dieter Gruen

发明人： Xingcheng Xiao ,  John Carlisle ,  Orlando Auciello ,  Jeffrey Elam ,  Dieter Gruen

IPC分类号： B32B9/00 ,  H05H1/24

CPC分类号： C23C16/26 ,  C23C16/272 ,  C30B29/02 ,  C30B29/04 ,  C30B29/605 ,  Y10T428/30

摘要： A material of carbon nanotubes and diamond bonded together. A method of producing carbon nanotubes and diamond covalently bonded together is disclosed with a substrate on which is deposited nanoparticles of a suitable catalyst on a surface of the substrate. A diamond seeding material is deposited on the surface of the substrate, and then the substrate is exposed to a hydrogen poor plasma for a time sufficient to grow carbon nanotubes and diamond covalently bonded together.

摘要翻译： 碳纳米管和金刚石的材料结合在一起。 公开了一种生产碳纳米管和共价结合在一起的金刚石的方法，其中在衬底上沉积有合适催化剂的纳米颗粒在衬底的表面上。 将金刚石种子材料沉积在衬底的表面上，然后将衬底暴露于不合氢的等离子体中足以使碳纳米管和金刚石共价键合在一起的时间。

公开(公告)号：US07426067B1

公开(公告)日：2008-09-16

申请号：US10322195

申请日：2002-12-17

申请人： Victor M. Bright ,  Jeffrey Elam ,  Francois Fabreguette ,  Steven M. George ,  Nils Hoivik ,  Yung-Cheng Lee ,  Ryan Linderman ,  Marie Tripp

发明人： Victor M. Bright ,  Jeffrey Elam ,  Francois Fabreguette ,  Steven M. George ,  Nils Hoivik ,  Yung-Cheng Lee ,  Ryan Linderman ,  Marie Tripp

IPC分类号： G02B26/08

CPC分类号： B81C1/0096 ,  B81B3/0005 ,  B81B2207/115 ,  B81C1/00674 ,  B81C2201/112 ,  Y10S359/90

摘要： A micro-electromechanical device or MEMS having a conformal layer of material deposited by atomic layer deposition is discussed. The layer may provide physical protection to moving components of the device, may insulate electrical components of the device, may present a biocompatible surface interface to a biological system, and may otherwise improve such devices. The layer may also comprise a combination of multiple materials each deposited with great control to allow creating layers of customizable properties and to allow creating layers having multiple independent functions, such as providing physical protection from wear and providing electrical insulation.

摘要翻译： 讨论了具有通过原子层沉积沉积的材料的保形层的微机电装置或MEMS。 该层可以为装置的移动部件提供物理保护，可以使装置的电气部件绝缘，可以向生物系统提供生物相容的表面界面，并且可以改进这种装置。 该层还可以包括多种材料的组合，每种材料沉积有很大的控制以允许产生可定制性质的层，并且允许产生具有多个独立功能的层，例如提供物理保护免受磨损和提供电绝缘。

公开(公告)号：US20060251875A1

公开(公告)日：2006-11-09

申请号：US11123602

申请日：2005-05-06

申请人： John Carlisle ,  Michael Pellin ,  Jeffrey Elam ,  Jian Wang

发明人： John Carlisle ,  Michael Pellin ,  Jeffrey Elam ,  Jian Wang

IPC分类号： B32B7/02

CPC分类号： A61L27/50 ,  A61L27/30 ,  Y10T428/2495 ,  Y10T428/249921 ,  Y10T428/265

摘要： A biocompatible and bio-inert device is disclosed along with a method of making same. The device includes multiple layers of materials, preferably at least on layer of Al2O3, and an exterior amorphous layer, preferably TiO2.

摘要翻译： 公开了生物相容性和生物惰性的装置及其制造方法。 该装置包括多层材料，优选至少在Al 2 O 3层3上，以及外部非晶层，优选TiO 2。