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    Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method
    22.
    发明授权
    Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权
    测量方法，测量仪器，光刻设备和器件制造方法

    公开(公告)号：US08593646B2

    公开(公告)日：2013-11-26

    申请号：US13369614

    申请日：2012-02-09

    申请人： Arie Jeffrey Den Boef ,  Marcel Hendrikus Maria Beems ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    发明人： Arie Jeffrey Den Boef ,  Marcel Hendrikus Maria Beems ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    IPC分类号： G01B11/14 ,  G01B11/00

    CPC分类号： G01B11/14 ,  G01B11/00 ,  G02B21/0048 ,  G02B26/105 ,  G03F7/70625 ,  G03F9/7088

    摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.

    摘要翻译： 设备（AS）测量光刻基板（W）上的标记（202）的位置。 测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。 基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记 ）。 该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。 在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。

    STAGE APPARATUS AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE APPARATUS
    23.
    发明申请
    STAGE APPARATUS AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE APPARATUS 失效
    包含这种装置的阶段装置和平面设备

    公开(公告)号：US20110299057A1

    公开(公告)日：2011-12-08

    申请号：US13100740

    申请日：2011-05-04

    申请人： Johannes Antonius Gerardus AKKERMANS ,  Theodorus Petrus Maria Cadee ,  George Wilhelmus Johannes Clijsen

    发明人： Johannes Antonius Gerardus AKKERMANS ,  Theodorus Petrus Maria Cadee ,  George Wilhelmus Johannes Clijsen

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70725 ,  G03F7/70991

    摘要： A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.

    摘要翻译： 一种用于定位物体的舞台装置，舞台装置包括被配置为保持对象的桌子，被配置为支撑桌子的支撑结构，桌子可相对于支撑结构移动，支撑结构包括第一数据时钟和 第二数据时钟和包括第一数据时钟和第二数据时钟中的另一个的表; 以及电路，被配置为使所述第一和第二数据时钟同步，所述电路包括发射机和接收机，所述发射机被配置为将时钟信号数据从所述第一数据时钟无线传输到所述第二数据时钟;以及同步电路， 数据时钟具有来自接收机接收的无线传输时钟信号数据的第一个数据时钟。

    Lithographic apparatus and positioning apparatus
    27.
    发明授权
    Lithographic apparatus and positioning apparatus 有权
    平版印刷设备和定位设备

    公开(公告)号：US08411247B2

    公开(公告)日：2013-04-02

    申请号：US12618832

    申请日：2009-11-16

    申请人： Noud Jan Gilissen ,  Theodorus Petrus Maria Cadee

    发明人： Noud Jan Gilissen ,  Theodorus Petrus Maria Cadee

    IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70875 ,  F25B21/00 ,  G03F7/70858 ,  Y02B30/66

    摘要： A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.

    摘要翻译： 光刻设备包括可移动的第一物体和包括热交换体的热交换器，所述热交换体包括具有电热量或磁热量特性的材料，并且被配置为通过与第一物体的热交换来影响第一物体的温度 以及发电机，其被配置为向所述热交换体提供电磁场，以改变所述热交换体的温度，以便冷却或加热所述第一物体。

    LITHOGRAPHIC APPARATUS, A METHOD FOR REMOVING MATERIAL OF ONE OR MORE PROTRUSIONS ON A SUPPORT SURFACE, AND AN ARTICLE SUPPORT SYSTEM
    28.
    发明申请
    LITHOGRAPHIC APPARATUS, A METHOD FOR REMOVING MATERIAL OF ONE OR MORE PROTRUSIONS ON A SUPPORT SURFACE, AND AN ARTICLE SUPPORT SYSTEM 有权
    平面设备，一种用于移除支持表面上的一个或多个主题的材料的方法，以及一个文章支持系统

    公开(公告)号：US20100214549A1

    公开(公告)日：2010-08-26

    申请号：US12699562

    申请日：2010-02-03

    申请人： Theodorus Petrus Maria Cadee ,  Noud Jan Gilissen ,  Rene Theodorus Petrus Compen ,  James Kennon

    发明人： Theodorus Petrus Maria Cadee ,  Noud Jan Gilissen ,  Rene Theodorus Petrus Compen ,  James Kennon

    IPC分类号： G03B27/58 ,  B24B51/00

    CPC分类号： B24B31/112 ,  B24B35/00 ,  G03B27/58 ,  G03F7/707 ,  G03F7/70783

    摘要： A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.

    摘要翻译： 平版印刷投影设备包括一个光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投影到基板的目标部分上;支撑台，其包括用于支撑物品的突起，检测器以检测高度 突起的偏差，用于改变突起材料的高度的材料去除装置，耦合在检测器和材料去除装置之间的控制器，其中材料去除装置包括从由以下组成的组中选择的去除工具：机械抛光装置， 磁流变整理工具，以及单点或多点金刚石工具。

    LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS
    29.
    发明申请
    LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS 有权
    平面设备和定位装置

    公开(公告)号：US20100141914A1

    公开(公告)日：2010-06-10

    申请号：US12618832

    申请日：2009-11-16

    申请人： Noud Jan GILISSEN ,  Theodorus Petrus Maria Cadee

    发明人： Noud Jan GILISSEN ,  Theodorus Petrus Maria Cadee

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70875 ,  F25B21/00 ,  G03F7/70858 ,  Y02B30/66

    摘要： A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.

    摘要翻译： 光刻设备包括可移动的第一物体和包括热交换体的热交换器，所述热交换体包括具有电热量或磁热量特性的材料，并且被配置为通过与第一物体的热交换来影响第一物体的温度 以及发电机，其被配置为向所述热交换体提供电磁场，以改变所述热交换体的温度，以便冷却或加热所述第一物体。