摘要:
In a charge coupled device, trap levels formed by insulating layers or floating electrodes are formed on a semiconductor layer or a semiconductor substrate. Stationary charges are trapped in some of the trap levels or floating electrodes. The charge transfer electrodes are in self-alignment with potential barrier regions.
摘要:
A two-phase, single-ply-electrode type charge-coupled device is provided that has a pair of a potential barrier region and a charge storage region underlying one charge transfer electrode. The charge storage region is formed in such a manner that the potential of the charge storage region becomes gradually deep in charge transfer direction. This structure enables smooth charge transfer.
摘要:
An aluminum film for covering an interlayer insulating film is formed by sputtering, and is then subjected to a heat treatment at a temperature lower than its melting point to cause a reflow. Then, an opening is formed in the aluminum film, so that a light shielding film is formed in such a way as to cover the step portion with a uniform thickness. Making the light shielding film of a solid state image sensing device thinner permits the opening size of the light shielding film to increase, ensures the effective use of light to improve the sensitivity, and improves the working precision in forming the opening, thus suppressing a variation in the sensitivity of the individual pixels.
摘要:
A solid-state imaging device comprises: an electric charge transfer portion for transferring an electric charge produced in a photodetector through photoelectric conversion from incident light to the electric charge; and, an output amplifier portion for detecting the electric charge to issue a signal. The charge transfer portion is provided with a first gate insulation film having a sufficient film thickness to keep a predetermined transfer efficiency. The output amplifier portion is provided with a second gate insulation film having a film thickness suitable for obtaining a predetermined mutual conductance capable of increasing the gain of the output amplifier portion.
摘要:
The film thickness of a second oxide film 105 is set to be larger than that of a first gate oxide film 103 in such a way that, when the identical voltage is applied to both of electrodes, the channel potentials under respective electrodes are ±0.2 V or less. The second gate oxide film 105 is formed by the CVD method and the like.
摘要:
A solid imaging device including a substrate voltage generating device possessing high display quality, high reliability, and method of manufacturing. The solid imaging device includes a plurality of photoelectric conversion elements, a vertical charge transfer portion for transferring the signal charges generated by the photoelectric conversion element, and a substrate voltage generating circuit. The substrate generating circuit 10 includes a variable resistor 11 formed by arranging a plurality of sets formed by selection switches 13 and resistors 14a-14e, and a load resistor 12 disposed by connecting with the variable resistor 11 between the source potential Vdd and the earth potential, and the substrate voltage Vsub is obtained from a contact between the variable resistor 11 and the load resistor 12. The selection switches 13 are consituted by antifuse elements.
摘要:
In a charge coupled device, a plurality of charge transfer electrodes are formed on a first insulating layer formed on a semiconductor substrate. Each of the charge transfer electrodes is formed by a first conductive layer and a second conductive layer narrower than the first conductive layer. A second insulating layer having the same area as the second conductive layer and is formed on the second conductive layer. A sidewall insulating layer is formed on sidewalls of the second insulating layer and the second conductive layer.
摘要:
A solid state image sensing device comprises a cell area, located at a semiconductor substrate, including photoelectric conversion portions and charge transfer portions and a peripheral circuit area formed around the cell area located at the semiconductor substrate. The peripheral circuit area includes a first p.sup.+ -type semiconductor region and an insulating film with a relatively large thickness formed on the first p.sup.+ -type semiconductor region. The cell area further includes a second p.sup.+ -type semiconductor region and an insulating film with a relatively small thickness formed on the second p.sup.+ -type semiconductor region. The majority of the insulating film with the relatively large thickness is formed by means of a CVD process.
摘要:
In a solid state image sensor comprising a pixel array section formed at a semiconductor substrate, and a substrate voltage setting circuit provided at the semiconductor substrate as a peripheral circuit of the pixel array section and including a non-volatile memory transistor, a light block film is formed to cover a gate electrode of the non-volatile memory transistor. This light block film is constituted of the same primary color filters as the primary color filters provided in the pixel array section. Thus, since the injecting of the light to a gate insulating film of the non-volatile memory transistor is prevented, after the electric charges are trapped in the gate insulating film of the non-volatile memory transistor such as the MNOS type, the MONOS type and the floating gate for giving a desired substrate voltage, the variation of the threshold voltage of the non-volatile memory transistor is prevented, with the result that substrate voltage generating circuit of the peripheral circuit can supply the stabilized substrate voltage having less variation, and therefore, the solid state image sensor operates with a high reliability.
摘要:
Provided are a fluorine-containing (meth)acrylic (co)polymer that scarcely generates gas when subjected to molding process, and is capable of supplying a molded body excellent in external appearance and transparency; a fluorine-containing (meth)acrylic resin film thereof; and a fluororesin laminated resin film having the same properties. The (co)polymer is a fluorine-containing (meth)acrylic (co)polymer obtained by polymerizing a monomer component including 100 to 70% by weight of a fluoroalkyl(meth)acrylate monomer, and 0 to 30% by weight of a different monomer copolymerizable therewith by effect of a radical polymerization initiator having a solubility in water of 0.1% or less by weight at 25 C, and having 8 to 14 carbon atoms.