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    Chamber Matching For Power Control Mode
    21.
    发明申请
    Chamber Matching For Power Control Mode 有权
    室内匹配功率控制模式

    公开(公告)号：US20140265851A1

    公开(公告)日：2014-09-18

    申请号：US13901509

    申请日：2013-05-23

    Applicant: LAM RESEARCH CORPORATION

    Inventor： Luc Albarede

    IPC: H05H1/46

    CPC classification number: H05H1/46 ,  H01J37/32183 ,  H01J37/32899 ,  H05H2001/4682

    Abstract: Systems and methods for performing chamber matching are described. One of the methods for performing chamber matching includes executing a first test within a first plasma chamber to measure a variable and executing a second test within a second plasma chamber to measure the variable. The first and second tests are executed based on one recipe. The method further includes determining a first relationship between the variable measured with the first test and power provided during the first test, determining a second relationship between the variable measured with the second test and power provided during the second test, and identifying power adjustment to apply to the second plasma chamber during a subsequent processing operation based on the first and second relationships. The power adjustment causes the second plasma chamber to perform the processing operation in a processing condition determined using the first plasma chamber.

    Abstract translation: 描述了用于执行室匹配的系统和方法。 执行室匹配的方法之一包括在第一等离子体室内执行第一测试以测量变量并在第二等离子体室内执行第二测试以测量该变量。 第一个和第二个测试是基于一个配方执行的。 该方法还包括确定用第一测试测量的变量与在第一测试期间提供的功率之间的第一关系，确定用第二测试测量的变量与第二测试期间提供的功率之间的第二关系，以及识别要应用的功率调整 在后续处理操作期间基于第一和第二关系到第二等离子体室。 功率调整使得第二等离子体室在使用第一等离子体室确定的处理条件下进行处理操作。

    Gas exhaust by-product measurement system
    23.
    发明授权
    Gas exhaust by-product measurement system 有权

    公开(公告)号：US10302553B2

    公开(公告)日：2019-05-28

    申请号：US15691405

    申请日：2017-08-30

    Applicant: Lam Research Corporation

    Inventor： Cristian Siladie ,  Luc Albarede ,  Yassine Kabouzi ,  Edward J. McInerney ,  Sassan Roham

    IPC: G01N21/15 ,  G01N21/3504 ,  H01L21/67

    Abstract: A gas exhaust by-product measurement system is provided. A gas chamber is configured to receive exhaust from the exhaust output. A light source, light detector, and at least one optical element are positioned so that a light beam from the light source is directed to the at least one optical element a plurality of times before reaching the light detector. At least one heater provides heat to the at least one optical element. A plurality of purge gas nozzles are in fluid connection with the optical cavity. A high flow line is in fluid connection between a purge gas source and the plurality of purge gas nozzles. A low flow line is in fluid connection between the purge gas source and the plurality of purge gas nozzles. At least one flow controller manages a plurality of flow rates including a high flow and a low flow.

    Control of impedance of RF delivery path
    26.
    发明授权
    Control of impedance of RF delivery path 有权
    控制RF输送路径的阻抗

    公开(公告)号：US09401264B2

    公开(公告)日：2016-07-26

    申请号：US14043574

    申请日：2013-10-01

    Applicant: Lam Research Corporation

    Inventor： Alexei Marakhtanov ,  Rajinder Dhindsa ,  Ken Lucchesi ,  Luc Albarede

    IPC: H01J7/24 ,  H01J37/32

    CPC classification number: H01J37/32183 ,  H01J37/32174 ,  H01J37/32449 ,  H01J37/32532 ,  H01J2237/3323 ,  H01J2237/3344

    Abstract: A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.

    Abstract translation: 等离子体系统包括RF发生器和包括阻抗匹配电路的火柴盒，其通过RF电缆耦合到RF发生器。 等离子体系统包括通过RF线耦合到火柴盒的卡盘和等离子体反应器。 RF线形成RF供应路径的一部分，RF供应路径在RF发生器之间通过火柴盒和卡盘延伸。 等离子体系统还包括耦合到阻抗匹配电路和卡盘之间的RF供给路径的相位调整电路。 相位调整电路具有耦合到RF供给路径的一端和接地的另一端。 等离子体系统包括耦合到相位调整电路的控制器。 控制器用于改变相位调整电路的参数，以基于调谐配方控制RF供应路径的阻抗。

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