公开(公告)号：US5594549A

公开(公告)日：1997-01-14

申请号：US70904

申请日：1993-06-04

申请人： Tetsuya Mori ,  Eiichi Murakami ,  Hirohiko Shinonaga

发明人： Tetsuya Mori ,  Eiichi Murakami ,  Hirohiko Shinonaga

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86

CPC分类号： G03F9/7088 ,  G03F9/7049

摘要： A position detecting method includes illuminating a grating mark of an object with monochromatic light; forming an interference image on an image pickup device by using .+-. n-th order light (n=1, 2, 3 . . . ) among reflective diffraction light from the grating mark; integrating an image signal produced by the image pickup device within a two-dimensional window of a predetermined size set with respect to the image signal and along one direction in two-dimensional coordinates, whereby a one-dimensional projection integration signal is produced; transforming, through rectangular transformation, the one-dimensional projection integration signal into a spatial frequency region; selecting, on the spatial frequency region and from the one-dimensional projection integration signal, a spatial frequency component which appears in the interference image due to the periodicity of the grating mark; and detecting the position of the grating mark on the basis of the selection.

摘要翻译： 位置检测方法包括用单色光照射物体的光栅标记; 在来自光栅标记的反射衍射光中使用+/- n级光（n = 1,2,3，...）在图像拾取装置上形成干涉图像; 将由图像拾取装置产生的图像信号在相对于图像信号设置的预定尺寸的二维窗口中并沿着二维坐标沿着一个方向进行积分，由此产生一维投影积分信号; 通过矩形变换将一维投影积分信号转换成空间频率区域; 在空间频率区域和一维投影积分信号上选择由于光栅标记的周期性而出现在干涉图像中的空间频率分量; 并根据选择来检测光栅标记的位置。

公开(公告)号：US4934064A

公开(公告)日：1990-06-19

申请号：US240003

申请日：1988-09-02

申请人： Nobuhito Yamaguchi ,  Mitsuya Sato ,  Takao Ukaji ,  Taro Ohmori ,  Eiichi Murakami

发明人： Nobuhito Yamaguchi ,  Mitsuya Sato ,  Takao Ukaji ,  Taro Ohmori ,  Eiichi Murakami

IPC分类号： G01R31/02 ,  G01R1/073 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC分类号： H01L21/67259 ,  G01R1/07314 ,  H01L21/681

摘要： A wafer prober for contacting probe needles of a probe card to bonding pads of a chip formed on a wafer, for allowing examination of characteristics of the chip, is disclosed. The wafer prober includes a wafer holder for holding a wafer and moving the same in X and Y directions. By the wafer holder, the wafer can be moved from an alignment information detecting station whereat alignment information can be detected by use of a TV camera, to an examining station whereat the probe needles of the probe card are used for the examination. The position of the wafer in a Z direction at the time when the alignment information is detected by the TV camera, can be made substantially coincident with the position of the wafer in the Z direction at the time when the probe needles contact the bonding pads. By this, an error caused by the movement of the wafer holder in the Z direction does not affect against the alignment accuracy of the wafer in the X and Y directions, such that the probe needles can correctly contact the bonding pads.

摘要翻译： 公开了一种用于将探针卡的探针接触到晶片上形成的芯片的焊盘的晶片探针，用于允许检查芯片的特性。 晶片探测器包括用于保持晶片并将其在X和Y方向上移动的晶片保持器。 通过晶片保持器，晶片可以从对准信息检测站移动，其中可以通过使用TV摄像机检测对准信息到探测卡的探针用于检查的检查站。 可以使得当电视摄像机检测到对准信息时的Z方向上的晶片的位置与探针接触焊盘时Z方向上的晶片位置基本一致。 由此，晶片保持器在Z方向的移动引起的误差不会影响晶片在X和Y方向上的对准精度，使得探针能够正确地接触焊盘。

公开(公告)号：US4929893A

公开(公告)日：1990-05-29

申请号：US252997

申请日：1988-10-04

申请人： Mitsuya Sato ,  Takao Ukaji ,  Nobuhito Yamaguchi ,  Taro Ohmori ,  Eiichi Murakami

发明人： Mitsuya Sato ,  Takao Ukaji ,  Nobuhito Yamaguchi ,  Taro Ohmori ,  Eiichi Murakami

IPC分类号： G01R31/28

CPC分类号： G01R31/2886

摘要： A wafer prober usable with a probe card for examination of chips formed on a wafer is disclosed. The wafer prober has a function for automatically aligning bonding pads of each chip with probe needles of the probe card. The prober includes a contact plate movable in X and Y directions with a wafer chuck. The contact blade is pressed against at least one of the tips of the probe needles, and the thus contacted needle tip is observed by a TV camera from the underneath of the contact plate. The video signal obtained thereby is used for the alignment between the bonding pads and the probe needles. Also, the TV camera is moved in the X and Y directions with the wafer chuck to allow that one and the same reference mark is observed by this TV camera and by another TV camera provided for image-taking the bonding pads. With the proposed structure, the bonding pads and the probe needles can be aligned automatically and accurately.

摘要翻译： 公开了一种可用于检查形成在晶片上的芯片的探针卡的晶片探测器。 晶片探测器具有将每个芯片的焊盘自动对准探针卡的探针的功能。 探测器包括可在X和Y方向上与晶片卡盘一起移动的接触板。 接触片被压靠在探针的至少一个尖端上，并且通过电视摄像机从接触板的下面观察到这样接触的针尖。 由此获得的视频信号用于接合焊盘和探针之间的对准。 此外，电视摄像机在X和Y方向上与晶片卡盘一起移动，以允许通过该TV摄像机和用于对接合焊盘进行摄像的另一台TV摄像机观察同一参考标记。 利用所提出的结构，可以自动且准确地对准接合焊盘和探针。

公开(公告)号：US08919208B2

公开(公告)日：2014-12-30

申请号：US13499947

申请日：2011-06-20

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： G01F1/66

CPC分类号： G01F1/667 ,  G01F1/662

摘要： An ultrasonic flowmeter apparatus, which can be mounted on a conduit flowing a fluid whose flow rate is to be measured, has two housing halves coupled swingably about an axis. Free ends of the housing halves include a clamp mechanism for closing and locking the halves in position. The halves have formed therein grooves 1a and 2a, respectively, and a pair of ultrasonic wave transmission and reception elements are provided on an inner wall of the groove 1a. When the conduit is clamped between the grooves, the conduit is urged against the inner walls and deformed into a substantially square cross sectional configuration. An ultrasonic wave beam B is projected from one of the elements into a fluid passing through the conduit, the beam is reflected by an opposite surface of the conduit urged against the groove 2a, and the reflected beam is received by the other element.

摘要翻译： 超声波流量计装置可以安装在流过要测量流体的流体的导管上，具有围绕轴线可摆动地联接的两个壳体半部。 外壳半部的自由端包括用于将半部闭合并锁定就位的夹紧机构。 半部分别形成有槽1a，2a，在槽1a的内壁上设置一对超声波收发元件。 当导管夹紧在凹槽之间时，导管被推靠在内壁上并变形成基本正方形的横截面构型。 超声波波束B从元件中的一个突出到通过导管的流体中，该波束被导管的相对表面反射，并且反射的波束被另一个元件接收。

公开(公告)号：US20100203724A1

公开(公告)日：2010-08-12

申请号：US12764411

申请日：2010-04-21

申请人： Takako FUNAKOSHI ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

发明人： Takako FUNAKOSHI ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

IPC分类号： H01L21/768

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： A manufacturing technique is disclosed for producing a semiconductor integrated circuit device having plural layers of buried wirings, and such that there is prevented the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 公开了一种用于制造具有多层埋置布线的半导体集成电路器件的制造技术，并且防止了在其底部连接到埋地布线的插头与嵌入布线之间的界面处的应力迁移引起的不连续性的发生，以及 埋地线。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。

公开(公告)号：US20080303158A1

公开(公告)日：2008-12-11

申请号：US12188591

申请日：2008-08-08

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

IPC分类号： H01L23/48

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 在具有多层埋地布线的半导体集成电路器件中，旨在防止在其底部连接到埋地布线的插头与埋地布线之间的界面处的应力迁移引起的不连续性的发生。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。

公开(公告)号：US07236254B2

公开(公告)日：2007-06-26

申请号：US11335473

申请日：2006-01-20

申请人： Osamu Kakuchi ,  Eiichi Murakami

发明人： Osamu Kakuchi ,  Eiichi Murakami

IPC分类号： G01B11/02

CPC分类号： G03F7/706 ,  G01B9/02098

摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

摘要翻译： 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到与图案相同的第二物体上，以及用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光的光进行测量 资源。

公开(公告)号：US07062344B2

公开(公告)日：2006-06-13

申请号：US10713012

申请日：2003-11-17

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： G06F19/00

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  G05B2219/45031 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： Disclosed is a fabricating system including a plurality of processing apparatuses connected to each other by means of an inter-apparatus transporter, wherein one group of semiconductor wafers are processed in processing apparatuses and other group of wafers are transported to specified processing apparatuses for a time interval from (To+T) to a time To; and another group of wafers are processed and the remaining group of wafers are transported for a time interval from (To+T) to (To+2T). Since processing apparatuses can receive at least one of works from the inter-apparatus transporter for a time interval T min, the distribution of works from the transporter to processing apparatuses is completed for the time interval T min. The transporter is emptied for each time interval T min, and works are unloaded to the emptied transporter, which makes easy the scheduling, control and management of the transporting of a plurality of works in the fabricating system. Moreover, since the fabricating system including processing apparatuses is periodically controlled at a cycle time T min, the scheduling of a plurality of works can be made easy, to enhance the level of optimization, thus improving the productivity.

公开(公告)号：US20060007416A1

公开(公告)日：2006-01-12

申请号：US11229829

申请日：2005-09-20

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： G03B27/52

CPC分类号： G03F9/7096 ,  G03F7/70883 ,  G03F9/7026 ,  Y10S438/947

摘要： An exposure apparatus for printing, by exposure, a pattern of an original onto a substrate includes a housing tightly filled with a predetermined ambience and for accommodating therein at least a portion of an exposure light optical axis, and a detection system having an optical system, wherein a portion of a light path of the detection system is disposed in a first space enclosed by the housing, and wherein at least another portion of the detection system including an electrical element thereof is disposed in a second space outside the housing.

公开(公告)号：US20050099635A1

公开(公告)日：2005-05-12

申请号：US10620389

申请日：2003-07-17

申请人： Osamu Kakuchi ,  Eiichi Murakami

发明人： Osamu Kakuchi ,  Eiichi Murakami

IPC分类号： H01L21/027 ,  G01B9/02 ,  G03F7/20

CPC分类号： G03F7/706 ,  G01B9/02098

摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

摘要翻译： 投影曝光装置包括：曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光;投影光学系统，用于将由光照射的图案投影到第二 物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光来进行测量。