公开(公告)号：US20220310813A1

公开(公告)日：2022-09-29

申请号：US17653235

申请日：2022-03-02

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Zia HOSSAIN ,  Balaji PADMANABHAN ,  Sauvik CHOWDHURY

IPC: H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/40

Abstract: A device includes a mesa disposed between a pair of vertical trenches in a semiconductor substrate. A gate electrode is disposed in each of the pair of vertical trenches, and a shield electrode is disposed below each of the gate electrodes in the pair of vertical trenches. The device further includes a bridge connection trench traversing the mesa. The bridge connection trench is in fluid communication with each of the pair of vertical trenches. A bridge shield electrode is disposed in the bridge connection trench and is coupled to the shield electrode disposed below each of the gate electrodes in the pair of vertical trenches.

公开(公告)号：US20190123041A1

公开(公告)日：2019-04-25

申请号：US16215870

申请日：2018-12-11

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Balaji PADMANABHAN ,  Prasad VENKATRAMAN ,  Zia HOSSAIN ,  Chun-Li LIU ,  Jason MCDONALD ,  Ali SALIH ,  Alexander YOUNG

IPC: H01L27/06 ,  H01L29/10 ,  H01L27/02 ,  H01L23/367 ,  H01L29/417 ,  H01L29/778 ,  H01L21/74 ,  H01L21/8258

CPC classification number: H01L27/0629 ,  H01L21/743 ,  H01L21/8258 ,  H01L23/3677 ,  H01L23/481 ,  H01L27/0255 ,  H01L27/0266 ,  H01L27/0688 ,  H01L29/1087 ,  H01L29/2003 ,  H01L29/41766 ,  H01L29/7783 ,  H01L29/861 ,  H01L29/872 ,  H01L2224/40245 ,  H01L2224/48247 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A cascode switch structure includes a group III-V transistor structure having a first current carrying electrode, a second current carrying electrode and a first control electrode. A semiconductor MOSFET device includes a third current carrying electrode electrically connected to the first current carrying electrode, a fourth current carrying electrode electrically connected to the first control electrode, and a second control electrode. A first diode includes a first cathode electrode electrically connected to the second current carrying electrode and a first anode electrode. A second diode includes a second anode electrode electrically connected to the first anode electrode and a second cathode electrode electrically connected to the fourth current carrying electrode. In one embodiment, the group III-V transistor structure, the first diode, and the second diode are integrated within a common substrate.

公开(公告)号：US20190115436A1

公开(公告)日：2019-04-18

申请号：US16134598

申请日：2018-09-18

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Zia HOSSAIN ,  Tetsuro ASANO ,  Syoji MIYAHARA ,  Yasuyuki SAYAMA

IPC: H01L29/40 ,  H01L29/78 ,  H01L29/423 ,  H01L29/36 ,  H01L29/06 ,  H01L29/10 ,  H01L29/812 ,  H01L29/08 ,  H01L29/66 ,  H01L29/739

Abstract: A semiconductor device structure includes a region of semiconductor material comprising a first conductivity type, an active region, and a termination region. A first active trench structure is disposed in the active region, and a second active trench structure is disposed in the active region and laterally separated from the first active trench by an active mesa region having a first width. A first termination trench structure is disposed in the termination region and separated from the second active trench by a transition mesa region having a second width and a higher carrier charge than that of the active mesa region. In one example, the second width is greater than the first width to provide the higher carrier charge. In another example, the dopant concentration in the transition mesa region is higher than that in the active mesa region to provide the higher carrier charge. The semiconductor device structure exhibits improved device ruggedness including, for example, improve unclamped inductive switching (UIS) performance.

公开(公告)号：US20170317072A1

公开(公告)日：2017-11-02

申请号：US15648211

申请日：2017-07-12

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Balaji PADMANABHAN ,  Prasad VENKATRAMAN ,  Zia HOSSAIN ,  Chun-Li LIU ,  Jason MCDONALD ,  Ali SALIH ,  Alexander YOUNG

IPC: H01L27/06 ,  H01L21/8258 ,  H01L23/367 ,  H01L27/02 ,  H01L29/417 ,  H01L21/74 ,  H01L29/10 ,  H01L29/778 ,  H01L29/872 ,  H01L23/48 ,  H01L29/20 ,  H01L29/861

CPC classification number: H01L27/0629 ,  H01L21/743 ,  H01L21/8258 ,  H01L23/3677 ,  H01L23/481 ,  H01L27/0255 ,  H01L27/0266 ,  H01L27/0688 ,  H01L29/1087 ,  H01L29/2003 ,  H01L29/41766 ,  H01L29/7783 ,  H01L29/861 ,  H01L29/872 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A cascode switch structure includes a group III-V transistor structure having a first current carrying electrode, a second current carrying electrode and a first control electrode. A semiconductor MOSFET device includes a third current carrying electrode electrically connected to the second current carrying electrode, a fourth current carrying electrode electrically connected to the first control electrode, and a second control electrode. A first diode includes a first cathode electrode electrically connected to the first current carrying electrode and a first anode electrode. A second diode includes a second anode electrode electrically connected to the first anode electrode and a second cathode electrode electrically connected to the fourth current carrying electrode. In one embodiment, the group III-V transistor structure, the first diode, and the second diode are integrated within a common substrate.

公开(公告)号：US20170033176A1

公开(公告)日：2017-02-02

申请号：US15289340

申请日：2016-10-10

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Jaume ROIG-GUITART ,  Peter MOENS ,  Zia HOSSAIN

IPC: H01L29/06 ,  H01L21/761

CPC classification number: H01L29/0623 ,  H01L21/761 ,  H01L29/0615 ,  H01L29/0619 ,  H01L29/0634 ,  H01L29/0688 ,  H01L29/0692 ,  H01L29/402 ,  H01L29/7395 ,  H01L29/74 ,  H01L29/872

Abstract: At least one embodiment is directed to a semiconductor edge termination structure, where the edge termination structure comprises several doped layers and a buffer layer.

Abstract translation: 至少一个实施例涉及半导体边缘终端结构，其中边缘终端结构包括多个掺杂层和缓冲层。

公开(公告)号：US20160118490A1

公开(公告)日：2016-04-28

申请号：US14853720

申请日：2015-09-14

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Balaji PADMANABHAN ,  Prasad VENKATRAMAN ,  Zia HOSSAIN ,  Chun-Li LIU ,  Jason MCDONALD ,  Ali SALIH ,  Alexander YOUNG

IPC: H01L29/778 ,  H01L27/02

CPC classification number: H01L27/0629 ,  H01L21/743 ,  H01L21/8258 ,  H01L23/3677 ,  H01L23/481 ,  H01L27/0255 ,  H01L27/0266 ,  H01L27/0688 ,  H01L29/1087 ,  H01L29/2003 ,  H01L29/41766 ,  H01L29/7783 ,  H01L29/861 ,  H01L29/872 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In one embodiment, a group III-V transistor structure includes a heterostructure disposed on a semiconductor substrate. A first current carrying electrode and a second current carrying electrode are disposed adjacent a major surface of the heterostructure and a control electrode is disposed between the first and second current carrying electrode. A clamping device is integrated with the group III-V transistor structure and is electrically connected to the first current carrying electrode a third electrode to provide a secondary current path during, for example, an electrical stress event.

Abstract translation: 在一个实施例中，III-V族晶体管结构包括设置在半导体衬底上的异质结构。 第一载流电极和第二载流电极邻近异质结构的主表面设置，并且控制电极设置在第一和第二载流电极之间。 钳位装置与III-V族晶体管结构集成，并且在第一电流承载电极处电连接第三电极，以在例如电应力事件期间提供次级电流路径。

公开(公告)号：US20160118379A1

公开(公告)日：2016-04-28

申请号：US14853729

申请日：2015-09-14

Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC

Inventor： Balaji PADMANABHAN ,  Prasad VENKATRAMAN ,  Zia HOSSAIN ,  Chun-Li LIU ,  Woochul JEON ,  Jason MCDONALD

IPC: H01L27/06 ,  H01L23/535 ,  H01L29/872 ,  H01L29/778 ,  H01L29/205

CPC classification number: H01L27/0629 ,  H01L21/743 ,  H01L21/8258 ,  H01L23/3677 ,  H01L23/481 ,  H01L27/0255 ,  H01L27/0266 ,  H01L27/0688 ,  H01L29/1087 ,  H01L29/2003 ,  H01L29/41766 ,  H01L29/7783 ,  H01L29/861 ,  H01L29/872 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In one embodiment, a cascode rectifier structure includes a group III-V semiconductor structure includes a heterostructure disposed on a semiconductor substrate. A first current carrying electrode and a second current carrying electrode are disposed adjacent a major surface of the heterostructure and a control electrode is disposed between the first and second current carrying electrode. A rectifier device is integrated with the group III-V semiconductor structure and is electrically connected to the first current carrying electrode and to a third electrode. The control electrode is further electrically connected to the semiconductor substrate and the second current path is generally perpendicular to a primary current path between the first and second current carrying electrodes.

Abstract translation: 在一个实施例中，共源共栅整流器结构包括III-V族半导体结构，其包括设置在半导体衬底上的异质结构。 第一载流电极和第二载流电极邻近异质结构的主表面设置，并且控制电极设置在第一和第二载流电极之间。 整流器件与III-V族半导体结构集成，并与第一载流电极和第三电极电连接。 控制电极进一步电连接到半导体衬底，第二电流通路大致垂直于第一和第二载流电极之间的初级电流通路。