Oxide semicondutor thin film transistor
    28.
    发明授权
    Oxide semicondutor thin film transistor 有权
    氧化物半导体薄膜晶体管

    公开(公告)号:US09093540B2

    公开(公告)日:2015-07-28

    申请号:US13683468

    申请日:2012-11-21

    Abstract: The present invention relates to a thin film transistor, a thin film transistor array panel, and a manufacturing method thereof. A thin film transistor according to an exemplary embodiments of the present invention includes: a gate electrode; a gate insulating layer positioned on or under the gate electrode; a channel region overlapping the gate electrode, the gate insulating layer interposed between the channel region and the gate electrode; and a source region and a drain region, facing each other with respect to the channel region, positioned in the same layer as the channel region, and connected to the channel region, wherein the channel region, the source region, and the drain region include an oxide semiconductor, and wherein a carrier concentration of the source region and the drain region is larger than a carrier concentration of the channel region.

    Abstract translation: 本发明涉及薄膜晶体管,薄膜晶体管阵列面板及其制造方法。 根据本发明的示例性实施例的薄膜晶体管包括:栅电极; 位于栅极电极上或下方的栅极绝缘层; 与所述栅电极重叠的沟道区,位于所述沟道区与所述栅电极之间的所述栅绝缘层; 以及源极区域和漏极区域,其相对于沟道区域彼此面对,位于与沟道区域相同的层中,并且连接到沟道区域,其中沟道区域,源极区域和漏极区域包括 氧化物半导体,其中源极区域和漏极区域的载流子浓度大于沟道区域的载流子浓度。

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