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    METHOD FOR FERMENTATIVE PRODUCTION OF N-ACETYL-D-GLUCOSAMINE BY MICROORGANISM
    23.
    发明申请
    METHOD FOR FERMENTATIVE PRODUCTION OF N-ACETYL-D-GLUCOSAMINE BY MICROORGANISM 有权
    通过微生物发酵制备N-乙酰-D-葡萄糖胺的方法

    公开(公告)号：US20100055746A1

    公开(公告)日：2010-03-04

    申请号：US11995104

    申请日：2006-07-14

    申请人： Tetsuya Mori ,  Wakako Ichikawa ,  Yuichi Kita ,  Yasuyuki Tetsuka

    发明人： Tetsuya Mori ,  Wakako Ichikawa ,  Yuichi Kita ,  Yasuyuki Tetsuka

    IPC分类号： C12P19/02 ,  C12N1/15

    CPC分类号： C12R1/885 ,  C12P19/26

    摘要： N-Acetyl-D-glucosamine can be produced by cultivating a fungus capable of producing N-acetyl-D-glucosamine, such as Trichoderma hamatum AB10282 strain (FERM BP-10623) or Trichoderma harzianum AB10283 strain (FERM BP-10624), in a culture medium supplemented with a carbon source other than chitin and chitin oligosaccharide and a nitrogen source to produce and accumulate N-acetyl-D-glucosamine in the culture medium and then collecting N-acetyl-D-glucosamine from the culture medium.

    摘要翻译： N-乙酰基-D-葡糖胺可以通过培养能够产生N-乙酰基-D-葡糖胺的真菌，如木霉木霉AB10282菌株（FERM BP-10623）或哈茨木霉AB10283菌株（FERM BP-10624），在 补充有几丁质和几丁质寡糖以外的碳源的培养基和氮源，以在培养基中产生并积累N-乙酰基-D-葡糖胺，然后从培养基中收集N-乙酰基-D-葡糖胺。

    Process for producing L-epi-2-inosose and novel process for producing epi-inositol using microorganisms
    25.
    发明授权
    Process for producing L-epi-2-inosose and novel process for producing epi-inositol using microorganisms 失效
    利用微生物生产外延蛋白-2-inosose的方法和生产表肌醇的新方法

    公开(公告)号：US07157268B2

    公开(公告)日：2007-01-02

    申请号：US10852153

    申请日：2004-05-25

    申请人： Atsushi Takahashi ,  Kenji Kanbe ,  Tetsuya Mori ,  Yuichi Kita ,  Tsuyoshi Tamamura ,  Tomio Takeuchi

    发明人： Atsushi Takahashi ,  Kenji Kanbe ,  Tetsuya Mori ,  Yuichi Kita ,  Tsuyoshi Tamamura ,  Tomio Takeuchi

    IPC分类号： C12P19/02 ,  C12N1/20

    CPC分类号： C12R1/18 ,  C12P19/02 ,  C12R1/38 ,  C12R1/64

    摘要： Provided are novel processes for the efficient production of L-epi-2-inosose and epi-inositol which are useful either as various medicines or intermediates for the syntheses of various medicines. In the processes, inexpensive myo-inositol is used as a starting compound which is reacted with a gram-negative bacterium capable of converting myo-inositol into L-epi-2-inosose, and thereby producing L-epi-2-inosose by conversion of myo-inositol into L-epi-2-inosose. A biologically pure culture of Pseudomonas sp. AB 10215 strain is also provided which has a characteristic nature of being capable of converting myo-inositol into L-epi-2-inosose.

    摘要翻译： 提供了用于有效生产L-外 - 二糖和外消旋肌醇的新方法，其可用作各种药物或用于合成各种药物的中间体。 在该方法中，使用廉价的肌醇作为起始化合物，其与能够将肌醇转化为L-外 - 二糖的革兰氏阴性细菌反应，从而通过转化产生L-表二-2-糖 的肌醇变为L-epi-2-inosose。 假单胞菌属的生物纯培养物 还提供了AB 10215菌株，其特征在于能够将肌醇转化为L-表 - 2-inosose。

    Process for producing scyllo-inositol
    26.
    发明申请
    Process for producing scyllo-inositol 有权
    生产鲨肌醇的方法

    公开(公告)号：US20060240534A1

    公开(公告)日：2006-10-26

    申请号：US10576030

    申请日：2004-10-14

    申请人： Masanori Yamaguchi ,  Yuichi Kita ,  Tetsuya Mori ,  Kenji Kanbe ,  Akihiro Tomoda ,  Atsushi Takahashi ,  Wakako Ichikawa

    发明人： Masanori Yamaguchi ,  Yuichi Kita ,  Tetsuya Mori ,  Kenji Kanbe ,  Akihiro Tomoda ,  Atsushi Takahashi ,  Wakako Ichikawa

    IPC分类号： C12P9/00 ,  C12P7/02 ,  C12N9/02 ,  C12N1/21

    CPC分类号： C12P7/02 ,  C07C29/145 ,  C12N9/0004 ,  C12N9/0006 ,  C12P7/18 ,  C12P7/26

    摘要： It is intended to provide a novel NAD+-independent myo-inositol 2-dehydrogenase which converts myo-inositol into scyllo-inosose in the absence of NAD+; a novel enzyme scyllo-inositol dehydrogenase which stereospecifically reduces scyllo-inosose into scyllo-inositol in the presence of NADH or NADPH; and a novel microorganism which belongs to the genus Acetobacter or Burkholderia and can convert myo-inositol into scyllo-inositol. By using these enzymes or the microorganism, scyllo-inositol is produced. Furthermore, scyllo-inositol is purified by adding boric acid and a metal salt to a liquid mixture containing scyllo-inositol and a neutral saccharide other than scyllo-inositol to form a scyllo-inositol/boric acid complex, separating the complex from the liquid mixture, dissolving the thus separated complex in an acid to give an acidic solution or an acidic suspension and then purifying scyllo-inositol from the acidic solution or the acidic suspension.

    摘要翻译： 旨在提供一种新的NAD +独立肌醇2-脱氢酶，其在不存在NAD +的情况下将肌醇转化为鲨肌蛋白; 在NADH或NADPH的存在下，立体选择性地将鲨肌内糖降解成鲨肌醇的新型鲨肌醇肌醇脱氢酶; 和属于醋杆菌属或伯克霍尔德氏菌属的新型微生物，可将肌醇转化为鲨肌醇。 通过使用这些酶或微生物，产生鲨肌醇。 此外，通过向含有鲨肌醇和除了鲨肌醇之外的中性糖的液体混合物中加入硼酸和金属盐以形成鲨肌醇/硼酸络合物，将所述络合物与液体混合物分离，将鲨肌醇纯化 将如此分离的络合物溶解在酸中，得到酸性溶液或酸性悬浮液，然后从酸性溶液或酸性悬浮液中纯化鲨肌醇。

    Exposure apparatus, and manufacturing method for devices using same
    27.
    发明授权
    Exposure apparatus, and manufacturing method for devices using same 失效
    曝光装置及使用该装置的装置的制造方法

    公开(公告)号：US06268902B1

    公开(公告)日：2001-07-31

    申请号：US08622364

    申请日：1996-03-26

    申请人： Tetsuya Mori

    发明人： Tetsuya Mori

    IPC分类号： G03B2768

    CPC分类号： G03F7/70358 ,  G03F7/70725

    摘要： An exposure apparatus includes an exposure device for exposing an exposure area of a substrate to a pattern of a mask, wherein the mask pattern is provided on the basis of a design pattern, and the mask pattern deviates in at least one of position, size and shape, from the design pattern, and a detector for detecting the deviation of the mask pattern from the design pattern and for producing a detection output. The exposure device is responsive to the output of the detector to effect an exposure operation to compensate for the pattern deviation.

    摘要翻译： 曝光装置包括曝光装置，用于将基板的曝光区域暴露于掩模图案，其中基于设计图案设置掩模图案，并且掩模图案在至少一个位置，尺寸和 形状，以及用于检测掩模图案与设计图案的偏差并用于产生检测输出的检测器。 曝光装置响应于检测器的输出以进行曝光操作以补偿图案偏差。

    Light source device and illumination system
    28.
    发明授权
    Light source device and illumination system 失效
    光源装置和照明系统

    公开(公告)号：US5971577A

    公开(公告)日：1999-10-26

    申请号：US725657

    申请日：1996-10-01

    申请人： Tetsuya Mori ,  Shinichi Shima

    发明人： Tetsuya Mori ,  Shinichi Shima

    IPC分类号： G02B19/00 ,  F21V7/08 ,  F21V8/00 ,  G02B21/06 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/70091 ,  G02B6/0006 ,  G03F7/7025

    摘要： An illumination system includes a light source device including a light source and a reflection mirror for reflecting light from the light source, and an optical system, including a plurality of lenses, for illuminating a surface with light from the light source device. A shadow of the light source is projected from the light source device in a direction inclined with respect to an optical axis of the optical system such that the shadow of the light source is not substantially projected on the surface through the optical system.

    摘要翻译： 照明系统包括：光源装置，其包括光源和用于反射来自光源的光的反射镜;以及包括多个透镜的光学系统，用于利用来自光源装置的光照射表面。 光源的阴影以相对于光学系统的光轴倾斜的方向从光源装置投影，使得光源的阴影基本上不通过光学系统投射在表面上。

    Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
    29.
    发明授权
    Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates 失效
    曝光装置和方法，其中通过比较入射在标线片台和晶片台参考板上的标记进行对准

    公开(公告)号：US5751404A

    公开(公告)日：1998-05-12

    申请号：US684100

    申请日：1996-07-22

    申请人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

    发明人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G02B11/00 ,  G03B27/32 ,  G03B27/52

    CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7015

    摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.

    摘要翻译： 一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统 以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板 在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向 和第二可动台。

    Projection exposure apparatus
    30.
    发明授权
    Projection exposure apparatus 失效
    投影曝光装置

    公开(公告)号：US5309197A

    公开(公告)日：1994-05-03

    申请号：US868705

    申请日：1992-04-15

    申请人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

    发明人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

    IPC分类号： G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

    CPC分类号： G03F9/7088 ,  G03F9/00

    摘要： A projection exposure apparatus includes a projection lens system for projecting an image of a pattern of an original on a substrate having a photosensitive layer, by using a sensitizing beam; a first detection optical system for detecting a mark of the substrate through the projection lens system and with a first non-sensitizing beam, the first detection optical system producing first information related to the position of the mark; a second detection optical system for detecting the mark of the substrate without the projection lens system and with a second nonsensitizing beam having a bandwidth broader than that of the first non-sensitizing beam, the second detection optical system producing second information related to the position of the mark; and a detector for detecting an error included in the first information, by using the first and second information.

    摘要翻译： 投影曝光装置包括：投影透镜系统，用于通过使用敏化光束将原稿的图案的图像投影在具有感光层的基板上; 第一检测光学系统，用于通过投影透镜系统和第一非感光束检测基板的标记，第一检测光学系统产生与标记的位置相关的第一信息; 第二检测光学系统，用于在没有投影透镜系统的情况下检测基板的标记，并且具有比第一非敏感光束宽的带宽的第二非敏感光束，第二检测光学系统产生与位置相关的第二信息 标记; 以及用于通过使用第一和第二信息来检测包括在第一信息中的错误的检测器。