公开(公告)号：US06374397B1

公开(公告)日：2002-04-16

申请号：US09332984

申请日：1999-06-15

申请人： Yuki Miyamoto ,  Takeo Ishibashi

发明人： Yuki Miyamoto ,  Takeo Ishibashi

IPC分类号： G06F1750

CPC分类号： G06T7/001 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/30148

摘要： A lot determination apparatus and method and a recording medium having the lot determination method recorded thereon, wherein there can be realized a reduction in the number of times wafers are re-subjected to photolithography and prevention of elimination of a chip lot in a subsequent step, by determination of whether or not a chip is conforming through comprehensive determination of results of a plurality of inspections such as an overlay inspection, an etched pattern inspection, and a resist pattern inspection. A determination is made as to whether or not a lot is defective by comprehensive determination of results of a plurality of inspection processes, thereby preventing elimination of the lot as being nonconforming. As a result, specifications for inspections can be relaxed, which in turn enables a reduction in a reprocessing ratio. Further, no short circuit arises between the first and second patterns while determination equations are satisfied, and elimination of a lot in a subsequent process can be prevented. Link check may be carried out not only for each set of measurement points but also on the basis of analysis of results of all the measurement points. Determination equations may be more generalized.

摘要翻译： 许多确定装置和方法以及其上记录有批次确定方法的记录介质，其中可以实现晶片重新进行光刻的次数的减少，并且防止在随后的步骤中消除芯片批次， 通过对覆盖检查，蚀刻图案检查和抗蚀剂图案检查等多次检查的结果的综合判定来确定芯片是否一致。 通过综合确定多个检查过程的结果，确定批次是否有缺陷，从而防止批次不合格。 因此，可以放宽检查规范，从而能够降低后处理比。 此外，在满足确定方程式的同时，在第一和第二图案之间不产生短路，并且可以防止后续处理中的批次的消除。 链路检查不仅可以用于每组测量点，而且还可以基于对所有测量点的结果进行分析。 确定方程式可能更广泛。

公开(公告)号：US20080044673A1

公开(公告)日：2008-02-21

申请号：US11812506

申请日：2007-06-19

申请人： Yuki Miyamoto ,  Tetsuo Tsuchiya

发明人： Yuki Miyamoto ,  Tetsuo Tsuchiya

IPC分类号： B32B15/04 ,  B05D3/02

CPC分类号： C23C18/14 ,  C23C18/1216 ,  C23C18/1241 ,  C23C18/1283 ,  C23C18/1295 ,  H01G4/1209 ,  H01G4/1227 ,  H01G4/33

摘要： An object is to provide a method of making a metal oxide film with a sufficiently high degree of crystal orientation, without difficulties, at low cost, and with little damage to a base material and the metal oxide film, and to provide laminates and electronic devices using the same. A method includes a step of forming a metal film having a (111) plane, on a base material; a step of forming a metal oxide film on the (111) plane of the metal film; and a step of maintaining a temperature of the metal oxide film formed on the (111) plane of the metal film, at 25-600° C. and irradiating the metal oxide film with UV light.

摘要翻译： 本发明的目的是提供一种以低成本制造具有足够高的晶体取向度的金属氧化物膜的方法，并且对基材和金属氧化物膜几乎没有损伤，并且提供层压板和电子器件 使用相同 一种方法包括在基材上形成具有（111）面的金属膜的步骤; 在金属膜的（111）面上形成金属氧化物膜的工序; 以及在金属膜的（111）面上形成的金属氧化物膜的温度保持在25〜600℃的步骤，并用紫外线照射金属氧化物膜。

公开(公告)号：US20070049026A1

公开(公告)日：2007-03-01

申请号：US11508923

申请日：2006-08-24

申请人： Yuki Miyamoto ,  Hitoshi Saita

发明人： Yuki Miyamoto ,  Hitoshi Saita

IPC分类号： H01L21/44 ,  H01L21/31

CPC分类号： H01L21/02263 ,  C23C18/1216 ,  C23C18/1241 ,  C23C18/125 ,  C23C18/1283 ,  H01L21/31691

摘要： A dielectric film production process comprising a baking step in which a dielectric film is formed by heating a precursor layer formed on a metal layer, wherein the metal layer contains at least one type of metal selected from the group consisting of Cu, Ni, Al, stainless steel and inconel, and during at least part of the baking step the precursor layer is heated in a reduced pressure atmosphere.

摘要翻译： 一种电介质膜制造方法，其特征在于，包括：烧成工序，其中通过加热形成在金属层上的前体层形成电介质膜，其中所述金属层含有选自Cu，Ni，Al， 不锈钢和铬镍铁合金，并且在至少部分烘烤步骤期间，将前体层在减压气氛中加热。

公开(公告)号：US20060279901A1

公开(公告)日：2006-12-14

申请号：US10542847

申请日：2004-01-16

申请人： Yuki Miyamoto ,  Yukio Sakashita

发明人： Yuki Miyamoto ,  Yukio Sakashita

IPC分类号： H01G4/255

CPC分类号： H01G4/1218 ,  C01G29/00 ,  C01P2002/20 ,  C01P2002/52 ,  C01P2002/77 ,  C01P2004/80 ,  C01P2006/40 ,  C04B35/475 ,  C04B35/6264 ,  C04B35/64 ,  C04B2235/3224 ,  C04B2235/441 ,  C04B2235/6585 ,  C04B2235/661 ,  C04B2235/787 ,  C04B2235/79 ,  H01B3/12 ,  H01G4/30

摘要： A thin film capacitance element composition, wherein a bismuth layer compound having a c-axis oriented vertically with respect to a substrate surface is expressed by a composition formula of (Bi2O2)2+ (Am−1BmO2m+1)2− or Bi2Am−1BmO3m+3, wherein “m” is an odd number, “A” is at least one element selected from Na, K, Pb, Ba, Sr, Ca and Bi, and “” is at least one element selected from Fe, Co, Cr, Ga, Ti, Nb, Ta, Sb, V, Mo and W; and Bi in the bismuth layer compound is excessively included with respect to the composition formula of (Bi2O2)2+(Am−1BmO3m+1)2+ or Bi2Am−1BmO3m+3, and the excessive content of Bi is in a range of 0

摘要翻译： 一种薄膜电容元件组合物，其中具有相对于衬底表面垂直取向的c轴的铋层化合物由（Bi 2 O 2 O 2）/ >）2 + （A m-1 B m O 2 m + 1）2 - 或者其中“m”是0或1以上的一个或多个，其中“m”是 奇数，“A”是选自Na，K，Pb，Ba，Sr，Ca和Bi中的至少一种元素，“”是选自Fe，Co，Cr，Ga，Ti，Nb， Ta，Sb，V，Mo和W; 铋层化合物中的Bi相对于（Bi 2 O 2 O 2）2 +的组成式（A _{> m-1 B 3 3> 3m + 1 而且，过量的Bi在0}

公开(公告)号：US06797443B2

公开(公告)日：2004-09-28

申请号：US09986084

申请日：2001-11-07

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada

IPC分类号： G03F900

CPC分类号： G03F7/70066 ,  G02B7/04 ,  G02B27/40 ,  G03F7/70641

摘要： Non-telecentric illuminating light obtained by controlling the shape of an opening of an illumination aperture is directed onto a photomask, and a characteristic such that an image of a pattern of the photomask formed by the non-telecentric illumination moves in the direction perpendicular to an optical axis when an image-forming plane is moved in the direction of the optical axis, to perform focus monitoring. This eliminates the need for a special photomask, so that inexpensive and highly precise focus monitoring method, focus monitoring apparatus, and a method of manufacturing a semiconductor device can be obtained.

摘要翻译： 通过控制照明孔的开口的形状而获得的非远心照明光被引导到光掩模上，并且具有使得由非远心照明形成的光掩模的图案的图像沿垂直于 当成像平面在光轴方向上移动时进行光轴执行聚焦监视。 这就消除了对特殊光掩模的需要，从而可以获得廉价且高精度的聚焦监视方法，聚焦监视装置和半导体装置的制造方法。

公开(公告)号：US06764794B2

公开(公告)日：2004-07-20

申请号：US10115246

申请日：2002-04-04

申请人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

发明人： Shuji Nakao ,  Yuki Miyamoto ,  Naohisa Tamada ,  Shinroku Maejima

IPC分类号： G03F900

CPC分类号： G03F7/70641 ,  G03F1/44 ,  G03F1/50 ,  G06K7/0095

摘要： A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is &lgr;, L/&lgr; is 10, or greater.

摘要翻译： 本发明的用于聚焦监视的光掩模具有允许曝光光通过的基板和用于聚焦监视的单元掩模结构。 用于焦点监测的单元掩模结构具有两种图案，并且形成在基板的表面上，并且具有形成在基板的后表面上的背面图案的遮光膜，用于基本上区分曝光光的入射方向， 进入两种模式，并进行位置测量。 当背面图案的尺寸为L且曝光光的波长为λ时，L /λ为10以上。

公开(公告)号：US06323560B1

公开(公告)日：2001-11-27

申请号：US09492750

申请日：2000-01-27

申请人： Koichiro Narimatsu ,  Shigenori Yamashita ,  Nobuyuki Yoshioka ,  Shinya Soeda ,  Atsushi Hachisuka ,  Koji Taniguchi ,  Yuki Miyamoto ,  Takayuki Saito ,  Ayumi Minamide

发明人： Koichiro Narimatsu ,  Shigenori Yamashita ,  Nobuyuki Yoshioka ,  Shinya Soeda ,  Atsushi Hachisuka ,  Koji Taniguchi ,  Yuki Miyamoto ,  Takayuki Saito ,  Ayumi Minamide

IPC分类号： H01L2358

CPC分类号： G03F7/706 ,  G03F7/70633 ,  Y10T428/24802 ,  Y10T428/24917

摘要： The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided.

摘要翻译： 本发明包括形成在第一层中的第一半导体元件形成元件，通过与第一半导体元件形成元件相同的制造步骤形成的第一测量标记，形成在第一层之上的第二层中的第二半导体元件形成元件， 以及在与第二半导体元件形成部件相同的制造步骤中形成的用于测量第一和第二半导体元件形成部件之间的配准精度的第二测量标记。 第一测量标记具有在照射光时受到与第一半导体元件形成部件相同的像差影响的图案，并且第二测量标记具有受光照射时受到与第二半导体元件形成部件相同的像差影响的图案 。 因此，可以提供考虑到像差影响的配准精度测量标记。

公开(公告)号：US06227145B1

公开(公告)日：2001-05-08

申请号：US09274982

申请日：1999-03-23

申请人： Yuki Miyamoto ,  Kengo Ochi

发明人： Yuki Miyamoto ,  Kengo Ochi

IPC分类号： A01K2900

CPC分类号： A01K1/0157 ,  A01K1/0107 ,  A01K1/0353 ,  A61F2013/15186

摘要： A household animal waste collection sheet having a liquid permeable top sheet, a liquid impermeable backing sheet and an absorbent core interposed between the top sheet and the backing sheet, is disclosed. The absorbent core is formed of a pulp layer and particulate super-absorbent polymers disposed on both a top face and a bottom face of the pulp layer. This waste collection sheet has a high rate of liquid-absorption while preventing liquid from flowing backward to the top sheet. Further, the waste collection sheet has a high stiffness.

摘要翻译： 公开了一种家用动物废物收集片，其具有透液性顶片，液体不可渗透背衬片和插入在顶片和背衬片之间的吸收芯。 吸收芯由纸浆层和布置在纸浆层的顶面和底面上的颗粒状超吸收聚合物形成。 该废弃物收集片具有高的液体吸收率，同时防止液体向后流向顶片。 此外，废物收集片具有高刚度。

公开(公告)号：US6068952A

公开(公告)日：2000-05-30

申请号：US231664

申请日：1999-01-15

申请人： Koichiro Narimatsu ,  Shigenori Yamashita ,  Nobuyuki Yoshioka ,  Shinya Soeda ,  Atsushi Hachisuka ,  Koji Taniguchi ,  Yuki Miyamoto ,  Takayuki Saito ,  Ayumi Minamide

发明人： Koichiro Narimatsu ,  Shigenori Yamashita ,  Nobuyuki Yoshioka ,  Shinya Soeda ,  Atsushi Hachisuka ,  Koji Taniguchi ,  Yuki Miyamoto ,  Takayuki Saito ,  Ayumi Minamide

IPC分类号： G03F1/36 ,  G03F1/42 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H05K1/02

CPC分类号： G03F7/706 ,  G03F7/70633 ,  Y10T428/24802 ,  Y10T428/24917

摘要： The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided.

摘要翻译： 本发明包括形成在第一层中的第一半导体元件形成元件，通过与第一半导体元件形成元件相同的制造步骤形成的第一测量标记，形成在第一层之上的第二层中的第二半导体元件形成元件， 以及在与第二半导体元件形成部件相同的制造步骤中形成的用于测量第一和第二半导体元件形成部件之间的配准精度的第二测量标记。 第一测量标记具有在照射光时受到与第一半导体元件形成部件相同的像差影响的图案，并且第二测量标记具有受光照射时受到与第二半导体元件形成部件相同的像差影响的图案 。 因此，可以提供考虑到像差影响的配准精度测量标记。

公开(公告)号：US08683969B2

公开(公告)日：2014-04-01

申请号：US13061666

申请日：2008-09-08

申请人： Masaki Morita ,  Yuki Miyamoto

发明人： Masaki Morita ,  Yuki Miyamoto

IPC分类号： F01P5/02 ,  F01P7/00

CPC分类号： B60H1/00764 ,  B60H1/00828 ,  B60H1/034 ,  F01N3/2006 ,  F01P7/08 ,  F01P2037/02 ,  F01P2060/08 ,  F02M26/00 ,  Y02A50/2322 ,  Y10T477/653

摘要： During the time period from the start of an engine to the completion of a catalyst warming-up, the drive of a blower in an air-conditioning equipment is inhibited to suppress the heat-exchange of the air, which is caused to flow in an air duct by the drive of the blower, with cooling water in a heater core disposed in a circulating passage. Therefore, the heat generated in the engine is restrained from being fed to the inside of a compartment through that air after fed to the cooling water. As a result, the temperatures of the engine and the cooling water rise quickly, and the temperature of the exhaust of the engine rises so that the heat is efficiently fed to the catalyst through the exhaust. This means that the heat generated in the engine is preferentially fed through the exhaust to the catalyst that is the portion needing the feed of heat at a low temperature, other than the compartment in the automobile.

摘要翻译： 在从发动机开始到催化剂预热完成的时间段期间，抑制空气调节设备中的鼓风机的驱动，抑制空气的热交换 通过鼓风机驱动的空气管道，其中设置在循环通道中的加热器芯中的冷却水。 因此，在供给到冷却水之后，发动机产生的热量被抑制成通过该空气供给到室内。 结果，发动机和冷却水的温度迅速上升，发动机排气的温度上升，从而通过排气将热量有效地送入催化剂。 这意味着在发动机中产生的热量优先地通过排气进料到催化剂，该催化剂是除了汽车隔室之外的低温下进行加热的部分。