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175 条记录 (耗时 0.041 秒)

    Laser system
    23.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号：US08908735B2

    公开(公告)日：2014-12-09

    申请号：US13231882

    申请日：2011-09-13

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    IPC分类号： H01S3/22 ,  H01S3/225 ,  H01S3/08 ,  H01S3/00 ,  H01S3/23 ,  H01S3/083 ,  H01S3/10

    CPC分类号： H01S3/225 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/2251 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2383 ,  H01S2301/02

    摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

    Filter for Material Supply Apparatus
    25.
    发明申请
    Filter for Material Supply Apparatus 有权
    过滤器材料供应设备

    公开(公告)号：US20120292527A1

    公开(公告)日：2012-11-22

    申请号：US13112784

    申请日：2011-05-20

    申请人： Igor V. Fomenkov ,  William N. Partlo ,  Georgiy O. Vaschenko ,  William Oldham

    发明人： Igor V. Fomenkov ,  William N. Partlo ,  Georgiy O. Vaschenko ,  William Oldham

    IPC分类号： H05H1/46

    CPC分类号： B01D29/56 ,  B22F3/105 ,  H05G2/006 ,  H05G2/008 ,  H05H1/46

    摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.

    摘要翻译： 在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。 第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。 通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。 片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。

    EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS
    26.
    发明申请
    EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 有权
    EUV光源与用于在EUV非输出期间维护LPP驱动激光输出的子系统

    公开(公告)号：US20120080584A1

    公开(公告)日：2012-04-05

    申请号：US13157233

    申请日：2011-06-09

    申请人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    IPC分类号： H05G2/00 ,  H01L31/00 ,  B01J19/12

    CPC分类号： G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

    摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

    摘要翻译： 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生 不聚焦在液滴上的光脉冲。

    System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
    30.
    发明授权
    System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus 有权
    系统管理极紫外（EUV）光刻设备的腔室之间的气流

    公开(公告)号：US07812329B2

    公开(公告)日：2010-10-12

    申请号：US12002073

    申请日：2007-12-14

    申请人： Alexander N. Bykanov ,  David C. Brandt ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Alexander N. Bykanov ,  David C. Brandt ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： G21K5/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916

    摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.

    摘要翻译： 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。