Abstract:
Embodiments herein describe techniques for wafer to wafer stacking of integrated circuit chips (e.g., dice) to form stacked IC devices. In one example, a stacked IC device is provided that includes a first wafer, a second wafer, and first conductive bridge. The second wafer is stacked on and secured to the first wafer. The second wafer has a plurality of IC dice that are communicatively coupled to a plurality of IC dice formed on the first wafer. The first conductive bridge has a first end that is sandwiched between the first and second wafers. The first conductive bridge shorts exposed pads of dice formed in the exclusion zones of the first and second wafers.
Abstract:
A circuit for enabling the discharge of electric charge in an integrated circuit is described. The circuit comprises an input/output pad coupled to a first node; a first diode coupled between the first node and a ground node; a transistor coupled in parallel with the first diode between the first node and ground node; and a resistor coupled between a body portion of the transistor and the ground node. A method of enabling the discharge of electric charge is also described.
Abstract:
An integrated circuit having improved radiation immunity is described. The integrated circuit comprises a substrate; a P-well formed on the substrate and having N-type transistors of a memory cell; and an N-well formed on the substrate and having P-type transistors of the memory cell; wherein the N-well has minimal dimensions for accommodating the P-type transistors.
Abstract:
Techniques for electrostatic discharge (ESD) protection in integrated circuit (IC) chip packages methods for testing the same are described that are configured to directs the risk of ESD events through ground and power interconnects preferentially over I/O interconnects to enhance ESD protection in chip packages. In one example, a chip package is provided that includes an IC die, a substrate, and a plurality of interconnects. The plurality of interconnects are exposed on a side of the substrate opposite the IC die. The interconnects provide terminations for substrate circuitry formed within the substrate. At least one of the last 5 interconnects of the plurality of interconnects respectively comprising rows and columns of interconnects disposed along the edges of the substrate that closest to each corner of substrate project farther from the substrate than interconnects within those rows and columns that are configured as I/O interconnects.
Abstract:
Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.
Abstract:
Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a semiconductor structure includes a semiconductor substrate, a p-type transistor having p+ source/drain regions disposed in a n-doped region in the semiconductor substrate, an n-type transistor having n+ source/drain regions disposed in a p-doped region in the semiconductor substrate, a n+ guard ring disposed in the n-doped region and laterally around the p+ source/drain regions of the p-type transistor, and a p+ guard ring disposed laterally around the n-doped region. The p+ guard ring is disposed between the p-type transistor and the n-type transistor.
Abstract:
An integrated circuit device is described. The integrated circuit device comprises a substrate having transmitter for receiving a signal to be transmitted to a receiver of the substrate by way of a transmission channel; a first plurality of contacts adapted to receive a first integrated circuit die, wherein a contact of the first plurality of contacts is adapted to receive the signal to be transmitted by the transmitter; a second plurality of contacts adapted to receive a second integrated circuit die, wherein a contact of the second plurality of contacts is adapted to receive the signal transmitted by the transmitter and received by the receiver; a first resistive element coupled between a contact of the first plurality of contacts and the transmitter; and a second resistive element coupled between a contact of the second plurality of contacts and the receiver. A method of transmitting data in an integrated circuit is also described.
Abstract:
Determining a circuit design-specific, failures in time rate for single event upsets for an integrated circuit (IC) includes determining, using a processor, a number of critical interconnect multiplexer bits for a circuit design for a target IC and determining a number of critical look-up table bits for the circuit design. Using the processor, a device vulnerability factor is estimated for the circuit design for the target IC using the number of critical interconnect multiplexer bits and the number of critical look-up table bits. The estimated device vulnerability factor can be stored, e.g., for subsequent comparison with other circuit designs.
Abstract:
Various example implementations are directed to circuits and methods for inter-die communication on a multi-die integrated circuit (IC) package. According to an example implementation, an IC package includes a first semiconductor die having a plurality of communication circuits for communicating data over respective data terminals of the package. The package also includes a second semiconductor die having N contacts for communicating data to and from the semiconductor die. The second semiconductor die includes a logic circuit configured to communicate M parallel data signals with one or more other semiconductor dies of the package, wherein M>N. The second semiconductor die also includes a plurality of serializer circuits, each configured to serialize data from a respective subset of the plurality of the M signal lines to produce serialized data and provide the serialized data to a respective one of the contacts.
Abstract:
According to a method of preparing a layout of semiconductor circuit elements, a computer processor determines a first value of a distance metric that describes a separation between at least one well of a first type and at least one well of a second type in a first layout of a circuit design represented in a memory coupled to the computer processor. The at least one well of the first type and the at least one well of the second type are rearranged into a second layout. The method determines a second value of the distance metric that describes separation between the at least one well of the first type and the at least one well of the second type in the second layout. The second layout is stored in response to the second value of the distance metric being greater than the first value of the distance metric.