Method of forming a pattern
    21.
    发明授权
    Method of forming a pattern 失效
    形成图案的方法

    公开(公告)号:US06420271B2

    公开(公告)日:2002-07-16

    申请号:US09814839

    申请日:2001-03-23

    IPC分类号: H01L214763

    摘要: A method of forming a pattern comprising the steps of, forming a lower film on a substrate, the lower film being a film containing carbon atom at a ratio of 80 wt % or more, or a vapor phase deposition film, either applying an adhesion-promoting treatment to a surface of the lower film or forming an adhesion-promoting on the lower film, forming an intermediate film on a surface of the lower film, forming a resist film on the intermediate film, forming a resist pattern by conducting a patterning exposure of the resist film, forming an intermediate film pattern by transferring the resist pattern to the intermediate film, and forming a lower film pattern by transferring the intermediate film pattern to the lower film.

    摘要翻译: 一种形成图案的方法,包括以下步骤:在基底上形成下膜,下膜是含有80重量%以上的碳原子的膜或气相沉积膜, 促进对下膜的表面的处理或在下膜上形成粘合促进,在下膜的表面上形成中间膜,在中间膜上形成抗蚀剂膜,通过进行图案曝光形成抗蚀剂图案 的抗蚀剂膜,通过将抗蚀剂图案转印到中间膜而形成中间膜图案,并通过将中间膜图案转印到下膜来形成下膜图案。

    Method of forming mold release film and making a glass optical element
    22.
    发明授权
    Method of forming mold release film and making a glass optical element 失效
    形成脱模膜并制成玻璃光学元件的方法

    公开(公告)号:US5851252A

    公开(公告)日:1998-12-22

    申请号:US798270

    申请日:1997-02-11

    摘要: In a method of forming a mold release film on the surface of a glass blank from which an optical element is made by press molding, a carbon film having a thickness of less than 50 angstroms or, preferably, less than 10 angstroms is formed on the surface of the glass blank, thereby improving the releasability of the mold and the molded article with respect to each other. A glass blank (1) is subjected to ashing with an oxygen plasma so as to remove organic dirt attached to the glass blank (1). Then, plasma cleaning with an argon plasma is effected so as to remove inorganic dirt attached to the glass blank (1). Thereafter, the glass blank (1) is subjected to methane plasma processing such that a carbon film (2) having a thickness of less than 50 angstroms is formed on the surface of the glass blank (1) from which the dirt has been removed.

    摘要翻译: 在通过压制成型从其制造光学元件的玻璃坯料的表面上形成脱模膜的方法中,形成厚度小于50埃,优选小于10埃的碳膜, 从而提高了模具和模制品相对于彼此的脱模性。 玻璃坯料(1)用氧等离子体进行灰化,以除去附着在玻璃坯料(1)上的有机污垢。 然后,进行氩等离子体的等离子体清洗,以除去附着在玻璃坯料(1)上的无机污垢。 此后,对玻璃坯料(1)进行甲烷等离子体处理,使得在去除了污物的玻璃坯料(1)的表面上形成厚度小于50埃的碳膜(2)。

    Method of forming mold release film
    23.
    发明授权
    Method of forming mold release film 失效
    脱模膜的形成方法

    公开(公告)号:US5723174A

    公开(公告)日:1998-03-03

    申请号:US798060

    申请日:1997-02-11

    申请人: Yasuhiko Sato

    发明人: Yasuhiko Sato

    摘要: In a method of forming a mold release film on at least molding surfaces of a mold comprising an upper die, a lower die, and a cylindrical die for press molding of an optical element, a TiAlN film is formed on the molding surfaces of the mold and is polished so as to yield a center-line mean roughness of about 1 nm or less, thereby improving the mold in terms of durability, heat resistance, specular characteristic, and the like while improving releasability of the mold and a molded article with respect to each other. A TiAlN film (1) is formed on molding surfaces (31a, 32a) of upper and lower dies (31, 32) by a sputtering technique or the like. Thus formed TiAlN film (1) is polished till its center-line mean roughness becomes about 1 nm. Accordingly, the molding surfaces (31a, 32a) are prevented from being discolored or becoming rough due to heat, whereby the mold can be improved in terms of durability, heat resistance, and the like.

    摘要翻译: 在至少在包括上模,下模和用于压模成型光学元件的圆柱形模的模具的成形表面上形成脱模膜的方法中,在模具的模制表面上形成TiAlN膜 并且抛光,以产生约1nm或更小的中心线平均粗糙度,从而在耐久性,耐热性,镜面特性等方面改进模具,同时提高模具和模制品的脱模性 对彼此。 通过溅射技术等在上模具和下模具(31,32)的模制表面(31a,32a)上形成TiAlN薄膜(1)。 将如此形成的TiAlN膜(1)抛光直到其中心线平均粗糙度变为约1nm。 因此,防止模制表面(31a,32a)由于热而变色或变得粗糙,从而可以在耐久性,耐热性等方面改善模具。

    Thin layer depositing apparatus
    26.
    发明授权
    Thin layer depositing apparatus 失效
    薄层沉积设备

    公开(公告)号:US4466876A

    公开(公告)日:1984-08-21

    申请号:US356720

    申请日:1982-03-10

    摘要: A thin layer depositing apparatus comprising a reaction vessel for putting therein substrates to be provided with a desired thin layer and a gas accelerating nozzle positioned at a desired portion of the reaction vessel so that reactive gas is introduced in the reaction vessel through the gas accelerating nozzle.

    摘要翻译: 一种薄层沉积设备,包括:反应容器,用于将其中设置有所需薄层的基板和位于反应容器的所需部分的气体加速喷嘴,使得反应气体通过气体加速喷嘴引入反应容器 。

    METHOD AND APPARATUS FOR MAKING COATING FILM
    27.
    发明申请
    METHOD AND APPARATUS FOR MAKING COATING FILM 审中-公开
    用于制作涂膜的方法和装置

    公开(公告)号:US20080131599A1

    公开(公告)日:2008-06-05

    申请号:US11940762

    申请日:2007-11-15

    IPC分类号: B05D3/12 B05C11/02

    CPC分类号: G03F7/162 B05D1/005 B05D7/52

    摘要: A method of forming a coating film includes dropping a first chemical onto a substrate to be treated and rotating the substrate, thereby forming a first coating film, the first chemical being comprised of a solvent and a solid added to the solvent, baking the first coating film, dropping a second chemical onto a first-chemical poorly-coated region of the stationary substrate, thereby forming a second coating film, the second chemical being comprised of a solvent and a solid added to the solvent, drying the second coating film, and baking the second coating film.

    摘要翻译: 形成涂膜的方法包括将第一化学品滴加到待处理的基底上并旋转基底,从而形成第一涂膜,第一化学品由溶剂和固体添加到溶剂中,烘烤第一涂层 从而形成第二涂膜,第二化学品由溶剂和添加到溶剂中的固体组成,干燥第二涂膜,以及将第二化学品涂布在固定基材的第一化学品涂层较差的区域上, 烘烤第二涂膜。

    Method of manufacturing semiconductor device
    28.
    发明授权
    Method of manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US07235490B2

    公开(公告)日:2007-06-26

    申请号:US10788216

    申请日:2004-02-27

    IPC分类号: H01L21/311

    摘要: A method of manufacturing a semiconductor device comprises preparing a working film to be processed, forming an adhesion improving region on the working film for increasing an adhesion between the working film and a mask material containing carbon, forming the mask material on the working film, forming a resist pattern on the mask material, the mask material having a higher etching resistance for the working film than the resist pattern, transferring the pattern of the resist pattern onto the mask material, and etching the working film by using the mask material as a mask.

    摘要翻译: 一种制造半导体器件的方法包括:制备待加工的工作薄膜,在工作薄膜上形成粘合改善区域,以增加工作薄膜和含有碳的掩模材料之间的粘附力,在工作薄膜上形成掩模材料,形成 在掩模材料上的抗蚀剂图案,掩模材料对抗蚀剂图案具有比工作膜更高的耐蚀刻性,将抗蚀剂图案的图案转印到掩模材料上,并且通过使用掩模材料作为掩模来蚀刻工作膜 。

    Combined optical elements
    30.
    发明授权
    Combined optical elements 失效
    组合光学元件

    公开(公告)号:US07085078B2

    公开(公告)日:2006-08-01

    申请号:US11034577

    申请日:2005-01-13

    IPC分类号: G02B7/02

    摘要: A compound optical unit has combined optical elements in which two optical elements having convex optical functional surfaces are joined to each other with the optical functional surfaces facing each other, the optical elements being formed of glass. An inner flange adjacent to the optical functional surfaces of each optical element is different in thickness from an outer flange formed outsides the inner flange, the outer flange has a top face formed higher then the optical functional surface, and each of the top faces of the outer flanges are jointed to each other.

    摘要翻译: 复合光学单元具有组合的光学元件,其中具有凸形光学功能表面的两个光学元件彼此接合,光学功能表面彼此面对,光学元件由玻璃形成。 与每个光学元件的光学功能表面相邻的内部凸缘的厚度与形成在内部凸缘外侧的外部凸缘的厚度不同,外部凸缘具有比光学功能表面高的顶面,并且, 外凸缘相互连接。