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    STRUCTURE
    22.
    发明申请
    STRUCTURE 有权
    结构体

    公开(公告)号：US20120231213A1

    公开(公告)日：2012-09-13

    申请号：US13425676

    申请日：2012-03-21

    申请人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    发明人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    IPC分类号： B32B3/30

    CPC分类号： B82Y30/00 ,  B32B27/08 ,  Y10T428/24174 ,  Y10T428/261 ,  Y10T428/31678 ,  Y10T428/31855

    摘要： A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of a self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4′-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.

    摘要翻译： 一种结构包括基板，形成在基板上的第一层和形成在第一层上的第二层。 第一层由自组装单层组成并含有4-（6-羟基己氧基）-4'-甲氧基联苯。 第二层通过包含由聚环氧乙烷构成的亲水性聚合物和由侧链上含有偶氮苯的聚甲基丙烯酸构成的疏水性聚合物的嵌段共聚物进行微相分离而获得。 第二层包含圆柱相，其长轴垂直于基底取向。 第二层的厚度T在A＆lt; NlE; T＆nlE; 50nm的范围内，其中A是满足5nm＆amp; NlE; A＆amp; NlE; 50nm的相分离周期长度。

    Pattern forming method
    23.
    发明授权
    Pattern forming method 有权
    图案形成方法

    公开(公告)号：US08974680B2

    公开(公告)日：2015-03-10

    申请号：US13426166

    申请日：2012-03-21

    申请人： Hiroki Tanaka ,  Ryosuke Yamamoto ,  Naoko Kihara

    发明人： Hiroki Tanaka ,  Ryosuke Yamamoto ,  Naoko Kihara

    IPC分类号： H01L21/302 ,  H01L21/461 ,  C03C15/00 ,  C03C25/68 ,  B44C1/22 ,  C08F2/00 ,  C08F4/00 ,  G11B5/82 ,  H01L21/308 ,  B81C1/00 ,  B82Y10/00 ,  G11B5/74 ,  G11B5/855

    CPC分类号： H01L21/3086 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0271 ,  H01L21/30604 ,  H01L21/3081

    摘要： A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymers, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately. The bond is broken, then selectively dissolving-removing either domain by a solvent to provide a polymer pattern of a remainder domain.

    摘要翻译： 图案形成方法包括形成含有具有第一接合基团的亲水性第一均聚物和具有能够与第一接合基团键合的第二接合基团的疏水性第二均聚物的涂膜，在第一和第二接合基团之间形成键，以产生 第一和第二均聚物的嵌段共聚物，并加热涂膜以将共聚物微相分离成亲水结构域和疏水结构域。 亲水和疏水畴交替排列。 该键断裂，然后通过溶剂选择性溶解除去任一结构域，以提供其余结构域的聚合物图案。

    Structure for recording medium
    24.
    发明授权
    Structure for recording medium 有权
    记录介质结构

    公开(公告)号：US08377551B2

    公开(公告)日：2013-02-19

    申请号：US13425676

    申请日：2012-03-21

    申请人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    发明人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    IPC分类号： B32B7/06 ,  B32B18/00 ,  B32B27/06 ,  B32B33/00

    CPC分类号： B82Y30/00 ,  B32B27/08 ,  Y10T428/24174 ,  Y10T428/261 ,  Y10T428/31678 ,  Y10T428/31855

    摘要： A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4′-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.

    摘要翻译： 一种结构包括基板，形成在基板上的第一层和形成在第一层上的第二层。 第一层由自组装单层组成并含有4-（6-羟基己氧基）-4'-甲氧基联苯。 第二层通过包含由聚环氧乙烷构成的亲水性聚合物和由侧链上含有偶氮苯的聚甲基丙烯酸构成的疏水性聚合物的嵌段共聚物进行微相分离而获得。 第二层包含圆柱相，其长轴垂直于基底取向。 第二层的厚度T在A＆lt; NlE; T＆nlE; 50nm的范围内，其中A是满足5nm＆amp; NlE; A＆amp; NlE; 50nm的相分离周期长度。

    Photosensitive composition and a pattern forming process using the same
    29.
    发明授权
    Photosensitive composition and a pattern forming process using the same 有权
    光敏组合物和使用其的图案形成方法

    公开(公告)号：US06197473B1

    公开(公告)日：2001-03-06

    申请号：US09154733

    申请日：1998-09-17

    申请人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

    发明人： Naoko Kihara ,  Satoshi Saito ,  Toru Ushirogouchi

    IPC分类号： G03F7023

    CPC分类号： G03F7/0045 ,  G03F7/022 ,  Y10S430/106

    摘要： The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.

    摘要翻译： 本发明的目的是提供一种对有机溶剂以及碱性显影剂或pH11或更低的水基显影剂具有高溶解度的光敏组合物，并提供用于获得高分辨抗蚀剂图案的图案形成方法 这些目的通过光敏组合物实现，该组合物包含在室温下为玻璃状的化合物，并且具有带有三个或更多个含有酸可分解取代基的芳环的环状结构，以及图案形成方法，其中使用所述感光 组合物暴露于光图案，并用碱的水溶液或pH11或更低的水性显影剂显影。

    Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group
    30.
    发明授权
    Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group 失效
    包含碱溶性粘合剂和具有磺酰基的光致酸发生剂的光敏组合物

    公开(公告)号：US5348838A

    公开(公告)日：1994-09-20

    申请号：US921692

    申请日：1992-07-30

    申请人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

    发明人： Toru Ushirogouchi ,  Naoko Kihara ,  Osamu Sasaki ,  Tsukasa Tada ,  Takuya Naito ,  Satoshi Saito

    IPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/004 ,  G03C1/492

    CPC分类号： C08G8/28 ,  C08K5/41 ,  G03F7/0045 ,  Y10S430/11

    摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.

    摘要翻译： 感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物 （1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在 引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基 基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。