利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

46 条记录 (耗时 0.035 秒)

    Method of forming fine pattern
    5.
    发明申请
    Method of forming fine pattern 审中-公开
    形成精细图案的方法

    公开(公告)号：US20120067843A1

    公开(公告)日：2012-03-22

    申请号：US13064301

    申请日：2011-03-16

    申请人： Akira Watanabe ,  Kaori Kimura ,  Yousuke Isowaki ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Akira Kikitsu

    发明人： Akira Watanabe ,  Kaori Kimura ,  Yousuke Isowaki ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Akira Kikitsu

    IPC分类号： C23F1/02

    CPC分类号： H01L21/3086 ,  B82Y10/00 ,  G03F7/0002 ,  G03F7/165 ,  G03F7/168 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/3081

    摘要： A method of forming a fine pattern according to an embodiment includes: forming a hard mask on a substrate; forming a mask reinforcing member on the hard mask; forming a di-block copolymer layer on the mask reinforcing member, the di-block copolymer layer comprising a sea-island structure; forming a pattern comprising a concave-convex structure in the di-block copolymer layer, with island portions of the sea-island structure being convex portions; and transferring the pattern onto the hard mask by performing etching on the mask reinforcing member and the hard mask, with a mask being the pattern formed in the di-block copolymer layer. The mask reinforcing member is comprised of a material having an etching speed that is higher than an etching speed for the hard mask and is lower than an etching speed for sea portions of the sea-island structure of the di-block copolymer layer.

    摘要翻译： 根据实施例的形成精细图案的方法包括：在基底上形成硬掩模; 在所述硬掩模上形成掩模加强部件; 在掩模加强部件上形成二嵌段共聚物层，二嵌段共聚物层包含海岛结构体; 在所述二嵌段共聚物层中形成包括凹凸结构的图案，所述海岛结构的岛部是凸部; 并通过在掩模增强部件和硬掩模上进行蚀刻将图案转印到硬掩模上，其中掩模是在二嵌段共聚物层中形成的图案。 掩模加强部件由蚀刻速度高于硬掩模的蚀刻速度的材料构成，并且低于二嵌段共聚物层的海岛结构的海水部分的蚀刻速度。

    Method for pattern formation
    6.
    发明授权
    Method for pattern formation 有权
    图案形成方法

    公开(公告)号：US07931819B2

    公开(公告)日：2011-04-26

    申请号：US11727158

    申请日：2007-03-23

    申请人： Naoko Kihara ,  Hiroyuki Hieda

    发明人： Naoko Kihara ,  Hiroyuki Hieda

    IPC分类号： H01L21/302

    CPC分类号： H01L21/3086 ,  B82Y10/00 ,  Y10S438/942

    摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.

    摘要翻译： 提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤， 所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含 聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

    Magnetic recording media
    7.
    发明申请
    Magnetic recording media 有权
    磁记录媒体

    公开(公告)号：US20060257694A1

    公开(公告)日：2006-11-16

    申请号：US11434519

    申请日：2006-05-16

    申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

    发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

    IPC分类号： G11B5/64

    CPC分类号： G11B5/855

    摘要： A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.

    摘要翻译： 磁记录介质具有由二维排列的磁性材料形成的记录单元，围绕记录单元的非磁性层，形成在每个记录单元上的粘合膜，以及直接附着在粘合膜上的润滑剂。

    STRUCTURE
    10.
    发明申请
    STRUCTURE 有权
    结构体

    公开(公告)号：US20120231213A1

    公开(公告)日：2012-09-13

    申请号：US13425676

    申请日：2012-03-21

    申请人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    发明人： Ryosuke Yamamoto ,  Hiroki Tanaka ,  Naoko Kihara ,  Toshiro Hiraoka

    IPC分类号： B32B3/30

    CPC分类号： B82Y30/00 ,  B32B27/08 ,  Y10T428/24174 ,  Y10T428/261 ,  Y10T428/31678 ,  Y10T428/31855

    摘要： A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of a self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4′-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.

    摘要翻译： 一种结构包括基板，形成在基板上的第一层和形成在第一层上的第二层。 第一层由自组装单层组成并含有4-（6-羟基己氧基）-4'-甲氧基联苯。 第二层通过包含由聚环氧乙烷构成的亲水性聚合物和由侧链上含有偶氮苯的聚甲基丙烯酸构成的疏水性聚合物的嵌段共聚物进行微相分离而获得。 第二层包含圆柱相，其长轴垂直于基底取向。 第二层的厚度T在A＆lt; NlE; T＆nlE; 50nm的范围内，其中A是满足5nm＆amp; NlE; A＆amp; NlE; 50nm的相分离周期长度。