公开(公告)号：US20100110397A1

公开(公告)日：2010-05-06

申请号：US12261798

申请日：2008-10-30

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/52 ,  F28D15/00

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 镜组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一镜块传递到热交换器。

公开(公告)号：US07591561B2

公开(公告)日：2009-09-22

申请号：US11382342

申请日：2006-05-09

Applicant: Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

Inventor： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

IPC: G02B5/08

CPC classification number: G02B5/10 ,  G02B7/1815 ,  G03F7/70783 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

Abstract translation: 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。

公开(公告)号：US07524072B2

公开(公告)日：2009-04-28

申请号：US11016059

申请日：2004-12-17

Applicant: Timo Laufer ,  Johannes Zellner

Inventor： Timo Laufer ,  Johannes Zellner

IPC: G02B5/08 ,  G02B1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G02B1/00 ,  G03F1/24 ,  G03F7/70858 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/065

Abstract: There is provided an optical component. The optical component includes a material having a coefficient of thermal expansion α, where the coefficient of thermal expansion is dependent on location. The following applies to the location-dependent coefficient of thermal expansion: α= α±Δα, with Δα being the maximum deviation of the coefficient of thermal expansion from the mean value of the coefficient of thermal expansion α of the material. The following homogeneity condition applies to the material:  Δα  ≤ ( 0.14 + 0.1 · x + 390 x ) · ɛ _ Q .  with the progress of the lacation-dependent progress of the coefficient of thermal expansion being periodical with a wavelength x given in mm, and the thermal output which is absorbed by the optical component being designated by Q given in watts (W), the resulting emissivity being designated by ε, and |Δα|in units of ppb K .

公开(公告)号：US07323703B2

公开(公告)日：2008-01-29

申请号：US11647007

申请日：2006-12-27

Applicant: I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

Inventor： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

Abstract translation: 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

公开(公告)号：US20080017801A1

公开(公告)日：2008-01-24

申请号：US11647024

申请日：2006-12-27

Applicant: Igor Fomenkov ,  Alexander Ershov

Inventor： Igor Fomenkov ,  Alexander Ershov

IPC: G01J1/18 ,  G01J1/04

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20060093253A1

公开(公告)日：2006-05-04

申请号：US11245288

申请日：2005-10-06

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: G02F1/335

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

公开(公告)号：US3821579A

公开(公告)日：1974-06-28

申请号：US33854473

申请日：1973-03-06

Applicant: BURNS S

Inventor： BURNS S

IPC: G21K1/06 ,  H01J35/04 ,  H01J35/08

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/065 ,  H01J35/04

Abstract: An x-ray source is disclosed for providing a brilliant, extremely low divergence, monochromatic x-ray beam. X-rays are generated by electron bombardment on the surfaces of a single crystal. The x-rays are subsequently repeatedly diffracted by an adjacent crystal surface. The x-ray beams emitted from the ends of the crystal in Bragg directions are monochromatic and with a divergence controlled by the diffraction process. The divergence of the emitted x-ray beams is independent of the final focal spot geometry. This permits heat transfer from a large x-ray emission area, a relatively large focal area but maintains a low divergence, high intensity and improved monochromaticity in the x-ray beam.

公开(公告)号：US20180074410A1

公开(公告)日：2018-03-15

申请号：US15815238

申请日：2017-11-16

Applicant: Carl Zeiss SMT GmbH

Inventor： Matthias Mueller ,  Thomas Fischer ,  Stefan Seitz

IPC: G03F7/20 ,  G02B19/00 ,  G02B26/08 ,  G02B5/08 ,  G02B5/09

CPC classification number: G03F7/70116 ,  G02B5/0891 ,  G02B5/09 ,  G02B19/0023 ,  G02B19/0095 ,  G02B26/0816 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70941 ,  G21K2201/065

Abstract: An illumination optical unit for EUV projection lithography illuminates an object field with illumination light. The illumination optical unit has a first facet mirror including a plurality of first facets on a first mirror carrier. Disposed downstream of the first facet mirror is a second facet mirror including a plurality of second facets arranged on a second mirror carrier around a facet arrangement center. Partial beams of the illumination light are guided superposed on one another into the object field, respectively via illumination channels which have one of the first facets and one of the second facets. Second maximum angle facets are arranged at the edge of the second mirror carrier. The second maximum angle facets predetermine maximum illumination angles of the illumination light which deviate maximally from a chief ray incidence on the object field.

公开(公告)号：US09541685B2

公开(公告)日：2017-01-10

申请号：US13971031

申请日：2013-08-20

Applicant: Carl Zeiss Laser Optics GmbH ,  Carl Zeiss SMT GmbH

Inventor： Holger Kierey ,  Heiko Siekmann ,  Andre Bresan

IPC: G02B5/08 ,  G02B5/20 ,  G02B13/14 ,  F21V9/04 ,  F21V9/06 ,  B24B13/00 ,  G02B1/10 ,  G02B5/10 ,  G02B5/18 ,  G03F7/20

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Abstract translation: 一种用于制造用于EUV投影曝光装置的反射型光学部件的方法，具有基体的部件和设置在基板上的反射层的部件，其中基板具有光学上的微结构化，包括以下步骤： 微结构化到衬底中，在微结构化已经加工到衬底中之后对衬底进行抛光，将反射层施加到衬底上。 用于EUV投影曝光装置的反射型光学部件对应地具有在微结构化和反射层之间的抛光表面。

公开(公告)号：US09041904B2

公开(公告)日：2015-05-26

申请号：US13331549

申请日：2011-12-20

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/52 ,  G02B7/18 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger includes at least one well defined therein. The mirror assembly includes a mirror block having a mirrored surface. The mirror assembly also has at least one surface. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The at least one surface is in contact with the liquid metal to transfer heat from the mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，一种装置包括热交换器，反射镜组件和第一液态金属界面。 热交换器包括至少一个井。 镜组件包括具有镜面的镜块。 镜组件还具有至少一个表面。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 所述至少一个表面与所述液态金属接触以将热量从所述镜块传递到所述热交换器。