公开(公告)号：US5062885A

公开(公告)日：1991-11-05

申请号：US543375

申请日：1990-06-26

申请人： Shunichiro Matsumoto ,  Tsutomu Inui ,  Rokuo Ichiyasu ,  Yoshitaka Chiba

发明人： Shunichiro Matsumoto ,  Tsutomu Inui ,  Rokuo Ichiyasu ,  Yoshitaka Chiba

IPC分类号： B22F3/00 ,  B22F9/08 ,  C22C1/04 ,  C23C14/34 ,  G11B5/851 ,  G11B11/105 ,  H01F1/055 ,  H01F41/18

CPC分类号： H01F41/183 ,  C22C1/0441 ,  C23C14/3414 ,  G11B11/10589 ,  G11B5/851 ,  H01F1/0551

摘要： A rare earth metal-iron group metal target for a magneto-optical disk is produced by mixing powder (a) produced by the rapid quenching treatment of an alloy composed of at least one rare earth metal and at least one iron group metal in a composition range which permits the formation of an eutectic structure, with powder (b) from at least one iron group metal in an amount necessary for meeting the composition requirements of the target; and subjecting the resulting mixture to pressure sintering in vacuum or in an inert gas atmosphere at a temperature lower than a liquid phase-appearing temperature of the mixture to produce a rare earth metal-iron group metal intermetallic bonding layer between the particles.

公开(公告)号：US4824481A

公开(公告)日：1989-04-25

申请号：US142363

申请日：1988-01-11

申请人： Dilip K. Chatterjee ,  Srinivas T. Rao

发明人： Dilip K. Chatterjee ,  Srinivas T. Rao

IPC分类号： B22F3/14 ,  C22C1/04 ,  C23C14/34 ,  H01F41/18 ,  B22F1/00

CPC分类号： C23C14/3414 ,  B22F3/14 ,  C22C1/0441 ,  H01F41/183

摘要： Sputtering targets are made by melting at least one rare earth and at least one transition metal to produce an amorphous alloy melt, forming a powder of the alloy in an oxygen free atmosphere, introducing the powdered alloy into a reducing mold, adding a layer of powdered oxygen-getter on top of the powdered alloy, and hot pressing the alloy.

摘要翻译： 通过熔化至少一种稀土和至少一种过渡金属来制造溅射靶，以产生无定形合金熔体，在无氧气氛中形成合金粉末，将粉末状合金引入还原模具中，加入一层粉末状 粉末合金顶部的吸氧剂，热压合金。

公开(公告)号：US20240186064A1

公开(公告)日：2024-06-06

申请号：US18440448

申请日：2024-02-13

申请人： Evatec AG

发明人： Claudiu Valentin Falub ,  Martin Bless

IPC分类号： H01F41/18 ,  B32B15/04 ,  C22C19/07 ,  C22C38/00 ,  C22C38/10 ,  C23C14/06 ,  C23C14/14 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C14/56 ,  H01F1/147 ,  H01J37/34

CPC分类号： H01F41/183 ,  B32B15/04 ,  C22C19/07 ,  C22C38/002 ,  C22C38/10 ,  C23C14/067 ,  C23C14/14 ,  C23C14/345 ,  C23C14/3464 ,  C23C14/352 ,  C23C14/505 ,  C23C14/568 ,  H01F1/147 ,  H01F41/18 ,  H01J37/3417 ,  H01J37/3429 ,  H01J37/3447 ,  C22C2202/02

摘要： The soft magnetic material multilayer deposition apparatus includes a circular arrangement of a multitude of substrate carriers in a circular inner space of a vacuum transport chamber. In operation the substrate carriers pass treatment stations. One of the treatment stations has a sputtering target made of a first soft magnetic material. A second treatment station includes a target made of a second soft magnetic material which is different from the first soft magnetic material of the first addressed target. A control unit controlling relative movement of the substrate carriers with respect to the treatment stations provides for more than one 360° revolution of the multitude of substrate carriers around the axis AX of the circular inner space of the vacuum transport chamber, while the first and second treatment stations are continuously operative.

公开(公告)号：US20230220539A1

公开(公告)日：2023-07-13

申请号：US17776777

申请日：2020-11-13

申请人： Dyson Technology Limited

发明人： Michael Edward RENDALL ,  Robert Ian Joseph GRUAR

IPC分类号： C23C14/34 ,  C23C14/14 ,  C23C14/06 ,  C23C14/08 ,  C23C14/56 ,  C23C14/02 ,  H01G9/00 ,  H01F41/18 ,  H01L33/00 ,  H01L33/50 ,  H01L31/032 ,  H01J37/34

CPC分类号： C23C14/3464 ,  C23C14/14 ,  C23C14/0641 ,  C23C14/086 ,  C23C14/562 ,  C23C14/024 ,  H01G9/0029 ,  H01F41/183 ,  H01L33/007 ,  H01L33/502 ,  H01L33/0054 ,  H01L31/0322 ,  H01J37/3429 ,  H01L2933/0041 ,  H01G9/2027

摘要： A method of manufacturing an electronic component including a substrate is provided. The method includes generating a plasma remote from a sputter target, generating sputtered material from the sputter target using the plasma, and depositing the sputtered material on a substrate as a crystalline layer.

公开(公告)号：US09103023B2

公开(公告)日：2015-08-11

申请号：US13131124

申请日：2010-03-08

申请人： Atsushi Sato

发明人： Atsushi Sato

IPC分类号： C23C14/34 ,  C22C32/00 ,  H01F41/18

CPC分类号： C23C14/3414 ,  B22F2998/00 ,  C22C32/0026 ,  C22C32/0052 ,  C22C32/0068 ,  H01F41/183 ,  B22F2303/01 ,  B22F2301/15

摘要： A nonmagnetic material particle-dispersed ferromagnetic material sputtering target comprising a mixture of an alloy containing 5 mol % or more and 20 mol % or less of Cr, 5 mol % or more and 30 mol % or less of Pt, and Co as the remainder thereof, and nonmagnetic material particles, wherein the structure of the target includes a phase (A) in which the nonmagnetic material particles are uniformly micro-dispersed in the alloy, and a spherical alloy phase (B) dispersed in the phase (A) in which the ratio of its volume in the target is 4% or more and 40% or less. Obtained is a nonmagnetic material particle-dispersed ferromagnetic material sputtering target capable of improving the leakage magnetic flux to obtain a stable electrical discharge with a magnetron sputtering device, and which has high density and generates few particles during sputtering.

摘要翻译： 一种非磁性材料颗粒分散铁磁材料溅射靶，其包含含有5mol％以上且20mol％以下的Cr，5mol％以上且30mol％以下的Pt的合金和余量的Co的混合物， 和非磁性材料颗粒，其中靶的结构包括其中非磁性材料颗粒均匀地微分散在合金中的相（A）和分散在相（A）中的球形合金相（B） 其目标体积的比例为4％以上且40％以下。 获得的是一种非磁性材料粒子分散的铁磁材料溅射靶，其能够通过磁控溅射装置提高泄漏磁通量以获得稳定的放电，并且在溅射期间具有高密度并且产生很少的颗粒。

公开(公告)号：US20150213822A1

公开(公告)日：2015-07-30

申请号：US14414518

申请日：2013-08-06

申请人： JX Nippon Mining & Metals Corporation

发明人： Shin-ichi Ogino

IPC分类号： G11B5/65 ,  C30B29/16 ,  H01F1/33 ,  C22C38/00 ,  C22C38/16 ,  C22C5/04 ,  C30B29/38 ,  C22C33/02

CPC分类号： G11B5/653 ,  B22F2998/10 ,  B22F2999/00 ,  C22C1/0466 ,  C22C1/051 ,  C22C5/04 ,  C22C32/0005 ,  C22C33/02 ,  C22C33/0278 ,  C22C33/0292 ,  C22C38/002 ,  C22C38/16 ,  C23C14/3414 ,  C30B29/16 ,  C30B29/38 ,  G11B5/65 ,  G11B5/851 ,  H01F1/33 ,  H01F10/123 ,  H01F41/183 ,  C22C1/1084 ,  B22F3/14 ,  B22F3/15 ,  B22F2201/11

摘要： Provided is an Fe—Pt based magnetic material sintered compact, comprising BN and SiO2 as non-magnetic materials, wherein Si and O are present in a region where B or N is present at a cut surface of the sintered compact. An object of the present invention is to provide a high density sputtering target which enables production of a magnetic thin film for heat-assisted magnetic recording media, and also reduces the amount of particles generated during sputtering.

摘要翻译： 提供了一种Fe-Pt系磁性材料烧结体，其包含BN和SiO 2作为非磁性材料，其中Si和O存在于烧结体的切割面处存在B或N的区域中。 本发明的目的是提供一种能够制造用于热辅助磁记录介质的磁性薄膜的高密度溅射靶，并且还减少溅射期间产生的颗粒的量。

公开(公告)号：US20150034483A1

公开(公告)日：2015-02-05

申请号：US14382552

申请日：2013-05-30

申请人： HITACHI METALS, LTD.

发明人： Jun Fukuoka ,  Kazuya Saito ,  Kouichi Sakamaki ,  Tomoyuki Hata

IPC分类号： C23C14/34 ,  B22F3/14 ,  H01J37/34

CPC分类号： H01J37/3429 ,  B22F3/14 ,  B22F9/082 ,  C22C1/0433 ,  C22C19/07 ,  C22C30/00 ,  C22C33/0285 ,  C22C38/00 ,  C22C38/10 ,  C22C38/12 ,  C22C38/26 ,  C22C38/30 ,  C22C2202/02 ,  C23C14/14 ,  C23C14/20 ,  C23C14/3414 ,  G11B5/851 ,  H01F41/183 ,  H01J2237/02

摘要： Provided is a Fe—Co-based alloy sputtering target material having a composition represented as an atomic ratio by the compositional formula: (Fea—Co100-a)100-b-c-d—Tab—Nbc-Md, wherein 0

摘要翻译： 本发明提供一种Fe-Co系合金溅射靶材料，其特征在于，组成式为：（Fea-Co100-a）100-bcd-Tab-Nbc-Md以原子比表示的组成，其中0

公开(公告)号：US08679268B2

公开(公告)日：2014-03-25

申请号：US13320840

申请日：2010-09-30

申请人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

发明人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

IPC分类号： C23C14/06 ,  C23C14/34 ,  H01F41/18 ,  C22C19/07

CPC分类号： C23C14/3414 ,  B22F2998/00 ,  C22C19/07 ,  C22C32/00 ,  C22C2202/02 ,  H01F41/183 ,  C22C32/0026 ,  B22F9/082

摘要： A ferromagnetic sputtering target comprising metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a basis metal (A), and flat phases (B), containing 90 wt % or more of Co, within the basis metal (A), the average grain size of the phases (B) is 10 μm or more and 150 μm or less, and the average aspect ratio of the phases (B) is 1:2 to 1:10. Provided is a ferromagnetic sputtering target capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.

摘要翻译： 一种铁磁溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，在所述基体金属（A）中，所述基体金属（A）和含有90重量％以上的Co的平坦相（B），所述相（B）的平均粒径为10μm， 多于150μm以下，相（B）的平均纵横比为1:2〜1:10。 本发明提供能够抑制溅射时的粒子产生的铁磁性溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

公开(公告)号：US20130292245A1

公开(公告)日：2013-11-07

申请号：US13995890

申请日：2011-12-19

申请人： Yuki Ikeda ,  Hideo Takami

发明人： Yuki Ikeda ,  Hideo Takami

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  B22F3/14 ,  B22F2009/043 ,  C22C5/04 ,  C22C32/0021 ,  C22C33/0278 ,  C22C38/00 ,  C22C38/002 ,  C22C38/008 ,  C22C38/16 ,  C23C14/3407 ,  G11B5/851 ,  H01F10/123 ,  H01F41/183

摘要： A ferromagnetic sputtering target having a composition comprising 5 to 50 mol % of Pt, 5 to 15 mol % of SiO2, 0.05 to 0.60 mol % of Sn, and Fe as the balance, wherein the Sn is contained in SiO2 grains (B) dispersed in a metal base (A). Provided is a nonmagnetic grain-dispersed ferromagnetic sputtering target which can suppress abnormal electric discharge of the oxide that may cause particle generation during sputtering.

摘要翻译： 具有5〜50摩尔％的Pt，5〜15摩尔％的SiO 2，0.05〜0.60摩尔％的Sn和Fe作为余量的组成的铁磁性溅射靶，其中，所述Sn分散在SiO 2粒子（B）中 在金属基体（A）中。 本发明提供一种能够抑制溅射时可能产生粒子的氧化物的异常放电的非磁性粒子分散铁磁性溅射靶。

公开(公告)号：US08568576B2

公开(公告)日：2013-10-29

申请号：US12745278

申请日：2009-03-27

申请人： Atsushi Sato

发明人： Atsushi Sato

IPC分类号： C25B9/00 ,  C25B11/00 ,  C25B13/00 ,  C23C14/00 ,  C04B35/00 ,  C09D5/23 ,  H01L29/12 ,  H01B1/02

CPC分类号： G11B5/851 ,  C22C19/07 ,  C22C49/08 ,  C22C49/14 ,  C22C2202/02 ,  C23C14/3414 ,  H01F41/183

摘要： Provided is a sputtering target of nonmagnetic-particle-dispersed ferromagnetic material comprising a phase (A) such that nonmagnetic particles are dispersed in a ferromagnetic material formed from a Co—Cr alloy containing 5 at % or more and 20 at % or less of Cr and Co as the remainder thereof, and schistose textures (B) with a short side of 30 to 100 μm and a long side of 50 to 300 μm formed from a Co—Cr alloy phase in the phase (A); wherein each of the foregoing nonmagnetic particles has such a shape and size that the particle is smaller than all hypothetical circles with a radius of 1 μm around an arbitrary point within the nonmagnetic particle, or a shape and size with at least two contact points or intersection points between the respective hypothetical circles and the interface of the ferromagnetic material and the nonmagnetic material.

摘要翻译： 提供了一种非磁性粒子分散的铁磁材料的溅射靶，其包括相（A），使得非磁性粒子分散在由含有5原子％以上且20原子％以下的Co-Cr合金形成的铁磁材料中 和Co作为其余部分，以及在相（A）中由Co-Cr合金相形成的短边为30至100μm的长边和50至300μm的短边纹理（B）; 其中每个上述非磁性颗粒具有这样的形状和尺寸，即颗粒小于在非磁性颗粒内的任意点附近具有半径为1μm的所有假想圆，或具有至少两个接触点或交叉点的形状和尺寸 各个假想圆之间的点和铁磁材料和非磁性材料的界面。