公开(公告)号：US20030108660A1

公开(公告)日：2003-06-12

申请号：US10008478

申请日：2001-12-10

Applicant: ALCATEL

Inventor： Michael Z. Yuan

IPC: B05D001/00

CPC classification number: B05C11/02 ,  B05C3/12 ,  C03C25/18

Abstract: A method and apparatus for adjusting the coating diameter and/or thickness during production of an elongated member being coated. In the preferred embodiment, the elongated member is an optical fiber. The apparatus includes a coating unit having a sizing die with an orifice through which the elongated member is conveyed, the diameter the orifice being adjustable. This is achieved by providing a helical spring in the sizing die with the inside of the spring defining the orifice. A tensioning mechanism adjusts the tension of the spring by causing relative rotation between opposite ends of the spring to change the diameter of the orifice. The apparatus further includes a measuring device, disposed downstream of the coating unit, for measuring the diameter of the coating; and a controller for adjusting the diameter of the orifice in response to the measured diameter of the coating.

Abstract translation: 一种用于在制造被涂覆的细长构件时调节涂层直径和/或厚度的方法和装置。 在优选实施例中，细长构件是光纤。 该装置包括具有具有孔口的定径模具的涂覆单元，细长构件通过该孔口被输送，孔口的直径是可调整的。 这是通过在定径模具中设置螺旋弹簧来实现的，弹簧的内部限定孔口。 张紧机构通过使弹簧的相对端之间的相对旋转改变孔的直径来调节弹簧的张力。 所述装置还包括设置在所述涂层单元下游的用于测量所述涂层直径的测量装置; 以及用于响应于测量的涂层直径来调节孔的直径的控制器。

公开(公告)号：US20030024178A1

公开(公告)日：2003-02-06

申请号：US09920750

申请日：2001-08-03

Inventor： Jeffrey H. Diamond

IPC: B05D001/00

CPC classification number: E06B7/28 ,  E06B5/10

Abstract: A stabilized window structure includes a window frame, a shattered window pane disposed in the window frame, and a layer of unifying material bonded to the window pane to form a cohesive mass removable from the frame as one or more integral and unitary pieces. A method of stabilizing and removing a shattered window pane from a window frame includes the steps of applying a layer of unifying material to an exterior surface and/or an interior surface of the shattered window pane, bonding the layer of unifying material to the window pane to form a cohesive mass therewith, and removing the cohesive mass from the window frame as one or more integral and unitary pieces.

Abstract translation: 稳定的窗户结构包括窗框，设置在窗框中的破碎窗玻璃，以及结合到窗玻璃上的一层均匀的材料，以形成可从框架移除的内聚物作为一个或多个整体和整体件。 从窗框稳定和去除破碎的窗玻璃的方法包括以下步骤：将均匀材料层施加到破碎的窗玻璃的外表面和/或内表面，将均匀材料层粘合到窗玻璃 以形成粘合物质，并且将作为一个或多个整体和整体件从窗框的粘合物质去除。

公开(公告)号：US20020132380A1

公开(公告)日：2002-09-19

申请号：US10033343

申请日：2001-11-02

Applicant:

Inventor： Akira Nakano ,  Tadahiro Ohmi

IPC: B05D001/00 ,  C23F001/00 ,  G01L021/30 ,  B05C011/00 ,  H01L021/306 ,  C23C016/00

CPC classification number: H01J37/32082 ,  C23C16/505 ,  C23C16/52 ,  H01J37/32935

Abstract: A plasma processing apparatus includes a plurality of plasma processing units. Each of the plasma processing units has a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit which matches the impedance between the radiofrequency generator and the plasma processing unit. The absolute value nullnullRAnull of the difference nullRA between the AC resistance RA0 at a time t0 and the AC resistance RA1 at a later time t1 and the absolute value nullnullRBnull of the difference nullRB between the AC resistance RB0 at the time t0 and the AC resistance RB1 at the later time t1 are maintained at a value less than an upper limit. Based on these values, whether or not the plasma processing apparatus which is reassembled or used at a user site maintains a required level of performance is evaluated.

Abstract translation: 等离子体处理装置包括多个等离子体处理单元。 每个等离子体处理单元具有等离子体激励电极，连接到等离子体激励电极的射频发生器和与射频发生器和等离子体处理单元之间的阻抗匹配的匹配电路。 绝对值| DELTARA | 时刻t0的交流电阻RA0与后期的交流电阻RA1之间的差值DELTARA与绝对值| DELTARB | 时刻t0的交流电阻RB0与后期时刻t1的交流电阻RB1之间的差值DELTARB保持在小于上限的值。 基于这些值，评价在用户现场重新组装或使用的等离子体处理装置是否保持所需的性能水平。

公开(公告)号：US20020094591A1

公开(公告)日：2002-07-18

申请号：US10093628

申请日：2002-03-08

Applicant: Tokyo Electron Limited of TBS Broadcast Center

Inventor： Edward L. Sill ,  William D. Jones ,  Craig T. Baldwin

IPC: B05D001/00 ,  G01L021/30 ,  H01L021/302

CPC classification number: H01J37/32174 ,  H01J37/321 ,  H01J37/32706

Abstract: A processing system for processing a substrate with a plasma comprises a processing chamber configured for containing a plasma and a substrate support. Electrodes are coupled to the substrate support and an RF power source is coupled to each of the electrodes for biasing the electrodes to create a DC bias on a substrate positioned on the supporting surface. A first comparator having first and second inputs is electrically coupled to one of the electrodes with an isolating device being coupled between the first and second inputs to isolate the first input from the bias on the one electrode. The comparator has an output reflective of a voltage difference between the first and second inputs. A second comparator has a first input coupled to the first electrode and a second input coupled to the second electrode, and has an output reflective of a voltage difference between the first and second inputs resulting from the bias difference between the first and second electrodes.

Abstract translation: 用于用等离子体处理衬底的处理系统包括被配置为容纳等离子体和衬底支撑件的处理室。 电极耦合到衬底支撑件，并且RF电源耦合到每个电极以偏置电极，以在位于支撑表面上的衬底上产生DC偏压。 具有第一和第二输入的第一比较器电耦合到电极中的一个，隔离装置耦合在第一和第二输入之间以将第一输入与一个电极上的偏置隔离。 比较器具有反映第一和第二输入之间的电压差的输出。 第二比较器具有耦合到第一电极的第一输入和耦合到第二电极的第二输入，并且具有反映第一和第二输入之间的电压差的输出，由第一和第二电极之间的偏置差产生。

公开(公告)号：US20020076480A1

公开(公告)日：2002-06-20

申请号：US09912747

申请日：2001-07-23

Inventor： Yung-Chieh Hsieh ,  Alireza Badakhshan

IPC: B05D001/00

CPC classification number: G02B6/4246 ,  G02B6/29361 ,  G02B6/29385 ,  G02B6/4249 ,  H04J14/02

Abstract: The invention is a tunable light source. Techniques for multiplexing various wavelengths into one fiber are provided. A thin film deposition optical monitoring system is provided that utilizes a multiplexer according to the present invention. Light from a multiplexed light source is passed through a fiber optic and emerges from the fiber tip. The light beam is collimated and passes through the substrate where a lens then focuses the transmitted light into a photo-detector. After signal processing, information is sent to the deposition flux source controller to control the deposition rate, coating material and whether deposition should be terminated. An advantage of the present invention over tunable lasers is realized in the low cost of the present invention.

Abstract translation: 本发明是可调光源。 提供了将各种波长复用成一根光纤的技术。 提供了利用根据本发明的多路复用器的薄膜沉积光学监测系统。 来自复用光源的光通过光纤并从光纤尖端出射。 光束被准直并通过衬底，其中透镜然后将透射的光聚焦到光检测器中。 在信号处理之后，将信息发送到沉积磁通源控制器以控制沉积速率，涂层材料以及是否应终止沉积。 本发明优于可调激光器的优点是以本发明的低成本实现。

公开(公告)号：US20020058105A1

公开(公告)日：2002-05-16

申请号：US09544368

申请日：2000-04-06

Inventor： John W Louks ,  Nancy J W Hiebert ,  Luther E Erickson ,  Peter T Benson

IPC: B05D001/00 ,  B05D005/00 ,  B05D003/00 ,  B05D003/12 ,  B05C003/02 ,  B05D001/30 ,  B05D001/04 ,  B05C005/02

CPC classification number: B05C5/008 ,  B05D1/007 ,  B05D1/26 ,  B05D1/305

Abstract: A system for applying a fluid coating onto a substrate includes forming a fluid wetting line by introducing a stream of fluid onto a first side of the substrate along a laterally disposed fluid-substrate contact area. An electrical force is created on the fluid from an electrical field (originating from electrical charges which are on the second side of the substrate) that is substantially at and downstream of the fluid wetting line. The electrical field can be generated by charges that have been transferred to the second side of the substrate from a remote charge generator.

Abstract translation: 用于将流体涂层施加到衬底上的系统包括通过沿着横向设置的流体 - 衬底接触区域将流体流引入到衬底的第一侧上来形成流体润湿管线。 在基本上位于流体润湿线的下游的来自电场（源自基板的第二侧上的电荷）的流体上产生电力。 可以通过从远程电荷发生器转移到衬底的第二侧的电荷来产生电场。

公开(公告)号：US20020043214A1

公开(公告)日：2002-04-18

申请号：US09975182

申请日：2001-10-10

Inventor： Hiroichi Inada ,  Hirofumi Ookuma

IPC: B05D001/00

CPC classification number: H01L21/6715 ,  G03F7/162 ,  G03F7/3021

Abstract: A treatment solution supply apparatus according to the present invention is a treatment solution supply apparatus for supplying a treatment solution onto a substrate which is disposed in a predetermined processing position on a mounting portion, comprising a treatment solution supply nozzle for supplying the treatment solution onto the substrate and a nozzle holder for releasably holding the treatment solution supply nozzle. The treatment solution supply nozzle is disposed in a predetermined stand-by position and the nozzle holder is movable in three dimensions. The movability of the nozzle holder in three dimensions makes it possible to finely adjust the position of the treatment solution supply nozzle and thereby, supply the treatment solution accurately to an appropriate position on the substrate.

Abstract translation: 根据本发明的处理溶液供应装置是一种处理溶液供应装置，用于将处理溶液供给到设置在安装部分上的预定处理位置的基板上，该基板包括处理溶液供应喷嘴，用于将处理溶液供应到 基板和用于可释放地保持处理溶液供应喷嘴的喷嘴保持器。 处理溶液供给喷嘴设置在预定待机位置，喷嘴保持器可三维移动。 喷嘴保持器在三维上的可移动性使得可以精细地调节处理溶液供应喷嘴的位置，从而将处理溶液精确地供应到基板上的适当位置。

公开(公告)号：US20020025371A1

公开(公告)日：2002-02-28

申请号：US09852152

申请日：2001-05-10

Inventor： Henry Lomasney ,  Perry Kilpatrick ,  Shirish Pandit

IPC: B05D001/00

CPC classification number: C09D7/00 ,  B05D5/061 ,  B05D7/53

Abstract: A method for controlling uniformity of applied film thickness of clear protective coatings by means of a color-dissipatable dye additive which dissipates within a reasonable timeframe, generally from hours to a few days, leaving the applied film with no evidence of its use during the application phase. The color additives temporarily impart color to an otherwise clear coating, and subsequently dissipate over a short period of time. An embodiment of this technology includes the addition of a compatibilizer carrier solution to increase the ease of measuring the dye for addition to the clear coating.

公开(公告)号：US20020009536A1

公开(公告)日：2002-01-24

申请号：US09125128

申请日：1998-08-11

Inventor： YUICHIRO IGUCHI ,  MASAHIRO MATSUMOTO ,  YUKO MIKAMI ,  TAKAKI MASAKI ,  TAKAO SANO ,  YOSHIYUKI KITAMURA ,  YOSHINORI TANI ,  HIDEKI IKEUCHI

IPC: B05D001/36 ,  B05D001/00 ,  B05C003/02

CPC classification number: H01J9/227 ,  H01J2211/42

Abstract: Since a widely applicable high quality plasma display equipped with a phosphor layer suitable as a highly precise plasma display can be produced continuously at a high productivity level, an industrially advantageous method and apparatus for producing a plasma display can be provided. The highly precise plasma display obtained in the present invention can be widely used in the display field, for example, for wall mounted television sets, information displays, etc. The method for producing a plasma display of the present invention comprises the step of continuously applying a phosphor paste containing a phosphor powder and an organic compound onto a substrate with a plurality of barrier ribs from a paste applicator with a plurality of outlet holes. Furthermore, the present invention comprises the steps of coating a substrate with a plurality of barrier ribs, with three phosphor pastes respectively containing a phosphor powder emitting light of red, green or blue, as stripes in the spaces between the respectively adjacent barrier ribs on the substrate, from a paste applicator with outlet holes, and heating to form a phosphor layer. Moreover, the apparatus for producing a plasma display of the present invention comprises a table for fixing a substrate with a plurality of barrier ribs, a paste applicator with a plurality of outlet holes to face the barrier ribs of the substrate, a supply means for supplying a phosphor paste to the paste applicator, and a moving means for three-dimensionally moving the table and the paste applicator relatively each other.

Abstract translation: 由于能够以高生产率水平连续地制造适用于高精度等离子显示器的广泛适用的配备有荧光体层的高品质等离子体显示器，所以可以提供用于制造等离子体显示器的工业上有利的方法和装置。 本发明中得到的高精度等离子体显示器可以广泛地用于显示领域，例如用于壁挂式电视机，信息显示器等。本发明的等离子体显示器的制造方法包括以下步骤： 将含有荧光体粉末和有机化合物的荧光体糊料从具有多个出口孔的糊料涂布器的具有多个隔壁的基板上。 此外，本发明包括以下步骤：用多个阻挡肋涂覆基板，三个荧光体浆料分别包含发射红色，绿色或蓝色光的荧光粉，作为条纹，在相邻的隔壁之间的空间中 基板，带有出口孔的糊状涂布器，并加热形成荧光体层。 此外，本发明的等离子体显示器的制造装置具有：用于固定具有多个隔壁的基板的台，具有多个出口孔的涂料器，以与基板的隔壁相对;供给装置， 向糊剂施加剂的荧光体膏，以及相对于彼此相对于三维地移动台和糊剂的移动装置。

公开(公告)号：US20020006877A1

公开(公告)日：2002-01-17

申请号：US09888780

申请日：2001-06-25

Applicant: Epion Corporation

Inventor： Wei-Kan Chu ,  Judy Z. Wu

IPC: B05D001/00 ,  B23K001/00

CPC classification number: B82Y15/00 ,  C30B29/22 ,  C30B29/225 ,  C30B31/22 ,  C30B33/00 ,  H01L39/2464

Abstract: Planarizing High Temperature Superconductor (HTS) surfaces, especially HTS thin film surfaces is crucial for HTS thin film device processing. Disclosed is a method of surface planarization for HTS film. The method includes first smoothing the HTS surface by Gas Cluster Ion Beam bombardment, followed by annealing in partial pressure of oxygen to regrow the damaged surface layer. A rough HTS surface can be planarized down to a smoothness with a standard deviation of one nanometer or better.

Abstract translation: 平面化高温超导体（HTS）表面，特别是HTS薄膜表面对于HTS薄膜器件处理至关重要。 公开了一种用于HTS膜的表面平面化方法。 该方法包括首先通过气体束离子束轰击使HTS表面平滑，然后在分压氧中退火以再生损坏的表面层。 粗糙的HTS表面可以平坦化到平滑度，标准偏差为一纳米或更好。