METHOD FOR MANUFACTURING A SCHOTTKY DIODE AND CORRESPONDING INTEGRATED CIRCUIT

    公开(公告)号:US20240030357A1

    公开(公告)日:2024-01-25

    申请号:US18224293

    申请日:2023-07-20

    CPC classification number: H01L29/8725 H01L29/66143 H01L29/0619

    Abstract: A semiconductor device includes a Schottky diode on a substrate. The Schottky diode includes a layer of polysilicon disposed on a dielectric layer within the substrate that is configured to electrically insulate the layer of polysilicon from the substrate. The layer of polysilicon includes an N-type doped first cathode region adjacent to an undoped second anode region. A first metal contact is disposed on a surface of the N-type doped first cathode region and a second metal contact is disposed on a surface of the undoped second anode region. The first metal contact and second metal contact are electrically insulated from each other by an insulating layer on the layer of polysilicon.

    ELECTRONIC DEVICE POWERING
    334.
    发明公开

    公开(公告)号:US20240006896A1

    公开(公告)日:2024-01-04

    申请号:US18346494

    申请日:2023-07-03

    CPC classification number: H02J7/0031 H02J7/0063

    Abstract: In accordance with an embodiment, a circuit for managing a power supply of an electronic module includes: a first state machine configured to receive a first command for disabling the module, and to verify that the first command remains the same for a first minimum time period; and a second state machine configured to cut off a power supply of a first portion of the module when the second state machine receives a second command from the first state machine indicating that the first command has remained the same for the first minimum time period. The first portion of the module is configured to is configured to be powered from a battery via a first power supply voltage.

    TRANSISTOR STRUCTURE
    336.
    发明公开

    公开(公告)号:US20230387293A1

    公开(公告)日:2023-11-30

    申请号:US18228309

    申请日:2023-07-31

    CPC classification number: H01L29/7813 H01L29/4236 H01L29/66734

    Abstract: A transistor is disclosed. In an embodiment a transistor includes a first semiconductor region of a substrate, a first trench delimiting the first semiconductor region on a first side, a first electrically-conductive element located in the first trench, a channel area in contact with the first semiconductor region and a first area of contact with the first semiconductor region, wherein the channel area and the first area of contact are on the same surface side of the substrate.

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