公开(公告)号：US20080018874A1

公开(公告)日：2008-01-24

申请号：US11488170

申请日：2006-07-18

Applicant: Mircea Dusa ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

Inventor： Mircea Dusa ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

IPC: G03B27/52

CPC classification number: G03F7/70683 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70641

Abstract: In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.

Abstract translation: 在散射方法中，将具有不同感光度的感光度的差分目标印刷在校准矩阵中并获得差分光谱。 将主成分分析应用于差分光谱，以获得对从单个目标获得的光谱获得的校准函数对底层结构的变化较不敏感的校准函数。

公开(公告)号：US09081303B2

公开(公告)日：2015-07-14

申请号：US12846652

申请日：2010-07-29

Applicant: Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Adrianus Johannes Hendrikus Schellekens ,  Michael Kubis

Inventor： Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Adrianus Johannes Hendrikus Schellekens ,  Michael Kubis

IPC: G03F7/20 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01B11/02 ,  G01B11/22 ,  G01N21/88

CPC classification number: G03F7/70641 ,  G01B11/02 ,  G01B11/22 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01N21/88 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065

Abstract: In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is formed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.

Abstract translation: 在确定在基板上的光刻工艺中使用的光刻设备的焦点的方法中，使用光刻工艺在基板上形成结构，该结构具有至少一个特征，该特征在印刷图案中具有不对称性 作为光刻设备在基板上的焦点的函数。 在用第一辐射束照射结构的同时形成和检测周期性结构的第一图像。 第一图像使用非零阶衍射辐射的第一部分形成。 在用第二辐射束照射结构的同时形成和检测周期性结构的第二图像。 使用在衍射光谱中与第一部分对称相对的非零级衍射辐射的第二部分形成第二图像。 确定测量的第一和第二部分光谱的强度的比率并用于确定周期性结构的轮廓的不对称性和/或提供焦点在基底上的指示。 在相同的仪器中，被检测部分的强度变化被确定为整个结构的过程引起的变化的量度。 可以从结构的测量中识别并排除具有不期望的工艺变化的结构区域。

公开(公告)号：US08868387B2

公开(公告)日：2014-10-21

申请号：US12247371

申请日：2008-10-08

Applicant: Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

Inventor： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

IPC: G06F7/50 ,  G06F17/10 ,  G06G7/48 ,  G01J3/00 ,  G06F17/50 ,  G01B11/24 ,  G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G01N21/25

CPC classification number: G03F7/70625 ,  G01B11/24 ,  G01N21/255 ,  G01N21/47 ,  G01N21/95607 ,  G06F17/10 ,  G06F17/5009

Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.

Abstract translation: 在光谱仪模型中使用的一组参数包括自由参数和固定参数。 设置参数的第一组值，并使用该模型生成第一个频谱。 固定参数中的一个的值被改变并产生第二个频谱。 然后将光谱仪的模型的反相应用于第二光谱以生成参数的一组值，该值与除了一个或多个空闲参数之外的第一组值相同。 如果自由参数明显改变，则固定参数被指定为空闲参数。

公开(公告)号：US20110292365A1

公开(公告)日：2011-12-01

申请号：US13132011

申请日：2009-12-01

Applicant: Hugo Augustinus Joseph Cramer ,  Maurits Van Der Schaar

Inventor： Hugo Augustinus Joseph Cramer ,  Maurits Van Der Schaar

IPC: G03B27/54 ,  G01N21/00

CPC classification number: G03F7/70633 ,  G01N21/4785 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70625

Abstract: Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of different measurements, a residual error indicative of the error in a scatterometer may be calculated. This error is an error in measurements of substrate parameters caused by irregularities of the scatterometer. The residual error may manifest itself as an asymmetry in the diffraction spectra.

Abstract translation: 公开了用于校准检查装置的方法，装置和光刻系统。 辐射被投影到基板的目标位置的图案上。 通过对图案进行多次测量并比较从不同测量图案反射的辐射的测量的第一或更高的衍射级数，可以计算指示散射仪中的误差的残差。 该误差是由散射仪的不规则引起的衬底参数的测量误差。 残余误差可能表现为衍射光谱中的不对称性。

公开(公告)号：US20110231167A1

公开(公告)日：2011-09-22

申请号：US13047185

申请日：2011-03-14

Applicant: Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

Inventor： Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

IPC: G06F17/10 ,  G03B27/54

CPC classification number: G03B27/52 ,  G03F7/70625 ,  G03F7/70641

Abstract: A method, a lithographic apparatus, and a computer-readable medium provide a model of a metrology tool to determine a measurement error and/or covariance of particular parameters, such as the critical dimension and the sidewall angle, of a number of targets, such as gratings. The model can include at least one measurement error source. The method can include using a metrology tool to measure each target and using the model to determine the measurement error of the measured parameters of the particular target when measured by said metrology tool. The value of the measured parameter along with the corresponding measurement error is then determined in the metrology tool output for each particular target, and can be used in exposure focus and dose control in a lithographic process.

Abstract translation: 方法，光刻设备和计算机可读介质提供计量工具的模型，以确定多个目标的特定参数（例如临界尺寸和侧壁角）的测量误差和/或协方差，例如 作为光栅。 该模型可以包含至少一个测量误差源。 该方法可以包括使用计量工具来测量每个目标并且使用该模型来确定由所述计量工具测量时特定目标的测量参数的测量误差。 然后在每个特定目标的计量工具输出中确定测量参数的值以及相应的测量误差，并可用于光刻过程中的曝光聚焦和剂量控制。

公开(公告)号：US20060120480A1

公开(公告)日：2006-06-08

申请号：US11003247

申请日：2004-12-03

Applicant: Armin Klomsdorf ,  Michael Carney ,  Joseph Cramer ,  Christopher LaRosa ,  Dale Schwent ,  Robert Trocke

Inventor： Armin Klomsdorf ,  Michael Carney ,  Joseph Cramer ,  Christopher LaRosa ,  Dale Schwent ,  Robert Trocke

IPC: H04L27/36 ,  H04L27/20

CPC classification number: H04L25/03834 ,  H04W52/16

Abstract: A communication unit is provided having a transmitter and a processor (103). The processor (103) receives information (105) representative of a configuration of physical channels (107). The processor (103) determines a scaling factor responsive to the information (105) and facilitates scaling a signal (109, 111) provided by a combination of the channels utilizing the scaling factor. The scaled signal (109, 111) is provided to the transmitter.

Abstract translation: 提供具有发射机和处理器（103）的通信单元。 处理器（103）接收表示物理信道（107）的配置的信息（105）。 处理器（103）响应于信息（105）确定缩放因子，并且便于利用缩放因子缩放由信道的组合提供的信号（109,111）。 缩放信号（109,111）被提供给发射机。

公开(公告)号：US4120650A

公开(公告)日：1978-10-17

申请号：US857675

申请日：1977-12-05

Applicant: Frank Robert Kappler ,  Roma Jean Killian ,  John Joseph Cramer

Inventor： Frank Robert Kappler ,  Roma Jean Killian ,  John Joseph Cramer

IPC: C11D3/39 ,  C11D3/395 ,  D06L3/02 ,  D06L3/06

CPC classification number: C11D3/395 ,  C11D3/39 ,  D06L3/02 ,  D06L3/06

Abstract: Stained textile fabrics, especially cotton-polyester, rayon-polyester blends stained in use with blood stains, can be reclaimed and returned to use by the process of washing and bleaching said fabrics in the presence of a non-ionic or anionic surface-active agent, together with an oxygen-releasing bleaching agent and a chlorine-releasing bleaching agent, said bleaching agents used either successively or simultaneously. The laundering process involves the use of aqueous solutions of bleaching agents at elevated temperatures and at high pH. The process of the invention provides a synergistic improvement in the removal of stains as compared with the use of either an oxygen-releasing bleaching agent or a chlorine-releasing bleaching agent. The process can include a hot aqueous acid sour treatment to remove rust stains and an aqueous sour to neutralize alkalies in the bleached fabric. The treatment can be completed in a period of time of about 30 to about 90 minutes.

Abstract translation: {PG，1染色纺织品，特别是棉花 - 聚酯，人造丝 - 聚酯混合物使用染色染色，可以回收利用，在非离子或阴离子存在下洗涤和漂白所述织物的过程 表面活性剂与释氧漂白剂和释氯漂白剂一起，所述漂白剂连续或同时使用。 洗涤方法涉及在高温和高pH下使用漂白剂的水溶液。 与使用释氧漂白剂或释氯漂白剂相比，本发明的方法提供了除去污渍的协同改进。 该方法可以包括热酸水处理以除去锈迹和含水酸以中和漂白织物中的碱。 治疗可以在约30至约90分钟的时间段内完成。

公开(公告)号：US09182682B2

公开(公告)日：2015-11-10

申请号：US13140292

申请日：2009-12-17

Applicant: Hugo Augustinus Joseph Cramer ,  Paul Christiaan Hinnen

Inventor： Hugo Augustinus Joseph Cramer ,  Paul Christiaan Hinnen

IPC: G03B27/68 ,  G03F7/20 ,  G03F1/00 ,  G03F1/44

CPC classification number: G03F7/70683 ,  G03F1/14 ,  G03F1/44 ,  G03F7/70625 ,  G03F7/70641 ,  Y10T428/24802

Abstract: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and a projection system of the exposure apparatus is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker may be measured by an inspection apparatus, such as, for example, a scatterometer to determine whether errors in focus, dose, and other related properties are present. The test pattern is arranged such that changes in focus and dose may be easily determined by measuring properties of a pattern that is exposed using the mask. The test pattern of the mask is arranged so that it gives rise to a marker pattern on the substrate surface. The marker pattern contains structures that have at least two measurable side wall angles. Asymmetry between side wall angles of a structure is related to focus (or defocus) of the exposure radiation from the exposure apparatus. The extent of defocus may thereby be determined by measuring an asymmetry in side wall angle of the printed marker pattern structures.

Abstract translation: 为了确定曝光装置是否输出正确的辐射剂量，并且曝光装置的投影系统正确地对准辐射，在掩模上使用测试图案将特定的标记印刷到基板上。 该标记可以通过诸如散射仪的检查装置来测量，以确定是否存在焦点，剂量和其它相关属性的误差。 测试图案被布置成使得可以通过测量使用掩模曝光的图案的性质容易地确定焦点和剂量的变化。 掩模的测试图案被布置成使得其在基板表面上产生标记图案。 标记图案包含具有至少两个可测量的侧壁角度的结构。 结构的侧壁角度之间的不对称性与来自曝光设备的曝光辐射的焦点（或散焦）有关。 由此可以通过测量印刷的标记图案结构的侧壁角度的不对称来确定散焦的程度。

公开(公告)号：US08773657B2

公开(公告)日：2014-07-08

申请号：US10590352

申请日：2005-02-22

Applicant: Hans Van Der Laan ,  Rene Hubert Jacobus Carpaij ,  Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers

Inventor： Hans Van Der Laan ,  Rene Hubert Jacobus Carpaij ,  Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers

IPC: G01J1/10

CPC classification number: G01N21/278 ,  G01N21/274 ,  G01N21/4785 ,  G01N21/4788 ,  G01N2021/95615 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70516 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70683

Abstract: A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.

Abstract translation: 根据实施例的方法包括从设置在校准基板上的多个标记结构集合，利用光学检测装置获得校准测量数据。 每个标记结构集包括使用过程参数的不同已知值创建的至少一个校准标记结构。 该方法包括使用光学检测装置从设置在基板上的至少一个标记结构获得测量数据，并使用未知的工艺参数值进行曝光; 以及基于所述过程参数和所述校准测量数据的已知值，通过使用模型中的回归系数，从所获得的测量数据中确定所述过程参数的未知值。

公开(公告)号：US08390823B2

公开(公告)日：2013-03-05

申请号：US12884107

申请日：2010-09-16

Applicant: Hugo Augustinus Joseph Cramer ,  Henricus Johannes Lambertus Megens

Inventor： Hugo Augustinus Joseph Cramer ,  Henricus Johannes Lambertus Megens

IPC: G01B11/24

CPC classification number: G03F1/84 ,  G03F7/70625

Abstract: A system and method determine an approximate structure of an object on a substrate. This may be applied in model based metrology of microscopic structures to assess critical dimension or overlay performance of a lithographic apparatus. A scatterometer is used to determine approximate structure of an object, such as a grating on a stack, on a substrate. The wafer substrate has an upper layer and an underlying layer. The substrate has a first scatterometry target region, including the grating on a stack object. The grating on a stack is made up of the upper and underlying layers. The upper layer is patterned with a periodic grating. The substrate further has a neighboring second scatterometry target region, where the upper layer is absent. The second region has just the unpatterned underlying layers.

Abstract translation: 系统和方法确定基板上的物体的近似结构。 这可以应用于基于模型的微观结构计量学以评估光刻设备的临界尺寸或覆盖性能。 散射仪用于确定物体的近似结构，例如堆叠上的光栅，在衬底上。 晶片衬底具有上层和下层。 衬底具有包括堆叠物体上的光栅的第一散射测量目标区域。 堆叠上的光栅由上层和下层组成。 上层用周期性光栅图案化。 衬底还具有相邻的第二散射测量目标区域，其中上层不存在。 第二个地区只是没有图案的下层。