公开(公告)号：US20090228408A1

公开(公告)日：2009-09-10

申请号：US12044959

申请日：2008-03-08

申请人： Sanjeev Kaushal ,  Sukesh Janubhai Patel ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Sukesh Janubhai Patel ,  Kenji Sugishima

IPC分类号： G06F15/18 ,  G06F11/07

CPC分类号： G05B13/0265 ,  G06N5/04 ,  G06N99/005

摘要： An autonomous biologically based learning tool system and a method that the tool system employs for learning and analysis are provided. The autonomous biologically based learning tool system includes (a) one or more tool systems that perform a set of specific tasks or processes and generate assets and data related to the assets that characterize the various processes and associated tool performance; (b) an interaction manager that receives and formats the data, and (c) an autonomous learning system based on biological principles of learning. The autonomous learning system comprises a memory platform and a processing platform that communicate through a network. The network receives data from the tool system and from an external actor through the interaction manager. Both the memory platform and the processing platform include functional components and memories that can be defined recursively. Similarly, the one or more tools can be deployed recursively, in a bottom-up manner in which an individual autonomous tools is assembled in conjunction with other (disparate or alike) autonomous tools to form an autonomous group tool, which in turn can be assembled with other group tools to form a conglomerated autonomous tool system. Knowledge generated and accumulated in the autonomous learning system(s) associated with individual, group and conglomerated tools can be cast into semantic networks that can be employed for learning and driving tool goals based on context.

摘要翻译： 提供了一种自主的基于生物学的学习工具系统和工具系统用于学习和分析的方法。 自主的基于生物学的学习工具系统包括（a）执行一组特定任务或过程的一个或多个工具系统，并生成与表征各种过程和相关工具性能的资产相关的资产和数据; （b）接收和格式化数据的交互管理器，（c）基于生物学习原理的自主学习系统。 自主学习系统包括通过网络进行通信的存储器平台和处理平台。 该网络通过交互管理器从工具系统和外部演员接收数据。 存储器平台和处理平台都包括可以递归定义的功能组件和存储器。 类似地，可以以自下而上的方式递归地部署一个或多个工具，其中单独的自主工具与其他（不同或相似）的自主工具结合组合以形成自主的组工具，其又可以被组装 与其他团体工具组成一个集团自主的工具系统。 在与个人，团体和集体工具相关的自主学习系统中生成和积累的知识可以被投入到可以用于基于上下文学习和驱动工具目标的语义网络中。

公开(公告)号：US07519885B2

公开(公告)日：2009-04-14

申请号：US11278382

申请日：2006-03-31

申请人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

IPC分类号： G06F11/00 ,  G11C29/00 ,  G06F11/30 ,  G06F19/00 ,  G01R31/26

CPC分类号： G05B19/41875 ,  C23C16/45546 ,  C23C16/52 ,  G05B23/0254 ,  G05B2219/1112 ,  G05B2219/37514 ,  G05B2219/37533 ,  G05B2219/45031 ,  G05B2223/02 ,  Y02P90/14 ,  Y02P90/22 ,  Y02P90/26

摘要： A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.

摘要翻译： 一种使用基于低压的建模技术实时监控处理系统的方法，所述技术包括处理处理室中的一个或多个晶片; 确定针对过程参数的变化率的测量的动态过程响应; 执行实时动态模型以产生预测的动态过程响应; 使用预测的动态过程响应和预期过程响应之间的差来确定动态估计误差; 并将动态估计误差与运算极限进行比较。

公开(公告)号：US07459175B2

公开(公告)日：2008-12-02

申请号：US11043459

申请日：2005-01-26

申请人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

IPC分类号： C23C16/52 ,  C23C14/22 ,  C23C16/44 ,  H01L21/66

CPC分类号： C23C16/45527 ,  C23C16/45546 ,  C23C16/45557 ,  C23C16/46 ,  C23C16/52

摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.

摘要翻译： 提出了一种包括多变量控制器的自适应实时热处理系统。 该方法包括创建MLD处理系统的动态模型，并将虚拟传感器并入动态模型中。 该方法包括使用包括智能设定点，动态模型和/或虚拟传感器的过程配方。

公开(公告)号：US07406644B2

公开(公告)日：2008-07-29

申请号：US11278012

申请日：2006-03-30

申请人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Pradeep Pandey ,  Kenji Sugishima

IPC分类号： G01R31/28

CPC分类号： H01L22/20

摘要： A method of monitoring a thermal processing system in real-time using a built-in self test (BIST) table to detect, diagnose and/or predict fault conditions and/or degraded performance. The method includes positioning a plurality of wafers in a processing chamber in the thermal processing system, performing a self test process, determining a real-time transient error from a measured transient response and a baseline transient response determined by a BIST rule stored in the BIST table, and comparing the transient error to operational limits and warning limits established by the BIST rule for the self test process.

摘要翻译： 使用内置自检（BIST）表来实时监测热处理系统的方法来检测，诊断和/或预测故障状况和/或降级的性能。 该方法包括将多个晶片定位在热处理系统中的处理室中，执行自测试过程，从测量的瞬态响应确定实时瞬态误差，以及由存储在BIST中的BIST规则确定的基线瞬态响应 表，并将瞬态误差与BIST规则为自检过程建立的运行极限和警告限制进行比较。

公开(公告)号：US5384463A

公开(公告)日：1995-01-24

申请号：US238349

申请日：1994-05-05

申请人： Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

发明人： Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

IPC分类号： G03F1/86 ,  H01J37/244 ,  H01J37/30 ,  H01J37/06

CPC分类号： G03F1/86 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/221 ,  H01J2237/2441 ,  H01J2237/24435 ,  H01J2237/2447 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2817

摘要： A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating electron beams onto the inspection sample and detecting secondary or backscattered electrons reflected from the surface of the inspection sample and/or transmitted electrons passing through the inspection sample. The pattern inspection apparatus includes an electron beam generator including at least one electron gun for generating at least one electron beam irradiating onto the surface of the inspection sample. A movable support is provided for supporting the inspection sample. The apparatus also includes a detector unit having a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processor for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detector. Also, when a plurality of electron beams are used for simultaneous irradiation of the inspection sample, the pattern inspection apparatus is provided with a mechanism for avoiding interference between the reflected electrons of the adjacent electron beams.

摘要翻译： 图案检查装置被设计为通过将电子束照射到检查样品上并检测从检查样品的表面反射的次级或反向散射电子来快速且准确地执行诸如掩模或晶片等的检查样本的检查 和/或穿过检查样品的透射电子。 图案检查装置包括电子束发生器，其包括至少一个电子枪，用于产生照射到检查样品表面上的至少一个电子束。 提供用于支撑检查样品的可移动支撑件。 该装置还包括具有多个电子检测元件的检测器单元，用于检测包含与检查样本的结构有关的信息的电子;以及检测信号处理器，用于同时或并行地形成检测器的电子检测元件的输出。 此外，当使用多个电子束同时照射检查样本时，图案检查装置设置有用于避免相邻电子束的反射电子之间的干涉的机构。

公开(公告)号：US5126220A

公开(公告)日：1992-06-30

申请号：US648697

申请日：1991-01-31

申请人： Kazuo Tokitomo ,  Yasutaka Ban ,  Kenji Sugishima

发明人： Kazuo Tokitomo ,  Yasutaka Ban ,  Kenji Sugishima

IPC分类号： G03F1/30 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027

CPC分类号： G03F1/30

摘要： A reticle comprises a substrate transparent to an optical beam, an opaque layer provided on the substrate for interrupting the optical beam according to the desired pattern, the opaque layer being patterned to form an opaque pattern that interrupts the optical beam and a transparent pattern that transmits the optical beam selectively according to the desired pattern; and a phase shift pattern transparent to the optical beam for transmitting the optical beam therethrough, wherein the phase shift pattern comprises an electrically conductive material and provided on the substrate in correspondence to the transparent pattern in the opaque layer, for canceling the diffraction of the optical beam passed through the transparent pattern.

公开(公告)号：US4748646A

公开(公告)日：1988-05-31

申请号：US27553

申请日：1987-03-18

申请人： Toshihiko Osada ,  Ichiro Honjo ,  Kenji Sugishima

发明人： Toshihiko Osada ,  Ichiro Honjo ,  Kenji Sugishima

IPC分类号： G01N23/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01J35/00 ,  H01L21/027 ,  H05G1/00 ,  G21K5/10

CPC分类号： G03F7/70075 ,  G03F7/70808

摘要： An X-ray lithography system, in which an X-ray beam is separated from synchrotron radiation beams and reflected by a scanning mirror which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber via a beryllium window, which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.

摘要翻译： 一种X射线光刻系统，其中X射线束与同步加速器辐射束分离并由扫描反射镜反射，该扫描镜垂直扫描反射的X射线束。 X射线通过铍窗被照射到曝光室中，铍窗垂直振荡，使得铍窗与X射线束的扫描操作同步地上下移动。

公开(公告)号：US4678919A

公开(公告)日：1987-07-07

申请号：US883425

申请日：1986-07-14

申请人： Kenji Sugishima ,  Kenji Nakagawa

发明人： Kenji Sugishima ,  Kenji Nakagawa

IPC分类号： G03F7/20 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H01J37/24

CPC分类号： H01L21/30 ,  H01J37/304

摘要： An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variations on the level of the surface of the workpiece due to an elastic deformation thereof during the exposure process. With the use of the correction data, the desired pattern is correctly reproduced as intended when the workpiece is fully supported and the surface thereof recovers its flatness.

摘要翻译： 一种用于在工件上产生所需图案的电子束曝光系统。 该图案由预定图案数据指定。 模式数据用修正数据修改。 从曝光过程中由于其弹性变形引起的工件表面的水平变化的信息获得校正数据。 通过使用校正数据，当工件被完全支撑并且其表面恢复其平坦度时，期望的图案被正确地再现。

公开(公告)号：US08725667B2

公开(公告)日：2014-05-13

申请号：US12416018

申请日：2009-03-31

申请人： Sanjeev Kaushal ,  Sukesh Janubhai Patel ,  Kenji Sugishima

发明人： Sanjeev Kaushal ,  Sukesh Janubhai Patel ,  Kenji Sugishima

IPC分类号： G06F15/18 ,  G06N3/00 ,  G06F17/00 ,  G06N5/02 ,  G06N7/00 ,  G06N7/08 ,  G06F19/00

CPC分类号： G05B13/0265 ,  G05B19/4065 ,  G05B2219/33041 ,  G05B2219/37252 ,  G06N5/04 ,  G06N99/005 ,  Y02P90/86

摘要： Autonomous biologically based learning tool system(s) and method(s) that the tool system(s) employs for learning and analysis of performance degradation and mismatch are provided. The autonomous biologically based learning tool system includes (a) one or more tool systems that perform a set of specific tasks or processes and generate assets and data related to the assets that characterize the various processes and associated tool performance; (b) an interaction manager that receives and formats the data, and (c) an autonomous learning system based on biological principles of learning. Objectively generated knowledge gleaned from synthetic or production data can be utilized to determine a mathematical relationship among a specific output variable and a set of associated influencing variables. The generated relationship facilitates assessment of performance degradation of a set of tools, and performance mismatch among tools therein.

摘要翻译： 提供了自动生物学的学习工具系统和工具系统用于学习和分析性能下降和失配的方法。 自主的基于生物学的学习工具系统包括（a）执行一组特定任务或过程的一个或多个工具系统，并生成与表征各种过程和相关工具性能的资产相关的资产和数据; （b）接收和格式化数据的交互管理器，（c）基于生物学习原理的自主学习系统。 可以利用从合成或生产数据中获取的客观生成的知识来确定特定输出变量与一组相关影响变量之间的数学关系。 生成的关系有助于评估一组工具的性能下降，以及其中的工具之间的性能不匹配。

公开(公告)号：US20120242667A1

公开(公告)日：2012-09-27

申请号：US13052943

申请日：2011-03-21

申请人： Sanjeev Kaushal ,  Kenji Sugishima ,  Sukesh Janubhai Patel ,  Robert Filman ,  Wolfgang Polak ,  Orion Wolfe ,  Jessie Burger

发明人： Sanjeev Kaushal ,  Kenji Sugishima ,  Sukesh Janubhai Patel ,  Robert Filman ,  Wolfgang Polak ,  Orion Wolfe ,  Jessie Burger

IPC分类号： G06T11/20

CPC分类号： G06N99/005 ,  G05B23/0237 ,  G06F3/04842

摘要： The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.

摘要翻译： 本公开涉及自动学习应用于任意半导体制造工具的多个制造工具参数之间的关系以及至少部分由自主学习系统支持的图形用户界面。 图形用户界面可以基于接收到的数据创建一个或多个矩阵，并且可以通过转换一个或多个矩阵来进一步生成附加矩阵。 可以输出一系列窗口，其中该系列窗口提供包括聚焦室和参考室之间的匹配的性能分析。 在一个方面，聚焦室和参考室可以是不同的室。 在另一方面，聚焦室和参考室可以是相同的室，其提供了相同室随时间的性能劣化的分析。