公开(公告)号：US20010040905A1

公开(公告)日：2001-11-15

申请号：US09891928

申请日：2001-06-25

Applicant: Lambda Physik AG

Inventor： Uwe Stamm ,  Hans-Stephan Albrecht ,  Uwe Leinhos ,  Wolfgang Zschocke

IPC: H01S003/13

CPC classification number: G01J1/58

Abstract: An ultraviolet light detection system is provided wherein a dark current background growth rate with total accumulated exposure dose is avoided, and parameters of an ultraviolet radiation source such as an ArF-excimer laser may be monitored without rapid degradation of the signal by the superposition of the dark current background over a desired signal. The invention provides a detector including a light sensitive element having a frequency conversion coating on its surface. The coating is preferably directly on the light sensitive element, absorbing incident ultraviolet light and re-emitting visible light in a direction toward the light sensitive element. The coating minimizes a dark current background that would otherwise appear when incident ultraviolet light impinges directly upon the light sensitive element, and thereby extends a lifetime of the light sensitive element. The detector is useful for detecting a wide range of ultraviolet wavelengths, and is particularly useful in solving the dark current growth rate with total accumulated exposure dose problem associated with detecting incident radiation under 240 nm.

公开(公告)号：US20030227956A1

公开(公告)日：2003-12-11

申请号：US10035919

申请日：2001-10-18

Applicant: Lambda Physik AG

Inventor： Michael J. Scaggs

IPC: H01S003/22 ,  H01S003/223 ,  H01S003/08

CPC classification number: H01S3/225 ,  H01S3/005 ,  H01S3/08004 ,  H01S3/2258

Abstract: An excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber and connected to the discharge circuit for energizing the gas mixture, a resonant cavity including the discharge chamber for generating a laser beam, and an intracavity homogenizer for homogenizing an intensity profile of the laser beam generated in the resonator. The intracavity homogenizer may include each of a first bi-prism and a second bi-prism disposed at opposite ends of the resonant cavity and having the discharge chamber disposed therebetween. In this case, optical axes of the first bi-prism and the second bi-prism are each at least substantially parallel to the optical axis of the laser beam.

Abstract translation: 准分子或分子氟激光系统包括填充有气体混合物的放电室，放电室内的多个电极，并连接到用于激励气体混合物的放电电路，包括用于产生激光束的放电室的谐振腔，以及 腔内均匀器，用于均化在谐振器中产生的激光束的强度分布。 腔内均质器可以包括设置在谐振腔的相对端处并且其间布置有放电室的第一双棱镜和第二双棱镜中的每一个。 在这种情况下，第一双棱镜和第二双棱镜的光轴至少基本上平行于激光束的光轴。

公开(公告)号：US20020186741A1

公开(公告)日：2002-12-12

申请号：US10114671

申请日：2002-04-01

Applicant: Lambda Physik AG

Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei V. Govorkov

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/106 ,  B23K26/12 ,  B23K26/128 ,  B23K26/705 ,  G01J1/4257 ,  G01J1/58 ,  G02B5/04 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  G03F7/70808 ,  H01S3/0014 ,  H01S3/0315 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08018 ,  H01S3/08036 ,  H01S3/08081 ,  H01S3/081 ,  H01S3/0811 ,  H01S3/0812 ,  H01S3/0971 ,  H01S3/09716 ,  H01S3/104 ,  H01S3/1055 ,  H01S3/1062 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/1392 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2258

Abstract: An excimer or molecular fluorine laser system generates a laser output bandwidth of less than 0.6 pm, and preferably 0.5-0.4 pm or less. The laser resonator has a line-narrowing unit preferably including a grating, and preferably also a beam expander, and may include one or more etalons or other interferometric devices. The grating may be preferably a blazed grating having a blaze angle greater than 76null, and is preferably around 80null. The grating structure is preferably defined by the surface of the grating substrate. The substrate is preferably aluminum. The system may further include an amplifier for increasing the energy of the sub-0.6 nm output beam.

Abstract translation: 准分子或分子氟激光系统产生小于0.6μm，优选0.5-0.4μm或更小的激光输出带宽。 激光谐振器具有优选地包括光栅的线窄变换单元，并且优选地还包括光束扩展器，并且可以包括一个或多个标准具或其它干涉测量装置。 光栅可以优选为具有大于76°的闪耀角度的闪耀光栅，并且优选地为大约80°。 光栅结构优选由光栅基板的表面限定。 基材优选为铝。 该系统还可以包括用于增加次0.6nm输出光束的能量的放大器。

公开(公告)号：US20020168049A1

公开(公告)日：2002-11-14

申请号：US10109581

申请日：2002-03-27

Applicant: Lambda Physik AG

Inventor： Guido Schriever ,  Ulrich Rebhan

IPC: G21G004/00

CPC classification number: H05G2/003 ,  B03C3/383 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916

Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.

Abstract translation: EUV光子源包括填充有气体混合物的等离子体室，等离子体室内限定等离子体区域和中心轴线的多个电极，连接到电极的电源电路，用于将主脉冲传送到电极以激励等离子体周围 沿着中心轴产生EUV射束的中心轴线，以及用于使气体混合物离子化的准分子离子化器，用于在将电脉冲从电源电路施加到电极上时在中心轴周围形成致密等离子体。 EUV源优选地包括用于从输出光束路径收集污染物微粒的电离单元和沉淀器。 可以沿着夹紧区域外的光束路径布置一组挡板以扩散从夹持区域发出的气体和污染物颗粒流，并吸收或反射从夹紧区域远离夹点区域发出的声波。 剪切孔，优选地由陶瓷和/或Al 2 O 3形成，用于至少部分地限定EUV束的接受角。 电源电路可以产生主脉冲和相对较低能量的前脉冲，用于在主脉冲之前均化预电离的等离子体。 多层EUV反射镜优选地设置成与夹持区域的光束输出侧相对，用于沿着中心轴反射辐射，以沿着EUV光束的光束路径输出。 EUV镜子优选地具有弯曲轮廓，用于基本上准直或聚焦反射的辐射。 特别地，EUV镜可以优选地具有双曲线轮廓。

公开(公告)号：US20020141471A1

公开(公告)日：2002-10-03

申请号：US10035351

申请日：2001-10-19

Applicant: Lambda Physik AG

Inventor： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/0811 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

Abstract translation: 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的放电电路，包括 一对谐振器反射表面，设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元，用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件，其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

公开(公告)号：US20020114362A1

公开(公告)日：2002-08-22

申请号：US10116903

申请日：2002-04-05

Applicant: Lambda Physik AG

Inventor： Klaus Wolfgang Vogler ,  Juergen Kleinschmidt

IPC: H01S003/13

CPC classification number: H01S3/036 ,  G02B5/1814 ,  G02B5/1838 ,  H01S3/0315 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08059 ,  H01S3/0809 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2258

Abstract: An efficient F2 laser is provided with improvements in line selection, monitoring capabilities, alignment stabilization, performance at high repetition rates and polarization characteristics. Line selection is preferably provided by a transmission grating or a grism. The grating or grism preferably outcouples the laser beam. The line selection may be fully provided at the front optics module. A monitor grating and an array detector monitor the intensity of the selected (and unselected) lines for line selection control. An energy detector is enclosed in an inert gas purged environment at slight overpressure. A blue or green reference beam is used for F2 laser beam alignment stabilization and/or spectral monitoring of the output laser beam. The blue or green reference beam advantageously is not reflected out with a atomic fluorine red emission of the laser and is easily resolved from the red emission. The clearing ratio of the laser gas flow through the discharge area is reduced by narrowing the discharge width using improved laser electrodes and/or by increasing the gas flow rate through the discharge while maintaining uniformity by using a more aerodynamic discharge chamber. The F2 laser beam is substantially polarized, e.g., 98% or better, using at least one intracavity polarization element preferably in combination with Brewster discharge chamber windows.

Abstract translation: 提供高效的F2激光器，具有线路选择，监视功能，对准稳定性，高重复率性能和极化特性的改进。 线选择优选地由透射光栅或棱镜提供。 光栅或棱镜优选地将激光束输出耦合。 线路选择可以完全提供在前光学模块。 监视器光栅和阵列检测器监视所选（和未选择）线的强度用于线选择控制。 一个能量检测器被封闭在惰性气体吹扫的环境中，轻微的超压。 使用蓝色或绿色参考光束进行F2激光束对准稳定和/或输出激光束的光谱监测。 蓝色或绿色参考光束有利地不被激光的原子氟红色发射反射，并且容易地从红色发射中消除。 通过使用改进的激光电极使放电宽度变窄并且/或通过增加通过放电的气体流量而减小激光气体流过放电区域的清除率，同时通过使用更多的空气动力学放电室来保持均匀性。 使用至少一个腔内偏振元件，优选与布鲁斯特放电室窗口组合，F2激光束基本上被极化，例如98％或更好。

公开(公告)号：US6414978B2

公开(公告)日：2002-07-02

申请号：US82629601

申请日：2001-04-03

Applicant: LAMBDA PHYSIK AG

Inventor： BRAGIN IGOR ,  BERGER VADIM ,  STAMM UWE ,  REBHAN ULRICH

IPC: H01S3/032 ,  H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

Abstract translation: 用于准分子或分子氟激光的激光器包括与气体流动容器连接并具有一对主电极和预电离单元的电极室，每个主电极连接到放电电路。 扰流器设置在电极室内，并且被成形为提供通过主电极之间的放电区域的更均匀的气流，以便将一个预电离单元与其中一个主电极隔离，并且反射在放电中产生的声波 区域进入气流容器，用于吸收。 扰流器单元可以在放电区域的任一侧上包括一对相对的扰流器元件。 一个或两个主电极包括基部和可以是从基部突出的接头的中心部分。 中心部分基本上承载周期性放电电流，使得放电宽度可以明显小于基部的宽度。 两个主电极的曲率可以符合通过放电室的气流的曲率，以进一步提高空气动力性能。 多个低电感性导电肋连接到接地的主电极并成形为提供更均匀的气体流通过限定在相邻肋之间的开口。

公开(公告)号：US20020034206A1

公开(公告)日：2002-03-21

申请号：US09925040

申请日：2001-08-07

Applicant: Lambda Physik AG.

Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

IPC: H01S003/10 ,  H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

公开(公告)号：US20020015432A1

公开(公告)日：2002-02-07

申请号：US09924817

申请日：2001-08-07

Applicant: Lambda Physik AG

Inventor： Jurgen Kleinschmidt ,  Peter Heist ,  Frank Voss ,  Andreas Gortler

IPC: H01S003/223 ,  H01S003/22

CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1062

Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

公开(公告)号：US20020015430A1

公开(公告)日：2002-02-07

申请号：US09858147

申请日：2001-05-14

Applicant: Lambda Physik AG

Inventor： Rustem Osmanow ,  Uwe Stamm ,  Andreas Targsdorg

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/225 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/0975

Abstract: Method and system for providing an excimer or molecular fluorine laser including a laser tube filled with a laser gas surrounded by an optical resonator, where the laser tube has multiple electrodes including a pair of main discharge electrodes connected to a discharge circuit for exciting the laser gas to produce a laser output beam. The discharge circuit has an all solid state switch and preferably does not include a transformer. The solid state switch includes multiple solid state devices that may be capable of switching voltages in excess of 12 kV, such as 14-32 kV or more, or the voltage needed to switch the laser. The series of switches has a rise time of approximately less than 300 ns, and preferably around 100 ns or less. The switch may be capable of switching voltages of slightly more than half, but less than the entire voltage needed to produce laser pulses of desired energies, and a voltage doubling circuit may be used to produce the voltage required to produce the desired output pulse energies. An oscillator-amplifier configuration may be used, wherein an oscillator switch may be capable of switching voltages less than the entire voltage needed to produce the desired laser pulse energies, while the amplifier amplifies the pulses to the desired pulse energies.

Abstract translation: 用于提供准分子或分子氟激光的方法和系统，其包括填充有由光学谐振器包围的激光气体的激光管，其中激光管具有多个电极，其包括连接到用于激发激光气体的放电电路的一对主放电电极 以产生激光输出光束。 放电电路具有全固态开关，并且优选地不包括变压器。 固态开关包括多个固态器件，其能够切换超过12kV的电压，例如14-32kV或更高，或切换激光所需的电压。 该系列开关具有大约小于300ns的上升时间，优选地在约100ns以下。 该开关可能能够切换稍大于一半但小于产生所需能量的激光脉冲所需的整个电压的电压，并且可以使用倍压电路来产生产生所需输出脉冲能量所需的电压。 可以使用振荡器放大器配置，其中振荡器开关可以能够切换小于产生所需激光脉冲能量所需的整个电压的电压，而放大器将脉冲放大到期望的脉冲能量。