公开(公告)号：US20160377972A1

公开(公告)日：2016-12-29

申请号：US15107054

申请日：2014-12-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Ralf Hofmann ,  Majeed Foad ,  Cara Beasley

IPC: G03F1/22 ,  C03C17/245

Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.

Abstract translation: 一种极紫外线掩模及其制造方法包括：提供玻璃陶瓷块; 从玻璃陶瓷块形成玻璃陶瓷基板; 以及在所述玻璃 - 陶瓷衬底上沉积平坦化层。

公开(公告)号：US20160011502A1

公开(公告)日：2016-01-14

申请号：US14696325

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Vinayak Vishwanath Hassan ,  Cara Beasley ,  Majeed A. Foad

IPC: G03F1/24 ,  H01J37/34 ,  H01J37/32 ,  C23C16/44

CPC classification number: G03F7/702 ,  C23C14/0605 ,  C23C14/0635 ,  C23C14/14 ,  C23C16/44 ,  G02B1/14 ,  G02B5/085 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F7/70033 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  H01J37/32798 ,  H01J37/3429

Abstract: An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract translation: 一种制造极紫外反射元件的设备和方法包括：基片; 所述多层叠层包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和由用于形成布拉格反射器的铌或碳化铌形成的第二反射层; 以及多层堆叠上和上方的覆盖层，用于通过减少氧化和机械侵蚀来保护多层堆叠。

公开(公告)号：US20160011345A1

公开(公告)日：2016-01-14

申请号：US14696331

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Cara Beasley ,  Vinayak Vishwanath Hassan ,  Majeed A. Foad

IPC: G02B5/08 ,  C23C16/455 ,  C23C16/24 ,  G03F7/20

CPC classification number: G02B5/0891 ,  C23C14/06 ,  C23C14/14 ,  C23C16/24 ,  C23C16/45525 ,  G02B5/0833 ,  G02B5/0875 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/008

Abstract: An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract translation: 极紫外线反射元件及其制造方法包括：基板; 所述多层叠层包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和具有分隔下部非晶层和上部非晶层的预防层的第二反射层; 以及多层堆叠上和上方的覆盖层，用于通过减少氧化和机械侵蚀来保护多层堆叠。

公开(公告)号：US20150235847A1

公开(公告)日：2015-08-20

申请号：US14425578

申请日：2013-10-24

Applicant: Applied Materials, Inc.

Inventor： Cara Beasley ,  Ralf Hofmann ,  Majeed A. Foad

IPC: H01L21/02

CPC classification number: H01L21/02376 ,  B05D3/061 ,  B05D3/065 ,  B05D3/141 ,  B05D5/12 ,  C01B32/182 ,  C01B32/184 ,  C01B32/186 ,  C01B32/20 ,  H01L21/02318 ,  H01L21/0234 ,  H01L21/02345 ,  H01L21/0237 ,  H01L21/02527 ,  H01L21/02628 ,  H01L21/02664 ,  H01L21/288

Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

Abstract translation: 本文所述的实施方案提供了在基底上形成石墨碳如石墨烯的方法和装置。 该方法包括提供包含线性共轭烃的前体，在基底上沉积来自前体的烃层，以及通过向基底施加能量从烃层形成石墨烯。 前体可以包括模板分子，例如多核芳族化合物，并且可以通过旋转，喷雾，通过浸渍，或通过冷凝沉积在基材上。 能量可以作为辐射能，热能或等离子体能量施加。

公开(公告)号：US20200058213A9

公开(公告)日：2020-02-20

申请号：US16220351

申请日：2018-12-14

Applicant: Applied Materials, Inc.

Inventor： Vinayak Vishwanath Hassan ,  Majeed A. Foad ,  Cara Beasley ,  Ralf Hofmann

IPC: G08B25/00 ,  G06F17/15 ,  G08B13/196 ,  G06F16/44 ,  G06F16/435 ,  G06Q50/00 ,  G06F16/2457 ,  G06F16/25 ,  G08B31/00 ,  G06F16/248

Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

公开(公告)号：US10551732B2

公开(公告)日：2020-02-04

申请号：US16220351

申请日：2018-12-14

Applicant: Applied Materials, Inc.

Inventor： Vinayak Vishwanath Hassan ,  Majeed A. Foad ,  Cara Beasley ,  Ralf Hofmann

IPC: G03F1/54 ,  G03F1/22 ,  G03F1/24

Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

公开(公告)号：US10551731B2

公开(公告)日：2020-02-04

申请号：US15107054

申请日：2014-12-19

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Majeed Foad ,  Cara Beasley

IPC: C23C16/34 ,  G03F1/22 ,  C23C16/40 ,  C03C17/245

Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.

公开(公告)号：US10236198B2

公开(公告)日：2019-03-19

申请号：US15689550

申请日：2017-08-29

Applicant: Applied Materials, Inc.

Inventor： Banqiu Wu ,  Nag B. Patibandla ,  Toshiaki Fujita ,  Ralf Hofmann ,  Pravin K. Narwankar ,  Jeonghoon Oh ,  Srinivas Satya ,  Li-Qun Xia

IPC: C23C16/458 ,  H01L21/673 ,  H01L21/677 ,  C23C16/455 ,  C23C16/54

Abstract: Methods of processing a plurality of substrates using a processing chamber with bottom and top openings and a plurality of processing slots are provided. A substrate positioned on a carrier is loaded into a first end of a processing chamber body through the bottom opening. The carrier is moved through a plurality of processing slots to a top opening at a second end of the chamber body and then removed from the processing chamber through the top opening.

公开(公告)号：US09905418B2

公开(公告)日：2018-02-27

申请号：US15427367

申请日：2017-02-08

Applicant: Applied Materials, Inc.

Inventor： Cara Beasley ,  Ralf Hofmann ,  Majeed A. Foad

IPC: B05D5/12 ,  H01L21/02 ,  H01L21/288 ,  C01B31/04

CPC classification number: H01L21/02376 ,  B05D3/061 ,  B05D3/065 ,  B05D3/141 ,  B05D5/12 ,  C01B32/182 ,  C01B32/184 ,  C01B32/186 ,  C01B32/20 ,  H01L21/02318 ,  H01L21/0234 ,  H01L21/02345 ,  H01L21/0237 ,  H01L21/02527 ,  H01L21/02628 ,  H01L21/02664 ,  H01L21/288

Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

公开(公告)号：US09739913B2

公开(公告)日：2017-08-22

申请号：US14696322

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Cara Beasley ,  Ralf Hofmann ,  Majeed A. Foad ,  Rudy Beckstrom, III

IPC: G02B5/08 ,  G02B1/14 ,  G03F7/20

CPC classification number: G02B5/0891 ,  C23C14/083 ,  C23C14/14 ,  C23C14/568 ,  C23C14/5853 ,  C23C14/5873 ,  C23C28/32 ,  C23C28/3455 ,  G02B1/14 ,  G02B5/0816 ,  G02B5/085 ,  G03F1/24 ,  G03F1/48 ,  G03F7/20 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062

Abstract: A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.