公开(公告)号：US20170235236A1

公开(公告)日：2017-08-17

申请号：US15481405

申请日：2017-04-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

公开(公告)号：US20160004171A1

公开(公告)日：2016-01-07

申请号：US14839633

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20150323872A1

公开(公告)日：2015-11-12

申请号：US14762190

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜和/或配置反射镜形状的致动器（500）的反射镜（510），致动器还为反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：US20140347642A1

公开(公告)日：2014-11-27

申请号：US14456845

申请日：2014-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。

公开(公告)号：US20210063898A1

公开(公告)日：2021-03-04

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20200225590A1

公开(公告)日：2020-07-16

申请号：US16707525

申请日：2019-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Erik Theodorus Maria BIJLAART ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN ,  Antonius Theodorus Anna Maria DERKSEN ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20190302625A1

公开(公告)日：2019-10-03

申请号：US16435630

申请日：2019-06-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Erik Roelof LOOPSTRA

IPC: G03F7/20 ,  H05H7/04 ,  G02B1/06 ,  G01J1/04 ,  G01J1/42 ,  G01J1/26 ,  H01S3/09 ,  G02B5/20 ,  G02B26/02 ,  G21K1/10

Abstract: A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20190235397A1

公开(公告)日：2019-08-01

申请号：US16376535

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20180129143A1

公开(公告)日：2018-05-10

申请号：US15862604

申请日：2018-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Alexander STRAAIJER ,  Bob STREEFKERK

IPC: G03F7/20

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20180031982A1

公开(公告)日：2018-02-01

申请号：US15549132

申请日：2016-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang NIENHUYS ,  Erik Willem BOGAART ,  Rilpho Ludovicus Donker ,  Borgert KRUIZINGA ,  Erik Roelof LOOPSTRA ,  Hako BOTMA ,  Gosse Charles DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Johannes Jacobus Matheus BASELMANS

IPC: G03F7/20 ,  G02B5/02

Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.