Perpendicular magnetic write head, method of manufacturing the same and method of forming magnetic layer pattern
    31.
    发明授权
    Perpendicular magnetic write head, method of manufacturing the same and method of forming magnetic layer pattern 有权
    垂直写磁头,制造方法及形成磁性层图案的方法

    公开(公告)号:US08102622B2

    公开(公告)日:2012-01-24

    申请号:US12318645

    申请日:2009-01-05

    IPC分类号: G11B5/127

    摘要: In a perpendicular magnetic write head manufacturing method a magnetic layer is formed on a substrate. On the magnetic layer, first and second nonmagnetic layers are formed with different materials. A mask pattern is formed on the second nonmagnetic layer, and the second nonmagnetic layer in a region not covered with the mask pattern is removed. Thereby, the patterned second nonmagnetic layer is formed while leaving the first nonmagnetic layer. The mask pattern is removed and a milling process is selectively performed on the first nonmagnetic layer and the magnetic layer with the patterned second nonmagnetic layer as a mask to remove all of the first nonmagnetic layer in an exposed region and to dig down the magnetic layer in the exposed region, thereby forming a main magnetic pole layer having an inclined part whose thickness decreases with distance from an edge position of the patterned second nonmagnetic layer.

    摘要翻译: 在垂直磁性写入头制造方法中,在衬底上形成磁性层。 在磁性层上,第一和第二非磁性层由不同的材料形成。 在第二非磁性层上形成掩模图案,并且去除未被掩模图案覆盖的区域中的第二非磁性层。 由此,形成图案化的第二非磁性层,同时离开第一非磁性层。 去除掩模图案,并且在第一非磁性层和具有图案化的第二非磁性层的磁性层上选择性地进行研磨工艺作为掩模,以去除暴露区域中的所有第一非磁性层,并将 从而形成具有倾斜部分的主磁极层,该倾斜部分的厚度随着距图案化的第二非磁性层的边缘位置的距离而减小。

    Nitride semiconductor light emitting element
    32.
    发明授权
    Nitride semiconductor light emitting element 有权
    氮化物半导体发光元件

    公开(公告)号:US08004006B2

    公开(公告)日:2011-08-23

    申请号:US12084634

    申请日:2006-11-07

    IPC分类号: H01L33/00

    摘要: Provided are a nitride semiconductor light emitting element which does not suffer a damage on a light emitting region and has a high luminance without deterioration, even though the nitride semiconductor light emitting element is one in which electrodes are disposed opposite to each other and an isolation trench for chip separation and laser lift-off is formed by etching; and a manufacturing method thereof. An n-type nitride semiconductor layer 2 has a step, formed in a position beyond an active layer 3 when viewed from a p side. Up to the position of this step A, a protective insulating film 6 covers a part of the n-type nitride semiconductor layer 2, the active layer 3, a p-type nitride semiconductor layer 4, the side of a p electrode 5 and a part of the top side of the p electrode 5. The use of a structure having a chip side face covered with the protective insulating film 6 prevents the active layer or the like from being exposed to an etching gas for a long time when an isolation trench for chip separation or laser lift-off is formed by etching.

    摘要翻译: 提供一种氮化物半导体发光元件,即使氮化物半导体发光元件是彼此相对设置的电极和隔离沟槽,也不会对发光区域造成损害并具有高亮度而不劣化 通过蚀刻形成芯片分离和激光剥离; 及其制造方法。 当从p侧观察时,n型氮化物半导体层2具有形成在超过有源层3的位置的台阶。 直到该步骤A的位置,保护绝缘膜6覆盖n型氮化物半导体层2,有源层3,p型氮化物半导体层4,p型电极5的一侧以及部分 使用由保护绝缘膜6覆盖的具有芯片侧面的结构使得有源层等长时间暴露于蚀刻气体时,当用于 通过蚀刻形成芯片分离或激光剥离。

    COUNTER-ROTATING AXIAL FLOW FAN
    34.
    发明申请
    COUNTER-ROTATING AXIAL FLOW FAN 有权
    逆转轴流风扇

    公开(公告)号:US20110142614A1

    公开(公告)日:2011-06-16

    申请号:US12967196

    申请日:2010-12-14

    IPC分类号: F04D29/52 F04D19/02

    摘要: A counter-rotating axial flow fan with reduced noise at the target operating point achieved without modifying a front impeller, a rear impeller, or a middle stationary portion is provided. An annular rib including a projecting surface for generating turbulent flow is formed on an inner wall portion of a casing at a position off from the middle stationary portion to a side of the rear impeller, the projecting surface extending radially inwardly of the inner wall portion and extending continuously in the circumferential direction of the inner wall portion. A fluid striking the projecting surface for generating turbulent flow is partially disturbed to form a turbulent flow before entering an area in which the rear impeller is provided. The turbulent flow suppresses flow separation of a fluid flowing along the surfaces of rear blades of the rear impeller from the surfaces of the rear blades.

    摘要翻译: 提供了在不改变前叶轮,后叶轮或中间静止部分的情况下实现在目标操作点处具有降低的噪声的反向旋转轴流风扇。 在从中间静止部分到后部叶轮的一侧的位置处,在壳体的内壁部分上形成包括用于产生湍流的突出表面的环形肋,所述突出表面沿着内壁部分的径向向内延伸, 在内壁部的圆周方向上连续延伸。 撞击突出表面以产生湍流的流体在进入其中设置后叶轮的区域之前部分地被扰动以形成湍流。 湍流抑制沿着后叶片的后叶的表面流动的流体与后叶片的表面的流动分离。

    Beam irradiation apparatus
    38.
    发明授权
    Beam irradiation apparatus 有权
    光束照射装置

    公开(公告)号:US07773281B2

    公开(公告)日:2010-08-10

    申请号:US12496334

    申请日:2009-07-01

    IPC分类号: G02B26/08

    摘要: A beam irradiation apparatus includes: an optical element which changes a travel direction of a laser beam by being rotated in a predetermined direction; an actuator which rotates the optical element in the direction; a refractive element which is disposed in the actuator and rotates in association with rotation of the optical element; a servo beam source which emits a servo beam to the refractive element; a photodetector which receives the servo beam refracted by the refractive element and outputs a signal according to a position where the servo beam is received; and a power adjustment circuit which adjusts emission power of the servo beam source. The power adjustment circuit adjusts the emission power so that a reception amount of the servo beam in the photodetector becomes constant based on an output signal from the photodetector.

    摘要翻译: 光束照射装置包括:光学元件,其通过沿预定方向旋转来改变激光束的行进方向; 沿该方向旋转光学元件的致动器; 折射元件,设置在致动器中并与光学元件的旋转相关联地旋转; 将伺服光束发射到折射元件的伺服光束源; 接收由折射元件折射的伺服光束并根据接收伺服光束的位置输出信号的光电检测器; 以及调整伺服光束源的发射功率的功率调节电路。 功率调整电路基于来自光电检测器的输出信号来调整发光功率,使得光电检测器中的伺服光束的接收量变得恒定。

    Beam irradiation apparatus
    39.
    发明授权
    Beam irradiation apparatus 失效
    光束照射装置

    公开(公告)号:US07773277B2

    公开(公告)日:2010-08-10

    申请号:US12047038

    申请日:2008-03-12

    IPC分类号: G02B26/08

    摘要: A light refracting element formed in parallel plate shape is attached to a support shaft of a mirror holder, a semiconductor laser and a PSD are disposed at positions between which the light refracting element is sandwiched. The light refracting element is rotated by rotation of the mirror holder, and whereby a laser beam irradiation position is changed on a light acceptance surface of PSD. The laser beam irradiation position on a light acceptance surface corresponds to the mirror rotation position, so that the mirror rotation position and a laser beam scanning position in a target area can be detected based on an output from the PSD.

    摘要翻译: 形成为平行板状的光折射元件被安装在镜保持器的支撑轴上,半导体激光器和PSD被设置在夹着光折射元件的位置。 光折射元件通过镜保持器的旋转而旋转,并且由此在PSD的光接收表面上改变激光束照射位置。 光接收表面上的激光束照射位置对应于反射镜旋转位置,从而可以基于PSD的输出来检测目标区域中的反射镜旋转位置和激光束扫描位置。

    BEAM IRRADIATION DEVICE AND LASER RADAR SYSTEM
    40.
    发明申请
    BEAM IRRADIATION DEVICE AND LASER RADAR SYSTEM 失效
    光束辐射装置和激光雷达系统

    公开(公告)号:US20100188648A1

    公开(公告)日:2010-07-29

    申请号:US12695497

    申请日:2010-01-28

    IPC分类号: G01C3/08 G01J1/20

    摘要: A beam irradiation device includes: a laser light source for emitting laser light; an actuator which scans a targeted area with the laser light; a servo optical system which changes a propagating direction of servo light in response to driving of the actuator; a photodetector which receives the servo light to output a signal depending on a light receiving position of the servo light; an actuator controlling section which controls the actuator based on the signal to be outputted from the photodetector; and a laser controlling section which controls the laser light source based on the signal to be outputted from the photodetector. The laser controlling section controls the laser light source to emit the laser light in a pulse manner at a timing when the light receiving position of the servo light coincides with a predetermined targeted position.

    摘要翻译: 光束照射装置包括:用于发射激光的激光源; 用激光扫描目标区域的致动器; 伺服光学系统,其响应于致动器的驱动而改变伺服光的传播方向; 接收所述伺服光以根据所述伺服光的光接收位置输出信号的光电检测器; 致动器控制部,其基于从所述光检测器输出的信号来控制所述致动器; 以及激光控制部,其基于从光电检测器输出的信号来控制激光光源。 在伺服光的光接收位置与预定目标位置一致的时刻,激光控制部分控制激光光源以脉冲方式发射激光。