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公开(公告)号：US10698248B2
公开(公告)日：2020-06-30
申请号：US15810591
申请日：2017-11-13
Applicant: BOE Technology Group Co., Ltd.
Inventor： Shi Shu , Chuanxiang Xu , Teng Luo , Feng Gu
IPC: G02F1/1335 , G02F1/1339 , G02F1/1368 , G02F1/1362 , G02F1/1343 , G02F1/1333
Abstract: The present disclosure provides a counter substrate, a display panel, a display device, and fabricating method, further simplifying the fabricating process of the display panel by reducing the number of masking times required during the making of a spacer pattern and a frame light shielding pattern while achieving the frame light shielding function of the counter substrate and getting the counter substrate conductive with an array substrate. The fabricating method of the counter substrate comprises: forming a transparent electrode layer on a first base substrate; forming a black spacer pattern and a frame light shielding pattern at the same time on the transparent electrode layer, wherein the frame light shielding pattern comprises a first via hole that exposes a portion of the transparent electrode layer; and forming a conductive light shielding layer pattern in the first via hole.
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公开(公告)号：US10690834B2
公开(公告)日：2020-06-23
申请号：US16144188
申请日：2018-09-27
Inventor： Huijuan Wang , Yunyun Tian , Zezhou Yang , Yonglian Qi , Dejiang Zhao , Minqi Chen , Tao Liu , Shi Shu
Abstract: The present disclosure relates to the field of display technologies, and especially discloses a backlight device and a method for manufacturing the same. The backlight device includes a backlight source, a light guide plate, a reflective layer, an optical adhesive layer and an outcoupling structure. Specifically, in the backlight device, the reflective layer and the light guide plate are located on opposite sides of the backlight source respectively.
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33.发明授权公开(公告)号：US10504944B2
公开(公告)日：2019-12-10
申请号：US15768634
申请日：2017-10-30
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Shi Shu , Chuanxiang Xu , Teng Luo , Feng Gu , Bin Zhang
IPC: H01L27/12 , G02F1/1362 , H01L29/417 , H01L29/423 , H01L29/66 , H01L29/786 , G02F1/1368 , H01L27/32 , G02F1/1343 , H01L21/02 , H01L21/30
Abstract: A method for fabricating a thin film transistor includes providing a substrate (100); forming a semiconductor layer (105) over the substrate (100); forming a source-drain metal layer (106) over the semiconductor layer (105); applying one patterning process to the semiconductor layer (105) and the source-drain metal layer (106) to form an active layer (1), a source electrode (2), and a drain electrode (3); forming a gate insulating layer (101) and an interlayer insulating layer (102) that cover the active layer (1), the source electrode (2), and the drain electrode (3); applying a patterning process to the interlayer insulating layer (102) to form a first window (10) in the interlayer insulating layer (102) to expose a portion of the gate insulating layer (101); and forming a gate electrode (4) in the first window (10). An orthogonal projection of the gate electrode (4) on the substrate (100) is in an orthogonal projection of the active layer (1) on the substrate (100).
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公开(公告)号：US10281782B2
公开(公告)日：2019-05-07
申请号：US15229601
申请日：2016-08-05
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Zhengliang Li , Shi Shu , Zhanfeng Cao , Bin Zhang , Xiaolong He , Qi Yao , Jincheng Gao , Feng Guan , Xuefei Sun
IPC: H01L21/02 , G02F1/1362 , H01L27/12
Abstract: A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes the following operations: forming a light shielding layer formed of a metal blacken production on a base substrate, wherein the metal blacken production is a product by blackening a metal; forming a preset film layer on the base substrate which is provided with the light shielding layer; forming both a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process. The method of forming a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process saves one patterning process.
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公开(公告)号：US20190097179A1
公开(公告)日：2019-03-28
申请号：US16120944
申请日：2018-09-04
Applicant: BOE Technology Group Co., Ltd.
Inventor： Shi Shu , Chuanxiang Xu , Jiangnan Lu
CPC classification number: H01L51/5284 , H01L27/322 , H01L27/3244 , H01L27/3248 , H01L27/3276 , H01L51/5253 , H01L51/56 , H01L2227/323
Abstract: An array substrate, a method of preparing the array substrate, and a display panel are provided, the method of preparing the array substrate includes: providing a base substrate; forming a plurality of light emitting devices arranged in an array on the base substrate; covering the base substrate, on which the plurality of light emitting devices are formed, with a black matrix material; activating the plurality of light emitting devices to expose the black matrix material; and developing the exposed black matrix material to form a black matrix.
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Patent Agency Ranking
36.发明授权公开(公告)号：US10108089B2
公开(公告)日：2018-10-23
申请号：US14437047
申请日：2014-06-23
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Jingxia Gu , Shi Shu , Feng Zhang , Guanbao Hui
Abstract: The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.
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公开(公告)号：US09893129B2
公开(公告)日：2018-02-13
申请号：US14351639
申请日：2013-06-19
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yonglian Qi , Shi Shu , Guanbao Hui
IPC: H01L27/32 , G02F1/1368 , H01L51/56 , H01L21/768 , H01L23/535 , G02F1/1362 , H01L27/12
CPC classification number: H01L27/3248 , G02F1/1362 , G02F1/1368 , G02F2001/136222 , H01L21/76802 , H01L21/76877 , H01L23/535 , H01L27/1259 , H01L27/322 , H01L51/56 , H01L2227/323 , H01L2924/0002 , H01L2924/00
Abstract: A method for fabricating a COA array substrate, an array substrate and a display device are provided. The fabrication method comprises the following steps: forming a protection layer (12) on the TFT substrate (11); coating a photoresist layer (21) on the protection layer (12), the photoresist layer (12) functioning as a planarized layer (14), wherein the TFT substrate (11) comprises a substrate (111) and a TFT (112); forming a color filter receiving hole (32) in the photoresist layer (21) through a photolithography process; fabricating the color filter layer (31) in the color filter receiving hole (32). The above fabrication method can reduce the complexity and cost of conventional method for fabricating the array substrate.
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38.发明申请公开(公告)号：US20170365684A1
公开(公告)日：2017-12-21
申请号：US15519324
申请日：2016-09-01
Applicant: BOE Technology Group Co., Ltd.
Inventor： Bin Zhang , Tingting Zhou , Zhen Liu , Zhanfeng Cao , Shi Shu , Qi Yao , Feng Guan
IPC: H01L29/66 , H01L27/12 , H01L21/027 , G03F7/40 , G03F7/20 , H01L29/786 , G03F7/16
CPC classification number: H01L29/6675 , G03F7/094 , G03F7/16 , G03F7/20 , G03F7/201 , G03F7/2022 , G03F7/2026 , G03F7/203 , G03F7/40 , H01L21/027 , H01L21/0274 , H01L27/12 , H01L29/78621 , H01L29/7869
Abstract: A method for forming a mask pattern is provided, comprising forming a negative photoresist on a substrate; in an environment without oxygen, to performing a first exposure on the negative photoresist by use of a first ordinary mask plate, so that a fully-cured portion of the negative photoresist is exposed to light and a semi-cured portion and a removed portion of the negative photoresist are not exposed to light; in an environment with oxygen, performing a second exposure on the negative photoresist by use of a second ordinary mask plate, so that the semi-cured portion of the negative photoresist is exposed to light and the removed portion of the negative photoresist not exposed to light; removing the uncured negative photoresist and forming the mask pattern.
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公开(公告)号：US09825256B2
公开(公告)日：2017-11-21
申请号：US14429372
申请日：2014-05-27
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yonglian Qi , Shi Shu
CPC classification number: H01L51/5262 , H01L27/322 , H01L27/3246 , H01L27/3248 , H01L51/5206 , H01L51/5237 , H01L51/5284
Abstract: The present invention relates to the field of display technology, and particularly to a display panel and a display device comprising the display panel. The display panel comprises a substrate, which is divided into a plurality of sub-pixel areas, each of which comprises a thin film transistor and an organic light-emitting diode device provided above the thin film transistor, wherein, a pixel define layer and a conductive layer are provided above the thin film transistor and below the organic light-emitting diode device, the pixel define layer is used for defining a light-transmissive region and a non-light-transmissive region of the sub-pixel area, an upper surface of the conductive layer and an upper surface of the pixel define layer are in the same plane, and the conductive layer is electrically connected to a drain of the thin film transistor.
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40.发明授权公开(公告)号：US09735195B2
公开(公告)日：2017-08-15
申请号：US14913174
申请日：2015-07-21
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Shi Shu , Jincheng Gao , Chuanxiang Xu , Feng Zhang
IPC: H01L27/146 , H01L27/144 , H01L31/02 , H01L31/0224 , H01L31/0232 , H01L31/115
CPC classification number: H01L27/14685 , H01L27/1443 , H01L27/1446 , H01L27/14612 , H01L27/1462 , H01L27/14629 , H01L27/14636 , H01L27/14658 , H01L31/022408 , H01L31/02327 , H01L31/115
Abstract: An array substrate and manufacturing method thereof, an X-ray flat panel detector and an image pickup system are provided. The array substrate is divided into a plurality of detection units, and each of the detection units has a first electrode and a photoelectric conversion structure provided therein. The first electrode is disposed on a side of the photoelectric conversion structure opposite to a light incident side, and is electrically connected to the photoelectric conversion structure. A reflective layer that is electrically conductive is further included between the first electrode and the photoelectric conversion structure, and a surface of the reflective layer facing the photoelectric conversion structure is a reflection surface. The utilization rate of light can be enhanced by the array substrate as stated in embodiments of the invention, so that the detection accuracy of the X-ray flat panel detector is enhanced.
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