Methods for making optical devices
    32.
    发明授权

    公开(公告)号:US09946084B2

    公开(公告)日:2018-04-17

    申请号:US15228245

    申请日:2016-08-04

    Inventor: Jue Wang

    CPC classification number: G02B27/149 C03C27/06 G02B1/18 G02B27/142

    Abstract: Described herein are methods for constructing optical device without the need of chemical adhesives. The methods involve performing the following steps: obtaining a first optical substrate comprising a first surface and a second optical substrate comprising a second surface; applying water to the first surface of the first optical substrate, to the second surface of the second optical substrate, or both; securing the first optical substrate to the second optical substrate, wherein the first surface of the first optical substrate is adjacent to the second surface of the second optical substrate; and applying deep ultraviolet radiation to the first optical substrate and the second optical substrate to form a bond without the use of adhesive. Also provided are optical devices constructed by the methods described herein.

    METHODS OF REDUCING SURFACE ROUGHNESS OF REFLECTANCE COATINGS FOR DUV MIRRORS

    公开(公告)号:US20180017719A1

    公开(公告)日:2018-01-18

    申请号:US15649736

    申请日:2017-07-14

    CPC classification number: G02B5/0833 G02B1/14 G02B5/0891

    Abstract: A method of reducing surface roughness of DUV reflectance coatings for a DUV mirror to improve the reflectance of the DUV mirror includes: forming the reflectance coating on a substrate, the reflectance coating including a film stack comprising multiple dielectric layers, including an uppermost layer. The method also includes adding to the uppermost layer a cap layer comprising SiO2 and having an upper surface with an initial RMS amount of surface roughness. The method further includes adding a sacrificial layer to the upper surface of the cap layer, wherein the sacrificial layer comprises SiO2. The method also includes etching the sacrificial layer down to the cap layer so that the upper surface of the cap layer has a final RMS amount of surface roughness that is less than the initial amount of surface roughness.

    UV AND DUV EXPANDED COLD MIRRORS
    35.
    发明申请
    UV AND DUV EXPANDED COLD MIRRORS 有权
    UV和DUV扩展冷镜

    公开(公告)号:US20150219805A1

    公开(公告)日:2015-08-06

    申请号:US14602550

    申请日:2015-01-22

    CPC classification number: G02B5/0891 G02B1/10 G02B1/12 G02B5/0833 G02B5/283

    Abstract: An expanded cold mirror is provided. The mirror includes a substrate and a coating deposited on the substrate. The coating includes a first coating stack comprising at least one period of a low refractive index metal oxide coating layer and a high refractive index metal oxide coating layer, a second coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal oxide layer, and a third coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal fluoride coating layer.

    Abstract translation: 提供扩展的冷镜。 反射镜包括沉积在基底上的基底和涂层。 所述涂层包括第一涂层叠层,其包括至少一个低折射率金属氧化物涂层和高折射率金属氧化物涂层的周期,第二涂层叠层,包括至少一个低折射率金属氟化物涂层的周期;以及 高折射率金属氧化物层和包含低折射率金属氟化物涂层和高折射率金属氟化物涂层的至少一个周期的第三涂层叠层。

    ENHANCED, DURABLE SILVER COATING STACKS FOR HIGHLY REFLECTIVE MIRRORS
    36.
    发明申请
    ENHANCED, DURABLE SILVER COATING STACKS FOR HIGHLY REFLECTIVE MIRRORS 有权
    增强,耐高温银涂层用于高反射镜

    公开(公告)号:US20140240821A1

    公开(公告)日:2014-08-28

    申请号:US13834230

    申请日:2013-03-15

    CPC classification number: G02B5/0858 G02B1/14 G02B5/0808 G02B5/0816

    Abstract: The disclosure is directed to a highly reflective multiband mirror that is reflective in the VIS-NIR_SWIR-MWIR-LWIR bands, the mirror being a complete thin film stack that consists of a plurality of layers on a selected substrate. In order from substrate to the final layer, the mirror consists of (a) substrate, (b) barrier layer, (c) first interface layer, (d) a reflective layer, (e) a second interface layer, (f) tuning layer(s) and (g) a protective layer. In some embodiments the tuning layer and the protective are combined into a single layer using a single coating material. The multiband mirror is more durable than existing mirrors on light weight metal substrates, for example 6061-Al, designed for similar applications. In each of the five layer types methods and materials are used to process each layer so as to achieve the desired layer characteristics, which aid to enhancing the durability performance of the stack.

    Abstract translation: 本公开涉及在VIS-NIR_SWIR-MWIR-LWIR带中是反射性的高反射多波束镜,镜是由选定基底上的多个层组成的完整薄膜叠层。 按照从底层到最终层的顺序,反射镜由(a)衬底,(b)阻挡层,(c)第一界面层,(d)反射层,(e)第二界面层,(f)调谐 层和(g)保护层。 在一些实施例中,调谐层和保护层使用单一涂层材料组合成单层。 多镜像镜比现有的镜子在轻质金属基底上更耐用,例如适用于类似应用的6061-Al。 在五层类型中的每一种中,使用方法和材料来处理每层,以便实现期望的层特性,这有助于提高堆的耐久性能。

    PLASMA ION ASSISTED DEPOSITION OF Mo/Si MULTILAYER EUV COATINGS
    37.
    发明申请
    PLASMA ION ASSISTED DEPOSITION OF Mo/Si MULTILAYER EUV COATINGS 有权
    等离子体辅助沉积Mo / Si多层EUV涂层

    公开(公告)号:US20130314773A1

    公开(公告)日:2013-11-28

    申请号:US13956816

    申请日:2013-08-01

    Abstract: The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2 nm to 5 nm, and the thicknesses are controlled to ±0.1 nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.

    Abstract translation: 本公开涉及用于极紫外光刻系统的反射镜的多层Mo / Si涂层以及使用等离子体离子辅助沉积(PIAD)技术制造这种反射镜的方法。 涂层沉积在适用于EUV光刻的基板上,并且是由40-100Mo / Si周期组成的Mo / Si涂层,每个周期由Mo层和Si层组成。 将各个Mo和Si层分别沉积到2nm至5nm范围内的规定或目标厚度,并将其厚度控制在±0.1nm。 使用来自等离子体源的等离子体在沉积涂层之前使衬底致密化和平滑化,并且涂层的每层是等离子体致密化和平滑化的。

    ATOMIC LAYER DEPOSITION DERIVED PROTECTIVE COATINGS FOR CALCIUM FLUORIDE OPTICAL COMPONENTS

    公开(公告)号:US20230123796A1

    公开(公告)日:2023-04-20

    申请号:US17965122

    申请日:2022-10-13

    Abstract: A coated optical component includes an optical component and a conformal coating. The optical component is crystalline calcium fluoride and the conformal coating is an atomic layer deposition (ALD) coating in contact with a surface of the optical component. The ALD coating includes a metal fluoride ALD coating having a metal different from calcium. The ALD coating can include other metal oxide or metalloid oxide ALD coating layers. The method for making the coated optical component includes depositing an atomic layer deposition (ALD) coating on a surface of the optical component, where the ALD coating can be a metalloid oxide, a metal oxide, a metal fluoride having a metal that is different from calcium, or combinations of these. Sulfur hexafluoride is used as a fluorine source in the ALD process.

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