摘要:
A disk drive and method are provided for controlling seeking of a transducer that is adjacent to a rotatable data storage disk in a disk drive. The disk drive includes an actuator for positioning the transducer relative to the disk, the method comprising. The actuator is controlled to move the transducer toward a target track on the disk during an initial phase of a seek mode during which the transducer is primarily accelerated toward the target track. During a settle phase of the seek mode which follows the initial phase the actuator is controlled to settle the transducer onto the target track. An initial position, an initial velocity, and an initial acceleration of the transducer are determined at a phase switch time at about when control of the actuator switches from the initial phase to the settle phase of the seek mode. Feed-forward control information is generated based on the determined initial position, initial velocity, and initial acceleration of the transducer. The actuator is controlled responsive to the feed-forward control information to settle the transducer onto the target track during the settle phase of the seek mode.
摘要:
A drain (7) includes a lightly-doped shallow impurity region (7a) aligned with a control gate (5), and a heavily-doped deep impurity region (7b) aligned with a sidewall film (8) and doped with impurities at a concentration higher than that of the lightly-doped shallow impurity region (7a). The lightly-doped shallow impurity region (7a) leads to improvement of the short-channel effect and programming efficiency. A drain contact hole forming portion (70) is provided to the heavily-doped impurity region (7b) to reduce the contact resistance at the drain (7).
摘要:
The present invention is directed to a method and apparatus for detecting and monitoring a bi-state head when self-servowriting a disk drive. In one embodiment, an integration window is opened about an expected time that a read head will read spiral servo information. An integration value associated with the integration window is determined. Next, a determination is made as to whether the integration value is less than a predetermined low amplitude limit. If it is, a comparison is made between a location of a maximum sync frame of a read signal envelope in the integration window and the center of the integration window. The read head is identified as a bi-state head if the location of the maximum sync frame is greater than a predetermined off-center limit relative to the location of the center of the integration window.
摘要:
A disk drive includes a transducer and a rotatable disk, which includes a plurality of tracks. A vibration state of the transducer relative to the disk is determined. The transducer is positioned relative one of the tracks based on a compensation scheme that varies based on the determination of the vibration state. The compensation scheme may be varied by selecting among output of two or more compensators, based on the determined of the vibration state of the transducer, to control positioning of the transducer. The compensation scheme may alternatively, or additionally, be varied by varying a contribution from a vibration state actuator compensator to the control of positioning of the transducer. The vibration state actuator compensator is configured to improve transducer track following while the transducer is subjected to vibration.
摘要:
More efficient use of silicon area is achieved by incorporating an electrostatic discharge protective (ESDP) device beneath a pad area of a semiconductor structure. The pad area includes a substrate having a first metal layer above it. A second metal layer is above the first metal layer. The ESDP device resides in the substrate below the first metal layer. A layer of dielectric separates the first and second metal layers. A via within the dielectric layer electrically couples the first and second metal layers. A via connects to the ESDP component. Subsequent metal layers can be arranged between the first and second metal layers. The Ohmic value of the resistance component of the ESDP device can be set during fabrication by fixing a number of individual via components, arranged electrically in parallel, by fixing the cross sectional area of the via components, and/or by fixing the length of the via components.
摘要:
The present invention relates to an oxidation reaction catalyzed by a reaction controlled phase-transfer catalyst having the general formula of [R1R2R3R4N]xHy[A] or QmMO3(L). The catalysts themselves are not soluble in the reaction medium, but can form an active species that is soluble in the reaction medium under the action of one of the reactants. The active species can in turn react selectively with another reactant. When one of the reactants is completely consumed, the catalyst will separated out from the reacting system and can be recovered by means of simple separation method. The recovered catalyst can be recycled with comparable efficiency as that of the original catalyst. The separation of said catalyst is similar to that of heterogeneous catalyst while said catalyst will completely exhibit the characteristics of homogeneous catalyst during the reaction. The catalytic oxidation reaction system is especially suitable for the large-scale industrial production of epoxy cyclohexane from cyclohexene or of epoxy propane from propylene.
摘要:
One aspect of the present invention provides a process for forming IC devices with ESD protection transistors. According to one aspect of the invention, an ESD protection transistor is provided with a light doping and then, after forming spacers, a heavy doping. The heavy doping with spacers in place can lower the sheet resistance, enhance the bipolar effect for the transistor, reduce the transistor's capacitance, and reduce the junction breakdown voltage, all without causing short channel effects. The invention thereby provides ESD protection transistors that are compact, highly sensitive, and fast-switching. The spacers can be formed at the same time as spacers for other transistors, such as other transistors in a peripheral region of the device.
摘要:
A method and apparatus are disclosed which allow for compensation of repeatable runout in a disk drive when an actuator arm assembly has a relatively high friction to inertia ratio in a pivot bearing assembly. The compensation uses one of two initial runout coefficients, based on a seek length. If the seek length is shorter than a predetermined distance, a current runout coefficient is used to compensate for repeatable runout which is continuously updated throughout a previous seek operation. If the seek length is greater than the predetermined distance, a transient runout coefficient is used to compensate for repeatable runout which is updated following the initial revolutions of the hard disk.
摘要:
The present invention provides a process for saliciding the word lines in a virtual ground array flash memory device without saliciding the substrate between word lines. According to the invention, in a process for manufacturing virtual ground array flash memory devices, a salicide protect layer covers the substrate between word lines in the core region while the tops of the word lines are exposed. The salicide protect layer can be brought into the desired configuration by one or more of masking the substrate between word lines during an etching process, removing salicide protection material in the core by polishing, and forming a comparatively thick layer of salicide protection material in the core whereby the tendency of the salicide protect layer to follow the contour of the underlying structures is reduced. With the substrate between word lines protected by the salicide protect layer, the word lines are salicided. The process of the invention produces virtual ground array flash memory devices with salicided word lines, but without shorting between bit lines.
摘要:
A semiconductor chip having a plurality of flash memory devices, shallow trench isolation in the periphery region, and LOCOS isolation in the core region. A hard mask is used first to create the shallow trench isolation. The LOCOS isolation is then created. Subsequent etching is used to remove stringers. The flash memory is able to use shallow trench isolation to limit encroachment. The flash memory may also have a nitridated tunnel oxide barrier layer. A hard mask is used to prevent nitride contamination of the gate oxide layer.